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41. 发明授权

US09436101B2 Optical arrangement and microlithographic projection exposure apparatus including same 有权
标题翻译：包括其的光学布置和微光刻投影曝光设备
公开(公告)号：US09436101B2
公开(公告)日：2016-09-06
申请号：US13407466
申请日：2012-02-28
申请人： Armin Schoeppach , Hans-Juergen Mann , Frank Eisert , Yim-Bun Patrick Kwan
发明人： Armin Schoeppach , Hans-Juergen Mann , Frank Eisert , Yim-Bun Patrick Kwan
IPC分类号： G03B27/68 , G03B27/70 , G03F7/20 , G02B17/06
CPC分类号： G03F7/70825 , G02B17/0657
摘要： An optical arrangement includes at least one optical element and a support element for the optical element. The optical element and the support element are connected together by way of at least three decoupling elements. The decoupling elements are formed monolithically with the optical element and with the support element.
摘要翻译：光学装置包括至少一个光学元件和用于光学元件的支撑元件。光学元件和支撑元件通过至少三个去耦元件连接在一起。解耦元件与光学元件和支撑元件一体地形成。

42. 发明授权

US08970819B2 Microlithography projection optical system, tool and method of production 有权
标题翻译：微光投影光学系统，工具及生产方法
公开(公告)号：US08970819B2
公开(公告)日：2015-03-03
申请号：US12235957
申请日：2008-09-23
申请人： Hans-Juergen Mann , Wilhelm Ulrich
发明人： Hans-Juergen Mann , Wilhelm Ulrich
IPC分类号： G03B27/42 , G03F7/20 , G03F1/62
CPC分类号： G03F7/702 , G02B17/08 , G03F1/62 , G03F7/70058 , G03F7/70233
摘要： A microlithography projection optical system is disclosed. The system can include a plurality of optical elements arranged to image radiation having a wavelength λ from an object field in an object plane to an image field in an image plane. The plurality of optical elements can have an entrance pupil located more than 2.8 m from the object plane. A path of radiation through the optical system can be characterized by chief rays having an angle of 3° or more with respect to the normal to the object plane. This can allow the use of phase shifting masks as objects to be imaged, in particular for EUV wavelengths.
摘要翻译：公开了一种微光刻投影光学系统。该系统可以包括多个光学元件，其被布置成将来自物体平面中的物体场的具有波长λ的辐射成像到图像平面中的图像场。多个光学元件可以具有距离物面大于2.8μm的入射光瞳。通过光学系统的辐射路径的特征在于主要光线相对于物平面的法线具有3°或更大的角度。这可以允许使用相移掩模作为要成像的对象，特别是对于EUV波长。

43. 发明授权

US08842284B2 Magnifying imaging optical unit and metrology system including same 有权
标题翻译：放大成像光学单元和包括其的计量系统
公开(公告)号：US08842284B2
公开(公告)日：2014-09-23
申请号：US13357222
申请日：2012-01-24
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G01N21/00 , G02B17/06 , G03F7/20
CPC分类号： G02B5/08 , F21V7/00 , G02B17/0663 , G03F7/70233
摘要： A magnifying imaging optical unit has at least four mirrors to image an object field in an object plane into an image field in an image plane. An absolute value of the Petzval radius of the image field is greater than 500 mm. The imaging optical unit can be used to inspect with sufficient imaging quality relatively large mask sections of lithography masks used during projection exposure to produce large scale integrated semiconductor components.
摘要翻译：放大成像光学单元具有至少四个镜，用于将物平面中的物场映像成像平面中的图像场。图像场的Petzval半径的绝对值大于500 mm。成像光学单元可以用于以足够的成像质量来检查在投影曝光期间使用的光刻掩模的相对较大的掩模部分以产生大规模集成半导体部件。

44. 发明授权

US08810903B2 Imaging optical system 有权
标题翻译：成像光学系统
公开(公告)号：US08810903B2
公开(公告)日：2014-08-19
申请号：US13481431
申请日：2012-05-25
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G02B17/06 , G03F7/24 , H01L21/027
CPC分类号： G03F7/702 , G02B17/06 , G02B17/0647 , G02B17/0663 , G03F7/70191 , G03F7/70233
摘要： The disclosure generally relates to imaging optical systems that include a plurality of mirrors, which image an object field lying in an object plane in an image field lying in an image plane, where at least one of the mirrors has a through-hole for imaging light to pass through. The disclosure also generally relates to projection exposure installations that include such imaging optical systems, methods of using such projection exposure installations, and components made by such methods.
摘要翻译：本发明一般涉及成像光学系统，其包括多个反射镜，其对位于像平面中的图像场中的物体平面中的物体场进行成像，其中至少一个反射镜具有用于成像光的通孔通过本公开还通常涉及包括这种成像光学系统的投影曝光装置，使用这种投影曝光装置的方法以及由这些方法制成的部件。

45. 发明授权

US08643824B2 Projection optics for microlithography 有权
标题翻译：微光刻投影光学
公开(公告)号：US08643824B2
公开(公告)日：2014-02-04
申请号：US13045723
申请日：2011-03-11
申请人： Hans-Juergen Mann
发明人： Hans-Juergen Mann
IPC分类号： G02B17/00 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/702 , G02B17/0848 , G02B17/0892 , G03F7/70225 , G03F7/70275
摘要： A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by such methods, are disclosed.
摘要翻译：一种用于微光刻的投影光学器件，其将物平面中的物场成像为图像平面中的图像场，其中所述投影光学器件包括至少一个弯曲镜，并且包括至少一个折射子单元以及相关系统，公开了通过这些方法制备的方法和产品。

46. 发明授权

US08629972B2 Projection objective for microlithography 有权
标题翻译：微光刻的投影目标
公开(公告)号：US08629972B2
公开(公告)日：2014-01-14
申请号：US12884670
申请日：2010-09-17
申请人： Johannes Zellner , Hans-Juergen Mann , Martin Endres
发明人： Johannes Zellner , Hans-Juergen Mann , Martin Endres
IPC分类号： G02B5/10 , G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70316 , G02B17/0663 , G03F7/702 , G03F7/70233
摘要： A projection objective for microlithography is used for imaging an object field in an object plane into an image field in an image plane. The projection objective comprises at least six mirrors of which at least one mirror has a freeform reflecting surface. The ratio between an overall length (T) of the projection objective and an object image shift (dOIS) can be smaller than 12. The image plane is the first field plane of the projection objective downstream of the object plane. The projection objective can have a plurality of mirrors, wherein the ratio between an overall length (T) and an object image shift (dOIS) is smaller than 2.
摘要翻译：用于微光刻的投影物镜用于将物平面中的物体场成像到图像平面中的图像场中。投影物镜包括至少六个反射镜，其中至少一个反射镜具有自由形反射表面。投影物镜的总长（T）与物体像偏移（dOIS）之间的比例可以小于12.像平面是物平面下游的投影物镜的第一场平面。投影物镜可以具有多个反射镜，其中总长度（T）和物体图像偏移（dOIS）之间的比率小于2。

47. 发明授权

US08436985B2 Combination stop for catoptric projection arrangement 有权
标题翻译：组合停止投影安排
公开(公告)号：US08436985B2
公开(公告)日：2013-05-07
申请号：US13479768
申请日：2012-05-24
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/72 , G03B27/54 , G03B27/42 , G03B27/58
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

48. 发明授权

US08363315B2 Catadioptric projection objective with mirror group 有权
标题翻译：反射折射投影物镜与镜组
公开(公告)号：US08363315B2
公开(公告)日：2013-01-29
申请号：US11578101
申请日：2005-04-07
申请人： Alexander Epple , Wilhelm Ulrich , Aurelian Dodoc , Hans-Juergen Mann , David Shafer
发明人： Alexander Epple , Wilhelm Ulrich , Aurelian Dodoc , Hans-Juergen Mann , David Shafer
IPC分类号： G02B17/00
CPC分类号： G02B17/0804 , G02B17/0808 , G02B17/0812 , G02B17/0816 , G02B17/0836 , G02B17/0844 , G02B17/0848 , G02B17/086 , G02B17/0892 , G03F7/70058 , G03F7/70225 , G03F7/70275 , G03F7/70341
摘要： A catadioptric projection objective for imaging an off-axis object field arranged in an object surface of the projection objective onto an off-axis image field arranged in an image surface of the projection objective has a front lens group, a mirror group comprising four mirrors and having an object side mirror group entry, an image side mirror group exit, and a mirror group plane aligned transversely to the optical axis and arranged geometrically between the mirror group entry and the mirror group exit; and a rear lens group. The mirrors of the mirror group are arranged such that at least one intermediate image is positioned inside the mirror group between mirror group entry and mirror group exit, and that radiation coming from the mirror group entry passes at least four times through the mirror group plane and is reflected at least twice on a concave mirror surface of the mirror group prior to exiting the mirror group at the mirror group exit. The mirror group entry is positioned in a region where radiation exiting the front lens group has an entry chief ray height. A second reflecting area is positioned in a region where radiation impinging on the second mirror has a second chief ray height deviating from the entry chief ray height in a first direction; and a fourth reflecting area is positioned in a region where radiation impinging on the fourth mirror has a fourth chief ray height deviating from the entry chief ray height in a second direction opposite to the first direction.
摘要翻译：用于将布置在投影物镜的物体表面中的离轴物体场成像到布置在投影物镜的图像表面中的离轴图像场的反射折射投射物镜具有前透镜组，包括四个反射镜的镜组和具有物体侧反射镜组入口，图像侧反射镜组出口和反射镜组平面，其横向于光轴对准并且几何地布置在反射镜组入口和反射镜组出口之间; 和后透镜组。反射镜组的镜子被布置成使得至少一个中间图像位于反射镜组入口和反射镜组出口之间的反射镜组内，并且来自镜组入口的辐射至少穿过镜组平面四次，在镜组出口处离开镜组之前，在镜组的凹面镜面上反射至少两次。反射镜组入口位于离开前透镜组的辐射具有入射主光线高度的区域中。第二反射区域位于辐射入射在第二反射镜上的第一主光线高度偏离第一方向上的入射光线高度的区域中; 并且第四反射区域位于与第一反射镜相反的第二方向上具有偏离入射光线高度的第四主光线高度的入射在第四反射镜上的辐射区域。

49. 发明申请

US20120236272A1 COMBINATION STOP FOR CATOPTRIC PROJECTION ARRANGEMENT 有权
标题翻译：用于投影安排的组合停止
公开(公告)号：US20120236272A1
公开(公告)日：2012-09-20
申请号：US13479768
申请日：2012-05-24
申请人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
发明人： Hans-Juergen Mann , Daniel Kraehmer , Aurelian Dodoc , Toralf Gruner
IPC分类号： G03B27/32
CPC分类号： G03F7/70941 , G02B5/005 , G02B17/0657 , G03F7/70233 , G03F7/7025
摘要： The disclosure relates to an optical projection arrangement that can be used to image a reticle onto a substrate. The projection arrangement includes reflective elements, by which a ray path is defined. A combination stop is in a pupil of the ray path. The combination stop has a first opening (aperture opening) for use as an aperture stop. The combination stop also has a second opening for allowing passage of a ray bundle of the ray path, such that the combination stop acts as a combined aperture stop and stray light stop. In addition, the disclosure relates to a corresponding combination stop for optical arrangements, as well as related systems, components and methods.
摘要翻译：本公开涉及一种可用于将掩模版成像到基底上的光学投影装置。投影装置包括反射元件，通过该反射元件定义光线路径。光束路径中的光瞳组合停止。组合止动件具有用作孔径光阑的第一开口（孔口）。组合挡块还具有用于允许射线路径的射线束通过的第二开口，使得组合挡块用作组合孔径光阑和杂散光挡块。此外，本公开涉及用于光学布置的相应组合停止，以及相关系统，部件和方法。

50. 发明授权

US08208199B2 Catadioptric projection objective 有权
公开(公告)号：US08208199B2
公开(公告)日：2012-06-26
申请号：US12409394
申请日：2009-03-23
申请人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
发明人： David Shafer , Wilhelm Ulrich , Aurelian Dodoc , Rudolf Von Buenau , Hans-Juergen Mann , Alexander Epple , Susanne Beder , Wolfgang Singer
IPC分类号： G02B17/00 , G02B21/00
CPC分类号： G02B17/0816 , G02B13/16 , G02B13/22 , G02B17/08 , G02B17/0804 , G02B17/0812 , G02B17/0892 , G02B21/02 , G02B21/33 , G03F7/70225 , G03F7/70275 , G03F7/70341 , G03F7/70958 , G03F7/70966
摘要： A catadioptric projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective has a first, refractive objective part for imaging the pattern provided in the object plane into a first intermediate image; a second objective part including at least one concave mirror for imaging the first intermediate imaging into a second intermediate image; and a third, refractive objective part for imaging the second intermediate imaging onto the image plane; wherein the projection objective has a maximum lens diameter Dmax, a maximum image field height Y′, and an image side numerical aperture NA; wherein COMP1=Dmax/(Y′·NA2) and wherein the condition COMP1

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