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    • 42. 发明申请
    • Shelf Mounting Bracket for Adjustable Organizer System
    • 可调节主办机构的货架安装支架
    • US20070205172A1
    • 2007-09-06
    • US11676667
    • 2007-02-20
    • David StitchickSean O'Brien
    • David StitchickSean O'Brien
    • A47F5/00
    • A47B47/022A47B57/42A47B96/027A47B96/028A47B96/061A47B96/1458Y10T24/44017
    • A shelf mounting bracket has a bracket body with a forward end, a rear end, an upper side, and a lower side. One or more connectors extend from the rear end for mounting the bracket to a support. At least one forward shelf support is provided near the forward end and faces in the direction of the upper side of the bracket body. At least one rear shelf support is provided near the rear end and faces in the direction of the upper side of the bracket body. A locking clip is carried near the rear end of the bracket body. The clip is slidable between a locked position such that a portion of the locking clip is positioned vertically over and spaced from the rear shelf support, and an unlocked position providing vertical clearance to the rear shelf support.
    • 搁架安装支架具有带有前端,后端,上侧和下侧的托架体。 一个或多个连接器从后端延伸,用于将支架安装到支架上。 在前端附近设置至少一个前搁板支撑件,并且在支架主体的上侧方向上面对。 至少一个后搁架支撑件设置在后端附近并面向支架主体上侧的方向。 锁定夹在托架主体的后端附近。 夹子可以在锁定位置之间滑动,使得锁定夹的一部分垂直地布置在后搁架支撑件上并与后搁架支撑件间隔开,并且解锁位置向后搁架支撑件提供垂直间隙。
    • 43. 发明申请
    • Modifying sub-resolution assist features according to rule-based and model-based techniques
    • 根据基于规则和基于模型的技术修改子分辨率辅助功能
    • US20060281016A1
    • 2006-12-14
    • US11150624
    • 2005-06-10
    • Sean O'Brien
    • Sean O'Brien
    • G06F17/50G03F1/00
    • G03F7/70441G03F1/36
    • Modifying sub-resolution assist features includes receiving a mask pattern for a photolithographic mask. The mask pattern includes main features, and the photolithographic mask is operable to pattern a wafer pattern for a semiconductor wafer. Placement of sub-resolution assist features for the main features is estimated. The following is repeated for one or more iterations: correcting the main features using a wafer pattern model operable to estimate the wafer pattern; evaluating the sub-resolution assist features according to the wafer pattern model; and modifying at least one sub-resolution assist feature in accordance with the evaluation.
    • 修改子分辨率辅助功能包括接收光刻掩模的掩模图案。 掩模图案包括主要特征,并且光刻掩模可操作以对半导体晶片的晶片图案进行图案化。 估计主要功能的子分辨率辅助功能的放置。 重复以下重复一次或多次迭代:使用可操作以估计晶片图案的晶片图案模型来​​校正主要特征; 根据晶片图案模型评估子分辨率辅助特征; 以及根据评估修改至少一个子分辨率辅助特征。