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    • 49. 发明授权
    • Semiconductor light-emitting device and method for producing the same
    • 半导体发光器件及其制造方法
    • US06377598B1
    • 2002-04-23
    • US09705230
    • 2000-11-01
    • Masanori WatanabeMasaya Ishida
    • Masanori WatanabeMasaya Ishida
    • H01S500
    • H01L33/305H01L33/145H01S5/2206H01S5/2226H01S5/2227H01S5/2231H01S5/305H01S5/3054
    • A light emitting device includes: a plurality of n-type III-V group compound semiconductor layers; a plurality of p-type III-V group compound semiconductor layers; and an active layer. Carbon atoms and II-group element atoms are both added to at least one of the plurality of p-type III-V group compound semiconductor layers. Alternatively, carbon atoms and Si atoms are both added to at least one of the plurality of n-type III-V group compound semiconductor layers. Another semiconductor light emitting device has a current blocking structure formed on the double hetero (DH) junction structure, and the current blocking structure at least includes a two-layered n-type current blocking layers including a Se-doped n-type first current blocking layer provided closer to the DH junction structure and a Si-doped n-type second current blocking layer formed on the n-type first current blocking layer.
    • 发光器件包括:多个n型III-V族化合物半导体层; 多个p型III-V族化合物半导体层; 和活性层。 碳原子和II族元素原子都被添加到多个p型III-V族化合物半导体层中的至少一个中。 或者,碳原子和Si原子都被添加到多个n型III-V族化合物半导体层中的至少一个中。 另一半导体发光器件具有形成于双异质(DH)结结构上的电流阻挡结构,并且电流阻挡结构至少包括两层n型电流阻挡层,其包括Se掺杂n型第一电流阻塞 提供更靠近DH结结构的层,以及形成在n型第一电流阻挡层上的Si掺杂的n型第二电流阻挡层。