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    • 41. 发明申请
    • METAL OXIDE SEMICONDUCTOR TRANSISTOR
    • 金属氧化物半导体晶体管
    • US20120313084A1
    • 2012-12-13
    • US13480742
    • 2012-05-25
    • CHUANG-CHUANG TSAIHsiao-Wen ZanHsin-Fei MengChun-Cheng Yeh
    • CHUANG-CHUANG TSAIHsiao-Wen ZanHsin-Fei MengChun-Cheng Yeh
    • H01L29/22H01L51/30
    • H01L29/78696H01L29/78606H01L29/78693
    • A metal oxide semiconductor transistor includes a gate, a metal oxide active layer, a gate insulating layer, a source, and a drain. The metal oxide active layer has a first surface and a second surface, and the first surface faces to the gate. The gate insulating layer is disposed between the gate and the metal oxide active layer. The source and the drain are respectively connected to the metal oxide active layer. The second surface defines a mobility enhancing region between the source and the drain. An oxygen content of the metal oxide active layer in the mobility enhancing region is less than an oxygen content of the metal oxide active layer in the region outside the mobility enhancing region. The metal oxide semiconductor transistor has high carrier mobility.
    • 金属氧化物半导体晶体管包括栅极,金属氧化物有源层,栅极绝缘层,源极和漏极。 金属氧化物活性层具有第一表面和第二表面,并且第一表面面向栅极。 栅极绝缘层设置在栅极和金属氧化物有源层之间。 源极和漏极分别连接到金属氧化物活性层。 第二表面限定了源极和漏极之间的迁移率增强区域。 迁移率增强区域中的金属氧化物活性层的氧含量小于迁移率增强区域外的区域中的金属氧化物活性层的氧含量。 金属氧化物半导体晶体管具有高载流子迁移率。