专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明授权

US08048812B2 Pitch reduced patterns relative to photolithography features 有权
标题翻译：相对于光刻特征的间距减小
公开(公告)号：US08048812B2
公开(公告)日：2011-11-01
申请号：US12769071
申请日：2010-04-28
申请人： Luan Tran , William T. Rericha , John Lee , Ramakanth Alapati , Sheron Honarkhah , Shuang Meng , Puneet Sharma , Jingyi Bai , Zhiping Yin , Paul Morgan , Mirzafer K. Abatchev , Gurtej S. Sandhu , D. Mark Durcan
发明人： Luan Tran , William T. Rericha , John Lee , Ramakanth Alapati , Sheron Honarkhah , Shuang Meng , Puneet Sharma , Jingyi Bai , Zhiping Yin , Paul Morgan , Mirzafer K. Abatchev , Gurtej S. Sandhu , D. Mark Durcan
IPC分类号： H01L21/302
CPC分类号： H01L21/0338 , H01L21/0337 , H01L21/3086 , H01L21/3088
摘要： Differently-sized features of an integrated circuit are formed by etching a substrate using a mask which is formed by combining two separately formed patterns. Pitch multiplication is used to form the relatively small features of the first pattern. Pitch multiplication is accomplished by patterning an amorphous carbon layer. Sidewall spacers are then formed on the amorphous carbon sidewalls which are then removed; the sidewall spacers defining the first mask pattern. A bottom anti-reflective coating (BARC) is then deposited to form a planar surface and a photoresist layer is formed over the BARC. The photoresist is next patterned by conventional photolithography to form the second pattern, which is transferred to the BARC. The combined pattern is transferred to an underlying amorphous silicon layer. The combined pattern is then transferred to the silicon oxide layer and then to an amorphous carbon mask layer. The combined mask pattern, is then etched into the underlying substrate.
摘要翻译：通过使用通过组合两个单独形成的图案形成的掩模蚀刻衬底来形成集成电路的不同尺寸的特征。间距乘法用于形成第一模式的较小特征。通过图案化无定形碳层来实现间距倍增。然后在非晶碳侧壁上形成侧壁间隔物，然后将其去除; 侧壁间隔物限定第一掩模图案。然后沉积底部抗反射涂层（BARC）以形成平坦表面，并且在BARC上形成光致抗蚀剂层。接下来通过常规光刻法将光致抗蚀剂图案化以形成第二图案，其转移到BARC。将组合图案转移到下面的非晶硅层。然后将组合图案转移到氧化硅层，然后转移到无定形碳掩模层。然后将组合的掩模图案蚀刻到下面的基底中。

42. 发明申请

US20100105211A1 NANO-CRYSTAL ETCH PROCESS 有权
标题翻译：纳米晶体蚀刻工艺
公开(公告)号：US20100105211A1
公开(公告)日：2010-04-29
申请号：US12650029
申请日：2009-12-30
申请人： Ramakanth Alapati , Paul Morgan , Max Hineman
发明人： Ramakanth Alapati , Paul Morgan , Max Hineman
IPC分类号： H01L21/3065
CPC分类号： H01L21/32134 , B82Y10/00 , H01L21/28273
摘要： A method for selectively removing nano-crystals on an insulating layer. The method includes providing an insulating layer with nano-crystals thereon; exposing the nano-crystals to a high density plasma comprising a source of free radical chlorine, ionic chlorine, or both to modify the nano-crystals; and removing the modified nano-crystals with a wet etchant.
摘要翻译：一种用于在绝缘层上选择性去除纳米晶体的方法。该方法包括在其上提供具有纳米晶体的绝缘层; 将纳米晶体暴露于包含游离基氯源，离子氯或二者的高密度等离子体，以修饰纳米晶体; 并用湿蚀刻剂去除修饰的纳米晶体。

43. 发明申请

US20080286975A1 PLATINUM NANODET ETCH PROCESS 有权
标题翻译：铂纳米粒子过程
公开(公告)号：US20080286975A1
公开(公告)日：2008-11-20
申请号：US11748196
申请日：2007-05-14
申请人： Ramakanth Alapati , Paul Morgan , Max Hineman
发明人： Ramakanth Alapati , Paul Morgan , Max Hineman
IPC分类号： H01L21/306
CPC分类号： H01L21/32134 , B82Y10/00 , H01L21/28273
摘要： A method for selectively removing nano-crystals on an insulating layer. The method includes providing an insulating layer with nano-crystals thereon; exposing the nano-crystals to a high density plasma comprising a source of free radical chlorine, ionic chlorine, or both to modify the nano-crystals; and removing the modified nano-crystals with a wet etchant.
摘要翻译：一种用于在绝缘层上选择性去除纳米晶体的方法。该方法包括在其上提供具有纳米晶体的绝缘层; 将纳米晶体暴露于包含游离基氯源，离子氯或二者的高密度等离子体，以修饰纳米晶体; 并用湿蚀刻剂去除修饰的纳米晶体。

44. 发明申请

US20070099397A1 Microfeature dies with porous regions, and associated methods and systems 审中-公开
标题翻译：具有多孔区域的微特征，以及相关的方法和系统
公开(公告)号：US20070099397A1
公开(公告)日：2007-05-03
申请号：US11634417
申请日：2006-12-04
申请人： Kyle Kirby , Paul Morgan
发明人： Kyle Kirby , Paul Morgan
IPC分类号： H01L21/00
CPC分类号： H01L21/76898 , H01L21/02126 , H01L21/02203 , H01L21/02321 , H01L21/02323 , H01L21/02337 , H01L21/02343 , H01L21/02351 , H01L21/31695 , H01L21/743 , H01L21/78
摘要： Microfeature dies with porous regions, and associated methods and systems are disclosed. A method in accordance with one embodiment of the invention includes forming a porous region between a die and a remainder portion of a microfeature workpiece, and separating the die from the remainder portion by removing at least a portion of the porous region. For example, the die can be removed from the remainder portion by making a cut at the porous region (e.g., with a rotating saw blade), etching material from the porous region, or directing a water jet at the porous region. In other embodiments, a porous region of the microfeature workpiece can receive conductive material to form a conductive pathway (e.g., a line and/or via) in the workpiece. In still further embodiments, the porous regions of the workpiece can be formed electrolytically with electrodes that are spaced apart from the workpiece and/or support relative movement between the electrodes and the workpiece.
摘要翻译：具有多孔区域的微特征模具以及相关方法和系统被公开。根据本发明的一个实施例的方法包括在模具和微特征工件的剩余部分之间形成多孔区域，并且通过去除多孔区域的至少一部分将模具与其余部分分离。例如，通过在多孔区域（例如，利用旋转的锯片）进行切割，从多孔区域蚀刻材料，或者在多孔区域引导水射流，可以将模具从剩余部分中除去。在其他实施例中，微特征工件的多孔区域可以接收导电材料以在工件中形成导电路径（例如，线路和/或通孔）。在另外的实施例中，可以用与工件间隔开的电极和/或支撑电极和工件之间的相对运动来电解形成工件的多孔区域。

45. 发明申请

US20060245190A1 LED signage device 审中-公开
标题翻译： LED标牌装置
公开(公告)号：US20060245190A1
公开(公告)日：2006-11-02
申请号：US11476993
申请日：2006-06-27
申请人： Chris Thompson , David McFerrin , Joe Counts , Paul Morgan , Timothy Thomas
发明人： Chris Thompson , David McFerrin , Joe Counts , Paul Morgan , Timothy Thomas
IPC分类号： F21V11/00
CPC分类号： G02B6/0001 , G09F9/33 , G09F13/22
摘要： A signage device (10) in which a housing (12) receives a circuit board (30) having a plurality of spaced-apart light sources (38) to define at least one symbol and a light-blocking sheet (60) having a message channel with opposing adjacent spaced-apart side walls. A light emitting surface closes a distal portion of the message channel, wherein light from the light sources communicates from the light emitting surface of the message channel.
摘要翻译：一种标牌装置（10），其中壳体（12）接收具有多个间隔开的光源（38）以限定至少一个符号的电路板（30）和具有消息的遮光片（60）通道与相对相邻的间隔开的侧壁。发光表面封闭消息通道的远端部分，其中来自光源的光从消息通道的发光表面通信。

46. 发明申请

US20050282301A1 Structure and method for field emitter tips 审中-公开
公开(公告)号：US20050282301A1
公开(公告)日：2005-12-22
申请号：US11209271
申请日：2005-08-23
申请人： Terry Gilton , Paul Morgan
发明人： Terry Gilton , Paul Morgan
IPC分类号： H01J1/05 , H01J1/14 , H01J1/304 , H01J1/38 , H01J1/48 , H01J9/02 , H01J9/38 , H01J19/06 , H01L21/00
CPC分类号： H01J1/3042 , H01J9/025 , H01J2201/30403 , H01J2329/00
摘要： Improved methods and structures are provided for an array of vertical geometries which may be used as emitter tips, as a self aligned gate structure surrounding field emitter tips, or as part of a flat panel display. The present invention offers controlled size in emitter tip formation under a more streamlined process. The present invention further provides a more efficient method to control the gate to emitter tip proximity in field emission devices. The novel method of the present invention includes implanting a dopant in a patterned manner into the silicon substrate and anodizing the silicon substrate in a controlled manner causing a more heavily doped region in the silicon substrate to form a porous silicon region.

47. 发明申请

US20050198401A1 Efficiently virtualizing multiple network attached stores 审中-公开
标题翻译：有效地虚拟化多个网络连接的商店
公开(公告)号：US20050198401A1
公开(公告)日：2005-09-08
申请号：US10767593
申请日：2004-01-29
申请人： Edward Chron , Paul Morgan , Lance Russell
发明人： Edward Chron , Paul Morgan , Lance Russell
IPC分类号： G06F15/16
CPC分类号： H04L12/413
摘要： A method and structure for communicating in a communications network comprising at least one communication virtualizer; a plurality of network-attached store computers connected to the communication virtualizer, wherein the plurality of network-attached store computers are configured to appear as a single available network-attached store computer; and at least one client computer connected to the communication virtualizer.
摘要翻译：一种用于在包括至少一个通信虚拟器的通信网络中进行通信的方法和结构; 连接到通信虚拟器的多个连接网络的存储计算机，其中所述多个网络连接的存储计算机被配置为显示为单个可用的网络连接的存储计算机; 以及连接到通信虚拟器的至少一个客户端计算机。

48. 发明公开

US20240150610A1 Cationic-Stabilized Dispersions, Hybridized Cationic-Stabilized Dispersions, In-Mold Coated Articles Prepared Utilizing Such Stabilized Dispersions, and Methods for Manufacturing Same 审中-公开
公开(公告)号：US20240150610A1
公开(公告)日：2024-05-09
申请号：US18384990
申请日：2023-10-30
申请人： Paul Morgan , Brodie Wright
发明人： Paul Morgan , Brodie Wright
IPC分类号： C09D175/04 , C08G18/08 , C09D105/00 , C09D133/08 , C09D133/26 , C09D139/02 , C09D179/02
CPC分类号： C09D175/04 , C08G18/0814 , C09D105/00 , C09D133/08 , C09D133/26 , C09D139/02 , C09D179/02 , C08L2201/54
摘要： A cationic-stabilized dispersion for use in fabricating an in-mold coated article including at least one of a cationic-stabilized polyurethane dispersion, a cationic-stabilized acrylic dispersion, a cationic-stabilized polyacrylamide dispersion, a cationic-stabilized polyallylamine dispersion, a cationic-stabilized polyetheramine dispersion, and a cationic-stabilized chitosan dispersion.

49. 发明授权

US10604674B2 Cationic-stabilized dispersions, hybridized cationic-stabilized dispersions, in-mold coated articles prepared utilizing such stabilized dispersions, and methods for manufacturing same 有权
公开(公告)号：US10604674B2
公开(公告)日：2020-03-31
申请号：US16290069
申请日：2019-03-01
申请人： Paul Morgan , Brodie Wright
发明人： Paul Morgan , Brodie Wright
IPC分类号： C09D171/00 , C09D175/04 , C09D133/08 , C09D179/02 , C09D133/26 , C09D105/00 , C09D139/02 , C08G18/08
摘要： A cationic-stabilized dispersion for use in fabricating an in-mold coated article including at least one of a cationic-stabilized polyurethane dispersion, a cationic-stabilized acrylic dispersion, a cationic-stabilized polyacrylamide dispersion, a cationic-stabilized polyallylamine dispersion, a cationic-stabilized polyetheramine dispersion, and a cationic-stabilized chitosan dispersion.

50. 发明授权

US10227503B2 Cationic-stabilized dispersions, hybridized cationic-stabilized dispersions, in-mold coated articles prepared utilizing such stabilized dispersions, and methods for manufacturing same 有权
公开(公告)号：US10227503B2
公开(公告)日：2019-03-12
申请号：US15644742
申请日：2017-07-08
申请人： Paul Morgan , Brodie Wright
发明人： Paul Morgan , Brodie Wright
IPC分类号： C09D171/00 , C09D133/00 , C08K3/36 , C08K5/06 , C08K5/09 , C09D175/04 , C09D133/08 , C09D179/02 , C09D133/26 , C09D105/00 , C09D139/02 , C08G18/08
摘要： A cationic-stabilized dispersion for use in fabricating an in-mold coated article including at least one of a cationic-stabilized polyurethane dispersion, a cationic-stabilized acrylic dispersion, a cationic-stabilized polyacrylamide dispersion, a cationic-stabilized polyallylamine dispersion, a cationic-stabilized polyetheramine dispersion, and a cationic-stabilized chitosan dispersion.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式