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    • 41. 发明公开
    • 감광성 수지 조성물, 경화막 및 그 제조 방법
    • 光敏可固化树脂组合物,固化膜和固化膜的方法
    • KR1020150003138A
    • 2015-01-08
    • KR1020140170320
    • 2014-12-02
    • 후지필름 가부시키가이샤
    • 히키타마사노리야마다사토루야마자키겐타
    • G03F7/039G03F7/09G03F7/26H01L21/027
    • G03F7/0392C08F220/26G03F7/004G03F7/0045G03F7/023G03F7/027G03F7/039G03F7/40
    • The present invention has the purpose to provide a photosensitive resin composition, which has a high sensitivity, an excellent storage stability, and an excellent reliability of an obtained cured film (in particular, chemical resistance), and a large exposure margin or development margin when manufacturing a cured film. As a means to achieve the purpose, provided is a photosensitive resin composition, which comprises (A) a polymer component including a repeat unit originated from a monomer having a carboxyl group protected with an acid labile group, and/or a repeat unit originated from a monomer having a phenolic hydroxide group protected by an acid labile group (a1), and a repeat unit (a2) having a cross linking group, in the identical polymer and/or different polymers; (B) a compound having an oxime sulfonate residue group represented by general formula (b1); and (C) a solvent, wherein the solvent includes at least one solvent having a boiling point less than 180°C, and at least one solvent having a boiling point of 180°C or higher, and (the sum amount of the solvent having a boiling point less than 180°C):(the sum amount of the solvent having a boiling point of 180°C or higher) is 99:1-50:50 in mass conversion.
    • 本发明的目的是提供一种感光性树脂组合物,其具有高灵敏度,优异的储存稳定性,并且获得的固化膜(特别是耐化学性)的可靠性优异,并且具有大的曝光余量或显影余量 制造固化膜。 作为实现目的的手段,提供了一种光敏树脂组合物,其包含(A)包含源自具有由酸不稳定基团保护的羧基的单体的重复单元的聚合物组分和/或源自 在相同的聚合物和/或不同的聚合物中,具有由酸不稳定基团(a1)保护的酚氢氧化物基团和具有交联基团的重复单元(a2)的单体; (B)具有由通式(b1)表示的肟磺酸酯残基的化合物; 和(C)溶剂,其中所述溶剂包括沸点低于180℃的至少一种溶剂和至少一种沸点为180℃以上的溶剂,和(溶剂的总量为 沸点低于180℃)(沸点为180℃以上的溶剂的总量)为质量转换率99:1-50:50。
    • 44. 发明公开
    • 전자부재용 포지티브형 감광성 수지 조성물, 경화막 및 표시 장치
    • 电子部件,固化膜和器件的正型型感光树脂组合物
    • KR1020130066512A
    • 2013-06-20
    • KR1020120140257
    • 2012-12-05
    • 후지필름 가부시키가이샤
    • 히키타마사노리스기하라코이치카시와기다이스케야마다사토루
    • G03F7/039G03F7/028G03F7/11G02F1/13
    • G03F7/0392C08F220/26G03F7/004G03F7/0045G03F7/023G03F7/0233G03F7/039G03F7/40
    • PURPOSE: A positive photosensitive resin composition for an electronic member, a curing film, and a display device are provided to improve the electronic characteristic and applicability of the composition by including a chain-structured aliphatic epoxy compound. CONSTITUTION: A positive photosensitive resin composition for an electronic member includes a polymer, a photoacid generator, and a chain-structured aliphatic epoxy compound. The polymer is either a polymer, which is obtained by copolymerizing a structure unit with a residual group protecting an acid group with an acid decomposable group and a structure unit with a cross-linking group, or a polymer with structure units which include a cross-linking group and a residual group protecting an acid group with an acid decomposable group. The molecular amount of the chain-structured aliphatic epoxy compound is 2000 or less. The viscosity of the chain-structured aliphatic epoxy compound at 25°C is 3000 mPa·s or less. The chain-structured aliphatic epoxy compound is represented by general formula X-1. In the general formula X-1, A is a linear or branched hydrocarbon group, possibly includes a hydroxyl group; and n is an integer from 1 to 4.
    • 目的:提供一种用于电子部件,固化膜和显示装置的正性感光性树脂组合物,以通过包含链状结构的脂肪族环氧化合物来提高组合物的电子特性和适用性。 构成:电子部件用正型感光性树脂组合物包括聚合物,光致酸产生剂和链状结构的脂肪族环氧化合物。 聚合物是通过使结构单元与具有酸可分解基团和具有交联基团的结构单元保护酸基的残基基团或具有包含交联基团的结构单元的聚合物共聚获得的聚合物, 连接基团和用酸可分解基团保护酸基的残基。 链状结构的脂肪族环氧化合物的分子量为2000以下。 链状结构脂肪族环氧化合物在25℃下的粘度为3000mPa·s以下。 链状结构的脂肪族环氧化合物由通式X-1表示。 在通式X-1中,A是直链或支链烃基,可能包括羟基; n为1〜4的整数。
    • 45. 发明公开
    • 감광성 수지 조성물, 경화막 및 그 제조 방법
    • 光敏可固化树脂组合物,固化膜和固化膜的方法
    • KR1020130035211A
    • 2013-04-08
    • KR1020120107009
    • 2012-09-26
    • 후지필름 가부시키가이샤
    • 히키타마사노리야마다사토루야마자키겐타
    • G03F7/039G03F7/09G03F7/26H01L51/50
    • G02F1/133345H01L51/0014
    • PURPOSE: A photosensitive resin composition, a method of manufacturing hardening film, organic EL displaying device or liquid crystal display is provided to be high-sensitive, stable in storing, be chemical resistant, high in exposure margin or development margin and ITP sputter resistant. CONSTITUTION: A photosensitive resin composition comprises a polymer component, a compound comprising an oxime sulfonate group which is represented as chemical structure b1. The polymer component comprises a monomer structure which is repetitive and includes carboxy group, a monomer group(a1) which is repetitive and includes a phenolic -OH group which is surrounded by an acid dissolution, a structure unit(a2) comprising a cross linking group in the same or the similar polymer. The solvent contains more than one solvent of which boiling point is below 180>= and more than one solvent of which boiling point is over 180>=. The ratio of total amount of the solvent below 180>= to the total amount of the solvent over 180>= is 99:1~50:5 after weight conversion. The chemical structure b1 has R5 which is represented as an alkyl group or an aryl group.
    • 目的:提供一种感光性树脂组合物,硬化膜的制造方法,有机EL显示装置或液晶显示装置,具有高灵敏度,稳定的储存,耐化学性,高曝光余量或显影余量以及ITP溅射性。 构成:感光性树脂组合物包含聚合物成分,以化学结构b1表示的包含肟磺酸酯基的化合物。 聚合物组分包括重复的单体结构,包括羧基,重复单体组(a1),并且包含被酸溶解包围的酚-OH基团,包含交联基团的结构单元(a2) 在相同或相似的聚合物中。 溶剂含有不止一种沸点低于180℃的溶剂,多于一种沸点超过180℃的溶剂=。 溶剂的总量低于180> =与超过180> =的溶剂的总量的比例在重量转化后为99:1〜50:5。 化学结构b1具有表示为烷基或芳基的R 5。
    • 46. 发明公开
    • 감광성 수지 조성물, 경화막의 형성 방법, 경화막, 유기 EL 표시 장치 및 액정 표시 장치
    • 感光性树脂组合物,形成固化膜的方法,固化膜,有机电致发光显示装置和液晶显示装置
    • KR1020110042008A
    • 2011-04-22
    • KR1020100100224
    • 2010-10-14
    • 후지필름 가부시키가이샤
    • 스기하라고이치야마다사토루안도우다케시
    • G03F7/039H01L21/027H01L51/50G02F1/13
    • G03F7/0395G02F1/1306G03F7/0125H01L21/0273H01L21/0274H01L51/5004
    • PURPOSE: A photosensitive resin composition, a method for forming a cured film, the cured film, an organic electroluminescent display device, and a liquid crystal display device are provided to obtain the superior the forming property of a contact hole and the sputtering quality of an indium thin oxide. CONSTITUTION: A photosensitive resin composition includes copolymer, a photoacid generator, a compound, and a solvent. The compound includes at least two partial structures represented chemical formula c1. The molecular weight of the compound is between 600 and 2,000. The copolymer includes a first monomer unit and a second monomer unit. The first monomer unit includes moiety, in which carboxylic group is protected by acid-labile group, or moiety, in which phenolic hydroxyl group is protective by acid-labile group. The second monomer unit includes crosslinkable group. In the chemical formula c1, R1 and R2 are methyl group or tert-butyl group. Either of R1 or R2 is tert-butyl group. R3 is -O- or -NH-.
    • 目的:提供感光性树脂组合物,固化膜的形成方法,固化膜,有机电致发光显示装置和液晶显示装置,以获得接触孔的形成性能和溅射质量优异 铟薄氧化物。 构成:光敏树脂组合物包括共聚物,光致酸产生剂,化合物和溶剂。 化合物包括化学式c1表示的至少两种部分结构。 该化合物的分子量为600至2,000。 共聚物包括第一单体单元和第二单体单元。 第一单体单元包括其中羧基被酸不稳定基保护的部分或其中酚羟基被酸不稳定基保护的部分。 第二单体单元包括可交联基团。 在化学式c1中,R 1和R 2是甲基或叔丁基。 R 1或R 2均为叔丁基。 R3是-O-或-NH-。
    • 49. 发明授权
    • 감광성 수지 조성물, 경화막의 형성 방법, 경화막, 유기 EL 표시 장치 및 액정 표시 장치
    • 光敏树脂组合物,形成固化膜的方法,固化膜,有机EL显示装置和液晶显示装置
    • KR101789813B1
    • 2017-10-25
    • KR1020100100224
    • 2010-10-14
    • 후지필름 가부시키가이샤
    • 스기하라고이치야마다사토루안도우다케시
    • G03F7/039H01L21/027H01L51/50G02F1/13
    • 경화감도, 투과율, ITO 스퍼터적성및 컨택트홀의형성성이우수한감광성수지조성물을제공하는것.(A) 카르복시기가산 분해성기로보호된잔기를갖는모노머단위또는페놀성수산기가산 분해성기로보호된잔기를갖는모노머단위 (a1) 과, 가교기를갖는모노머단위 (a2) 를함유하는공중합체, (B) 광산발생제, (C) 식 (c1) 로나타내는부분구조를분자내에적어도 2 개갖고, 분자량이 600 이상 2,000 이하인화합물및 (D) 용제를함유하는것을특징으로하는감광성수지조성물.(식 (c1) 중, R및 R는각각독립적으로메틸기또는 tert-부틸기를나타내고, R및 R중적어도하나는 tert-부틸기이고, R은 -O- 또는 -NH- 를나타낸다)
    • 固化敏感性,渗透性,ITO溅射能力和haneungeot提供接触孔形成优良的感光性树脂组合物。(A)具有羧基添加具有的单体单元或酚seongsusan组与具有被保护的部分残基单元的酸分解性基团保护的分解性基团的单体 (a1)和由所述共聚物表示的部分结构,(B)光致产酸剂,具有的基团交联(C)式(C1)含有单体单元(a2)在分子中具有至少两个,具有600至2000的分子量 以下,将化合物(d)特征在于,含有溶剂(式(C1),其中,R和R各自独立地为甲基或表示叔丁基,至少一个R和感光性树脂组合物,R是普遍叔丁基 基团,且R表示-O-或-NH-)