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41. 发明授权

US06497992B1 Process for manufacturing semiconductor integrated circuit device 失效
标题翻译：半导体集成电路器件制造工艺
公开(公告)号：US06497992B1
公开(公告)日：2002-12-24
申请号：US09551615
申请日：2000-04-17
申请人： Takashi Yunogami , Shunji Sasabe , Kazuyuki Suko , Jun Abe , Takao Kumihashi , Fumio Murai
发明人： Takashi Yunogami , Shunji Sasabe , Kazuyuki Suko , Jun Abe , Takao Kumihashi , Fumio Murai
IPC分类号： G03F726
CPC分类号： H01L21/02071 , G03F7/40 , H01L21/0274 , H01L21/31122 , H01L21/31144 , H01L21/32139
摘要： In order that reaction products of low vapor pressure may be prevented from being deposited on the side wall of a predetermined pattern when this pattern is to be formed by dry-etching a Pt film or a PZT film, a resist mask 54 having a rounded outer periphery at its head is used when the Pt film 53 deposited on a semiconductor substrate 50 is to be dry-etched. After this dry-etching, moreover, an overetching of a proper extent is performed to completely remove the side wall deposited film 55 which is left on the side of the pattern. The resist mask 54 is formed by exposing and developing a benzophenone novolak resist and subsequently by heating to set it while irradiating it, if necessary, with ultraviolet rays.
摘要翻译：为了防止当通过干法蚀刻Pt膜或PZT膜而形成该图案时，可以防止低蒸气压的反应产物沉积在预定图案的侧壁上，具有圆形外部的抗蚀剂掩模54 当要沉积在半导体衬底50上的Pt膜53被干蚀刻时，使用其头部周边。此外，在该干蚀刻之后，进行适当程度的过蚀刻以完全去除留在图案侧的侧壁沉积膜55。抗蚀剂掩模54通过曝光和显影二苯甲酚酚醛清漆抗蚀剂而形成，随后通过加热固化，同时照射它，如果需要，用紫外线照射。

42. 发明申请

US20140325787A1 WIPER APPARATUS 有权
标题翻译： WIPER装置
公开(公告)号：US20140325787A1
公开(公告)日：2014-11-06
申请号：US14344206
申请日：2012-08-08
申请人： Koji Iwazaki , Jun Abe
发明人： Koji Iwazaki , Jun Abe
IPC分类号： B60S1/34
CPC分类号： B60S1/34 , B60S1/0452 , B60S1/245
摘要： A wiper apparatus is provided with: a wiper arm (14) which is swung about a rotation shaft (18); and a wiper motor (13) for generating drive power to be transmitted to the rotation shaft (18), the wiper apparatus is provided with a power transmission mechanism (19) for transmitting the drive power from the rotation shaft (18) to the wiper arm (14), the power transmission mechanism (19) is provided with: a link member (19a) fixed to the rotation shaft (18); and a support shaft (19b) fixed at a position on the link member (19a), which deviates from the rotation shaft (18), and configured to support the wiper arm (14), a coupling section between the support shaft (19b) and the wiper arm (14) is positioned in front of the front end of the front glass (11), and at least one part of the wiper motor (13) is located within the projection region of the front glass (11), thereby suppressing the increase in the number of parts.
摘要翻译：刮水器装置设置有：围绕旋转轴（18）摆动的刮水器臂（14）; 以及用于产生要传递到旋转轴（18）的驱动力的刮水器马达（13），刮水器装置设置有用于将驱动力从旋转轴（18）传递到刮水器的动力传递机构（19）臂（14），动力传递机构（19）设置有：固定到旋转轴（18）的连杆构件（19a）; 以及支撑轴（19b），其固定在与所述旋转轴（18）偏离的所述连杆构件（19a）上的位置，并且构造成支撑所述刮水器臂（14），所述支撑轴（19b）并且所述刮水器臂（14）位于所述前玻璃（11）的前端的前方，所述刮水器马达（13）的至少一部分位于所述前玻璃（11）的突出部内，由此抑制零件数量的增加。

43. 发明授权

US08852386B2 Plasma processing apparatus 有权
标题翻译：等离子体处理装置
公开(公告)号：US08852386B2
公开(公告)日：2014-10-07
申请号：US12883761
申请日：2010-09-16
申请人： Hachishiro Iizuka , Yuki Mochizuki , Jun Abe
发明人： Hachishiro Iizuka , Yuki Mochizuki , Jun Abe
IPC分类号： H01L21/3065 , H01J37/32
CPC分类号： H01J37/32834 , H01J37/32091
摘要： A plasma processing apparatus includes a shower head that supplies a gas toward a substrate in a shower pattern through a plurality of gas discharge holes provided in a facing surface of the shower head facing a mounting table; a multiple number of gas exhaust holes provided in the facing surface of the shower head; a vertically movable ring-shaped member that is installed along a circumference of the mounting table and is configured to form, at a raised position, a processing space surrounded by the mounting table, the shower head and the ring-shaped member; a multiplicity of gas supply holes opened in an inner wall of the ring-shaped member to supply a gas into the processing space; and a plurality of gas exhaust holes opened in an inner wall of the ring-shaped member to evacuate the processing space.
摘要翻译：一种等离子体处理装置，包括：喷淋头，其通过设置在面对安装台的淋浴头的面对面上的多个气体排出孔向喷射模式的基板供给气体; 多个排气孔设置在淋浴喷头的相对面上; 沿着所述安装台的圆周安装的可垂直移动的环形构件，并且构造成在升高位置形成由所述安装台，所述淋浴头和所述环形构件包围的处理空间; 多个气体供给孔，其在所述环状部件的内壁上开口，向所述处理空间供给气体; 以及在所述环状构件的内壁中开口的多个排气孔，以对所述处理空间进行抽真空。

44. 发明申请

US20130026776A1 ASSIST GRIP FOR VEHICLE 有权
标题翻译：协助车辆
公开(公告)号：US20130026776A1
公开(公告)日：2013-01-31
申请号：US13408326
申请日：2012-02-29
申请人： Jun Abe , Hideki Oino
发明人： Jun Abe , Hideki Oino
IPC分类号： B60N3/02
CPC分类号： B60N3/023
摘要： There is provided an assist grip for a vehicle capable of gripping a grip main body easily when in use and applying force thereon and facilitating movement of getting off. The assist grip 1 for the vehicle includes the grip main body 2 for supporting getting out movement from the seat 51 of the occupant, which is provided in the lower part of the door opening 10 beside the seat 51, where the grip main body 2 is provided in a manner capable of raising and lowering in an outward direction of the vehicle. Accordingly, since the grip main body 2 falls outward of the vehicle at the time of use of the assist grip 1, a portion to which a hand of the occupant is applied becomes large, and a flexibility of posture change increases, and getting out of the occupant becomes easy.
摘要翻译：提供了一种用于能够在使用中容易地夹持把手主体并且在其上施加力并有助于下车的移动的车辆的辅助把手。用于车辆的辅助把手1包括握持主体2，其用于支撑从乘员座椅51移出的位置，该主体设置在座椅51的旁边的门开口10的下部，手柄主体2为以能够在车辆的向外方向上升降的方式设置。因此，由于在使用辅助把手1时手柄主体2向车外方向突出，所以使用者的手的一部分变大，姿势变化的灵活性增加，乘客变得容易。

45. 发明申请

US20110067815A1 PLASMA PROCESSING APPARATUS AND SHOWER HEAD 有权
标题翻译：等离子体加工设备和淋浴头
公开(公告)号：US20110067815A1
公开(公告)日：2011-03-24
申请号：US12888664
申请日：2010-09-23
申请人： Hachishiro Iizuka , Jun Abe , Yuki Mochizuki
发明人： Hachishiro Iizuka , Jun Abe , Yuki Mochizuki
IPC分类号： H01L21/3065
CPC分类号： H01J37/3244 , H01J37/3266
摘要： A plasma processing apparatus includes a shower head that is installed within a processing chamber for processing a substrate therein so as to face a mounting table for mounting the substrate thereon and supplies a gas toward the substrate in a shower pattern through a plurality of gas discharge holes provided in a facing surface of the shower head facing the mounting table; a plurality of gas exhaust holes formed through the shower head to be extended from the facing surface of the shower head to an opposite surface from the facing surface; a multiple number of rod-shaped magnet pillars standing upright in a gas exhaust space communicating with the gas exhaust holes on the side of the opposite surface; and a driving unit that varies a distance between the magnet pillars and the gas exhaust holes by moving at least a part of the magnet pillars.
摘要翻译：一种等离子体处理装置，包括安装在用于处理基板的处理室内的淋浴喷头，面对用于将基板安装在其上的安装台，并通过多个气体排出孔向喷射基板喷射气体设置在所述淋浴喷头的面向所述安装台的面对面上; 多个排气孔，其形成为穿过所述淋浴喷头，从所述喷淋头的相对表面延伸到与所述相对表面相反的表面; 多个杆状磁体柱直立放置在与相对表面侧的排气孔连通的排气空间中; 以及驱动单元，其通过移动至少一部分磁体柱来改变磁体柱和排气孔之间的距离。

46. 发明申请

US20100243607A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD USING SAME 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20100243607A1
公开(公告)日：2010-09-30
申请号：US12750015
申请日：2010-03-30
申请人： Takeshi Ohse , Shinji Himori , Jun Abe , Norikazu Yamada
发明人： Takeshi Ohse , Shinji Himori , Jun Abe , Norikazu Yamada
IPC分类号： C23F1/08 , C23F1/00
CPC分类号： H01J37/02 , H01J37/32091 , H01J37/32146 , H01J37/32165
摘要： A substrate processing method uses a substrate processing apparatus including a chamber for accommodating a substrate, a lower electrode to mount the substrate, a first RF power applying unit for applying an RF power for plasma generation into the chamber, and a second RF power applying unit for applying an RF power for bias to the lower electrode. The RF power for plasma generation is controlled to be intermittently changed by changing an output of the first RF power applying unit at a predetermined timing. If no plasma state or an afterglow state exists in the chamber by a control of the first RF power applying unit, an output of the second RF power applying unit is controlled to be in an OFF state or decreased below an output of the second RF power applying unit when the output of the first RF power applying unit is a set output.
摘要翻译：基板处理方法使用基板处理装置，其包括用于容纳基板的室，用于安装基板的下电极，用于将用于等离子体产生的RF功率施加到室中的第一RF功率施加单元和第二RF功率施加单元用于向下电极施加用于偏压的RF功率。通过在预定的定时改变第一RF功率施加单元的输出来控制等离子体产生的RF功率间歇地改变。如果通过第一RF功率施加单元的控制在腔室中不存在等离子体状态或余辉状态，则第二RF功率施加单元的输出被控制为处于OFF状态或降低到低于第二RF功率的输出当第一RF功率施加单元的输出为设定输出时，施加单元。

47. 发明授权

US07752869B2 Optical fiber preform, method for manufacturing thereof, and optical fiber obtained by drawing thereof 失效
标题翻译：光纤预制件，其制造方法以及通过其制造得到的光纤
公开(公告)号：US07752869B2
公开(公告)日：2010-07-13
申请号：US11133193
申请日：2005-05-20
申请人： Tetsuya Otosaka , Dai Inoue , Hiroshi Oyamada , Jun Abe , Hideo Hirasawa
发明人： Tetsuya Otosaka , Dai Inoue , Hiroshi Oyamada , Jun Abe , Hideo Hirasawa
IPC分类号： C03B37/018
CPC分类号： C03C13/045 , C03B37/01211 , C03B37/01291 , C03B37/01446 , C03B2201/12 , C03B2201/20 , C03B2201/28 , C03B2201/31 , C03B2203/22 , C03B2203/23 , G02B6/03694 , Y02P40/57
摘要： A method for manufacturing a preform having a core and a multilayer clad, includes covering a circumference of a rod including at least the core and an inner clad layer with a first tube including at least a high viscosity clad layer, and unifying the rod and the first tube by heating and contracting the first tube.
摘要翻译：一种制造具有芯和多层包层的预成型体的方法，包括至少包括所述芯和内包层的至少包括高粘度覆层的第一管覆盖至少包含芯的圆周的周边，并将所述棒和第一管通过加热和收缩第一管。

48. 发明申请

US20080176091A1 Optical fiber base material and manufacturing method therefore 审中-公开
标题翻译：因此，光纤基材和制造方法
公开(公告)号：US20080176091A1
公开(公告)日：2008-07-24
申请号：US11826218
申请日：2007-07-13
申请人： Jun Abe , Nobuyasu Mantoku , Fumio Saitoh
发明人： Jun Abe , Nobuyasu Mantoku , Fumio Saitoh
IPC分类号： C03B37/012 , C03B37/018 , C03C13/04
CPC分类号： C03C13/00 , C03B37/01486 , C03B2201/12 , Y02P40/57
摘要： There is provided a method for manufacturing an optical fiber base material. The method includes: connecting a dummy rod 3 to an end of a target formed of a quartz glass rod to form a rod with dummy, the target becoming the optical fiber base material by depositing thereon glass particles; forming a taper portion 10 of which a diameter of the dummy rod side is narrower than a diameter of the target side in a connecting portion between the dummy road being chucked and the target 5 when processing the rod with dummy to transparently vitrify it; and depositing glass particles on an outer circumference of the glass rod with dummy after the processing the dummy rod so as to cover the outer circumference of a large diameter side of the taper portion 10 and forming soot.
摘要翻译：提供了一种制造光纤基材的方法。该方法包括：将虚拟棒3连接到由石英玻璃棒形成的靶的端部以形成具有虚拟的杆，所述目标通过在其上沉积玻璃颗粒而变为光纤基材; 形成一个锥形部分10，其中，当用虚拟物处理该棒时，虚拟棒侧的直径在被夹持的虚拟公路与目标5之间的连接部分中的目标侧的直径比其透明玻璃化; 并且在处理所述虚拟棒之后，将具有虚拟物的玻璃棒的玻璃颗粒沉积在所述锥形部分10的大直径侧的外圆周上并形成烟灰。

49. 发明申请

US20070204422A1 Wiper Blade 有权
标题翻译：雨刮片
公开(公告)号：US20070204422A1
公开(公告)日：2007-09-06
申请号：US11629739
申请日：2005-06-17
申请人： Ken Machida , Masaru Fujiwara , Ryu Ikezawa , Jun Abe , Yasuo Ohashi , Mineya Fukushi , Yukiho Murata
发明人： Ken Machida , Masaru Fujiwara , Ryu Ikezawa , Jun Abe , Yasuo Ohashi , Mineya Fukushi , Yukiho Murata
IPC分类号： B60S1/38
CPC分类号： B60S1/3893 , B60S1/38 , B60S2001/3812 , B60S2001/382 , B60S2001/3822
摘要： A wiper blade 11 linked to a wiper arm 14 has a blade rubber 16 and a rubber holder 15 with a U-shaped section, wherein the rubber holder 15 is formed shorter in axial length than the blade rubber 16 and surrounds an intermediate portion of the blade rubber 16. Both end portions in a longitudinal direction of the rubber holder 15 are provided with a pair of holding portions 31 and 32, wherein the holding portion 31 has a holding claw 33 engaged with a stopper portion 36 provided in a holding groove 35 of the blade rubber 16 and the holding portion 32 has a holding claw 37 engaged slidably with the holding groove 35 of the blade rubber 16 and the rubber holder 15 is linked to the blade rubber 16 by two position of these holding portions 31 and 32.
摘要翻译：连接到刮水器臂14的刮水片11具有叶片橡胶16和具有U形截面的橡胶保持件15，其中橡胶保持件15形成为比叶片橡胶16更短的轴向长度，并且包围橡胶保持件15的长度方向两端部设置有一对保持部31,32，其中保持部31具有与设置在保持槽35中的止动部36卡合的保持爪33 刀片橡胶16和保持部32具有与刀片橡胶16的保持槽35可滑动地卡合的保持爪37，并且橡胶保持件15通过这些保持部31和32的两个位置连接到刀片橡胶16。

50. 发明申请

US20050229639A1 Optical fiber preform, method for manufacturing thereof, and optical fiber obtained by drawing thereof 失效
标题翻译：光纤预制件，其制造方法以及通过其制造得到的光纤
公开(公告)号：US20050229639A1
公开(公告)日：2005-10-20
申请号：US11133193
申请日：2005-05-20
申请人： Tetsuya Otosaka , Dai Inoue , Hiroshi Oyamada , Jun Abe , Hideo Hirasawa
发明人： Tetsuya Otosaka , Dai Inoue , Hiroshi Oyamada , Jun Abe , Hideo Hirasawa
IPC分类号： G02B6/00 , C03B37/012 , C03B37/014 , C03B37/018 , C03C13/04 , G02B6/02 , C03B37/075
CPC分类号： C03C13/045 , C03B37/01211 , C03B37/01291 , C03B37/01446 , C03B2201/12 , C03B2201/20 , C03B2201/28 , C03B2201/31 , C03B2203/22 , C03B2203/23 , G02B6/03694 , Y02P40/57
摘要： Even if an optical fiber obtained by drawing a preform is exposed to hydrogen atmosphere, an OH peak in the optical fiber at wavelength of about 1385 nm hardly rises regardless of the condition of drawing.
摘要翻译：即使通过拉伸预成型体获得的光纤暴露于氢气氛中，波长约1385nm的光纤中的OH峰也不会随着拉伸条件而上升。

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