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41. 发明授权

US5758680A Method and apparatus for pressure control in vacuum processors 失效
公开(公告)号：US5758680A
公开(公告)日：1998-06-02
申请号：US627712
申请日：1996-03-29
申请人： Farro Frank Kaveh , Michael S. Barnes , Brett C. Richardson , Christopher H. Olson
发明人： Farro Frank Kaveh , Michael S. Barnes , Brett C. Richardson , Christopher H. Olson
IPC分类号： G05D16/20 , F17D1/16 , F16K17/34 , F17D1/18
CPC分类号： G05D16/2013 , Y10S438/909 , Y10T137/0396 , Y10T137/2572 , Y10T137/7761
摘要： A method and apparatus is disclosed for controlling the pressure of reaction chamber in wafer processing equipment. The disclosed apparatus and method uses a ballast port for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve which is located between the reaction chamber and turbo pump. The disclosed apparatus and method further introduces process gases at higher rate than set point levels to reduce the transition time or stabilization time required when raising the pressure in the reaction chamber.

42. 发明授权

US5452510A Method of making an electrostatic chuck with oxide insulator 失效
标题翻译：制造具有氧化物绝缘体的静电卡盘的方法
公开(公告)号：US5452510A
公开(公告)日：1995-09-26
申请号：US169910
申请日：1993-12-20
申请人： Michael S. Barnes , Robert P. Westerfield, Jr.
发明人： Michael S. Barnes , Robert P. Westerfield, Jr.
IPC分类号： B23Q3/15 , H01L21/683 , H02N13/00 , H01R43/00
CPC分类号： H01L21/6831 , Y10T29/49117 , Y10T29/49885 , Y10T29/49888 , Y10T29/49982 , Y10T29/49986 , Y10T29/49993
摘要： An electrostatic chuck and method of manufacture of the chuck in which the component parts are machined, then partially anodized to provide a hard insulating surface on surfaces that are not in contact with the wafer, and then assembled, after which the top surface abutting the workpiece is machined and a correction radius is cut to suppress discharges between the electrodes.
摘要翻译：一种静电卡盘及其制造方法，其中对零件进行机械加工，然后进行部分阳极氧化处理，以在不与晶片接触的表面上提供硬绝缘表面，然后组装，之后顶表面邻接工件被加工并且修正半径被切割以抑制电极之间的放电。

43. 发明授权

US5241245A Optimized helical resonator for plasma processing 失效
标题翻译：用于等离子体处理的优化螺旋谐振器
公开(公告)号：US5241245A
公开(公告)日：1993-08-31
申请号：US879663
申请日：1992-05-06
申请人： Michael S. Barnes , Dennis K. Coultas , John G. Forster , John H. Keller
发明人： Michael S. Barnes , Dennis K. Coultas , John G. Forster , John H. Keller
IPC分类号： H05H1/46 , B01J19/08 , C23C16/50 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H01P7/00
CPC分类号： H01J37/321
摘要： An optimized helical resonator which increases the plasma density for efficient processing of semiconductor wafers is characterized by a low inductance and, hence, a low Q. A first embodiment uses either a distributed or lumped capacitance to reduce the value of .omega.L to less than about 200 Ohms. A second embodiment uses a flat spiral coil having a low value of .omega.L and resonant as a 1/4 or 1/2 wave resonator. A third embodiment combines features of the first two embodiments using both spiral and solenoid coils as the helical resonator.
摘要翻译：提高用于半导体晶片的有效处理的等离子体密度的优化螺旋谐振器的特征在于低电感，因此具有低Q.第一实施例使用分布式或集总电容将ωL的值减小到小于约 200欧姆第二实施例使用具有低ΩΩL值并且谐振的扁平螺旋线圈作为1/4或1/2波形谐振器。第三实施例组合了使用螺旋和螺线管线圈的前两个实施例的特征作为螺旋谐振器。

44. 发明授权

US10796611B2 Drive-through order point 有权
公开(公告)号：US10796611B2
公开(公告)日：2020-10-06
申请号：US15274563
申请日：2016-09-23
申请人： Michael S. Barnes
发明人： Michael S. Barnes
IPC分类号： G09F7/18 , G09F13/22 , H04R1/02
摘要： An order point can be employed in a drive-through or similar setting. The order point can have one or more rotatable menu cases. Each rotatable menu case can include two opposing sides that are equally configured to display a menu. The menu case can be mounted to the order point in a manner that allows either side of the menu case to be rotated into a forward facing position. The menu case can also include angle stops which limit the range of rotation of the menu case and retain the menu case in the forward facing positions. The order point may also include a pivoting canopy which functions to shade the menu cases as well as to prevent damage when a vehicle is too tall.

45. 发明授权

US09508310B2 Manual switch system for outputting multimedia content to a digital sign 有权
标题翻译：用于将多媒体内容输出到数字标牌的手动切换系统
公开(公告)号：US09508310B2
公开(公告)日：2016-11-29
申请号：US13569498
申请日：2012-08-08
申请人： Michael S. Barnes
发明人： Michael S. Barnes
IPC分类号： G06F15/16 , G09G5/00
CPC分类号： G09G5/003 , G09G2380/14
摘要： The present invention extends to a manual switch system for selecting multimedia content from one or various source inputs to be provided to a digital display. The manual switch system of the present invention provides a compact, convenient, and simple to use solution for updating a digital display in many environments. In a particular example, the manual switch can be used within a fast food restaurant to quickly and easily update the menu such as when the restaurant switches from serving breakfast to lunch or dinner.
摘要翻译：本发明延伸到用于从要提供给数字显示器的一个或多个源输入中选择多媒体内容的手动切换系统。本发明的手动开关系统提供了在许多环境中更新数字显示器的紧凑，方便和易于使用的解决方案。在一个特定的例子中，手动开关可以在快餐店内使用，以便快速方便地更新菜单，例如餐厅从供应早餐切换到午餐或晚餐时。

46. 发明授权

US06706138B2 Adjustable dual frequency voltage dividing plasma reactor 有权
标题翻译：可调双频分压等离子体反应堆
公开(公告)号：US06706138B2
公开(公告)日：2004-03-16
申请号：US09931324
申请日：2001-08-16
申请人： Michael S. Barnes , John Holland , Alexander Paterson , Valentin Todorov , Farhad Moghadam
发明人： Michael S. Barnes , John Holland , Alexander Paterson , Valentin Todorov , Farhad Moghadam
IPC分类号： H01L21306
CPC分类号： H01J37/3244 , H01J37/32082
摘要： Apparatus and method for processing a substrate are provided. The apparatus for processing a substrate comprises: a chamber having a first electrode; a substrate support disposed in the chamber and providing a second electrode; a high frequency power source electrically connected to either the first or the second electrode; a low frequency power source electrically connected to either the first or the second electrode; and a variable impedance element connected to one or more of the electrodes. The variable impedance element may be tuned to control a self bias voltage division between the first electrode and the second electrode. Embodiments of the invention substantially reduce erosion of the electrodes, maintain process uniformity, improve precision of the etch process for forming high aspect ratio sub-quarter-micron interconnect features, and provide an increased etch rate which reduces time and costs of production of integrated circuits.
摘要翻译：提供了用于处理基板的设备和方法。用于处理衬底的设备包括：具有第一电极的腔室; 设置在所述室中并提供第二电极的衬底支撑件; 电连接到第一或第二电极的高频电源; 电连接到第一或第二电极的低频电源; 和连接到一个或多个电极的可变阻抗元件。可调谐可变阻抗元件以控制第一电极和第二电极之间的自偏压分压。本发明的实施例大大减少电极的侵蚀，保持工艺均匀性，提高用于形成高纵横比亚微米互连特征的蚀刻工艺的精度，并提供增加的蚀刻速率，从而减少集成电路的生产时间和成本。

47. 发明授权

US6142163A Method and apparatus for pressure control in vacuum processors 失效
标题翻译：真空处理器中压力控制的方法和装置
公开(公告)号：US6142163A
公开(公告)日：2000-11-07
申请号：US53530
申请日：1998-03-31
申请人： Brian K. McMillin , Farro F. Kaveh , Michael S. Barnes
发明人： Brian K. McMillin , Farro F. Kaveh , Michael S. Barnes
IPC分类号： G05D16/20 , F16K17/34 , F17D1/16
CPC分类号： G05D16/2013 , Y10T137/0396 , Y10T137/2572 , Y10T137/7761
摘要： A method and apparatus is disclosed for controlling the pressure of a reaction chamber in wafer processing equipment. The disclosed apparatus and method uses a ballast port for inserting gas into the evacuation system, thereby controlling the pressure in the reaction chamber. The disclosed apparatus and method further uses estimation curves to estimate the desired position of a controlled gate valve which is located between the reaction chamber and turbo pump. The disclosed apparatus and method achieves a set point pressure by prepositioning a throttle valve followed by repositioning the throttle valve based on the difference between a measure pressure and the set point pressure using proportional and integral control, wherein enablement of integral control is delay for a pre-specified period.
摘要翻译：公开了一种用于控制晶片加工设备中的反应室的压力的方法和装置。所公开的装置和方法使用用于将气体插入抽空系统中的压载端口，从而控制反应室中的压力。所公开的装置和方法还使用估计曲线来估计位于反应室和涡轮泵之间的受控闸阀的期望位置。所公开的装置和方法通过使用比例和积分控制基于测量压力和设定点压力之间的差异来预先设定节流阀，然后重新定位节流阀来实现设定点压力，其中积分控制的启用是预先的延迟规定期

48. 发明授权

US5975013A Vacuum plasma processor having coil with small magnetic field in its center 失效
标题翻译：真空等离子体处理器在其中心具有小磁场的线圈
公开(公告)号：US5975013A
公开(公告)日：1999-11-02
申请号：US978868
申请日：1997-11-28
申请人： John Patrick Holland , Michael S. Barnes
发明人： John Patrick Holland , Michael S. Barnes
IPC分类号： H01J37/32 , H05H1/00
CPC分类号： H01J37/321
摘要： A substantially planar coil of a vacuum plasma processor has plural turns for exciting gas in the processor to a plasma state in response to r.f. coil energization. The coil is located outside the processor and surrounded by a shield tending to cause magnetic flux coupled from peripheral portions of the coil to the gas to be less than magnetic flux coupled from interior portions of the coil to the gas. The coil is arranged so magnetic flux derived from a center portion of an area circumscribed by the coil is less than the magnetic flux derived from all other areas circumscribed by the coil. The magnetic flux is such that the density of the plasma in the processor on a processed substrate is relatively uniform even though the coil exhibits transmission line properties so there are substantial peak-to-peak current variations along the length of the coil.
摘要翻译：真空等离子体处理器的基本上平面的线圈具有多个匝数，用于响应于r.f而将处理器中的气体激发到等离子体状态。线圈通电。线圈位于处理器外部并且被屏蔽物包围，从而导致从线圈的周边部分耦合到气体的磁通量小于从线圈的内部部分耦合到气体的磁通量。线圈被布置成从由线圈外接的区域的中心部分导出的磁通小于由线圈外接的所有其它区域导出的磁通量。磁通量使得处理的衬底上的处理器中的等离子体的密度相对均匀，即使线圈表现出传输线特性，因此沿着线圈的长度存在实质的峰 - 峰电流变化。

49. 发明授权

US5759280A Inductively coupled source for deriving substantially uniform plasma flux 失效
标题翻译：用于导出基本上均匀的等离子体通量的电感耦合源
公开(公告)号：US5759280A
公开(公告)日：1998-06-02
申请号：US662732
申请日：1996-06-10
申请人： John Patrick Holland , Michael S. Barnes
发明人： John Patrick Holland , Michael S. Barnes
IPC分类号： H01J37/32 , C23C16/00
CPC分类号： H01J37/321
摘要： A planar coil exciting a plasma of an r.f. vacuum plasma processor for a workpiece processed surface in a chamber includes plural turns. The coil, chamber and workpiece are arranged to produce in the chamber a magnetic flux having substantially greater density in peripheral portions of the coil and chamber than in a center portion of the chamber and coil so a substantially uniform plasma flux is incident on a processed surface of the workpiece.
摘要翻译：激励r.f.等离子体的平面线圈用于室内工件处理表面的真空等离子体处理器包括多匝。线圈，腔室和工件被布置成在腔室中产生在线圈和腔室的周边部分中具有比在腔室和线圈的中心部分中具有显着更大密度的磁通量，使得基本上均匀的等离子体通量入射到加工表面的工件。

50. 发明授权

US5670066A Vacuum plasma processing wherein workpiece position is detected prior to chuck being activated 失效
标题翻译：真空等离子体处理，其中在卡盘被激活之前检测工件位置
公开(公告)号：US5670066A
公开(公告)日：1997-09-23
申请号：US405676
申请日：1995-03-17
申请人： Michael S. Barnes , Luo Laizhong
发明人： Michael S. Barnes , Luo Laizhong
IPC分类号： H01L21/683 , H03K17/955 , B23K10/00
CPC分类号： H01L21/6833 , H03K17/955 , Y10S269/903 , Y10T279/23
摘要： A determination of whether a workpiece is properly positioned on an electrostatic chuck in a vacuum plasma processing chamber is made by measuring the capacitance across a pair of electrodes of the chuck. If the chuck is properly positioned, the workpiece is held in situ on the chuck by applying a DC voltage to the chuck. The workpiece is then processed by the plasma.
摘要翻译：通过测量卡盘的一对电极上的电容来确定在真空等离子体处理室中是否将工件适当地定位在静电卡盘上。如果卡盘正确定位，则通过向卡盘施加直流电压将工件原位保持在卡盘上。然后通过等离子体处理工件。

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