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41. 发明授权

US4714831A Spherical retarding grid analyzer 失效
标题翻译：球形延迟网格分析仪
公开(公告)号：US4714831A
公开(公告)日：1987-12-22
申请号：US859102
申请日：1986-05-01
申请人： Gregory J. Clark , Praveen Chaudhari , Jerome J. Cuomo , Margaret A. Frisch , James L. Speidell
发明人： Gregory J. Clark , Praveen Chaudhari , Jerome J. Cuomo , Margaret A. Frisch , James L. Speidell
IPC分类号： G21K1/087 , H01J37/04 , H01J37/05 , H01J49/48 , H01J40/04
CPC分类号： H01J37/04 , H01J49/488
摘要： A spherical grid for use in instrumentation comprising a rigid non-magnetic frame having a pattern of holes. Into each hole a flat wafer is placed, each wafer having etched therein holes defining the grid mesh. The frame maintains the geometric conformal shape allowing large units to be constructed.
摘要翻译：用于仪器的球形网格，包括具有孔图案的刚性非磁性框架。在每个孔中放置一个平坦的晶片，每个晶片在其中蚀刻有限定网格网格的孔。框架保持几何适形形状，允许构建大型单元。

42. 发明授权

US4633129A Hollow cathode 失效
标题翻译：空心阴极
公开(公告)号：US4633129A
公开(公告)日：1986-12-30
申请号：US729028
申请日：1985-04-30
申请人： Jerome J. Cuomo , Harold R. Kaufman , Stephen M. Rossnagel
发明人： Jerome J. Cuomo , Harold R. Kaufman , Stephen M. Rossnagel
IPC分类号： H01J37/077 , H01J1/02 , H01J43/08
CPC分类号： H01J1/025
摘要： A long life high current density hollow cathode electron beam source for use in various E-beam apparatus which uses an ionizable gas within the hollow cathode. Bombardment of an electron emissive surface within the hollow cathode by energetic gas ions causes electrons to be emitted by secondary emission rather than thermionic emission effects. Once initialized by an external ionization voltage the device is essentially self sustaining and operates near room temperature, rather than at thermionic emission temperatures, and with reduced voltages.
摘要翻译：一种长寿命的高电流密度中空阴极电子束源，用于各种电子束装置，其使用空心阴极内的可电离气体。通过能量气体离子轰击空心阴极内的电子发射表面，可以通过二次发射而不是热离子发射效应来发射电子。一旦通过外部电离电压初始化，器件基本上是自我维持的，并且在室温附近操作，而不是在热离子发射温度下并且具有降低的电压。

43. 发明授权

US4541890A Hall ion generator for working surfaces with a low energy high intensity ion beam 失效
标题翻译：霍尔离子发生器用于具有低能量高强度离子束的工作表面
公开(公告)号：US4541890A
公开(公告)日：1985-09-17
申请号：US654045
申请日：1984-09-24
申请人： Jerome J. Cuomo , Harold R. Kaufman
发明人： Jerome J. Cuomo , Harold R. Kaufman
IPC分类号： H01J27/02 , H01J37/08
CPC分类号： H01J27/143 , H01J37/08
摘要： Apparatus and method for generating low energy, high intensity ion beams. A Hall current ion source is provided to conduct many integrated circuit fabrication processes which require low energy ion bombardment such as surface cleaning. Ion sources are provided which have tapered magnetic pole pieces for controlling the dispersion pattern of the ion beam.
摘要翻译：用于产生低能量，高强度离子束的装置和方法。提供霍尔电流离子源以进行需要低能量离子轰击（诸如表面清洁）的许多集成电路制造工艺。提供离子源，其具有用于控制离子束的分散图案的锥形磁极片。

44. 发明授权

US4316093A Sub-100A range line width pattern fabrication 失效
标题翻译：亚100A范围线宽图案制造
公开(公告)号：US4316093A
公开(公告)日：1982-02-16
申请号：US81760
申请日：1979-10-04
申请人： Alec N. Broers , Jerome J. Cuomo , Robert B. Laibowitz , Walter W. Molzen, Jr.
发明人： Alec N. Broers , Jerome J. Cuomo , Robert B. Laibowitz , Walter W. Molzen, Jr.
IPC分类号： G03F7/00 , G03F7/004 , H01L21/027 , H01L21/312 , B05D3/06
CPC分类号： H01L21/0277 , G03F7/0017 , G03F7/004 , H01L21/312 , H01L21/3121
摘要： Sub-100A line width patterns are formed on a member by electron beam conversion and fixing of a resist that arrives at the reaction zone point by surface migration into a resist pattern of a precise thickness and width while the member rests on an electron backscattering control support.
摘要翻译：通过电子束转换和通过表面迁移而到达反应区点的抗蚀剂固定到具有精确厚度和宽度的抗蚀剂图案的部件上形成小于100A的线宽图案，同时元件靠在电子反向散射控制支架。

45. 发明授权

US4250009A Energetic particle beam deposition system 失效
标题翻译：能量粒子束沉积系统
公开(公告)号：US4250009A
公开(公告)日：1981-02-10
申请号：US40339
申请日：1979-05-18
申请人： Jerome J. Cuomo , Richard J. Gambino , James M. Harper , John D. Kupstis
发明人： Jerome J. Cuomo , Richard J. Gambino , James M. Harper , John D. Kupstis
IPC分类号： C23F4/00 , C23C14/34 , C23C14/46 , C23C15/00
CPC分类号： C23C14/46
摘要： An energetic particle beam is accelerated towards a sputtering target. The target is located at an angle to the path of the beam (although it need not be). The target material which is dislodged by the ion beam can be directed towards a substrate. The material is composed of atoms forming both positive and negative ions. The voltage difference between the target and the substrate can be adjusted to be positive or negative so that either positive ions or negative ions can be accelerated to the substrate by means of adjusting the target-substrate voltage difference. In addition, means can be provided for collecting electrons included with the ions moving towards and away from the target. Such means can comprise a grid located adjacent to the target. It is also possible that electrons can be collected by means of an electric field confining structure which permits the ions to pass through while the electrons are deflected. Techniques. used elsewhere to separate electrons from ions have included bending beams to fit through apertures and use of magnetic grids to deflect electrons differentially. In both cases, the degree of deflection of ions is far different because the mass of an ion is large relative to the mass of an electron which makes separation easy. The advantage here is that the sputter deposition makes it possible to deposit positive and negative ions alternately or in a desired graded mixture at an interface under gradually changing voltage control.
摘要翻译：高能粒子束朝向溅射靶加速。目标位于与梁的路径成一定角度（尽管不需要）。通过离子束移动的目标材料可以被引向衬底。该材料由形成正离子和负离子的原子组成。可以将目标和衬底之间的电压差调整为正或负，以便通过调整目标衬底电压差来将正离子或负离子加速到衬底。此外，可以提供用于收集包含在离开靶子和远离靶的离子中的电子的装置。这种装置可以包括位于与目标相邻的网格。也可以通过允许离子在电子被偏转的同时通过的电场约束结构来收集电子。技巧在其他地方使用离子分离电子的方法包括弯曲梁以适应穿孔，并使用磁栅来使电子差异化。在这两种情况下，离子的偏转程度是非常不同的，因为离子的质量相对于电子的质量大，这使得分离变得容易。这里的优点是，溅射沉积使得可以在逐渐变化的电压控制下交替地或者在期望的分级混合物在界面处沉积正离子和负离子。

46. 发明授权

US4231816A Amorphous metallic and nitrogen containing alloy films 失效
标题翻译：无定形金属和含氮合金膜
公开(公告)号：US4231816A
公开(公告)日：1980-11-04
申请号：US866115
申请日：1977-12-30
申请人： Jerome J. Cuomo , Amitava Gangulee , John Kobliska
发明人： Jerome J. Cuomo , Amitava Gangulee , John Kobliska
IPC分类号： C22C1/00 , C22C45/04 , C23C14/00 , C23C14/14 , C23C30/00 , H01C7/00 , H01F10/12 , H01F10/13 , H01F10/14 , H01F41/18 , C04B35/00
CPC分类号： C22C45/04 , C23C14/0036 , C23C30/00 , H01C7/006 , H01F10/131 , Y10T428/31522
摘要： These amorphous metal-alloy films include nitrogen, greater than about one atomic percent at least one transition metal selected from Cr, Fe, Co and Ni with at least one element forming an amorphous alloy therewith, selected from the "glass forming" elements, i.e., B, Si, Al, C and P. The alloys can be formed by deposition in a vacuum chamber. When films are sputtered, the target is composed of the above alloy elements with at least one element selected from each of the transition metal and glass forming element groups. Sputtering occurs in an atmosphere above about 2% vol. N.sub.2 gas mixed with an inert gas, e.g., Ar. Alloys produced include N, i.e., (Co-Fe-B)N and (Fe-B)N. Above about 2 atomic % N in the film, films have lower values of saturation magnetization 4.pi.M.sub.s. Above a 2% vol. N.sub.2 gas in the plasma, electrical resistivity increases. Over 0.5% vol. N.sub.2 gas in the plasma, the film's effective perpendicular anisotropy field H.sub.k.sup.* increases. For (Co-Fe-B)N, the anisotropy direction moves from in plane to perpendicular above 2% vol. N.sub.2 plasmas. For (Fe-B)N, H.sub.k.sup.* increases with N.sub.2 up to 10% vol. N.sub.2 plasma. The N% in a film varies linearly with the log of N.sub.2 % vol. Films show markedly improved adhesion, corrosion resistance and hardness. Magnetic thermal stability increases with N.sub.2 above about 5% vol. N.sub.2 in a plasma. Structural and magnetic properties are stable for annealing up to 400.degree. C.
摘要翻译：这些非晶金属合金膜包括大于约1原子％的选自Cr，Fe，Co和Ni中的至少一种过渡金属与选自“玻璃形成”元素的至少一种元素形成非晶合金的氮，即，B，Si，Al，C和P.合金可以通过沉积在真空室中形成。当溅射薄膜时，靶材由上述合金元素组成，其中至少一种元素选自过渡金属和玻璃形成元素组。溅射发生在高于约2％vol的气氛中。与惰性气体混合的N 2气体，例如Ar。所生产的合金包括N，即（Co-Fe-B）N和（Fe-B）N。膜中的约2原子％N以上，膜具有较低的饱和磁化强度，等离子体中的N2气体，电阻率增加。超过0.5％等离子体中的N2气体，膜的有效垂直各向异性场Hk *增加。对于（Co-Fe-B）N，各向异性方向从平面延伸到垂直于2％vol以上。 N2等离子体。对于（Fe-B）N，Hk *随着N2增加至10体积％。 N2等离子体。膜中的N％随着N2％体积的对数线性变化。膜显示出显着改善的附着力，耐腐蚀性和硬度。磁性热稳定性随着N2高于约5％vol而增加。 N2在等离子体中。结构和磁性能在400℃退火时是稳定的。

47. 发明授权

US3949387A Beam addressable film using amorphous magnetic material 失效
标题翻译：使用非晶磁性材料的光束寻址膜
公开(公告)号：US3949387A
公开(公告)日：1976-04-06
申请号：US284512
申请日：1972-08-29
申请人： Praveen Chaudhari , Jerome J. Cuomo , Richard J. Gambino , Thomas R. McGuire
发明人： Praveen Chaudhari , Jerome J. Cuomo , Richard J. Gambino , Thomas R. McGuire
IPC分类号： G11C11/14 , G11B11/10 , G11B11/105 , G11B11/11 , G11C13/06 , G11C19/08 , H01F10/00 , H01F10/12 , H01F10/13
CPC分类号： G11B11/11 , G11B11/10 , G11B11/10504 , G11B11/10515 , G11B11/10517 , G11B11/10526 , G11B11/10545 , G11B11/10591 , G11C13/06 , G11C19/0808 , G11C19/085 , G11C19/0866 , H01F10/13 , H01F10/137
摘要： A beam addressable file using as a storage medium an amorphous magnetic composition having uniaxial anisotropy. The storage medium can be prepared in thin film or bulk form or as particles in a binder. The storage medium can be comprised of a single element or a multicomponent system where at least one of the components has an unpaired spin so that the composition has a net magnetic moment. The storage comosition exists in a microcrystalline structure (i.e., it has localized atomic ordering over a distance 25-100 angstroms) and also in a substantially amorphous structure (i.e., when the composition has localized atomic ordering only over distances less than 25 angstroms). Binary and ternary compositions, either alloys or compounds, are suitable. particularly good examples are combinations of rare earth elements and transition metal elements. The magnetic properties of these amorphous magnetic compositions are easily changed during fabrication or after fabrication, and the compositions can be doped readily without adversely affecting magnetic properties. Either electron beams or light beams can be used to write information into the storage medium and optical readout is generally preferred. Curie point writing or compensation point writing is used.
摘要翻译：使用具有单轴各向异性的非晶磁性组合物作为存储介质的光束可寻址文件。存储介质可以以薄膜或本体形式或作为粘合剂中的颗粒制备。存储介质可以由单个元件或多组分系统组成，其中至少一个组件具有不成对的纺丝，使得组合物具有净磁矩。存储组合存在于微晶结构中（即，其在25-100埃的距离上具有局部原子排列），并且还存在于基本上非晶结构中（即，当组合物仅在小于25埃的距离处具有局部原子排列时）。二元和三元组合物，合金或化合物都是合适的。特别好的例子是稀土元素和过渡金属元素的组合。这些非晶磁性组合物的磁性能在制造过程中或在制造之后容易改变，并且可以容易地掺杂组合物而不会不利地影响磁性能。可以使用电子束或光束将信息写入存储介质，并且通常优选光学读出。使用居里点写入或补偿点写入。

48. 发明授权

US08491936B2 Functionally graded biocompatible coating and coated implant 有权
标题翻译：功能分级的生物相容性涂层和涂层植入物
公开(公告)号：US08491936B2
公开(公告)日：2013-07-23
申请号：US11082180
申请日：2005-03-16
申请人： Afsaneh Rabiei , Jerome J. Cuomo , Brent C. Thomas
发明人： Afsaneh Rabiei , Jerome J. Cuomo , Brent C. Thomas
IPC分类号： A61F2/00 , A61K9/16
CPC分类号： A61L27/32 , A61C8/0012 , A61C8/0013 , A61F2/0077 , A61F2/30767 , A61F2/3094 , A61F2002/30028 , A61F2002/30029 , A61F2002/30929 , A61F2002/3098 , A61F2250/0051 , A61F2310/00796
摘要： The present invention provides a biocompatible coating comprising calcium phosphate that is functionally graded across the thickness of the coating. The coating, which preferably includes hydroxyapatite, is particularly useful for coating implants, such as dental or orthopedic implants. The functionally graded coating is generally crystalline near the interface with the surface of the implant, with crystallinity and crystal diameter decreasing toward the outer layer of the coating. The invention further provides methods for preparing a coated implant comprising a functionally graded calcium phosphate coating thereon.
摘要翻译：本发明提供一种生物相容性涂层，其包含在功能上分级穿过涂层厚度的磷酸钙。优选包括羟基磷灰石的涂层对于涂覆植入物例如牙科或矫形植入物是特别有用的。功能梯度涂层在与植入物表面的界面附近通常是结晶的，结晶度和晶体直径朝着涂层的外层减小。本发明进一步提供了制备涂覆植入物的方法，其中包括其上功能性梯度的磷酸钙涂层。

49. 发明授权

US06627034B1 Pattern release film between two laminated surfaces 失效
标题翻译：两层压表面之间的图案剥离膜
公开(公告)号：US06627034B1
公开(公告)日：2003-09-30
申请号：US09625903
申请日：2000-07-26
申请人： Stefan Ufer , Jerome J. Cuomo
发明人： Stefan Ufer , Jerome J. Cuomo
IPC分类号： B32B3112
CPC分类号： B32B7/06 , B32B27/08 , B32B27/281 , B32B37/0076 , B32B2315/02 , B32B2379/08 , Y10T156/1056 , Y10T156/1064
摘要： A method of forming a laminate structure comprises providing a first substrate and a second substrate each having first and second substrate surfaces respectively, and wherein the surfaces are present in an opposed spaced apart relationship; contacting at least one of the first or second substrate surfaces with a release material such that a portion of the first or second substrate surface is covered with the release material while the remainder of the first or second substrate surface is not covered with the release material; bringing the first and second substrate surfaces of the first and second substrates into contact with each other; and subjecting the substrates to conditions such that the portions of the first and second substrate surfaces not covered with release material become bonded to one another and a laminate structure is formed. The portion of the first or second substrate surface covered with the release material allows the first and second substrates to separate from each other such that an opening is formed therebetween that is substantially coincident with the portion covered with the release material.
摘要翻译：形成层压结构的方法包括提供分别具有第一和第二基板表面的第一基板和第二基板，并且其中所述表面以相对间隔的关系存在; 使第一或第二基板表面中的至少一个与释放材料接触，使得第一或第二基板表面的一部分被释放材料覆盖，而第一或第二基板表面的其余部分未被释放材料覆盖; 使第一和第二基板的第一和第二基板表面彼此接触; 并且使基板经受使得没有被剥离材料覆盖的第一和第二基板表面的部分彼此粘合并形成层压结构的条件。用释放材料覆盖的第一或第二基底表面的部分允许第一和第二基底彼此分离，使得在其间形成与被释放材料覆盖的部分基本重合的开口。

50. 发明授权

US5622635A Method for enhanced inductive coupling to plasmas with reduced sputter contamination 失效
标题翻译：减少溅射污染的等离子体感应耦合增强方法
公开(公告)号：US5622635A
公开(公告)日：1997-04-22
申请号：US417026
申请日：1995-04-05
申请人： Jerome J. Cuomo , C. Richard Guarnieri , Jeffrey A. Hopwood
发明人： Jerome J. Cuomo , C. Richard Guarnieri , Jeffrey A. Hopwood
IPC分类号： C23C14/00 , C23C16/50 , C23F4/00 , H01J37/32 , H01L21/205 , H01L21/302 , H01L21/3065 , H05H1/46 , C03C25/06 , H05H1/24
CPC分类号： H01J37/321 , H05H1/46
摘要： A method of gas plasma treating a workpiece in a process chamber having RF coil outside the chamber, a flat dielectric window, and a electrically conducting shield, adapted to be located between the RF coil and the dielectric window. The shield comprises a planar body section having a periphery, central opening, and outer gaps forming a substantially continuous opening about the periphery. A uniform magnetic field, inductively coupled with the plasma, is formed by routing the flux lines of the magnetic field through the central opening and outer gaps of the shield. Contamination from sputtering is substantially eliminated by reducing the capacitive electric fields generated by the coil that interfere with the inductive coupling between the coil and the gas plasma.
摘要翻译：一种在室外具有RF线圈的处理室中的气体等离子体处理方法，平坦电介质窗口和导电屏蔽件，其适于位于RF线圈和电介质窗口之间。屏蔽包括具有周边，中心开口和外部间隙的平面主体部分，其围绕周边形成基本上连续的开口。通过使磁场的磁通线穿过屏蔽的中心开口和外部间隙来形成与等离子体感应耦合的均匀磁场。通过减少线圈产生的电容电场干扰线圈和气体等离子体之间的电感耦合，基本上消除了溅射污染。

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