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41. 发明申请

US20090128793A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 审中-公开
标题翻译：液体回收装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：US20090128793A1
公开(公告)日：2009-05-21
申请号：US12318574
申请日：2008-12-31
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： A lithographic projection apparatus includes a substrate table by which a substrate is held, a projection system via which a patterned beam is projected onto the substrate to expose the substrate through liquid, and a liquid supply system. The liquid supply system includes a supply flow path, and supplies the liquid via the supply flow path during the exposure. The liquid supply system also includes a device by which the supply flow path is connected with a vacuum system to prevent liquid in the supply flow path from leaking.
摘要翻译：光刻投影装置包括：基板，通过该基板被保持，投影系统，图案化的光束通过该投影系统投影到基板上以通过液体曝光基板;以及液体供应系统。液体供给系统包括供给流路，并且在曝光期间经由供给流路供给液体。液体供给系统还包括供给流路与真空系统连接以防止供给流路中的液体泄漏的装置。

42. 发明申请

US20090123853A1 ALIGNING APPARATUS, ALIGNING METHOD, EXPOSURE APPARATUS, EXPOSURE METHOD, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：校准装置，校正方法，曝光装置，曝光方法和装置制造方法
公开(公告)号：US20090123853A1
公开(公告)日：2009-05-14
申请号：US11630825
申请日：2005-06-21
申请人： Dai Arai
发明人： Dai Arai
IPC分类号： B65G35/00 , G03F1/00
CPC分类号： G03F7/709 , G03F7/70716 , G03F7/70758 , H01L21/682
摘要： An aligning apparatus and the like are provided which can improve stage alignment accuracy during stage acceleration and suppress the generation of internal vibration of the stage to improve throughput. An aligning apparatus including a table part (43) with an aligning target object (W) placed thereon and movable at least in a uniaxial direction, a driving part that applies a driving force (F) to the table part (43) in the uniaxial direction, and a position measuring part (48) that measures a position in the uniaxial direction of the table part, wherein the table part (43) comprises actuators (96, 97), provided at one or more among somewhere between two points, one being a point of application of force (91) at which the driving force (F) is applied and the other being an aligning target point (92) upon which the aligning target object W is placed, somewhere between two points, one being a point to be measured (93) by the position measuring part and the other being the aligning target point (92), and somewhere between two points, one being the point of application of force (91) and the other being the measured point (93), to maintain relative positions between the respective two points substantially constant.
摘要翻译：提供了一种对准装置等，其可以在阶段加速期间提高阶段对准精度，并且抑制阶段的内部振动的产生以提高生产率。一种对准装置，包括具有放置在其上且能够至少沿单轴方向移动的对准目标物体（W）的工作台部（43），驱动部，其以单轴方式向台部（43）施加驱动力（F）方向和测量台部件的单轴方向位置的位置测量部件（48），其中，所述工作台部件（43）包括致动器（96,97），其设置在两点之间的一个或多个位置，一个作为施加驱动力（F）的力（91）的施加点，另一个是对准对象物W放置在其上的对准目标点（92），两点之间的某处，一个是点由位置测量部分测量（93），另一个是对准目标点（92），两点之间的某处，一个是施加力（91），另一个是测量点（93），以维持相应两点之间的相对位置基本恒定。

43. 发明申请

US20080151213A1 Bearing Device, Stage Device, and Exposure Apparatus 审中-公开
标题翻译：轴承装置，舞台装置和曝光装置
公开(公告)号：US20080151213A1
公开(公告)日：2008-06-26
申请号：US11665465
申请日：2005-10-07
申请人： Dai Arai
发明人： Dai Arai
IPC分类号： G03B27/58 , F16C32/06 , F16K31/00 , F16C29/02
CPC分类号： G03F7/70816 , F16C29/025 , F16C32/064
摘要： A sufficient moving stroke can be secured without connecting a tube, etc. for supply of air. A movable body (3) having a pad part (73) and a fixed body (2) are provided. The movable body (3) is movably supported by the fixed body (2) by supplying the medium to the pad part (73). A supply part (5) which is provided in the fixed body (2) and to which the medium is supplied; a connecting part (75) which connects the supply part (5) with the pad part (73); and an opening and closing unit (6) which opens and closes the connecting part (75) according to the position of the movable body (3) with respect to the fixed body (2), are provided.
摘要翻译：可以在不连接用于供应空气的管等的情况下确保足够的移动行程。设有具有垫部（73）和固定体（2）的移动体（3）。移动体（3）通过将介质供给到垫部（73）而被固定体（2）可移动地支撑。供给部（5），其设置在所述固定体（2）中，所述介质被供给到所述供给部（5）将所述供给部（5）与所述垫部（73）连接的连接部（75）以及根据可移动体（3）相对于固定体（2）的位置来打开和关闭连接部分（75）的打开和关闭单元（6）。

44. 发明申请

US20070119405A1 Lubricating system for internal combustion engine 有权
标题翻译：内燃机润滑系统
公开(公告)号：US20070119405A1
公开(公告)日：2007-05-31
申请号：US11604366
申请日：2006-11-27
申请人： Kinya Mizuno , Hiroshi Sotani , Dai Arai
发明人： Kinya Mizuno , Hiroshi Sotani , Dai Arai
IPC分类号： F01M1/02
CPC分类号： F01M1/02 , F01M2001/126
摘要： A lubricating system for an internal combustion engine in which oil in a crankcase is supplied into an oil tank by a scavenging pump wherein it is possible to reduce the size of an engine body and the size of the scavenging pump. An oil tank is provided in an engine body adjacent, in the direction along the axis of a crankshaft, to a centrifugal clutch contained in a clutch containing chamber communicating with the inside of a crank chamber. A wall portion for partitioning the inside of the oil tank and the clutch containing chamber from each other is provided with an opening portion for communication between the clutch containing chamber and the inside of the oil tank, the opening portion being located on the outer side relative to the outermost rotational locus of a centrifugal clutch as viewed in the direction along the axis of the crankshaft.
摘要翻译：一种用于内燃机的润滑系统，其中通过扫气泵将曲轴箱中的油供给到油箱中，其中可以减小发动机主体的尺寸和扫气泵的尺寸。在发动机主体中，沿着曲轴的轴线方向，与容纳在与曲轴室内部连通的离合器容纳室中的离心式离合器设置油箱。用于将油箱和离合器容纳室的内部彼此分隔的壁部分设置有用于在离合器容纳室和油箱内部之间连通的开口部分，开口部分位于外侧相对到沿着曲轴的轴线的方向观察离心式离合器的最外侧旋转轨迹。

45. 发明申请

US20070081133A1 Projection exposure apparatus and stage unit, and exposure method 审中-公开
标题翻译：投影曝光装置和舞台装置，曝光方法
公开(公告)号：US20070081133A1
公开(公告)日：2007-04-12
申请号：US10582488
申请日：2004-12-14
申请人： Yasunaga Kayama , Dai Arai
发明人： Yasunaga Kayama , Dai Arai
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70775 , G03F7/70341 , G03F7/70783 , G03F9/7011 , G03F9/7026
摘要： A projection exposure apparatus (100) has a substrate table (30) on which a substrate (W) is mounted that can be moved holding the substrate, a position measuring system (18 and others) that measures positional information of the substrate table, and a correction unit (19) that corrects positional deviation occurring in at least either the substrate or the substrate table due to supply of a liquid. In this case, the correction unit corrects the positional deviation occurring in at least either the substrate or the substrate table due to the supply of the liquid. Accordingly, exposure with high precision using a liquid immersion method is performed on the substrate.
摘要翻译：投影曝光装置（100）具有：基板（30），其上安装有可移动的基板（W），保持基板;位置测量系统（18等），其测量基板台的位置信息;以及校正单元（19），其校正由于液体的供应而在至少基板或基板台中发生的位置偏差。在这种情况下，校正单元校正由于液体供应而在至少基板或基板台中发生的位置偏差。因此，在基板上进行使用液浸法的高精度的曝光。

46. 发明申请

US20060238730A1 Exposure apparatus and method for producing device 有权
公开(公告)号：US20060238730A1
公开(公告)日：2006-10-26
申请号：US11473147
申请日：2006-06-23
申请人： Masahiro Nei , Naoyuki Kobayashi , Dai Arai , Soichi Owa
发明人： Masahiro Nei , Naoyuki Kobayashi , Dai Arai , Soichi Owa
IPC分类号： G03B27/42
CPC分类号： G03F7/707 , G03F7/70341
摘要： An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery unit 20 which recovers the liquid 50 outflowed to the outside of the substrate P. When the exposure process is performed in accordance with the liquid immersion method, the pattern can be transferred accurately while suppressing any environmental change even when the liquid outflows to the outside of the substrate.

47. 发明申请

US20050243293A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：液体回收装置，曝光装置，曝光方法及装置制造方法
公开(公告)号：US20050243293A1
公开(公告)日：2005-11-03
申请号：US11171243
申请日：2005-07-01
申请人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
发明人： Hideaki Hara , Hiroaki Takaiwa , Dai Arai
IPC分类号： G03B27/42 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70341 , G03F7/2041 , G03F7/70533 , G03F7/70866 , G03F7/70933 , G03F7/70991
摘要： An exposure apparatus exposes a substrate by projecting an image of a pattern onto the substrate via a projection optical system and a liquid that fills a gap between the projection optical system and the substrate. The exposure apparatus has a liquid recovery mechanism with a drive section powered by electric power supplied from a commercial power source and an uninterruptible power source separate from the commercial power source. When the commercial power source has a failure, the supply of electric power to the drive section is switched to the uninterruptible power source.
摘要翻译：曝光装置通过投影光学系统和填充投影光学系统和基板之间的间隙的液体将图案的图像投影到基板上来曝光基板。曝光装置具有液体回收机构，其具有由商用电源提供的电力供电的驱动部分和与商用电源分离的不间断电源。当商用电源发生故障时，将驱动部分的电力供应切换到不间断电源。

48. 发明申请

US20050219488A1 Exposure apparatus and method for producing device 审中-公开
标题翻译：曝光装置及其制造方法
公开(公告)号：US20050219488A1
公开(公告)日：2005-10-06
申请号：US11141090
申请日：2005-06-01
申请人： Masahiro Nei , Naoyuki Kobayashi , Dai Arai , Soichi Owa
发明人： Masahiro Nei , Naoyuki Kobayashi , Dai Arai , Soichi Owa
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G03F7/707 , G03F7/70341
摘要： An exposure apparatus exposes a substrate P by locally filling a side of an image plane of a projection optical system PL with a liquid 50 and projecting an image of a pattern onto the substrate P through the liquid 50 and the projection optical system PL. The exposure apparatus includes a recovery unit 20 which recovers the liquid 50 outflowed to the outside of the substrate P. When the exposure process is performed in accordance with the liquid immersion method, the pattern can be transferred accurately while suppressing any environmental change even when the liquid outflows to the outside of the substrate.
摘要翻译：曝光装置通过用液体50局部填充投影光学系统PL的像面的一侧来曝光基板P，并通过液体50和投影光学系统PL将图案的图像投影到基板P上。曝光装置包括回收单元20，其回收流出到基板P的外部的液体50.当根据浸液方式进行曝光处理时，即使在液体向衬底外部流出。

49. 发明申请

US20050175497A1 Temperature control method and apparatus and exposure method and apparatus 审中-公开
标题翻译：温度控制方法及装置及曝光方法及装置
公开(公告)号：US20050175497A1
公开(公告)日：2005-08-11
申请号：US11066008
申请日：2005-02-25
申请人： Dai Arai , Tomoyuki Yoshida
发明人： Dai Arai , Tomoyuki Yoshida
IPC分类号： G03F7/20 , G05B19/43
CPC分类号： G03F7/70858 , G03F7/70933
摘要： A temperature control technique and an exposure technique are provided with which high temperature control accuracy can be realized even when a device, which causes thermal fluctuation depending on a temperature-controlled fluid, is used. A gas recovered from a reticle chamber as the temperature control objective, and a high purity purge gas supplied from a gas supply source are mixed in a mixing section. The temperature of the mixed gas is lowered by a refrigerator. Subsequently, the humidity of the gas is measured by a temperature sensor. The gas is then supplied to the reticle chamber via a heating mechanism, a chemical filter which absorbs or generates heat depending on the humidity and a dust protective filter. The heating amount to the gas by the heating mechanism is controlled based on temperature information by a temperature sensor in the reticle chamber and humidity information by the humidity sensor.
摘要翻译：提供了一种温度控制技术和曝光技术，即使当使用导致根据温度控制流体的热波动的装置时，也可以实现高温度控制精度。从作为温度控制目标的标线腔室回收的气体和从气体供给源供给的高纯度吹扫气体混合在混合部中。混合气体的温度由冰箱降低。随后，通过温度传感器测量气体的湿度。然后通过加热机构，根据湿度吸收或产生热量的化学过滤器和防尘过滤器将气体供给到标线室。基于加热机构对气体的加热量，通过温度传感器在标线室内的温度信息和湿度传感器的湿度信息进行控制。

50. 发明授权

US5807044A Machine tool with pivoting spindle unit 失效
标题翻译：机床与枢轴主轴单元
公开(公告)号：US5807044A
公开(公告)日：1998-09-15
申请号：US763783
申请日：1996-12-11
申请人： Jun Watari , Takashi Yoshida , Tetsuharu Komatsu , Dai Arai , Tomomi Kousaka , Kazuhide Ito
发明人： Jun Watari , Takashi Yoshida , Tetsuharu Komatsu , Dai Arai , Tomomi Kousaka , Kazuhide Ito
IPC分类号： B23Q1/00 , B23Q1/44 , B23Q1/54 , B23Q1/58 , B23Q1/70 , B23Q5/40 , B23C1/00
CPC分类号： B23Q1/5481 , B23Q1/58 , B23Q5/40 , Y10T408/93 , Y10T409/306664 , Y10T409/307112 , Y10T409/307672 , Y10T409/30784 , Y10T409/308232 , Y10T409/308512 , Y10T409/309576
摘要： Ball screws are moved axially to move a spindle unit in directions X, Y to position a cutter mounted on the spindle unit. Support arm assemblies which support the spindle unit are also moved. Then, a slide table which supports the support arm assemblies is moved in a direction Z to cause the cutter to machine a workpiece.
摘要翻译：滚珠丝杠轴向移动，以使主轴单元沿X，Y方向移动，以使安装在主轴单元上的刀具定位。支撑主轴单元的支撑臂组件也移动。然后，支撑支撑臂组件的滑动台沿Z方向移动，使切割机加工工件。

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