会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 45. 发明授权
    • Method of forming source/drain region of semiconductor device
    • 形成半导体器件的源极/漏极区域的方法
    • US07312113B2
    • 2007-12-25
    • US11399877
    • 2006-04-07
    • Dong Ho Lee
    • Dong Ho Lee
    • H01L21/8238
    • H01L21/823807H01L21/823814
    • A method of forming a source/drain region of a semiconductor device includes forming a photoresist pattern through which an NMOS region of a semiconductor substrate is exposed, and then performing an ion implant process to form NMOS LDD regions in the semiconductor substrate of the NMOS region. An ion implant process is performed to form PMOS pocket regions in a PMOS region of the semiconductor substrate. Spacers are formed on sidewalls of a PMOS gate electrode pattern and sidewalls of an NMOS gate electrode pattern, and an ion implant process is performed to form PMOS source/drain regions in the semiconductor substrate in which the PMOS pocket regions are formed. An ion implant process is performed to form NMOS source/drain regions in the semiconductor substrate in which the NMOS LDD regions are formed.
    • 形成半导体器件的源极/漏极区域的方法包括形成通过其暴露半导体衬底的NMOS区域的光致抗蚀剂图案,然后进行离子注入工艺以在NMOS区域的半导体衬底中形成NMOS LDD区域 。 执行离子注入工艺以在半导体衬底的PMOS区域中形成PMOS袋区域。 间隔件形成在PMOS栅电极图案的侧壁和NMOS栅电极图案的侧壁上,并且执行离子注入工艺以在其中形成PMOS袋区域的半导体衬底中形成PMOS源/漏区。 执行离子注入工艺以在其中形成NMOS LDD区的半导体衬底中形成NMOS源极/漏极区。
    • 46. 发明授权
    • Method for fabricating semiconductor capacitors
    • 制造半导体电容器的方法
    • US06706642B2
    • 2004-03-16
    • US10330565
    • 2002-12-27
    • Dong Ho LeeJong Woon Park
    • Dong Ho LeeJong Woon Park
    • H01L21302
    • H01L28/84H01L21/32135H01L28/91
    • The present invention relates to a method for fabricating semiconductor capacitors, which enables the capacitance of the capacitors to be increased. This method comprises the steps of: forming a cylinder type polycrystalline silicon pattern on a semiconductor substrate; forming an amorphous metal film on the substrate in such a manner that the amorphous metal film covers the polycrystalline silicon pattern; crystallizing the amorphous metal film so as to form grown metal grains and grain boundaries between the metal grains; firstly etching the crystallized metal film by a wet etching process in such a manner that the polycrystalline silicon pattern is selectively exposed due to the difference in the wet etching rate between the metal grains and the grain boundaries; secondly etching the exposed portion of the polycrystalline silicon pattern by a wet etching process so as to form a storage node electrode whose surface has hemispherical grooves; and successively forming a dielectric layer and a plate electrode on the resulting structure in such a manner that they cover the storage node electrode.
    • 本发明涉及一种制造半导体电容器的方法,其能够增加电容器的电容。 该方法包括以下步骤:在半导体衬底上形成圆柱型多晶硅图案; 在所述基板上形成非晶金属膜,使得所述非晶金属膜覆盖所述多晶硅图案; 使无定形金属膜结晶化,形成金属颗粒之间生长的金属颗粒和晶界; 首先通过湿式蚀刻工艺蚀刻结晶的金属膜,使得由于金属颗粒和晶界之间的湿蚀刻速率的差异,多晶硅图案被选择性地暴露; 其次通过湿蚀刻工艺蚀刻多晶硅图案的暴露部分,以形成其表面具有半球形凹槽的存储节点电极; 并且在所得到的结构上依次形成介电层和平板电极,使得它们覆盖存储节点电极。
    • 48. 发明授权
    • Apparatus for generating quasi equally spaced frequencies using an
optical frequency shifter in a multi-channel transmission system
    • 用于在多声道传输系统中使用光学移频器产生准等间隔频率的装置
    • US5784170A
    • 1998-07-21
    • US646121
    • 1996-05-07
    • Chang Soo ParkDong Ho Lee
    • Chang Soo ParkDong Ho Lee
    • H04J14/00H04B10/50H04B10/572H04J14/02
    • H04J14/0224H04B10/505H04B10/506H04B10/572
    • The present invention relates to an apparatus for generating quasi equally spaced multi-channel frequencies using a frequency shifter. The optical multi-channel transmission system using OFDM or WDM can be provided with quasi equally spaced(unequally sequential spaced) frequencies on the basis of the functional relation among the frequency differences(n.sub.ij =n.sub.i -n.sub.j (i=j=1,2,3, . . . n)) of any two neighboring channels. Namely, after generating equally spaced frequencies by using a reference resonator, such as a Fiber Fabry Perot(FFP) resonator, each of the equally spaced frequencies is sequentially shifted by a frequency shifter, which generates and controls the quasi equally spaced(unequally sequential spaced) frequencies in order to effectively avoid crosstalk due to FFWM, and fully make use of the transmission bandwidth belonging to the low dispersion region of the optical fiber. the effect of the present invention will be apparent as follows: by easily generating and controlling quasi equally spaced frequencies having a functional relation between two adjacent channels, crosstalk due to Fiber Four Wave Mixing(FFWM) is effectively avoided, and the transmission bandwidth in the region of the low dispersion is fully utilized. Furthermore, the compatibility is easily accomplished.
    • 本发明涉及一种使用移频器产生准等距多声道频率的装置。 基于频差之间的功能关系,可以使用OFDM或WDM的光多通道传输系统提供准等间隔(不等间隔的)频率(nij = ni-nj(i = j = 1,2, 3,...,n))。 也就是说,在通过使用参考谐振器(例如光纤法布里珀罗(FFP))谐振器产生等间隔的频率之后,每个等间隔的频率被移频器顺序移位,该移频器产生并控制准等距间隔(不等间隔的 )频率,以便有效地避免由于FFWM引起的串扰,并充分利用属于光纤低色散区域的传输带宽。 本发明的效果将显而易见:通过容易地产生和控制具有两个相邻通道之间的功能关系的准等间隔的频率,有效地避免了由于光纤四波混频(FFWM)引起的串扰,并且传输带宽 低分散的区域被充分利用。 此外,容易实现兼容性。