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    • 42. 发明申请
    • Cutting Insert and Indexable Tooth Cutting Tool Using the Same
    • 切割刀片和可转位齿轮刀具使用它
    • US20110255925A1
    • 2011-10-20
    • US13169860
    • 2011-06-27
    • Satoru Yoshida
    • Satoru Yoshida
    • B23C5/08B23C5/20
    • B23F21/146Y10T407/17Y10T407/173Y10T407/1924Y10T407/1942Y10T407/245
    • A cutting insert is removably mountable on an insert seat formed in a peripheral of a tool body rotated around an axis O and of substantial disc shape. The cutting insert includes a substantially planar insert body of a substantially square shape in plan view, a flank at an upper face of the body, a rake face at a side of the body intersecting with the flank, and a cutting edge at an intersection ridge between the rake face and the flank. The cutting edge is a substantial involute in side view of the body, the rake face is inclined to an inside of the body from an upper toward a lower face, and at least a front end arranged in a peripheral of the tool body is concave constituting a part of a substantially conical side face.
    • 切削刀片可移除地安装在形成在围绕轴线O旋转并且具有大致盘形状的工具主体的周边中的刀片座上。 切削刀片包括在平面图中大致正方形形状的基本上平面的插入体,身体的上表面处的侧面,与侧面相交的身体侧面的前刀面,以及交叉点的切削刃 在耙面和侧翼之间。 切削刃是主体的侧视图中的实质渐开线,前刀面从上部向下表面倾斜到主体的内侧,并且至少布置在工具主体的周边中的前端是凹构成的 大致圆锥形侧面的一部分。
    • 48. 发明申请
    • DEVELOPMENT DEVICE, AND IMAGE FORMING APPARATUS AND PROCESS CARTRIDGE USING THE DEVELOPMENT DEVICE
    • 开发设备,以及使用开发设备的图像形成装置和处理盒
    • US20070264052A1
    • 2007-11-15
    • US11748533
    • 2007-05-15
    • Satoru YoshidaHiroya HiroseKiyonori Tsuda
    • Satoru YoshidaHiroya HiroseKiyonori Tsuda
    • G03G15/08
    • G03G15/0893G03G15/0877G03G2215/0822G03G2215/0838
    • A development device includes a developer carrying member, developer supply, developer collection and developer agitation conveyance paths, transfer and communication openings, and partition. The developer carrying member bears a two-component developer. The developer supply and developer collection conveyance paths respectively convey the two-component and collected developers in the first direction. The developer agitation conveyance path conveys excess and collected developers in a second direction while agitating to supply the agitated developers to the developer supply conveyance path. The partition separates the developer collection, developer supply, and developer agitation conveyance paths. The transfer opening transfers the collected developer from the first to the second direction. The communication opening, disposed at a further upstream side of the developer collection conveyance path than the transfer opening in the first direction and at a higher position than the developer collection conveyance path, communicates the developer collection conveyance path with the developer agitation conveyance path.
    • 显影装置包括显影剂承载构件,显影剂供应,显影剂收集和显影剂搅拌输送路径,转印和交换开口以及分隔。 显影剂承载构件具有双组分显影剂。 开发商供应和开发者收集运输路径分别在第一个方向传达双组分和收集的开发者。 显影剂搅拌输送路径在搅动的同时向第二方向传送多余的和收集的显影剂,以将搅动的显影剂供应到显影剂供给输送路径。 分隔开分隔开显影剂收集,显影剂供应和显影剂搅拌输送路径。 传送口将收集的显影剂从第一方向转移到第二方向。 连通开口设置在显影剂收集输送路径的比第一方向上的转印开口更远的上游侧,并且位于比显影剂收集输送路径更高的位置,使显影剂收集输送路径与显影剂搅拌输送路径连通。
    • 50. 发明授权
    • Process for preparing polymer compound for resist
    • 制备抗蚀剂聚合物化合物的方法
    • US06653418B1
    • 2003-11-25
    • US10219262
    • 2002-08-16
    • Katsuhiro MaruyamaSatoru YoshidaSatoru KitanoHitoshi Mashio
    • Katsuhiro MaruyamaSatoru YoshidaSatoru KitanoHitoshi Mashio
    • C08F404
    • C08F12/22
    • There is provided a process for preparing a polymer compound for a resist, which can improve the performance, such as the heat resistance, sensitivity and resolution of the resist, without causing film loss of the resist, line width reduction of the resist or deterioration of the dry etching resistance of the polymer. This process comprises dissolving a styrene-based monomer containing at least a 4-acetoxystyrene monomer, and a dimethyl-2,2′-azobiscarboxylate ester in a solvent, thereby to polymerize the styrene-based monomer; adding an alkali catalyst to the resulting polymer solution, thereby to hydrolyze the polymer solution; and washing the resulting polymer compound with water.
    • 提供了制备抗蚀剂用高分子化合物的方法,其可以提高抗蚀剂的耐热性,灵敏度和分辨率等性能,而不会导致抗蚀剂的膜损失,抗蚀剂的线宽减小或抗蚀剂的劣化 聚合物的耐干蚀刻性。 该方法包括将至少含有4-乙酰氧基苯乙烯单体的苯乙烯基单体和二甲基-2,2'-偶氮二羧酸酯溶解在溶剂中,从而聚合苯乙烯类单体; 向所得聚合物溶液中加入碱催化剂,从而水解聚合物溶液; 并用水洗涤所得高分子化合物。