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    • 42. 发明申请
    • METHOD FOR PRODUCING NANO-FIBER WITH UNIFORMITY
    • 用于生产具有均匀性的纳米纤维的方法
    • US20080277836A1
    • 2008-11-13
    • US12098760
    • 2008-04-07
    • Jong-Chul Park
    • Jong-Chul Park
    • B29C47/00
    • D01D5/0061
    • The present invention relates to a method for the mass-production of nanofiber through electrospinning, particularly to a method for the mass-production of nanofiber having required properties by adjusting the spinning condition of a spinning area in which nozzle blocks and collectors are installed for electrospinning the spinning solution with uniformity. The method for producing nanofiber by electrospinning comprises the steps of determining a spinning area formed by a nozzle block in which a plurality of spinning nozzles are arranged and a collector on which nanofiber are collected; determining factors in adjusting physical properties of nanofiber in the spinning area; and adjusting the determined factors and electrospinning in the spinning area.
    • 本发明涉及通过静电纺丝技术大规模生产纳米纤维的方法,特别涉及一种通过调节其中安装喷嘴块和集电器的纺丝区域的纺丝区域进行静电纺丝的具有所需性能的大规模生产纳米纤维的方法 纺丝溶液均匀。 通过静电纺丝制造纳米纤维的方法包括以下步骤:确定由其中排列有多个纺丝喷嘴的喷嘴块形成的纺丝区域和收集纳米纤维的收集器; 确定纺丝区纳米纤维物理性质的因素; 并在纺纱区域中调整确定的因子和静电纺丝。
    • 49. 发明授权
    • Semiconductor device and method of fabricating the same
    • 半导体装置及其制造方法
    • US07863677B2
    • 2011-01-04
    • US12212356
    • 2008-09-17
    • Jong-Chul ParkSang-Sup Jeong
    • Jong-Chul ParkSang-Sup Jeong
    • H01L29/66
    • H01L27/0207H01L21/76897H01L21/823425H01L21/823437H01L29/7833
    • A semiconductor device and a method of fabricating the same are provided. The semiconductor device includes a plurality of active regions which are defined in a semiconductor substrate, a plurality of gate lines which are formed as zigzag lines, extend across the active regions, are symmetrically arranged, and define a plurality of first regions and a plurality of second regions therebetween, and wherein the first regions being narrower than the second regions. The semiconductor device further includes an insulation layer which defines a plurality of contact regions by filling empty spaces in the first regions between the gate lines and, extending from the first regions, and surrounding sidewalls of portions of the gate lines in the second regions, and wherein the contact regions partially exposing the active regions and a plurality of contacts which respectively fill the contact regions.
    • 提供半导体器件及其制造方法。 半导体器件包括限定在半导体衬底中的多个有源区,被形成为锯齿形线的多条栅极线,跨过有源区延伸,对称地排列,并且限定多个第一区和多个 第二区域,其中第一区域比第二区域窄。 半导体器件还包括绝缘层,其通过填充栅极线之间的第一区域中的空白空间和从第一区域延伸并在第二区域中的栅极线的部分周围的侧壁填充多个接触区域,以及 其中所述接触区域部分地暴露所述有源区域和分别填充所述接触区域的多个触点。