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41. 发明授权

US08045134B2 Lithographic apparatus, control system and device manufacturing method 有权
标题翻译：光刻设备，控制系统和器件制造方法
公开(公告)号：US08045134B2
公开(公告)日：2011-10-25
申请号：US11373493
申请日：2006-03-13
申请人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
发明人： Marcus Adrianus Van De Kerkhof , Johannes Henricus Wilhelmus Jacobs , Tammo Uitterdijk , Nicolas Alban Lallemant
IPC分类号： G03B27/52
CPC分类号： G03F7/70858 , G03F7/70258 , G03F7/70341 , G03F7/705 , G03F7/70575 , G03F7/706
摘要： An immersion lithographic apparatus is disclosed that has a measurement system or a prediction system for measuring and/or predicting, respectively, an effect associated with a temperature fluctuation of the immersion liquid, and a control system for controlling the or another effect associated with the temperature of the immersion liquid, on the basis of the measurement and/or prediction obtained by the measurement system and/or prediction system, respectively. An associated control system and device manufacturing method is also disclosed.
摘要翻译：公开了一种浸没式光刻设备，其具有用于分别测量和/或预测与浸没液体的温度波动相关的影响的测量系统或预测系统，以及用于控制与温度相关的或另一效应的控制系统基于由测量系统和/或预测系统获得的测量和/或预测的浸没液体。还公开了一种相关的控制系统和设备制造方法。

42. 发明申请

US20110200246A1 Method of Measuring Overlay Error and a Device Manufacturing Method 有权
标题翻译：测量覆盖误差的方法和器件制造方法
公开(公告)号：US20110200246A1
公开(公告)日：2011-08-18
申请号：US13055594
申请日：2009-07-27
申请人： Marcus Adrianus Van De Kerkhof , Leonardus Henricus Marie Verstappen
发明人： Marcus Adrianus Van De Kerkhof , Leonardus Henricus Marie Verstappen
IPC分类号： G06K9/00
CPC分类号： G03F7/70633 , G03F7/705
摘要： The overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined.
摘要翻译：测量scribelane中目标的重叠误差。由于例如对曝光处理的不同响应，芯片区域中所需特征的覆盖误差可能与此不同。使用模型来模拟这些差异，从而更准确地测量所确定的特征的覆盖误差。

43. 发明申请

US20110199592A1 LITHOGRAPHIC APPARATUS, REMOVABLE MEMBER AND DEVICE MANUFACTURING METHOD 有权
标题翻译：平面设备，可拆卸构件和设备制造方法
公开(公告)号：US20110199592A1
公开(公告)日：2011-08-18
申请号：US12946618
申请日：2010-11-15
申请人： Roelof Frederik De Graff , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Nina Vladimirovna Dziomkina , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf , Vijay Kumar Badam
发明人： Roelof Frederik De Graff , Marcus Adrianus Van De Kerkhof , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Gerardus Martinus Antonius De Rooij , Martijn Houben , Nina Vladimirovna Dziomkina , Johanna Antoinette Maria Sondag-Huethorst , Niek Elout De Kruijf , Vijay Kumar Badam
IPC分类号： G03B27/52 , C09J7/00 , F16J15/02
CPC分类号： C09J7/0217 , B32B2307/546 , B32B2307/56 , B32B2307/71 , B32B2307/73 , B32B2405/00 , C09J7/21 , C09J7/385 , G03F7/70341 , G03F7/70808 , G03F7/70916 , G03F7/7095 , Y10T428/28 , Y10T428/2843 , Y10T428/2848 , Y10T428/2852
摘要： A sealing member is provided to prevent immersion liquid ingress to a gap between components. The sealing member has a plastic or polymer sealing portion that is adhered to the components forming the gap being sealed. The sealing member is constructed so as to reduce the force-coupling, in particular the time-related force-coupling, between the components being sealed.
摘要翻译：提供密封构件以防止浸入液体进入部件之间的间隙。密封构件具有粘附到形成被密封的间隙的部件的塑料或聚合物密封部分。密封构件被构造成减少被密封的部件之间的力耦合，特别是与时间有关的力耦合。

44. 发明授权

US07443485B2 Apodization measurement for lithographic apparatus 有权
标题翻译：光刻设备的变迹测量
公开(公告)号：US07443485B2
公开(公告)日：2008-10-28
申请号：US11220389
申请日：2005-09-07
申请人： Marcus Adrianus Van De Kerkhof , Haico Victor Kok
发明人： Marcus Adrianus Van De Kerkhof , Haico Victor Kok
IPC分类号： G03B27/54 , G03B27/72
CPC分类号： G03F7/70591
摘要： A method and apparatus are provided for measuring the apodization of projection optics for use in a lithographic apparatus, the projection optics having an object plane where, in use, a reticle is placed, a pupil plane, and an image plane where, in use, a wafer is placed. The method includes placing one or more Appropriate apertures in said object plane for creating a substantially uniform light distribution, illuminating the or each aperture and measuring the intensity distribution at a plane which is conjugate to the pupil plane in order to calculate the apodization of the projection optics.
摘要翻译：提供了一种用于测量用于光刻设备的投影光学器件的变迹的方法和装置，所述投影光学器件具有物体平面，其中在使用中放置了掩模版，瞳平面和图像平面，放置晶片。该方法包括将一个或多个适当的孔放置在所述物体平面中，以产生基本上均匀的光分布，照亮该孔或每个孔并测量与瞳平面共轭的平面处的强度分布，以便计算投影的变迹光学。

45. 发明授权

US07375799B2 Lithographic apparatus 有权
标题翻译：平版印刷设备
公开(公告)号：US07375799B2
公开(公告)日：2008-05-20
申请号：US11065349
申请日：2005-02-25
申请人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk
发明人： Marcus Adrianus Van De Kerkhof , Wilhelmus Petrus De Boeij , Hendrikus Robertus Marie Van Greevenbroek , Michel Fransois Hubert Klaassen , Martijn Gerard Dominique Wehrens , Tammo Uitterdijk
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70133 , G03F7/70566 , G03F7/70591 , G03F7/7085
摘要： A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate; and a detector for measuring the intensity of the radiation after it has passed through the projection system. The apparatus further includes a polarization changing element, such as a quarter-wave plate, that is adjustable; and a polarization analyzer, such as a linear polarizer, wherein the polarization changing element and the polarization analyzer are arranged in order in the radiation beam path at the level at which a patterning device would be held by the support. By taking intensity measurements, using the detector, for different rotational orientations of the polarization changing element, information on the state of polarization of the radiation at the level of the patterning device can be obtained. Because the polarization analyzer is located before the projection system, the measurements are not affected by the fact that the detector is located after the projection system, such as at the level of the substrate.
摘要翻译：光刻设备包括被配置为调节辐射束的照明系统; 构造成支撑图案形成装置的支撑件，所述图案形成装置能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持基板的基板台; 投影系统，被配置为将所述图案化的辐射束投影到所述基板的目标部分上; 以及用于在辐射通过投影系统之后测量辐射强度的检测器。该装置还包括可调节的诸如四分之一波片的偏振变化元件; 以及诸如线性偏振器的偏振分析器，其中偏振改变元件和偏振分析器在辐射束路径中依次布置在图案形成装置将被支撑件保持的水平处。通过采用强度测量，使用检测器，对于偏振变化元件的不同的旋转取向，可以获得关于在图案形成装置的电平处的辐射的偏振状态的信息。由于偏振分析仪位于投影系统之前，测量不受检测器位于投影系统之后（例如在基板的水平面）的事实的影响。

46. 发明授权

US06650399B2 Lithographic projection apparatus, a grating module, a sensor module, a method of measuring wave front aberrations 有权
标题翻译：平版印刷设备，光栅模块，传感器模块，测量波前像差的方法
公开(公告)号：US06650399B2
公开(公告)日：2003-11-18
申请号：US10073119
申请日：2002-02-12
申请人： Johannes Jacobus Matheus Baselmans , Marco Hugo Petrus Moers , Hans Van Der Laan , Robert Wilhelm Willekers , Wilhelmus Petrus De Boeij , Marcus Adrianus Van De Kerkhof
发明人： Johannes Jacobus Matheus Baselmans , Marco Hugo Petrus Moers , Hans Van Der Laan , Robert Wilhelm Willekers , Wilhelmus Petrus De Boeij , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B2742
CPC分类号： G01M11/0264 , G01M11/0285 , G03F7/706
摘要： A lithographic projection apparatus including an illumination system; a support structure for holding a mask; a substrate table for holding a substrate; a projection system for projecting a pattern onto a target portion of the substrate; and an interferometric measurement system for measuring wave front aberrations of the projection system, characterized in that the interferometric measurement system including: a grating, featuring a grating pattern in a grating plane, said grating being movable into and out of the projection beam, such that the grating plane is substantially coincident with said object plane; a pinhole, featuring a pinhole pattern in a pinhole plane and arranged in a pinhole plate, said pinhole being movable into and out of the projection beam, such that the pinhole plane is substantially coincident with a plane downstream of the projection system and optically conjugate to said object plane, and a detector with a detector surface substantially coincident with a detection plane, said detection plane located downstream of the pinhole at a location where a spatial distribution of the electric field amplitude of the projection beam is substantially a Fourier transformation of a spatial distribution of the electric field amplitude of the projection beam in the pinhole plane.
摘要翻译：一种光刻投影装置，包括照明系统; 用于保持面罩的支撑结构; 用于保持衬底的衬底台; 投影系统，用于将图案投影到所述基板的目标部分上; 以及用于测量所述投影系统的波前像差的干涉测量系统，其特征在于，所述干涉测量系统包括：光栅，其特征在于光栅平面中的光栅图案，所述光栅可移入和移出所述投影光束，使得光栅平面基本上与所述物平面重合; 针孔，其具有针孔平面中的针孔图案并且布置在针孔板中，所述针孔可移动进入和离开投影梁，使得针孔平面基本上与投影系统的下游平面重合，并且与光学共轭所述物体平面和检测器表面基本上与检测平面重合的检测器，所述检测平面位于所述针孔的下游，所述位置处投影光束的电场振幅的空间分布基本上是空间的傅立叶变换投影光束在针孔平面中的电场振幅分布。

47. 发明授权

US09494872B2 Inspection method for lithography 有权
标题翻译：光刻检验方法
公开(公告)号：US09494872B2
公开(公告)日：2016-11-15
申请号：US13060390
申请日：2009-09-08
申请人： Kaustuve Bhattacharyya , Arie Jeffrey Den Boef , Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar
发明人： Kaustuve Bhattacharyya , Arie Jeffrey Den Boef , Marcus Adrianus Van De Kerkhof , Maurits Van Der Schaar
IPC分类号： G03F7/20
CPC分类号： G03F7/70633 , G03F7/70625
摘要： The present invention relates to an inspection apparatus and method which include projecting a measurement radiation beam onto a target on a substrate in order to measure the radiation reflected from the target and obtain information related to properties of the substrate. In the present embodiments, the measurement spot, which is the focused beam on the substrate, is larger than the target. Information regarding the radiation reflected from the target is kept and information regarding the radiation reflected from the surface around the target is eliminated. This is done either by having no reflecting (or no specularly reflecting) surfaces around the target or by having known structures around the target, the information from which may be recognized and removed from the total reflected beam. The reflected beam is measured in the pupil plane of the projector such that the information obtained is related to diffraction orders of the reflected beam and profile, critical dimension or overlay of structures on the substrate may be determined.
摘要翻译：本发明涉及一种检查装置和方法，其包括将测量辐射束投射到基板上的目标上，以便测量从目标反射的辐射，并获得与基板的特性有关的信息。在本实施例中，作为基板上的聚焦光束的测量点大于目标。关于从目标反射的辐射的信息被保留，并且关于从目标周围的表面反射的辐射的信息被消除。这可以通过在靶周围没有反射（或没有镜面反射）表面或通过在靶周围具有已知结构来完成，可以从总反射光束识别和去除信息。在投影仪的瞳平面中测量反射光束，使得所获得的信息与反射光束的衍射级和轮廓，基底上的结构的临界尺寸或重叠相关。

48. 发明授权

US08982329B2 Method and apparatus for measuring line end shortening, substrate and patterning device 有权
标题翻译：用于测量线端缩短的方法和装置，基板和图案形成装置
公开(公告)号：US08982329B2
公开(公告)日：2015-03-17
申请号：US12933806
申请日：2009-04-22
申请人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Marcus Adrianus Van De Kerkhof
发明人： Maurits Van Der Schaar , Arie Jeffrey Den Boef , Richard Johannes Franciscus Van Haren , Marcus Adrianus Van De Kerkhof
IPC分类号： G03B27/32 , G01B11/14 , G03F7/20 , G01N21/956 , G03F1/00 , G03F1/44
CPC分类号： G03F7/70683 , G01N21/95607 , G03F1/0092 , G03F1/14 , G03F1/44 , G03F1/84 , G03F7/70625 , G03F7/70641
摘要： End of line effect can occur during manufacture of components using a lithographic apparatus. These end of line effects can result in line end shortening of the features being manufactured. Such line end shortening may have an adverse impact on the component being manufactured. It is therefore desirable to predict and/or monitor the line end shortening. A test pattern is provided that has two separate areas such that, as designed, when the two areas are illuminated with radiation (for example from an angle-resolved scatterometer) they result in diffused radiation with asymmetry that is equal in sign to each other, but opposite in magnitude. When the test pattern is actually manufactured, line end shortening occurs, and so the asymmetry of the two areas are not equal and opposite. From the measured asymmetry of the manufactured test pattern, the amount of line end shortening that has occurred can be estimated.
摘要翻译：在使用光刻设备的部件的制造期间可能发生线路效应的结束。这些线路效应的结束可能导致正在制造的功能的线端缩短。这种线端缩短可能对正在制造的部件产生不利影响。因此，希望预测和/或监视线端缩短。提供了具有两个独立区域的测试图案，使得如设计的那样，当两个区域被辐射照射时（例如，从角度分辨的散射仪）照射，它们导致具有彼此相等的不对称性的漫射辐射，但在数量上相反。当实际制造测试图形时，发生线端缩短，因此两个区域的不对称性不相等。根据制造的测试图案的测量不对称性，可以估计发生的线端缩短量。

49. 发明授权

US08830472B2 Method of assessing a model of a substrate, an inspection apparatus and a lithographic apparatus 有权
标题翻译：评估基板，检查装置和光刻装置的模型的方法
公开(公告)号：US08830472B2
公开(公告)日：2014-09-09
申请号：US12920984
申请日：2009-03-30
申请人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Henricus Petrus Maria Pellemans , Martin Ebert
发明人： Arie Jeffrey Den Boef , Hugo Augustinus Joseph Cramer , Marcus Adrianus Van De Kerkhof , Henricus Petrus Maria Pellemans , Martin Ebert
IPC分类号： G01N21/55 , G01N21/956 , G01N21/95 , G03F7/20 , G01N21/47 , G01N21/88
CPC分类号： G01N21/9501 , G01N21/47 , G01N21/95607 , G01N2021/8845 , G03F7/70625
摘要： A method of assessing a model of a substrate is presented. A scatterometry measurement is taken using radiation at a first wavelength. The wavelength of the radiation is then changed and a further scatterometry measurement taken. If the scatterometry measurements are consistent across a range of wavelengths then the model is sufficiently accurate. However, if the scatterometry measurements change as the wavelength changes then the model of the substrate is not sufficiently accurate.
摘要翻译：提出了一种评估底物模型的方法。使用第一波长的辐射进行散射测量。然后改变辐射的波长，并进行进一步的散射测量。如果散射测量在波长范围内是一致的，则模型是足够准确的。然而，如果散射测量值随着波长的变化而变化，则衬底的模型不够准确。

50. 发明授权

US08773637B2 Lithographic apparatus and device manufacturing method of applying a pattern to a substrate using sensor and alignment mark 有权
标题翻译：平版印刷设备和使用传感器和对准标记将图案施加到基板的装置制造方法
公开(公告)号：US08773637B2
公开(公告)日：2014-07-08
申请号：US12908564
申请日：2010-10-20
申请人： Marcus Adrianus Van De Kerkhof , Willem Jurrianus Venema , Bearrach Moest , Vasco Miguel Matias Serrao , Cedran Bomhof
发明人： Marcus Adrianus Van De Kerkhof , Willem Jurrianus Venema , Bearrach Moest , Vasco Miguel Matias Serrao , Cedran Bomhof
IPC分类号： G03B27/52 , G03F9/00
CPC分类号： G03F7/70775 , B21B38/00 , G03F9/7011 , G03F9/7019 , G03F9/7026 , G03F9/7088 , G03F9/7092 , H01J2235/062
摘要： A lithographic apparatus includes at least one image alignment sensor for receiving radiation projected from an alignment mark on a reticle. Processor processes signals from the sensor(s) to resolve spatial information in the projected alignment mark to establish a reference for measuring positional relationships between a substrate support and the patterning location. Examples of the sensor include line arrays of photodetectors. A single array can resolve spatial information in a plane of the sensor (X, Y direction) and in a perpendicular (Z) direction. At least a final step in establishing the reference position is performed while holding the substrate support stationary. Errors and delays induced by mechanical scanning of prior art sensors are avoided. Alternatively (not illustrated) the sensor is moved for mechanical scanning relative to the substrate support, independently of the main positioning systems.
摘要翻译：光刻设备包括至少一个图像对准传感器，用于接收从掩模版上的对准标记投射的辐射。处理器处理来自传感器的信号以解决投影对准标记中的空间信息，以建立用于测量基板支撑件和图案化位置之间的位置关系的参考。传感器的示例包括光电检测器的线阵列。单个阵列可以解析传感器（X，Y方向）和垂直（Z）方向的平面内的空间信息。在保持基板支撑固定的同时执行建立基准位置的至少最后一步。避免了现有技术传感器的机械扫描引起的错误和延迟。或者（未示出），传感器相对于基板支撑件移动以进行机械扫描，而与主定位系统无关。

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