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    • 45. 发明授权
    • DEVICE AND METHOD FOR THE HIGH-FREQUENCY ETCHING OF A SUBSTRATE USING A PLASMA ETCHING INSTALLATION AND DEVICE AND METHOD FOR IGNITING A PLASMA AND FOR PULSING THE PLASMA OUT PUT OR ADJUSTING THE SAME UPWARDS
    • 使用等离子体蚀刻安装的基板的高频蚀刻的装置和方法以及用于点燃等离子体并用于脉冲等离子体输出或调整相同UPWARDS的方法
    • US06720273B1
    • 2004-04-13
    • US09763138
    • 2001-04-20
    • Volker BeckerFranz LaermerAndrea SchilpThomas Beck
    • Volker BeckerFranz LaermerAndrea SchilpThomas Beck
    • H01L213065
    • H01J37/32174C30B33/12H01J37/32082H01L21/3065H01L21/30655H01L21/3085H01L21/3086
    • A device and a method capable of being carried out therewith for, preferably, anisotropically etching a substrate (10), in particular, a patterned silicon body, with the assistance of a plasma (14), is proposed. In the process, the plasma (14) is produced by a plasma source (13) to which a high-frequency generator (17) is connected for applying a high-frequency power. Moreover, this high-frequency generator is in communication with a first means which periodically changes the high-frequency power applied to the plasma source (13). Besides, provision is preferably made for a second means which adapts the output impedance of the high-frequency generator (17) to the prevailing impedance of the plasma source (13) which changes as a function of the high-frequency power. The proposed anisotropic etching method is carried out in separate and alternating etching and polymerization steps, a higher high-frequency power of up to 5000 watts being, at least temporarily, applied to the plasma source (13) during the etching steps than during the deposition steps. The proposed device is also suitable for igniting a plasma (14) and for adjusting upward or pulsing a plasma power from a starting value to up to 5000 watts.
    • 提出了一种借助于等离子体(14)能够进行优选地各向异性地蚀刻衬底(10)特别是图案化硅体的装置和方法。 在该过程中,等离子体(14)由连接有高频发生器(17)的等离子体源(13)产生,以施加高频电力。 此外,该高频发生器与周期性地改变施加到等离子体源(13)的高频功率的第一装置通信。 此外,优选地对于将高频发生器(17)的输出阻抗适配为等离子体源(13)的主要阻抗(其随高频功率变化而变化)的第二装置进行设置。 所提出的各向异性蚀刻方法在分离和交替的蚀刻和聚合步骤中进行,在蚀刻步骤期间至少暂时施加高达5000瓦特的高频功率至等离子体源(13)比在沉积期间更高 脚步。 所提出的装置还适用于点燃等离子体(14)并且用于将等离子体功率从起始值向上调节或脉冲至高达5000瓦特。
    • 49. 发明申请
    • Molecularly Imprinted Polymers for Use as Imaging and Therapeutics Agents
    • 分子印迹聚合物用作成像和治疗剂
    • US20120093720A1
    • 2012-04-19
    • US13274093
    • 2011-10-14
    • Robert JonesThomas Beck
    • Robert JonesThomas Beck
    • A61K49/00A61K51/06C08G65/34
    • A61K49/0002A61K51/06A61K51/1244C08G65/329C08L71/02C08L2203/02
    • The invention described herein provides biocompatible molecularly imprinted polymers (MIPs) that are non-toxic, water soluble, small molecular weight, and degradable in a living body. The MIPs are capable of binding to all or a portion of a specific target macromolecule associated with a disease located within the living body and they are derivatized for stealth for in vivo applications to avoid the reticuloendothelial system. The MIPs of the invention are functionalized to an amine or carboxyl group and are derivatized with an imaging and/or therapeutic agent for taking images of the disease and/or for providing therapy. The macromolecule can be selected from a group consisting of proteins, glycoproteins, lipoproteins, peptidoglycans, peptides, polypeptides, polynucleotides, and polysaccharides. The invention described herein also provides methods and kits wherein MIPs of the invention can be employed as targeted imaging and therapeutic agents.
    • 本文描述的本发明提供了生物相容性分子印迹聚合物(MIP),其在生物体中是无毒的,水溶性的,小分子量的和可降解的。 MIP能够结合与位于生物体内的疾病相关的特定目标大分子的全部或一部分,并且它们被衍生化用于隐形以用于体内应用以避免网状内皮系统。 本发明的MIP被官能化为胺或羧基,并且用成像和/或治疗剂衍生以获取疾病图像和/或用于提供治疗。 大分子可以选自蛋白质,糖蛋白,脂蛋白,肽聚糖,肽,多肽,多核苷酸和多糖。 本文所述的发明还提供了本发明的MIP可用作靶向成像和治疗剂的方法和试剂盒。