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41. 发明授权

US06247548B1 Moving apparatus with drive power assisting device and movement controlling method 失效
标题翻译：带动力辅助装置的移动装置和运动控制方法
公开(公告)号：US06247548B1
公开(公告)日：2001-06-19
申请号：US09000030
申请日：1998-05-21
申请人： Toshiro Hayashi , Yuichi Nanae , Hiroyoshi Hayashi , Ichiro Katagiri , Naomasa Sato , Tetsuo Endo , Hiroyuki Itoh
发明人： Toshiro Hayashi , Yuichi Nanae , Hiroyoshi Hayashi , Ichiro Katagiri , Naomasa Sato , Tetsuo Endo , Hiroyuki Itoh
IPC分类号： B62M2302
CPC分类号： B62M6/45 , B60L11/007 , B60L11/1801 , B60L11/1872 , B60L2200/12 , B60L2240/36 , B62M6/50 , B62M6/65 , G01R31/36 , H02J7/1415 , H02K7/14 , H02K11/048 , H02K21/22 , H02K29/10 , Y02T10/641 , Y02T10/7005 , Y02T10/705 , Y10T428/249923
摘要： A moving apparatus with a driving force assist mechanism traveled mainly by human power. This moving apparatus detects, in a non-contact manner, with respect to rotating portion such as traveling wheel, etc., rotation speed of the rotating portion to detect traveling state to deliver, from the driving force assist mechanism, assistant driving force corresponding to speed change information that a person who operates the moving apparatus intends to give on the basis of the detected traveling information to carry out traveling to thereby permit smooth traveling even in the case where traveling by only human power becomes difficult.
摘要翻译：具有主要由人力驱动的驱动力辅助机构的移动装置。该移动装置以非接触的方式相对于诸如行进轮等的旋转部来检测旋转部的旋转速度，以检测行驶状态，从驱动力辅助机构传递对应于操作移动装置的人员的变速信息旨在基于检测到的行驶信息进行行驶，从而即使在仅通过人力行驶变得困难的情况下也允许顺利行驶。

42. 发明授权

US6088080A Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US6088080A
公开(公告)日：2000-07-11
申请号：US65524
申请日：1998-04-24
申请人： Hiroyuki Itoh
发明人： Hiroyuki Itoh
IPC分类号： G03F7/20 , H01L21/027 , G03B27/42 , G03B27/52 , G03B27/68
CPC分类号： G03F7/70616 , G03F7/70241 , G03F7/70633 , G03F7/70875
摘要： An exposure apparatus includes a stage for holding a substrate at an exposure station, an arm mechanism for conveying a substrate to be exposed, onto the stage, and a sensor provided on one of the stage and the arm mechanism, for measuring temperature of the substrate to be exposed. On the basis of the measured temperature, pattern projection magnification to the workpiece, for example, is corrected.
摘要翻译：曝光装置包括用于在曝光站保持基板的台，用于将待曝光的基板输送到台上的臂机构和设置在台架和臂机构之一上的传感器，用于测量基板的温度被暴露。在测量温度的基础上，例如对工件的图案投影放大率进行校正。

43. 发明授权

US5993081A In-line processing system 失效
标题翻译：在线处理系统
公开(公告)号：US5993081A
公开(公告)日：1999-11-30
申请号：US732718
申请日：1996-10-18
申请人： Hiroyuki Itoh , Shinji Tsutsui , Masahide Sato
发明人： Hiroyuki Itoh , Shinji Tsutsui , Masahide Sato
IPC分类号： B65G49/07 , G03F7/20 , H01L21/677 , G03D5/00 , B65G25/00
CPC分类号： H01L21/67748 , G03F7/7075 , G03F7/70991 , H01L21/67745 , H01L21/67778 , Y10S414/137 , Y10S414/138
摘要： An in-line processing system having an exposure processing unit and a coating and development processing unit is provided with a conveyance arm for transferring a workpiece between these units. The conveyance arm can access to each of these units, and these units have horizontal workpiece holding planes of substantially the same level. The workpiece can be conveyed between these units while being kept laid horizontally.
摘要翻译：具有曝光处理单元和涂布显影处理单元的在线处理系统设置有用于在这些单元之间传送工件的输送臂。输送臂可以接近这些单元中的每一个，并且这些单元具有基本上相同水平的水平工件保持平面。工件可以在这些单元之间传送并保持水平放置。

44. 发明授权

US5972772A Electron beam drawing process 失效
标题翻译：电子束拉制工艺
公开(公告)号：US5972772A
公开(公告)日：1999-10-26
申请号：US922334
申请日：1997-09-03
申请人： Minoru Sasaki , Yuji Tange , Yutaka Hojyo , Kazuyoshi Oonuki , Hiroyuki Itoh
发明人： Minoru Sasaki , Yuji Tange , Yutaka Hojyo , Kazuyoshi Oonuki , Hiroyuki Itoh
IPC分类号： G03F9/00 , G03F7/20 , H01J37/304 , H01J37/305 , H01J37/317 , H01L21/027 , H01L21/76
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/2061 , H01J37/304 , H01J37/3045 , H01J37/3174 , H01J2237/3045 , H01J2237/30455 , H01J2237/3175
摘要： An electron beam drawing process of high throughput, coping with the changes in static distortion and dynamic distortion of a lower layer exposure apparatus or an optical reduction exposure apparatus. At least two marks formed in each chip formed on a wafer are detected for a predetermined number of chips, and the relation between the shape distortion of each chip in the wafer plane and the wafer coordinates is determined from the positions of the detected marks and the designed positions of the marks by a statistical processing. Patterns are drawn in all chips while correcting the patterns to be drawn on the individual chips, by using the relation between the determined chip shape distortion and the wafer coordinates. As a result, the superposition exposure with the lower layer can be achieved with a high throughput and with a high accuracy without any manual adjustment.
摘要翻译：一种高产量的电子束拉制工艺，能够应对下层曝光装置或光学还原曝光装置的静态失真和动态变形的变化。对于预定数量的芯片，检测在晶片上形成的每个芯片中形成的至少两个标记，并且根据检测到的标记和晶片坐标的位置确定晶片平面中每个芯片的形状失真与晶片坐标之间的关系通过统计处理设计标记的位置。通过使用确定的芯片形状失真和晶片坐标之间的关系来校正在各个芯片上绘制的图案，在所有芯片中绘制图案。因此，无需任何手动调整，可以以高产量和高精度实现与较低层的重叠曝光。

45. 发明授权

US5759423A Electron beam writing method and apparatus for carrying out the same 失效
标题翻译：电子束写入方法及其执行装置
公开(公告)号：US5759423A
公开(公告)日：1998-06-02
申请号：US563329
申请日：1995-11-28
申请人： Yasunari Sohda , Yasuhiro Someda , Hiroyuki Itoh , Katsuhiro Kawasaki , Norio Saitou
发明人： Yasunari Sohda , Yasuhiro Someda , Hiroyuki Itoh , Katsuhiro Kawasaki , Norio Saitou
IPC分类号： G03F7/20 , H01J37/317 , H01L21/027 , B44C1/22 , H01L21/00
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31776
摘要： An electron beam writing apparatus comprises: an electron beam source for projecting an electron beam; a first mask provided with a first rectangular aperture for passing the electron beam projected by the electron beam source to shape the electron beam in a primary shaped beam having a rectangular cross section; a second mask provided with a second rectangular aperture for passing the primary shaped beam to shape the primary shaped beam in a secondary shaped beam having a rectangular cross section, and triangular apertures for passing the primary shaped beam to form a secondary shaped beam having a triangular cross section; a first electron beam deflecting system for moving the primary shaped beam on the surface of the second mask; and a second electron beam deflecting system for moving the secondary shaped beam on the surface of a workpiece on which a pattern is to be written. Each of the triangular apertures is formed in a size such that the triangular aperture can be entirely covered with a rectangular image formed by the first shaped beam on the surface of the second mask.
摘要翻译：电子束写入装置包括：用于投射电子束的电子束源; 第一掩模，设置有第一矩形孔，用于使由电子束源投影的电子束通过，以将电子束形成为具有矩形横截面的主要形状的梁; 第二掩模，其设置有第二矩形孔，用于使主要成形梁通过，以形成具有矩形截面的次级成形梁的主要成形梁，以及三角形孔，用于使初级成形梁通过以形成具有三角形的二次成形梁横截面; 第一电子束偏转系统，用于将第一形状光束移动到第二掩模的表面上; 以及用于在待写入图案的工件的表面上移动二次成形光束的第二电子束偏转系统。每个三角形孔形成为使得三角形孔可以被由第二掩模的表面上的第一成形束形成的矩形图像完全覆盖的尺寸。

46. 发明授权

US5545715A Flame-retardant resin composition 失效
标题翻译：阻燃树脂组合物
公开(公告)号：US5545715A
公开(公告)日：1996-08-13
申请号：US904737
申请日：1992-06-26
申请人： Hiroyuki Itoh , Masanori Suzuki , Akira Kamiya , Takeki Furuyama
发明人： Hiroyuki Itoh , Masanori Suzuki , Akira Kamiya , Takeki Furuyama
IPC分类号： C08L25/04 , C08L25/18 , C08L33/04 , C08L33/08 , C08L33/18 , C08L33/24 , C08L35/00 , C08L51/00 , C08L51/04 , C08L51/08 , C08L53/00 , C08J5/10 , C08K3/10
CPC分类号： C08L51/04 , C08L25/18 , C08L51/085
摘要： The present invention provides a flame-retardant resin composition comprising 100 parts by weight of a bromine-containing copolymer composition containing 1 to 40% by weight of bromine, and comprising 0 to 30 parts by weight of a flame-retarding adjuvant and 0.5 to 30 parts by weight of a polyorganosiloxane-reinforced resin component obtained by polymerizing a vinyl monomer (d) in the presence of a polyorganosiloxane polymer. The flame-retardant resin composition of the present invention has attained a remarkably higher flame retardancy by the inclusion of a polyorganosiloxane-reinforced resin. A significant improvement in the dripping phenomenon has also been achieved. Further, this composition exhibits superior impact resistance and moldability, and a superior outer appearance in the formed products.
摘要翻译：本发明提供一种阻燃性树脂组合物，其包含100重量份含有1〜40重量％的溴的含溴共聚物组合物，并含有0〜30重量份的阻燃助剂和0.5〜30重量份通过在聚有机硅氧烷聚合物的存在下聚合乙烯基单体（d）获得的聚有机硅氧烷增强树脂组分的重量份。通过包含聚有机硅氧烷增强树脂，本发明的阻燃树脂组合物获得了显着更高的阻燃性。滴水现象也有明显的改善。此外，该组合物表现出优异的耐冲击性和成型性，并且在成型体中表现出优异的外观。

47. 发明授权

US5508835A Master clock distributing method and apparatus using same 失效
标题翻译：主时钟分配方法和使用其的设备
公开(公告)号：US5508835A
公开(公告)日：1996-04-16
申请号：US127137
申请日：1993-09-27
申请人： Yasushi Takahashi , Hiroyuki Itoh
发明人： Yasushi Takahashi , Hiroyuki Itoh
IPC分类号： G02B6/00 , G06F1/06 , G06F1/10 , H04B10/2507 , H04B10/556 , H04L7/00 , H04L7/033 , H04J14/08 , H04B10/00
CPC分类号： H04L7/0075 , G06F1/06 , G06F1/105 , H04L7/0337
摘要： A logic processing apparatus comprises a plurality of integrated circuits, a multi-phase clock generator for distributing clock signals having different phases from one another to the respective integrated circuits, and a package, for air tight sealing the multi-phase clock generator and the plurality of integrated circuits, which has an optical signal transmissible window for transmitting the master clock signal to the multi-phase clock generator through the optical transmitting line.
摘要翻译：逻辑处理装置包括多个集成电路，用于将具有彼此不同相位的时钟信号分配给各个集成电路的多相时钟发生器和用于气密密封多相时钟发生器和多个时钟发生器的封装的集成电路，其具有用于通过光发送线将主时钟信号发送到多相时钟发生器的光信号传输窗。

48. 发明授权

US5440008A Process for preparing polyhydroxycarboxylic acid 失效
标题翻译：制备聚羟基羧酸的方法
公开(公告)号：US5440008A
公开(公告)日：1995-08-08
申请号：US246289
申请日：1994-05-19
申请人： Fumiaki Ichikawa , Mineo Kobayashi , Masahiro Ohta , Yasunori Yoshida , Shoji Obuchi , Hiroyuki Itoh
发明人： Fumiaki Ichikawa , Mineo Kobayashi , Masahiro Ohta , Yasunori Yoshida , Shoji Obuchi , Hiroyuki Itoh
IPC分类号： C08G63/06 , C08G63/78 , C08G63/82
CPC分类号： C08G63/823 , C08G63/06 , C08G63/785
摘要： A process for preparing polyhydroxycarboxylic acid by conducting dehydration polycondensation of hydroxycarboxylic acids in the presence or absence of a catalyst and in the presence or absence of an organic solvent, comprising using a vertical high viscosity reactor during all or a portion of the dehydration polycondensation steps and conducting hot polycondensation while separating and removing low boiling components. The process can provide high molecular weight polyhydroxycarboxylic acid with ease and cheaply in industry.
摘要翻译：在存在或不存在催化剂的情况下以及存在或不存在有机溶剂的情况下通过羟基羧酸的脱水缩聚制备聚羟基羧酸的方法，包括在全部或部分脱水缩聚步骤中使用垂直高粘度反应器，和在分离和除去低沸点组分的同时进行热缩聚。该工艺可以在工业上轻松便宜地提供高分子量的聚羟基羧酸。

49. 发明授权

US5302647A Flame resistant resin composition 失效
标题翻译：耐火树脂组合物
公开(公告)号：US5302647A
公开(公告)日：1994-04-12
申请号：US728223
申请日：1991-07-12
申请人： Masanori Suzuki , Hiroyuki Itoh , Masaaki Mawatari , Tateki Furuyama
发明人： Masanori Suzuki , Hiroyuki Itoh , Masaaki Mawatari , Tateki Furuyama
IPC分类号： C08K5/00 , C08K5/523 , C09K21/14 , C08K3/28 , C08K3/32
CPC分类号： C09K21/14 , C08K5/0066 , C08K5/523
摘要： A flame retardant resin composition which includes the following component (A) and component (B) blended in the ratio (A):(B)=100:1-40 parts by weight. Component (A) is a thermoplastic resin including 0-70% by weight of a rubber component and 100-30% by weight of a polymer component formed from monomers comprising a methylated aromatic vinyl monomer and an hydroxylated aromatic vinyl monomer and, optionally, an aromatic vinyl monomer other than the above monomers, a cyanated vinyl monomer, a (meth)acrylic acid ester monomer, maleic anhydride, and a maleimide monomer; graft ratio of the thermoplastic resin being 10-150% when the rubber component is used. Component (B) is a flame retarder.
摘要翻译：一种阻燃树脂组合物，其包含以（A）：（B）的比例共混的以下组分（A）和组分（B）= 100：1-40重量份。组分（A）是包含0-70重量％的橡胶组分和100-30重量％的由包含甲基化芳族乙烯基单体和羟基化芳族乙烯基单体的单体形成的聚合物组分的热塑性树脂，任选地，芳族乙烯基单体，上述单体，氰化乙烯基单体，（甲基）丙烯酸酯单体，马来酸酐和马来酰亚胺单体; 当使用橡胶组分时，热塑性树脂的接枝率为10-150％。组分（B）是阻燃剂。

50. 发明授权

US5296017A Method and apparatus for concentrating chlorine gas 失效
标题翻译：浓缩氯气的方法和装置
公开(公告)号：US5296017A
公开(公告)日：1994-03-22
申请号：US888360
申请日：1992-05-27
申请人： Yoshitsugu Kono , Masaaki Ura , Hiroyuki Itoh , Satoshi Tsuruda
发明人： Yoshitsugu Kono , Masaaki Ura , Hiroyuki Itoh , Satoshi Tsuruda
IPC分类号： B01D53/04 , B01D53/047 , C01B7/07
CPC分类号： C01B7/0743 , B01D53/04 , B01D53/047 , B01D2253/102 , B01D2253/108 , B01D2256/26 , B01D2257/104 , B01D2257/2025 , B01D2259/40009 , B01D2259/40062 , B01D2259/402 , B01D53/0423
摘要： A method and an apparatus for concentrating/purifying a chlorine gas are disclosed in which a pressure swing adsorption method for alternately repeating an adsorbing operation and a desorbing operation employing one or more adsorption towers packed with an adsorbent for adsorbing the chlorine gas are used to obtain a high-purity concentrated/purified chlorine gas and an exhaust gas containing virtually no chlorine gas is obtained from the chlorine gas containing impurities by terminating the adsorption operation when the rate of temperature rise near the outlet end of an adsorption tower due to adsorption of chlorine therein rises above a predetermined amount.
摘要翻译：公开了一种用于浓缩/纯化氯气的方法和装置，其中使用用于交替重复吸附操作和采用一个或多个填充有用于吸附氯气的吸附剂的吸附塔的解吸操作的变压吸附方法来获得当由于吸附氯而吸附塔出口附近的温度上升时，通过终止吸附操作，从含有杂质的氯气中获得高纯浓缩纯化氯气和实际上不含氯气的废气其中高于预定量。

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