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41. 发明申请

WO2010124268A3 SUBSTRATE SUPPORT HAVING SIDE GAS OUTLETS AND METHODS 审中-公开
标题翻译：底板支撑带有气体出口和方法
公开(公告)号：WO2010124268A3
公开(公告)日：2011-03-03
申请号：PCT/US2010032322
申请日：2010-04-23
申请人： APPLIED MATERIALS INC , VELLAIKAL MANOJ , FOAD MAJEED , MARIN JOSE ANTONIO , MCCLELLAND SCOTT D
发明人： VELLAIKAL MANOJ , FOAD MAJEED , MARIN JOSE ANTONIO , MCCLELLAND SCOTT D
IPC分类号： H01L21/687 , B23Q3/15 , H01L21/68 , H02N13/00
CPC分类号： B23Q3/15 , H01L21/6831
摘要： A substrate support for a process chamber comprises an electrostatic chuck having a receiving surface to receive the substrate and a gas distributor baseplate below the electrostatic chuck. The gas distributor baseplate comprises a circumferential sidewall having a plurality of gas outlets that are spaced apart from one another to introduce a process gas into the process chamber from around the perimeter of the substrate and in a radially outward facing direction.
摘要翻译：用于处理室的基板支撑件包括静电卡盘，其具有用于容纳基板的接收表面和静电卡盘下方的气体分配器底板。气体分配器底板包括周向侧壁，其具有彼此间隔开的多个气体出口，以将工艺气体从基板的周边周围引导到处理室中并沿径向向外的方向。

42. 发明申请

WO2010120805A3 MODIFICATION OF MAGNETIC PROPERTIES OF FILMS USING ION AND NEUTRAL BEAM IMPLANTATION 审中-公开
公开(公告)号：WO2010120805A3
公开(公告)日：2010-10-21
申请号：PCT/US2010/030924
申请日：2010-04-13
申请人： APPLIED MATERIALS, INC. , FOAD, Majeed, A. , MERRY, Nir
发明人： MERRY, Nir
IPC分类号： G11B5/84 , G11B5/82 , G11B5/73
摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on the substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of alternative processes that expose substrates to energy of varying forms.

43. 发明申请

WO2010120725A2 HDD PATTERN APPARATUS USING LASER, E-BEAM, OR FOCUSED ION BEAM 审中-公开
标题翻译：使用激光，电子束或聚焦离子束的硬盘图案设备
公开(公告)号：WO2010120725A2
公开(公告)日：2010-10-21
申请号：PCT/US2010/030823
申请日：2010-04-13
申请人： APPLIED MATERIALS, INC. , FOAD, Majeed A. , MOFFATT, Stephen
发明人： FOAD, Majeed A. , MOFFATT, Stephen
IPC分类号： G11B5/84 , G11B5/82 , G11B5/73
CPC分类号： G03B27/42 , G11B5/8404 , H01F10/187 , H01F41/34
摘要： A method and apparatus for manufacturing magnetic storage media is provided. A structural substrate is coated with a magnetically active material, and a magnetic pattern is formed in the magnetically active material by treating portions of the material with energy from a laser, e-beam, or focused ion beam. The beam may be divided into a packet of beamlets by passing the beam through a divider, which may be a diffraction grating for laser energy, a thin film single crystal for electrons, or a perforated plate for ions, or the beam may be generated by an array of emitters. The beamlets are then focused to a desired dimension and distribution by optics or electric fields. The resulting beam packet may be shaped further by passing through an aperture of any desired shape. The resulting beam may be applied sequentially to exposure zones to treat an entire substrate or plurality of substrates.
摘要翻译：提供了一种用于制造磁存储介质的方法和装置。用磁性活性材料涂覆结构基材，通过用激光，电子束或聚焦离子束的能量处理材料的部分，在磁性活性材料中形成磁性图案。通过将光束通过分隔器（可以是用于激光能量的衍射光栅），用于电子的薄膜单晶或用于离子的多孔板，可以将光束分成束分束，或者可以通过一组发射器。然后通过光学或电场将子束聚焦到期望的尺寸和分布。所得到的束束可以进一步通过穿过任何所需形状的孔。所得到的光束可以顺序施加到曝光区域以处理整个基板或多个基板。

44. 发明申请

WO2010118266A2 USE SPECIAL ION SOURCE APPARATUS AND IMPLANT WITH MOLECULAR IONS TO PROCESS HDD (HIGH DENSITY MAGNETIC DISKS) WITH PATTERNED MAGNETIC DOMAINS 审中-公开
标题翻译：使用特殊离子源装置和分子离子注入具有图形磁场的HDD（高密度磁性磁盘）
公开(公告)号：WO2010118266A2
公开(公告)日：2010-10-14
申请号：PCT/US2010/030442
申请日：2010-04-08
申请人： APPLIED MATERIALS, INC. , MOFFATT, Stephen , FOAD, Majeed, A.
发明人： MOFFATT, Stephen , FOAD, Majeed, A.
IPC分类号： G11B5/84 , G11B5/73
CPC分类号： G11B5/855 , B82Y10/00 , G11B5/746 , H01F10/16 , H01F10/265 , H01F41/34
摘要： A method and apparatus for manufacturing magnetic storage media is provided. A structural substrate is coated with a magnetically susceptible material, and a patterned resist layer is formed over the magnetically susceptible material. Atom groups are directed toward the substrate, penetrating the resist and implanting into the magnetically susceptible layer. Thick portions of the resist prevent implantation in some areas to form a pattern of magnetic properties on the substrate. Energy and composition of the atom groups, thickness and hardness of the resist, and lattice energy of the magnetically susceptible material may all be adjusted to yield desired fragmentation and implantation of the atom groups, including in some embodiments mere impact on the surface without implanting. A protective layer and a lubricating layer are formed over the patterned magnetically susceptible layer.
摘要翻译：提供了一种用于制造磁存储介质的方法和装置。用磁敏材料涂覆结构基材，并且在磁敏感材料上形成图案化的抗蚀剂层。原子团指向衬底，穿透抗蚀剂并注入到磁敏感层中。抗蚀剂的厚部分防止在一些区域中的注入以在基底上形成磁性的图案。原子组的能量和组成，抗蚀剂的厚度和硬度以及磁敏材料的晶格能都可以被调整以产生所需的原子团的分裂和注入，包括在一些实施方案中仅仅对表面的冲击而不会进行注入。在图案化的易磁化层上形成保护层和润滑层。

45. 发明申请

WO2010098993A2 HDD PATTERN IMPLANT SYSTEM 审中-公开
标题翻译：硬盘图案植入系统
公开(公告)号：WO2010098993A2
公开(公告)日：2010-09-02
申请号：PCT/US2010/024163
申请日：2010-02-12
申请人： APPLIED MATERIALS, INC. , FOAD, Majeed, A. , NEWMAN, Jacob , MARIN, Jose, Antonio , HOFFMAN, Daniel, J. , MOFFATT, Stephen , VERHAVERBEKE, Steven
发明人： FOAD, Majeed, A. , NEWMAN, Jacob , MARIN, Jose, Antonio , HOFFMAN, Daniel, J. , MOFFATT, Stephen , VERHAVERBEKE, Steven
IPC分类号： G11B5/73 , G11B5/82 , G11B5/84
CPC分类号： G11B5/82 , C23C14/48 , C23C14/50 , C23C16/00 , C23F1/00 , G11B5/84 , G11B5/855 , H01L21/673 , H01L21/677 , H01L21/687
摘要： Methods and apparatus for forming substrates having magnetically patterned surfaces is provided. A magnetic layer comprising one or more materials having magnetic properties is formed on a substrate. The magnetic layer is subjected to a patterning process in which selected portions of the surface of the magnetic layer are altered such that the altered portions have different magnetic properties from the non-altered portions without changing the topography of the substrate. A protective layer and a lubricant layer are deposited over the patterned magnetic layer. The patterning is accomplished through a number of processes that expose substrates to energy of varying forms. Apparatus and methods disclosed herein enable processing of two major surfaces of a substrate simultaneously, or sequentially by flipping. In some embodiments, magnetic properties of the substrate surface may be uniformly altered by plasma exposure and then selectively restored by exposure to patterned energy.
摘要翻译：提供了用于形成具有磁性图案化表面的基底的方法和设备。在基板上形成包含一种或多种具有磁性的材料的磁性层。对磁性层进行图案化处理，其中磁性层的表面的选定部分被改变，使得改变的部分与未改变的部分具有不同的磁性，而不改变衬底的形貌。在图案化的磁性层上沉积保护层和润滑剂层。图案化通过使衬底暴露于不同形式的能量的许多工艺来实现。本文公开的装置和方法能够同时或顺序地翻转来处理衬底的两个主表面。在一些实施例中，衬底表面的磁特性可以通过等离子体暴露均匀地改变，然后通过暴露于图案化能量选择性地恢复。

46. 发明申请

WO2010048030A4 PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS 审中-公开
标题翻译：磁化薄膜的加能离子图形化
公开(公告)号：WO2010048030A4
公开(公告)日：2010-09-02
申请号：PCT/US2009060868
申请日：2009-10-15
申请人： APPLIED MATERIALS INC , NALAMASU OMKARAM , VERHAVERBEKE STEVEN , FOAD MAJEED , VENKATESAN MAHALINGAM , KRISHNA NETY M
发明人： NALAMASU OMKARAM , VERHAVERBEKE STEVEN , FOAD MAJEED , VENKATESAN MAHALINGAM , KRISHNA NETY M
IPC分类号： G11B5/84 , G11B5/74
CPC分类号： G11B5/855 , B82Y10/00 , C23C14/042 , C23C14/48 , C23C14/5826 , G11B5/743 , G11B5/746 , G11B5/82
摘要： A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portion of the magnetic thin film may be subjected to thermal excitation. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.
摘要翻译：一种用于在衬底上构图磁性薄膜的方法包括：提供围绕磁性薄膜的图案，图案的选择区域允许一个或多个元件的通电离子穿透。以足够的能量产生通电的离子，以穿透选择性区域和与选择性区域相邻的磁性薄膜的一部分。衬底被放置以接收激励的离子。磁性薄膜的该部分可以经受热激励。磁性薄膜的部分呈现出与选择性其他部分不同的磁性。还公开了一种用于在介质两侧上用磁性薄膜构图磁性介质的方法。

47. 发明申请

WO2010048030A2 PATTERNING OF MAGNETIC THIN FILM USING ENERGIZED IONS 审中-公开
标题翻译：使用能量离子对磁薄膜进行绘图
公开(公告)号：WO2010048030A2
公开(公告)日：2010-04-29
申请号：PCT/US2009/060868
申请日：2009-10-15
申请人： APPLIED MATERIALS, INC. , NALAMASU, Omkaram , VERHAVERBEKE, Steven , FOAD, Majeed , VENKATESAN, Mahalingam , KRISHNA, Nety M.
发明人： NALAMASU, Omkaram , VERHAVERBEKE, Steven , FOAD, Majeed , VENKATESAN, Mahalingam , KRISHNA, Nety M.
IPC分类号： G11B5/84 , G11B5/74
CPC分类号： G11B5/855 , B82Y10/00 , C23C14/042 , C23C14/48 , C23C14/5826 , G11B5/743 , G11B5/746 , G11B5/82
摘要： A method for patterning a magnetic thin film on a substrate includes: providing a pattern about the magnetic thin film, with selective regions of the pattern permitting penetration of energized ions of one or more elements. Energized ions are generated with sufficient energy to penetrate selective regions and a portion of the magnetic thin film adjacent the selective regions. The substrate is placed to receive the energized ions. The portion of the magnetic thin film may be subjected to thermal excitation. The portions of the magnetic thin film are rendered to exhibit a magnetic property different than selective other portions. A method for patterning a magnetic media with a magnetic thin film on both sides of the media is also disclosed.
摘要翻译：用于在衬底上图案化磁性薄膜的方法包括：提供围绕磁性薄膜的图案，该图案的选择区域允许一个或多个元件的激发离子的穿透。通过足够的能量产生通电的离子以穿透选择区域和一部分与选择区域相邻的磁性薄膜。放置基板以接收通电离子。磁性薄膜的一部分可能受到热激发。使磁性薄膜的部分呈现与选择性其他部分不同的磁性。还公开了一种用于在介质两侧用磁性薄膜图案化磁性介质的方法。

48. 发明申请

WO2010019283A2 METHOD FOR MEASURING DOPANT CONCENTRATION DURING PLASMA ION IMPLANTATION 审中-公开
标题翻译：测量等离子体离子注入过程中掺杂剂浓度的方法
公开(公告)号：WO2010019283A2
公开(公告)日：2010-02-18
申请号：PCT/US2009/034995
申请日：2009-02-24
申请人： APPLIED MATERIALS, INC. , FOAD, Majeed A. , LI, Shijian
发明人： FOAD, Majeed A. , LI, Shijian
IPC分类号： H01L21/66 , H01L21/265
CPC分类号： G01N21/68 , G01N21/59 , H01L21/26513 , H01L22/12 , H01L22/26
摘要： Embodiments of the invention generally provide methods for end point detection at predetermined dopant concentrations during plasma doping processes. In one embodiment, a method includes positioning a substrate within a process chamber, generating a plasma above the substrate and transmitting a light generated by the plasma through the substrate, wherein the light enters the topside and exits the backside of the substrate, and receiving the light by a sensor positioned below the substrate. The method further provides generating a signal proportional to the light received by the sensor, implanting the substrate with a dopant during a doping process, generating multiple light signals proportional to a decreasing amount of the light received by the sensor during the doping process, generating an end point signal proportional to the light received by the sensor once the substrate has a final dopant concentration, and ceasing the doping process.
摘要翻译：本发明的实施例通常提供用于在等离子体掺杂工艺期间在预定掺杂剂浓度下进行终点检测的方法。在一个实施例中，一种方法包括：将衬底放置在处理室内，在衬底上方产生等离子体，并将由等离子体产生的光透过衬底，其中光进入顶面并离开衬底的背面，由位于基板下方的传感器发出的光。该方法还提供产生与传感器接收的光成比例的信号，在掺杂过程期间用掺杂剂注入衬底，产生与在掺杂过程期间由传感器接收的光的减少量成比例的多个光信号，产生一旦衬底具有最终掺杂剂浓度，则终止点信号与由传感器接收的光成比例，并停止掺杂过程。

49. 发明申请

WO2009085965A4 REMOVAL OF SURFACE DOPANTS FROM A SUBSTRATE 审中-公开
标题翻译：从基材上去除表面多金属
公开(公告)号：WO2009085965A4
公开(公告)日：2009-08-27
申请号：PCT/US2008087446
申请日：2008-12-18
申请人： APPLIED MATERIALS INC , RAMASWAMY KARTIK , COLLINS KENNETH S , GALLO BIAGIO , HANAWA HIROJI , FOAD MAJEED A , HILKENE MARTIN A , SANTHANAM KARTIK , SCOTNEY-CASTLE MATTHEW D
发明人： RAMASWAMY KARTIK , COLLINS KENNETH S , GALLO BIAGIO , HANAWA HIROJI , FOAD MAJEED A , HILKENE MARTIN A , SANTHANAM KARTIK , SCOTNEY-CASTLE MATTHEW D
IPC分类号： H01L21/265 , H01L21/306
CPC分类号： H01L21/2254 , H01L21/2253
摘要： A method and apparatus for removing excess dopant from a doped substrate is provided. In one embodiment, a substrate is doped by surfaced deposition of dopant followed by formation of a capping layer and thermal diffusion drive-in. A reactive etchant mixture is provided to the process chamber, with optional plasma, to etch away the capping layer and form volatile compounds by reacting with excess dopant. In another embodiment, a substrate is doped by energetic implantation of dopant. A reactive gas mixture is provided to the process chamber, with optional plasma, to remove excess dopant adsorbed on the surface and high-concentration dopant near the surface by reacting with the dopant to form volatile compounds. The reactive gas mixture may be provided during thermal treatment, or it may be provided before or after at temperatures different from the thermal treatment temperature. The volatile compounds are removed. Substrates so treated do not form toxic compounds when stored or transported outside process equipment.
摘要翻译：提供了用于从掺杂衬底去除过量掺杂剂的方法和设备。在一个实施例中，衬底通过掺杂剂的表面沉积进行掺杂，随后形成覆盖层和热扩散驱入。向处理室提供反应性蚀刻剂混合物（具有可选等离子体）以蚀刻掉封盖层并通过与过量掺杂剂反应形成挥发性化合物。在另一个实施例中，通过能量注入掺杂剂来掺杂衬底。利用可选的等离子体将反应气体混合物提供给处理室，以通过与掺杂剂反应形成挥发性化合物来去除吸附在表面上的过量掺杂剂和表面附近的高浓度掺杂剂。可以在热处理期间提供反应性气体混合物，或者可以在不同于热处理温度的温度之前或之后提供反应性气体混合物。挥发性化合物被除去。如此处理的基材在工艺设备外储存或运输时不会形成有毒化合物。

50. 发明申请

WO2008073954B1 WET PHOTORESIST STRIPPING PROCESS AND APPARATUS 审中-公开
标题翻译：湿式光刻胶剥离工艺及设备
公开(公告)号：WO2008073954B1
公开(公告)日：2008-11-27
申请号：PCT/US2007087161
申请日：2007-12-12
申请人： APPLIED MATERIALS INC , CHO SEON-MEE , FOAD MAJEED A
发明人： CHO SEON-MEE , FOAD MAJEED A
IPC分类号： H01L21/02 , H01L21/311
CPC分类号： H01L21/67075 , G03F7/42 , G03F7/423 , G03F7/426 , H01L21/31133
摘要： A process for stripping photoresist from a substrate is provided. A processing system for implanting a dopant into a layer of a film stack, annealing the stripped film stack, and stripping the implanted film stack is also provided. When high dopant concentrations are implanted into a photoresist layer, a crust layer may form on the surface of the photoresist layer that may not be easily removed. The methods described herein are effective for removing a photoresist layer having such a crust on its surface.
摘要翻译：提供了从衬底剥离光刻胶的工艺。还提供了一种处理系统，用于将掺杂剂注入到薄膜叠层的层中，对剥离的薄膜叠层进行退火以及剥离注入的薄膜叠层。当将高掺杂浓度注入到光致抗蚀剂层中时，可能在光致抗蚀剂层的表面上形成可能不容易去除的硬皮层。本文描述的方法对于去除其表面上具有这样的外壳的光致抗蚀剂层是有效的。

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