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    • 42. 发明授权
    • Magnetoresistance effect element, magnetic head, and magnetic reproducing apparatus
    • 磁阻效应元件,磁头和磁再现装置
    • US07218484B2
    • 2007-05-15
    • US10659299
    • 2003-09-11
    • Susumu HashimotoKatsuhiko KouiMasashi SahashiHitoshi Iwasaki
    • Susumu HashimotoKatsuhiko KouiMasashi SahashiHitoshi Iwasaki
    • G11B5/39
    • H01L43/08G11B5/3906H01L43/12Y10T428/1121
    • A magnetoresistance effect element comprises: a magnetoresistance effect film, a pair of electrodes, and a phase separation layer. The magnetoresistance effect film includes a first ferromagnetic layer whose direction of magnetization is pinned substantially in one direction, a second ferromagnetic layer whose direction of magnetization changes in response to an external magnetic field, and an intermediate layer provided between the first and second ferromagnetic layers. The pair of electrodes are electrically coupled to the magnetoresistance effect film and configured to supply a sense current perpendicularly to a film plane of the magnetoresistance effect film. The phase separation layer is provided between the pair of electrodes. The phase separation layer has a first phase and a second phase formed by a phase separation in a solid phase from an alloy including a plurality of elements. One of the first and second phases includes at least one element selected from the group consisting of oxygen, nitrogen, fluorine and carbon in higher concentration than other of the first and second phases.
    • 磁阻效应元件包括:磁阻效应膜,一对电极和相分离层。 磁阻效应膜包括其磁化方向基本上被固定在一个方向上的第一铁磁层,其磁化方向响应于外部磁场而变化的第二铁磁性层和设置在第一和第二铁磁层之间的中间层。 一对电极电耦合到磁阻效应膜并且被配置为提供垂直于磁阻效应膜的膜平面的感测电流。 相分离层设置在该对电极之间。 相分离层具有通过从包含多个元素的合金固相中相分离而形成的第一相和第二相。 第一和第二相中的一个包括选自氧,氮,氟和碳中的至少一种元素,其浓度高于第一相和第二相中的其它相。
    • 45. 发明授权
    • Magnetoresistance effect device having hard magnetic film structural body
    • 具有硬磁性膜结构体的磁阻效应器件
    • US07116527B1
    • 2006-10-03
    • US08940020
    • 1997-09-29
    • Hideaki FukuzawaShin-ichi NakamuraYuzo KamiguchiHitoshi IwasakiAkio HoriSusumu Hashimoto
    • Hideaki FukuzawaShin-ichi NakamuraYuzo KamiguchiHitoshi IwasakiAkio HoriSusumu Hashimoto
    • G11B5/33
    • G11B5/3932B82Y25/00H01F10/132H01F10/16H01F10/3281H01L43/08
    • A base film of a hard magnetic film containing Co as a structural element has a crystal metal base film such as a Cr film formed on the main surface of a substrate and a reactive base film (mixing layer) formed between the substrate and the crystal metal base film and having a reactive amorphous layer containing a structural element of the substrate and a structural element of the crystal metal base film. A hard magnetic film containing Co as a structural element is formed on the crystal metal base film. With the crystal metal base film such as the Cr film formed on an amorphous layer, a hard magnetic film with a bi-crystal structure can be obtained with high reproducibility. With the hard magnetic film, magnetic characteristics such as coercive force Hc, residual magnetization Mr, saturated magnetization Ms, and square ratio S can be improved without need to use a thick base film. The hard magnetic film containing Co as a structural element is applied to a bias magnetic field applying film of a magnetoresistance effect device and a record layer of a magnetic record medium.
    • 含有Co作为结构元件的硬磁性膜的基膜具有形成在基板的主表面上的Cr膜等晶体金属基膜和在基板和结晶金属之间形成的反应性基膜(混合层) 并且具有包含基板的结构元件的反应性非晶层和晶体金属基膜的结构元件。 在晶体金属基膜上形成含有Co作为结构元素的硬磁性膜。 利用在非晶层上形成的Cr膜等晶体金属基膜,可以以高再现性获得具有双晶结构的硬磁性膜。 对于硬磁性膜,可以提高矫顽力Hc,剩余磁化强度Mr,饱和磁化强度Ms和平方比S等磁特性,而无需使用厚基膜。 含有Co作为结构元件的硬磁性膜被施加到磁阻效应装置的偏磁场施加膜和磁记录介质的记录层。