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41. 发明申请

US20050204824A1 Device and system for pressure sensing and control 审中-公开
标题翻译：用于压力感测和控制的装置和系统
公开(公告)号：US20050204824A1
公开(公告)日：2005-09-22
申请号：US10805742
申请日：2004-03-22
申请人： Daniel Goodman
发明人： Daniel Goodman
IPC分类号： B65D51/18 , F16K37/00
CPC分类号： F16K37/0091
摘要： Embodiments of the present invention provide devices and systems in which pressure sensing and pressure control capabilities are integrated. One embodiment of the present invention can include a device for pressure sensing and control comprising a sensor portion operable to sense a pressure and a control portion. The control portion can be operable to compare the sensed pressure to a set point; generate a control signal based on a difference between the sensed pressure and the set point; and output the control signal. The sensor portion and the control sensor portion and control portion can be integrated in a housing.
摘要翻译：本发明的实施例提供集成了压力感测和压力控制能力的装置和系统。本发明的一个实施例可以包括用于压力感测和控制的装置，包括可操作以感测压力的传感器部分和控制部分。控制部分可操作以将感测的压力与设定点进行比较; 基于感测到的压力和设定点之间的差产生控制信号; 并输出控制信号。传感器部分和控制传感器部分和控制部分可以集成在壳体中。

42. 发明申请

US20050057165A1 Methods and apparatus for calibration and metrology for an integrated RF generator system 失效
标题翻译：用于集成射频发生器系统的校准和计量的方法和装置
公开(公告)号：US20050057165A1
公开(公告)日：2005-03-17
申请号：US10897580
申请日：2004-07-23
申请人： Daniel Goodman
发明人： Daniel Goodman
IPC分类号： H01J37/32 , H05B31/26
CPC分类号： H01J37/32935 , H01J37/32082
摘要： The invention features RF plasma generation systems, methods for operating the systems, methods for calibrating the systems, and calibration apparatus. One RF plasma generation system includes an impedance matching network having an input port to receive an RF signal from an RF generator, and an output port to deliver the RF signal to an input port of a plasma vessel associated with a load. The system includes an RF signal probe in electromagnetic communication with the input port of the impedance matching network to detect at least one RF signal parameter associated with the RF signal at the input port of the impedance matching network. The system can include a calibration storage unit that stores calibration data. The calibration data includes an association of values of the RF signal parameter with values of at least one characteristic of the load.
摘要翻译：本发明的特征在于RF等离子体生成系统，用于操作系统的方法，用于校准系统的方法以及校准装置。一个RF等离子体发生系统包括阻抗匹配网络，其具有用于从RF发生器接收RF信号的输入端口和用于将RF信号传送到与负载相关联的等离子体容器的输入端口的输出端口。该系统包括与阻抗匹配网络的输入端口电磁通信的RF信号探测器，以在阻抗匹配网络的输入端口处检测与RF信号相关联的至少一个RF信号参数。该系统可以包括存储校准数据的校准存储单元。校准数据包括RF信号参数的值与负载的至少一个特性的值的关联。

43. 发明授权

US06781317B1 Methods and apparatus for calibration and metrology for an integrated RF generator system 有权
标题翻译：用于集成射频发生器系统的校准和计量的方法和装置
公开(公告)号：US06781317B1
公开(公告)日：2004-08-24
申请号：US10373163
申请日：2003-02-24
申请人： Daniel Goodman
发明人： Daniel Goodman
IPC分类号： H01J724
CPC分类号： H01J37/32935 , H01J37/32082
摘要： The invention features RF plasma generation systems, methods for operating the systems, methods for calibrating the systems, and calibration apparatus. One RF plasma generation system includes an impedance matching network having an input port to receive an RF signal from an RF generator, and an output port to deliver the RF signal to an input port of a plasma vessel associated with a load. The system includes an RF signal probe in electromagnetic communication with the input port of the impedance matching network to detect at least one RF signal parameter associated with the RF signal at the input port of the impedance matching network. The system can include a calibration storage unit that stores calibration data. The calibration data includes an association of values of the RF signal parameter with values of at least one characteristic of the load.
摘要翻译：本发明的特征在于RF等离子体生成系统，用于操作系统的方法，用于校准系统的方法以及校准装置。一个RF等离子体发生系统包括阻抗匹配网络，其具有用于从RF发生器接收RF信号的输入端口和用于将RF信号传送到与负载相关联的等离子体容器的输入端口的输出端口。该系统包括与阻抗匹配网络的输入端口电磁通信的RF信号探测器，以在阻抗匹配网络的输入端口处检测与RF信号相关联的至少一个RF信号参数。该系统可以包括存储校准数据的校准存储单元。校准数据包括RF信号参数的值与负载的至少一个特性的值的关联。

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