会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 41. 发明授权
    • Substrate processing apparatus and method of manufacturing semiconductor device
    • 基板处理装置及半导体装置的制造方法
    • US08471477B2
    • 2013-06-25
    • US13071227
    • 2011-03-24
    • Masayuki TomitaKatsunori FunakiShinji YashimaRyuichi Shimada
    • Masayuki TomitaKatsunori FunakiShinji YashimaRyuichi Shimada
    • H05B31/26
    • H01J37/32183H01J37/32091
    • A processing speed may be easily controlled over the wide range within the impedance variation range. A substrate processing apparatus includes: a processing chamber configured to process a substrate; a substrate support unit configured to support the substrate in the processing chamber; a processing gas supply unit configured to supply a processing gas into the processing chamber; a plasma generation electrode configured to convert the processing gas supplied into the processing chamber to be in a plasma state; a radio frequency power source configured to apply a radio frequency power to the plasma generation electrode; a variable impedance electrode installed at the substrate support unit and configured to control an electric potential of the substrate; a variable impedance mechanism connected to the variable impedance electrode and configured to vary an impedance according to a reciprocal of a peak-to-peak voltage of the plasma generation electrode; an exhaust unit configured to exhaust an atmosphere in the processing chamber; and a controller configured to control at least the variable impedance mechanism.
    • 可以在阻抗变化范围内的宽范围内容易地控制处理速度。 基板处理装置包括:处理室,被配置为处理基板; 衬底支撑单元,其构造成在所述处理室中支撑所述衬底; 处理气体供给单元,其构造成将处理气体供给到所述处理室中; 等离子体产生电极,被配置为将供应到处理室中的处理气体转换成等离子体状态; 射频电源,被配置为向所述等离子体产生电极施加射频电力; 可变阻抗电极,其安装在所述基板支撑单元处并且被配置为控制所述基板的电位; 连接到所述可变阻抗电极并被配置为根据所述等离子体产生电极的峰 - 峰电压的倒数改变阻抗的可变阻抗机构; 排气单元,其构造成排出处理室中的气氛; 以及控制器,被配置为至少控制所述可变阻抗机构。
    • 48. 发明授权
    • Control apparatus and method for direct-injection spark-ignition internal combustion engine
    • 直喷式火花点火内燃机的控制装置及方法
    • US06408816B1
    • 2002-06-25
    • US09658661
    • 2000-09-08
    • Masayuki TomitaKimiyoshi Nishizawa
    • Masayuki TomitaKimiyoshi Nishizawa
    • F02B1700
    • F02D41/402F02B2075/125F02D41/0255F02D41/1473F02D41/3023Y02T10/123Y02T10/26Y02T10/44
    • A control apparatus and method for a direct-injection spark-ignition internal combustion engine in which a stratified combustion is performed to raise an exhaust temperature under a condition prior to a completion of an engine warm-up. The stratified combustion is provided with a lean air-fuel mixture formed over a whole combustion chamber through a fuel injection at a suction stroke and a rich air-fuel mixture formed in an inner space surrounding a spark plug at the combustion chamber through a fuel injection at a compression stroke and a fuel injection quantity of the fuel injection at the suction stroke. A fuel injection quantity of the fuel injection at the compression stroke is corrected by use of a feedback correction coefficient so that an average air-fuel ratio over the whole combustion chamber is controlled to be a predetermined target air-fuel ratio.
    • 一种用于直喷式火花点火内燃机的控制装置和方法,其中在发动机预热完成之前的条件下进行分层燃烧以提高排气温度。 分层燃烧设置有通过在吸入行程处的燃料喷射在整个燃烧室上形成的贫空燃混合物,以及通过燃料喷射形成在燃烧室周围的火花塞周围的内部空间中的浓空气燃料混合物 在压缩行程和在吸入行程处的燃料喷射的燃料喷射量。 通过使用反馈校正系数来校正压缩冲程的燃料喷射的燃料喷射量,使得整个燃烧室的平均空燃比被控制为预定的目标空燃比。