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41. 发明申请

US20060289501A1 Method of manufacturing honeycomb structure 审中-公开
标题翻译：制造蜂窝结构的方法
公开(公告)号：US20060289501A1
公开(公告)日：2006-12-28
申请号：US11436034
申请日：2006-05-18
申请人： Taishi Michiwaki , Yuji Ito , Yukihisa Wada
发明人： Taishi Michiwaki , Yuji Ito , Yukihisa Wada
IPC分类号： H05B6/80
CPC分类号： B24D3/08 , B24B9/06 , B24B19/22
摘要： There is disclosed a honeycomb structure manufacturing method which is capable of efficiently and inexpensively manufacturing a honeycomb structure for preferable use in a filter for trapping particulates in an exhaust gas or the like by use of a long-life grinding member whose satisfactory grinding performance is retained for a long time. The method includes the step of: working an outer periphery of a coarsely shaped honeycomb structure 20 made of a porous ceramic by use of a grinding member 10 to obtain a honeycomb structure 30 having a predetermined shape, wherein diamond abrasive grains of the grinding member 10 have a grain size of 40 to 150 mesh (JIS B 4130 standard) and a concentration degree of 80 or more, and the surfaces of the diamond abrasive grains are coated with at least one selected from the group consisting of Ti, Ni, and Cr.
摘要翻译：公开了一种能够有效且廉价地制造蜂窝结构体的蜂窝结构体制造方法，该蜂窝结构体优选用于通过使用保持令人满意的研磨性能的长寿命研磨部件来捕集废气等中的微粒的过滤器需很长时间。该方法包括以下步骤：通过使用研磨部件10对由多孔陶瓷制成的粗形蜂窝结构体20的外周进行加工，得到具有规定形状的蜂窝结构体30，其中研磨部件10的金刚石磨粒具有40至150目（JIS B 4130标准）的粒度和80以上的浓度，并且金刚石磨粒的表面涂覆有选自Ti，Ni和Cr中的至少一种。

42. 发明申请

US20060103058A1 Die for forming honeycomb structure and method of manufacturing honeycomb structure 有权
标题翻译：用于形成蜂窝结构的模具和蜂窝结构体的制造方法
公开(公告)号：US20060103058A1
公开(公告)日：2006-05-18
申请号：US11268598
申请日：2005-11-08
申请人： Yukihisa Wada , Tomohiro Iida , Jiro Maeda
发明人： Yukihisa Wada , Tomohiro Iida , Jiro Maeda
IPC分类号： B29C47/00
CPC分类号： B28B3/269 , B28B3/26 , B29C47/0028 , B29C47/12 , B29L2031/60
摘要： There is disclosed a die for forming a honeycomb structure and a method of manufacturing the honeycomb structure by use of the die, in which variations of cell pitches are suppressed in a central portion and the vicinity of an outer periphery after drying and firing an extruded honeycomb structure, and the honeycomb structure having a uniform cell pitch can be manufactured. A die 1 for forming a honeycomb structure has a front surface provided with groovy slits 2 formed between cell blocks 3 and a back surface provided with back holes 4a communicating with the slits 2. The die 1 has a structure in which a pitch P of the adjacent cell blocks 3 is enlarged from a central portion of the front surface toward an outer periphery in a stepwise manner.
摘要翻译：公开了一种用于形成蜂窝结构的模具和使用该模具制造蜂窝结构体的方法，其中干燥和烧制挤出蜂窝体之后的中心部分和外周附近抑制了单元间距的变化可以制造具有均匀电池间距的蜂窝结构体。用于形成蜂窝结构的模具1具有设置有形成在单元块3之间的格子狭缝2的前表面和设置有与狭缝2连通的后孔4a的后表面。模具1具有这样的结构，其中相邻单元块3的间距P从分段的前表面的中心部分向外周增大。

43. 发明授权

US06830979B2 Method for fabricating semiconductor device 有权
标题翻译：制造半导体器件的方法
公开(公告)号：US06830979B2
公开(公告)日：2004-12-14
申请号：US10152334
申请日：2002-05-22
申请人： Yukihisa Wada
发明人： Yukihisa Wada
IPC分类号： H10L21336
CPC分类号： H01L21/823468 , H01L21/31111 , H01L21/31608 , H01L21/31625 , H01L21/3185 , H01L21/76224 , H01L28/84 , H01L28/91 , H01L29/6653
摘要： There is provided a method for fabricating a semiconductor device involving the formation of two or more oxide films having different etching properties. A multilayer-film sidewall including a first oxide film such as an NSG film, a TEOS film, or a HTO film and a second oxide film such as a BPSG film or a PSG film is formed over the side surfaces of a gate electrode. After the multilayer-film sidewall is used as an implantation mask for forming the source and drain of a MIS transistor, wet etching is performed by using an aqueous solution mixture containing a hydrofluoric acid and an inorganic acid (a hydrochloric acid, a sulfuric acid, or the like) in selectively removing the second oxide film. This increases the etching selectivity between the individual oxide films and allows the removal of only the upper-layer second oxide film.
摘要翻译：提供了一种用于制造半导体器件的方法，该半导体器件涉及形成具有不同蚀刻性能的两个或更多个氧化物膜。在栅电极的侧面上形成包括诸如NSG膜，TEOS膜或HTO膜的第一氧化物膜和诸如BPSG膜或PSG膜的第二氧化物膜的多层膜侧壁。在将多层膜侧壁用作用于形成MIS晶体管的源极和漏极的注入掩模之后，通过使用含有氢氟酸和无机酸（盐酸，硫酸，等）选择性地除去第二氧化物膜。这增加了各个氧化物膜之间的蚀刻选择性，并允许仅去除上层第二氧化物膜。

44. 发明授权

US5265346A Drying carrier adapted for carrying honeycomb structure 失效
标题翻译：适用于承载蜂窝结构的干燥载体
公开(公告)号：US5265346A
公开(公告)日：1993-11-30
申请号：US858067
申请日：1992-03-26
申请人： Sueharu Jikumaru , Yukihisa Wada
发明人： Sueharu Jikumaru , Yukihisa Wada
IPC分类号： F26B3/347 , F26B15/14 , F26B25/18 , F26B23/08
CPC分类号： F26B25/18 , B28B11/248 , F26B15/14
摘要： A drying carrier adapted for carrying honeycomb structures includes a plurality of perforated plates spaced to each other in the longitudinal direction of the drying carrier and made of a material having a conductivity higher than that of the drying carrier. Each of said perforated plates is provided with a convex portion having an upper contacting surface to be contacted with the bottom surface of the honeycomb structure to be carried. The surface area (A) of the upper contacting surface of the convex portion is smaller than the bottom surface area of the honeycomb structure.

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