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41. 发明授权

US07456931B2 Device manufacturing method, computer program product and lithographic apparatus 有权
标题翻译：设备制造方法，计算机程序产品和光刻设备
公开(公告)号：US07456931B2
公开(公告)日：2008-11-25
申请号：US12000189
申请日：2007-12-10
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders , Maria Johanna Agnes Rubingh
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders , Maria Johanna Agnes Rubingh
IPC分类号： G03B27/42
CPC分类号： G03B27/42 , G03F7/70258 , G03F7/705
摘要： A method of optimizing adjustable settings of adjustable elements of a projection system in a lithographic apparatus is disclosed that includes determining an object spectrum for a pattern and an illumination arrangement, determining a symmetry of the object spectrum, constructing a merit function for a wavefront in a pupil plane of the projection system with the settings of the adjustable elements as variables with reference to the symmetry, and optimizing the merit function.
摘要翻译：公开了一种优化光刻设备中的投影系统的可调节元件的可调节设置的方法，其包括确定图案和照明布置的物体光谱，确定物体光谱的对称性，构建物体光谱中的波前的优值函数投影系统的瞳平面与可调元素的设置作为参考对称性的变量，并优化功能函数。

42. 发明授权

US07359029B2 Lithographic apparatus and method of reducing thermal distortion 失效
标题翻译：平版印刷设备和减少热变形的方法
公开(公告)号：US07359029B2
公开(公告)日：2008-04-15
申请号：US11440437
申请日：2006-05-25
申请人： Jozef Maria Finders , Erik Roelof Loopstra
发明人： Jozef Maria Finders , Erik Roelof Loopstra
IPC分类号： G03B27/42
CPC分类号： G03B27/522 , G03F7/70258 , G03F7/70875
摘要： A lithographic apparatus is disclosed that has a heater configured to supply energy to a patterning device to heat the patterning device to form a desired thermal distortion pattern of the patterning device and a controller configured to effect an optical correction in the apparatus corresponding to the desired thermal distortion pattern to reduce the effect of thermal distortion of the patterning device on a pattern.
摘要翻译：公开了一种光刻设备，其具有被配置为向图案形成装置供应能量以加热图案形成装置以形成图案形成装置的期望热变形图案的加热器，以及被配置为在对应于所需热量的装置中实现光学校正的控制器畸变图案，以减少图案形成装置的热变形对图案的影响。

43. 发明授权

US07256873B2 Enhanced lithographic resolution through double exposure 失效
标题翻译：通过双重曝光增强光刻分辨率
公开(公告)号：US07256873B2
公开(公告)日：2007-08-14
申请号：US10765218
申请日：2004-01-28
申请人： Jozef Maria Finders , Donis George Flagello , Steven George Hansen
发明人： Jozef Maria Finders , Donis George Flagello , Steven George Hansen
IPC分类号： G03B27/32 , G03B27/42 , G03B27/54
CPC分类号： G03F7/70433 , G03F7/70466
摘要： A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.
摘要翻译：本文给出了用于增强光刻系统中的图像分辨率的系统和方法。本发明包括将掩模版图案分解为能够被光刻系统光学分辨的至少两个构成子图案，用预定的光致抗蚀剂层涂覆基底，以及暴露至少两个构成子图案中的第一个，通过将投影光束引导通过第一子图案使得光刻系统在基板的预定光致抗蚀剂层上产生第一子图案图像。本发明还包括处理曝光的基板，通过将投影光束引导通过第二子图案来暴露至少两个构成子图案中的第二个，使得光刻系统在预定的光致抗蚀剂上产生第二子图案图像层，然后组合第一和第二子图案图像以在衬底上产生期望的图案。

44. 发明授权

US07256870B2 Method and apparatus for controlling iso-dense bias in lithography 有权
标题翻译：在光刻中控制等密度偏差的方法和装置
公开(公告)号：US07256870B2
公开(公告)日：2007-08-14
申请号：US11046902
申请日：2005-02-01
申请人： Jozef Maria Finders
发明人： Jozef Maria Finders
IPC分类号： G03B27/54 , G03B27/42 , G03B27/32 , G03C5/00
CPC分类号： G03F7/70625 , G03F7/70575
摘要： The present invention relates to a lithographic apparatus and a method of using the apparatus in the manufacture of a device such as an integrated circuit (IC). In particular, the present invention relates to a lithographic apparatus wherein iso-dense bias in a printed pattern on a substrate is capable of being controlled by using radiation with a spectral distribution comprising two or more spectral peaks.
摘要翻译：本发明涉及光刻设备和在制造诸如集成电路（IC）的器件中的装置的方法。特别地，本发明涉及一种光刻设备，其中印刷图案上的等密度偏压能够通过使用具有包括两个或多个光谱峰值的光谱分布的辐射来控制。

45. 发明授权

US06795163B2 Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby 有权
标题翻译：平版印刷制造工艺，光刻投影装置和由此制造的装置
公开(公告)号：US06795163B2
公开(公告)日：2004-09-21
申请号：US10114309
申请日：2002-04-03
申请人： Jozef Maria Finders
发明人： Jozef Maria Finders
IPC分类号： G03B2742
CPC分类号： G03F7/70558 , G03F7/70458 , G03F7/70625 , G03F7/70991
摘要： A lithographic manufacturing process is disclosed in which a first information on a first lithographic transfer function of a first lithographic projection apparatus is obtained. The information is compared with a second information on a second lithographic transfer function of a second lithographic projection apparatus, for reference. The difference between the first and second information is calculated. Then, the change of machine settings for the first lithographic projection apparatus, needed to minimize the difference, is calculated and applied to the first lithographic projection apparatus such that the match between the first and second lithographic projection apparatus of any pitch-dependency of feature errors is improved.
摘要翻译：公开了一种光刻制造方法，其中获得关于第一光刻投影装置的第一平版印刷传递函数的第一信息。将该信息与第二光刻投影设备的第二光刻传递函数的第二信息进行比较以供参考。计算第一和第二信息之间的差异。然后，计算第一光刻投影设备最小化所需的第一平版印刷投影设备的机器设置的改变并将其应用于第一平版印刷投影设备，使得第一和第二光刻投影设备之间的任意间距依赖性的特征误差改进了

46. 发明授权

US09535341B2 Method for a lithographic apparatus 有权
标题翻译：光刻设备的方法
公开(公告)号：US09535341B2
公开(公告)日：2017-01-03
申请号：US12617855
申请日：2009-11-13
申请人： Laurentius Cornelius De Winter , Jozef Maria Finders
发明人： Laurentius Cornelius De Winter , Jozef Maria Finders
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70641 , G03F7/70125 , G03F7/70308 , G03F7/70591 , G03F7/70891
摘要： A method is described that includes illuminating a patterning device pattern with a radiation beam having a symmetric illumination mode, the patterning device pattern comprising a first pattern feature that substantially diffracts radiation of the radiation beam, and a second pattern feature that does not substantially diffract radiation of the radiation beam, introducing an asymmetry, relative to an optical axis, in the substantially diffracted radiation using a phase modulation element, illuminating a radiation beam receiving element with radiation emanating from the phase modulation element to form a receiving element pattern that is related to the patterning device pattern, the receiving element pattern having first and second receiving element pattern features related to the first and second pattern features respectively, and determining information at least indicative of a focal property from positional information regarding the relative positions of the first and second receiving element pattern features.
摘要翻译：描述了一种方法，其包括用具有对称照明模式的辐射束照射图案形成装置图案，图案形成装置图案包括基本上衍射辐射束的辐射的第一图案特征，以及基本上不辐射辐射的第二图案特征使用相位调制元件在基本上衍射的辐射中引入相对于光轴的不对称性，用相位调制元件发射的辐射照射辐射束接收元件，以形成与图案形成装置图案，接收元件图案具有分别与第一和第二图案特征相关的第一和第二接收元件图案特征，以及根据关于第一和第二图案特征的相对位置的位置信息来确定至少指示焦点特性的信息 g元素图案特征。

47. 发明授权

US08416394B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08416394B2
公开(公告)日：2013-04-09
申请号：US13159979
申请日：2011-06-14
申请人： Jozef Maria Finders
发明人： Jozef Maria Finders
IPC分类号： G03B27/72 , G03B27/54
CPC分类号： G03F7/70141 , G03F7/70191 , G03F7/70466
摘要： A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into a number of first-order diffracted beams, one associated with a first pitch in the pattern, along a first direction, another associated with a second pitch along a different, second direction in the pattern. An area is identified where the first-order diffracted beam associated with the first pitch traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of this first-order diffracted beam in relation to the optical phase of the other first-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.
摘要翻译：光刻设备包括相位调节器，用于在曝光基板上的图案时调节穿过相位调节器的光学元件的光波的相位。在一个实施例中，光学元件是光刻设备的投影系统中的热可控光学元件。在使用中，用包括离轴辐射束的照明模式照亮图案。该光束沿着第一方向被衍射成多个一阶衍射光束，一个与图案中的第一间距相关联，另一个与图案中沿着不同的第二方向的第二间距相关联。识别与第一音调相关联的一阶衍射光束穿过光学元件的区域。通过计算相对于其它一级衍射光束的光学相位的该一级衍射光束的期望光学相位来优化图案的图像的图像特性。控制相位调节器以将期望的光学相位施加到一阶衍射光束。

48. 发明申请

US20120182534A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120182534A1
公开(公告)日：2012-07-19
申请号：US13159979
申请日：2011-06-14
申请人： Jozef Maria FINDERS
发明人： Jozef Maria FINDERS
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70141 , G03F7/70191 , G03F7/70466
摘要： A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into a number of first-order diffracted beams, one associated with a first pitch in the pattern, along a first direction, another associated with a second pitch along a different, second direction in the pattern. An area is identified where the first-order diffracted beam associated with the first pitch traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of this first-order diffracted beam in relation to the optical phase of the other first-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.
摘要翻译：光刻设备包括相位调节器，用于在曝光基板上的图案时调节穿过相位调节器的光学元件的光波的相位。在一个实施例中，光学元件是光刻设备的投影系统中的热可控光学元件。在使用中，用包括离轴辐射束的照明模式照亮图案。该光束沿着第一方向被衍射成多个一阶衍射光束，一个与图案中的第一间距相关联，另一个与图案中沿着不同的第二方向的第二间距相关联。识别与第一音调相关联的一阶衍射光束穿过光学元件的区域。通过计算相对于其它一级衍射光束的光学相位的该一级衍射光束的期望光学相位来优化图案的图像的图像特性。控制相位调节器以将期望的光学相位施加到一阶衍射光束。

49. 发明申请

US20120099091A1 METHOD OF OPTIMIZING A LITHOGRAPHIC PROCESS, DEVICE MANUFACTURING METHOD, LITHOGRAPHIC APPARATUS, COMPUTER PROGRAM PRODUCT AND SIMULATION APPARATUS 有权
标题翻译：优化算法的方法，设备制造方法，平面设备，计算机程序产品和仿真设备
公开(公告)号：US20120099091A1
公开(公告)日：2012-04-26
申请号：US13277830
申请日：2011-10-20
申请人： Jozef Maria Finders
发明人： Jozef Maria Finders
IPC分类号： G03B27/54
CPC分类号： G03F7/705
摘要： A method of optimizing a lithographic process for imaging a pattern, including a plurality of features, onto a substrate using a lithographic apparatus, the lithographic apparatus having a controllable illumination system to illuminate a patterning device and a controllable projection system to project an image of the patterning device onto the substrate, the method including selecting a feature from the plurality of features, determining an illumination setting for the illumination system to optimize imaging of the selected feature, and determining a projection setting for the projection system to optimize imaging of the selected feature taking account of the illumination setting.
摘要翻译：一种优化光刻工艺的方法，用于使用光刻设备将包括多个特征的图案成像到基板上，所述光刻设备具有可照明系统以照亮图案形成装置和可控投影系统以投影图像的图像所述方法包括从所述多个特征中选择特征，确定所述照明系统的照明设置以优化所选特征的成像，以及确定所述投影系统的投影设置以优化所选特征的成像考虑到照明设置。

50. 发明申请

US20110211182A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 失效
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110211182A1
公开(公告)日：2011-09-01
申请号：US13103551
申请日：2011-05-09
申请人： Jozef Maria FINDERS
发明人： Jozef Maria FINDERS
IPC分类号： G03B27/54
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70308
摘要： A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.
摘要翻译：光刻设备包括相位调节器，用于在曝光基板上的图案时调节穿过相位调节器的光学元件的光波的相位。在一个实施例中，光学元件是光刻设备的投影系统中的热可控光学元件。在使用中，用包括离轴辐射束的照明模式照亮图案。该光束被衍射成相对于光轴相对和不对称倾斜的零级和一级衍射光束。识别出一级衍射光束穿过光学元件的区域。通过相对于零级衍射光束的光学相位计算一级衍射光束的期望的光学相位来优化图案的图像的图像特性。控制相位调节器以将期望的光学相位施加到一阶衍射光束。

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