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    • 44. 发明申请
    • MULTI CHANNEL DETECTOR, OPTICS THEREFOR AND METHOD OF OPERATING THEREOF
    • 多通道探测器,其光学器件及其操作方法
    • US20130270439A1
    • 2013-10-17
    • US13543608
    • 2012-07-06
    • Pavel Adamec
    • Pavel Adamec
    • H01J37/244H01J37/26H01J37/22
    • H01J37/244H01J2237/2441H01J2237/2449H01J2237/24592
    • A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap, a particle optics configured for separating the signal beam in a first portion of the signal beam and in at least one second portion of the signal beam, configured for focusing the first portion of the signal beam, and configured for deflecting and focusing the at least one second portion of the signal beam, wherein the particle optics includes a first electrode and at least one second electrode. Therein, the first electrode is an inner electrode and the at least one second electrode is provided radially outward of the first electrode.
    • 描述了用于检测信号光束的二次带电粒子检测装置。 所述装置包括具有至少两个具有主动检测区域的检测元件的检测器装置,其中所述主动检测区域被间隙分开,所述粒子光学器件被配置用于在所述信号束的第一部分中和在至少一个 所述信号光束的第二部分被配置用于聚焦所述信号光束的所述第一部分,并且被配置为偏转和聚焦所述信号光束的所述至少一个第二部分,其中所述粒子光学器件包括第一电极和至少一个第二电极。 其中,第一电极是内电极,并且至少一个第二电极设置在第一电极的径向外侧。
    • 46. 发明授权
    • Fast wafer inspection system
    • 快速晶圆检测系统
    • US07932495B2
    • 2011-04-26
    • US12202833
    • 2008-09-02
    • Pavel Adamec
    • Pavel Adamec
    • G21K7/00H01J37/08
    • H01J37/28H01J37/244H01J37/265H01J2237/24465H01J2237/24495H01J2237/24592
    • A charged particle beam device is provided including a particle source emitting a primary particle beam, a secondary particle beam generated by the impingement of the primary particle beam on the sample, a detection unit for detecting the secondary particle beam, the detector having at least two detector channels, and a distribution deflecting device for deflecting the secondary particle beam in a chronological sequence. Further, a detection assembly for a fast wafer inspection system is provided including a distribution deflecting device for distributing a secondary particle beam in a chronological sequence and a detector for detecting the secondary particle beam, the detector having multiple detector channels. Further, a method of operating a particle beam device with chronological resolution is provided.
    • 提供一种带电粒子束装置,包括发射一次粒子束的粒子源,通过一次粒子束撞击在样本上产生的二次粒子束,用于检测二次粒子束的检测单元,该检测器具有至少两个 检测器通道和用于按时间顺序偏转次级粒子束的分布偏转装置。 此外,提供了一种用于快速晶片检查系统的检测组件,其包括用于按时间顺序分布二次粒子束的分布偏转装置和用于检测二次粒子束的检测器,该检测器具有多个检测器通道。 此外,提供了按照时间分辨率操作粒子束装置的方法。
    • 49. 发明授权
    • Device and method for controlling focussed electron beams
    • 用于控制聚焦电子束的装置和方法
    • US06943507B2
    • 2005-09-13
    • US10474464
    • 2002-04-08
    • Dieter WinklerPavel Adamec
    • Dieter WinklerPavel Adamec
    • H01J37/073H01J37/304H01J29/52
    • H01J37/073H01J37/304H01J2237/06316H01J2237/0635H01J2237/31774
    • The invention provides a focussing electron beam device with a single or an array of field emitter beam sources to generate electron beams with field emitter beam sources, at least one anode capable of accelerating the electrons of the electron beams towards a specimen, focussing components capable of focussing the electron beams onto the specimen and a control circuit that a) senses for deviations of the actual current values of the electron beams from desired current values; b) controls first voltages V1 to adjust the actual current values of the electron beams to the desired current values and c) controls second voltages V2 to adjust the actual focus positions of the electron beams to the desired focus positions. The voltage control circuit adjusts the actual current values of the electron beams to the desired current values and makes it possible to adjust the current values of an array of electron beams to a single value. Furthermore, a focussing electron beam device is disclosed with an array of field emitter beam sources integrated onto a substrate, which makes it possible to have arrays of field emitter beam sources with thousands or even millions of field emitter beam sources. With the integration of the control circuits for each field emitter beam source it is possible to adjust the current values and focus positions of each electron beam individually. Furthermore, methods are disclosed describing the operation of a single field emitter beam source or an array of field emitter beam sources.
    • 本发明提供一种聚焦电子束装置,其具有单个或阵列的场致发射束源,以产生具有场致发射束源的电子束,至少一个阳极,能够将电子束的电子加速朝向检体, 将电子束聚焦到样本上,以及控制电路,其a)感测电子束的实际电流值与期望电流值的偏差; b)控制第一电压V 1以将电子束的实际电流值调整到期望的电流值,并且c)控制第二电压V 2以将电子束的实际焦点位置调整到期望的焦点位置。 电压控制电路将电子束的实际电流值调整到期望的电流值,并且可以将电子束阵列的电流值调整为单个值。 此外,公开了一种聚焦电子束器件,其集成在衬底上的场发射器束源的阵列,这使得可以具有数千甚至数百万场发射器束源的场发射器束源的阵列。 通过对每个场发射器束源的控制电路的集成,可以单独地调整每个电子束的电流值和聚焦位置。 此外,公开了描述单个场发射器束源或场发射器束源的阵列的操作的方法。
    • 50. 发明授权
    • Charged particle beam column
    • 带电粒子束柱
    • US06614026B1
    • 2003-09-02
    • US09292710
    • 1999-04-15
    • Pavel Adamec
    • Pavel Adamec
    • H01J37145
    • H01J37/28H01J37/1478H01J2237/1506
    • A column for directing a beam of charged particles with a finite energy spread onto a specimen surface under an oblique beam landing angle comprises: a particle source; an objective lens; a deflection unit for deflecting the beam of charged particles away from the optical axis such that the beam.of charged particles traverses the objective lens off-axis, thereby causing a chromatic aberration, a compensation unit adapted to disperse the beam of charged particles, thereby substantially compensating said chromatic aberration in the plane of the specimen surface, whereby the combined action of the objective lens and the deflection unit directs the beam of charged particles to hit the specimen surface under said large beam landing angle.
    • 用于将有限能量的带电粒子束引导到倾斜束着陆角的样品表面上的列包括:粒子源; 物镜; 偏转单元,用于使带电粒子束偏离光轴,使得带电粒子的束离轴偏离物镜,从而产生色差,适于分散带电粒子束的补偿单元,从而 基本上补偿了样品表面的平面中的色差,由此物镜和偏转单元的组合作用引导带电粒子束在所述大光束着落角度下撞击试样表面。