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    • 41. 发明申请
    • Digital broadcasting receiving unit and digital broadcasting system
    • 数字广播接收单元和数字广播系统
    • US20070253493A1
    • 2007-11-01
    • US11785406
    • 2007-04-17
    • Hiroshi ShirotaTadashi SaitoKazuyuki ItoRyosuke OkudaMasao Aramoto
    • Hiroshi ShirotaTadashi SaitoKazuyuki ItoRyosuke OkudaMasao Aramoto
    • H04B1/66
    • H04N21/4305
    • This invention provides a digital broadcasting receiving unit capable of achieving synchronization of time information between a base station and a receiving unit with reference clock without use of a crystal oscillator (VCXO) having a variable frequency. The crystal oscillator oscillates a clock of a predetermined fixed frequency. A variable digital dividing circuit divides a fixed frequency by a division ratio so as to change the division ratio. A system decoder detects reference time information from the base station. A reference counter generates time information of a receiving unit. A phase comparator detects a difference between reference time information and time information. A division ratio control circuit controls the change of the division ratio based on the difference. The reference counter generates time information based on a clock having a frequency obtained by dividing by the variable digital dividing circuit and feeds back time information to the phase comparator.
    • 本发明提供一种数字广播接收单元,其能够在不使用具有可变频率的晶体振荡器(VCXO)的基准时钟的情况下实现基站与接收单元之间的时间信息的同步。 晶体振荡器振荡预定固定频率的时钟。 可变数字分频电路将固定频率除以分频比以改变分频比。 系统解码器从基站检测参考时间信息。 参考计数器产生接收单元的时间信息。 相位比较器检测参考时间信息和时间信息之间的差异。 分频比控制电路基于该差异来控制分频比的变化。 参考计数器基于具有通过可变数字分频电路除以获得的频率的时钟产生时间信息,并将时间信息反馈到相位比较器。
    • 49. 发明授权
    • Pattern forming method and photomasks used therefor
    • 图案形成方法和使用的光掩模
    • US5316878A
    • 1994-05-31
    • US894519
    • 1992-06-04
    • Tadashi SaitoHideyuki Jinbo
    • Tadashi SaitoHideyuki Jinbo
    • G03F1/34G03F1/68G03F7/00G03F7/20H01L21/027G03F1/08
    • B82Y40/00B82Y10/00G03F1/34G03F1/70G03F7/0002G03F7/2022G03F7/70466
    • In a photoresist pattern formation by exposure using first and second photomasks, the first photomask has a transparent part, a rectangular opaque part having a first pair of sides and a second pair of sides, and a phase shifter, having a first edge crossing one of the first pair of sides, so that a part of the first edge is in the transparent part, and the second photomask has a transparent part, a rectangular opaque part corresponding to the rectangular opaque part of the first photomask, and a stripe-shaped opaque part corresponding to the first part of the first edge of the phase shifter. The rectangular opaque part of the first photomask is expanded in the direction of the first pair of sides, while the rectangular opaque part of the second photomask is expanded in the direction the second pair of sides. The amount of expansion is preferably not smaller than a misalignment tolerance.
    • 在通过使用第一和第二光掩模曝光的光致抗蚀剂图案形成中,第一光掩模具有透明部分,具有第一对侧面和第二对侧面的矩形不透明部分,以及移相器,其具有与 所述第一对侧面,使得所述第一边缘的一部分在所述透明部分中,并且所述第二光掩模具有透明部分,对应于所述第一光掩模的矩形不透明部分的矩形不透明部分和条形不透明部分 部分对应于移相器的第一边缘的第一部分。 第一光掩模的矩形不透明部分沿着第一对侧面的方向扩展,而第二光掩模的矩形不透明部分沿第二对侧面的方向扩展。 膨胀量优选不小于不对准公差。