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41. 发明申请

US20100028787A1 SUBSTRATE FOR EUV MASK BLANKS 有权
标题翻译：用于防紫外线遮罩的基材
公开(公告)号：US20100028787A1
公开(公告)日：2010-02-04
申请号：US12490833
申请日：2009-06-24
申请人： Akio KOIKE , Ken EBIHARA
发明人： Akio KOIKE , Ken EBIHARA
IPC分类号： G03F7/20 , G03F1/00 , C03C3/04
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , C03B19/1415 , C03B19/1453 , C03B19/1469 , C03B19/1492 , C03B2201/21 , C03B2201/42 , C03C3/06 , C03C2201/14 , C03C2201/21 , C03C2201/23 , C03C2201/42 , Y02P40/57
摘要： A substrate that is suitable for an EUV mask or an EUV mask blank and excellent in flatness, is provided.A substrate for an EUV mask blank, which is made of a silica glass containing from 1 to 12 mass % of TiO2, wherein the surface roughness (rms) in a surface quality area of the substrate is at most 2 nm, and the maximum variation (PV) of the stress in the surface quality area of the substrate is at most 0.2 MPa.
摘要翻译：提供了适用于EUV掩模或EUV掩模坯料并且具有优异的平面度的基板。由含有1〜12质量％的TiO 2的二氧化硅玻璃构成的EUV掩模坯的基板，其中，所述基板的表面质量区域的表面粗糙度（rms）为2nm以下，最大变化量基板的表面质量区域的应力的最大值（PV）为0.2MPa以下。

42. 发明申请

US20090242387A1 PROCESS FOR PRODUCING SILICA GLASS CONTAINING TIO2, AND OPTICAL MATERIAL FOR EUV LITHOGRAPHY EMPLOYING SILICA GLASS CONTAINING TIO2 审中-公开
标题翻译：生产含有二氧化硅玻璃的工艺，含有二氧化硅的二氧化硅玻璃的光学材料和含有二氧化硅的二氧化硅玻璃的光学材料
公开(公告)号：US20090242387A1
公开(公告)日：2009-10-01
申请号：US12466032
申请日：2009-05-14
申请人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
发明人： Akio KOIKE , Yasutomi Iwahashi , Noriaki Shimodaira , Shinya Kikugawa , Naoki Sugimoto
IPC分类号： C23C14/34
CPC分类号： C03C3/06 , C03B19/1453 , C03B19/1484 , C03B2201/21 , C03B2201/42 , C03C17/40 , C03C2201/21 , C03C2201/42 , G03F7/70958
摘要： The claimed invention relates to a process for producing an optical material for EUV lithography, wherein the optical material contains a silica glass having a TiO2 concentration of from 3 to 12 mass % and a hydrogen molecule content of less than 5×1017 molecules/cm3 in the glass. The process including coating a multilayer film on the silica glass by ion beam sputtering.
摘要翻译：所要求保护的发明涉及一种用于制造用于EUV光刻的光学材料的方法，其中所述光学材料包含玻璃中TiO 2浓度为3至12质量％且氢分子含量小于5×10 17分子/ cm 3的二氧化硅玻璃。该方法包括通过离子束溅射在二氧化硅玻璃上涂覆多层膜。

43. 发明申请

US20070042893A1 Silica glass containing TiO2 and process for its production 有权
标题翻译：含二氧化硅的硅玻璃及其生产工艺
公开(公告)号：US20070042893A1
公开(公告)日：2007-02-22
申请号：US11589875
申请日：2006-10-31
申请人： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
发明人： Akio Koike , Yasutomi Iwahashi , Yasuyuki Takimoto , Shinya Kikugawa
IPC分类号： C03C3/06 , C03B19/00 , C03B23/00 , C03B32/00
CPC分类号： C03C3/06 , C03B19/1453 , C03B2201/12 , C03B2201/23 , C03B2201/42 , C03C2201/12 , C03C2201/23 , C03C2201/42
摘要： It is to provide a silica glass containing TiO2, having a wide temperature range wherein the coefficient of thermal expansion is substantially zero. A silica glass containing TiO2, which has a TiO2 concentration of from 3 to 10 mass %, a OH group concentration of at most 600 mass ppm and a Ti3+ concentration of at most 70 mass ppm, characterized by having a fictive temperature of at most 1,200° C., a coefficient of thermal expansion from 0 to 100° C. of 0±150 ppb/° C., and an internal transmittance T400-700 per 1 mm thickness in a wavelength range of from 400 to 700 nm of at least 80%. A process for producing a silica glass containing TiO2, which comprises porous glass body formation step, F-doping step, oxygen treatment step, densification step and vitrification step.
摘要翻译：提供含有TiO 2的二氧化硅玻璃，其具有宽的温度范围，其中热膨胀系数基本上为零。含有TiO 2浓度为3〜10质量％，OH基浓度为600质量ppm以下且Ti 3 +浓度为70质量ppm以下，其特征在于，假想温度为1200℃以下，0〜100℃的热膨胀系数为0±150ppb /℃。并且在400至700nm的波长范围内每1mm厚度的内部透射率T 400-700 至少为80％。一种制备含有TiO 2的二氧化硅玻璃的方法，其包括多孔玻璃体形成步骤，F掺杂步骤，氧处理步骤，致密化步骤和玻璃化步骤。

44. 发明申请

US20060258967A1 Walking aid device 有权
标题翻译：行走辅助装置
公开(公告)号：US20060258967A1
公开(公告)日：2006-11-16
申请号：US10557338
申请日：2004-03-15
申请人： Takako Fujil , Yoshirou Koyama , Hisashi Katoh , Takashi Hirata , Akio Koike , Taiji Koyama
发明人： Takako Fujil , Yoshirou Koyama , Hisashi Katoh , Takashi Hirata , Akio Koike , Taiji Koyama
IPC分类号： A61F5/00
CPC分类号： B25J9/0006 , A61F5/0102 , A61H1/0255 , A61H3/00 , A61H3/008 , A61H2201/0192 , A61H2201/1215 , A61H2201/163 , A61H2201/1642 , A61H2201/165 , A61H2205/081
摘要： In order to provide a walking assistance device capable of favorably providing an assisting force for maintaining the upright posture while reducing the sense of pressure when worn by the user, a hip support member (1) of the walking assisting device, which comprises an assisting force generator (hip joint actuator 10) disposed at least on a side of a hip joint to provide an assisting force to a movement of a lower limb, is provided with: a back support (4) equipped with pads (18, 19, 20) for respectively abutting an intermediate portion between right and left erector spinae muscles, lateral outer sides of the spinae muscles and right and left iliac crests; and a belt (5) connected to the back support for tightening a lower part of the rectus abdominis muscle. In this way, a supporting force can be provided to the lumbar vertebrae to steadily keep the upright posture while reducing a resistance to a bending movement of the waist caused by the support member. Further, the drive torque from the assisting force generator can be supported by the whole hip portion and this can contribute to preventing inadvertent move of the support member.
摘要翻译：为了提供一种行走辅助装置，其能够有利地提供用于维持直立姿势的辅助力，同时在使用者佩戴时降低压力感觉，行走辅助装置的臀部支撑构件（1）包括辅助力至少设置在髋关节一侧以提供对下肢运动的辅助力的发生器（髋关节致动器10）设置有：配备有垫（18,19,20）的后支撑件（4）用于分别邻接右和左耳直肌之间的中间部分，脊肌的侧外侧和右髂骨和左髂骨顶; 以及连接到后支撑件的带（5），用于收紧腹直肌的下部。以这种方式，可以向腰椎提供支撑力以稳定地保持直立姿势，同时减少由支撑构件引起的腰部弯曲运动的阻力。此外，来自辅助力发生器的驱动扭矩可以由整个臀部支撑，并且这可以有助于防止支撑构件的意外移动。

45. 发明授权

US4860369A Flat speaker unit 失效
标题翻译：平板扬声器单元
公开(公告)号：US4860369A
公开(公告)日：1989-08-22
申请号：US36340
申请日：1987-04-09
申请人： Katsumi Koshimura , Akio Koike
发明人： Katsumi Koshimura , Akio Koike
IPC分类号： H04R1/02 , H04R1/24 , H04R9/04
CPC分类号： H04R1/025 , H04R1/24 , H04R9/047 , H04R2201/021
摘要： A flat speaker device having a flat speaker unit fitted into a through-hole for mounting a speaker of a wall surface board having its back secured to a wall surface leaving a specific spacing therebetween, the flat speaker unit comprising a total-drive type flat speaker comprising a plurality of magnets juxtaposed on a plane and a diaphragm formed from a plurality of projections for respectively covering the plurality of magnets, a speaker frame with a mounting flange mounted on the flat speaker so as to encircle the outer periphery of the flat speaker, rod-like screw members mounted so as to pass through the speaker frame from the front surface towards the back, and swining blades each disposed on the back of the speaker frame with one end threadedly engaged with a respective rod-like screw member and having a length such that when the blade is swung outwardly of a diagonal line of the speaker frame, the tip portion of the blade extends outwardly from the speaker frame.
摘要翻译：一种扁平扬声器装置，其具有安装在通孔中的平板扬声器单元，所述通孔用于安装壁表面板的扬声器，所述壁表面板的背面固定在墙壁表面上，留下一定间隔，所述平板扬声器单元包括全驱动型平板扬声器包括并列在平面上的多个磁体和由用于分别覆盖所述多个磁体的多个突起形成的隔膜;扬声器框架，其具有安装在所述平坦扬声器上的安装凸缘，以围绕所述平坦扬声器的外周; 杆状螺纹构件安装成从前表面朝向背面穿过扬声器框架，并且将每个设置在扬声器框架背面的叶片切割成一个与相应的杆状螺钉构件螺纹接合的一端，并且具有长度使得当叶片从扬声器框架的对角线向外摆动时，叶片的尖端部分从扬声器框架向外延伸。

46. 发明授权

US08356494B2 Process for producing porous quartz glass object, and optical member for EUV lithography 失效
标题翻译：用于生产多孔石英玻璃物体的方法和用于EUV光刻的光学构件
公开(公告)号：US08356494B2
公开(公告)日：2013-01-22
申请号：US13210673
申请日：2011-08-16
申请人： Takahiro Mitsumori , Yasutomi Iwahashi , Akio Koike
发明人： Takahiro Mitsumori , Yasutomi Iwahashi , Akio Koike
IPC分类号： C03B37/018 , C03C3/06
CPC分类号： C03B19/1423 , C03B2201/42 , C03B2207/06 , C03B2207/20 , C03C3/06 , C03C2201/42 , C03C2203/44
摘要： A process for producing a porous quartz glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.
摘要翻译：一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积并生长在基材上，其中燃烧器具有至少两个喷嘴，其中含有（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体，以及（D）选自以下的一种或多种气体：一组稀有气体，N 2，CO 2，卤化氢和H 2 O，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

47. 发明申请

US20120292793A1 PROCESS FOR PRODUCING ARTICLE HAVING FINE CONCAVE AND CONVEX STRUCTURE ON SURFACE 审中-公开
标题翻译：生产具有表面微细凹凸和凸起结构的物品的方法
公开(公告)号：US20120292793A1
公开(公告)日：2012-11-22
申请号：US13565298
申请日：2012-08-02
申请人： Akio KOIKE , Shinya KIKUGAWA , Yoshiyuki NISHIHARA
发明人： Akio KOIKE , Shinya KIKUGAWA , Yoshiyuki NISHIHARA
IPC分类号： G02B1/12
CPC分类号： B29C33/38 , B29C33/424 , B29C2791/005 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention relates to a method for producing an article having a fine concave and convex structure on a surface thereof, comprising the following steps (i) to (iii): (i) step of sandwiching a photocurable composition between a mold having an inverted structure of the fine concave and convex structure on a surface thereof and a substrate; (ii) step of irradiating the photocurable composition with light; and (iii) step of separating the mold from the cured product to obtain an article comprising the substrate having on a surface thereof the cured product having the fine concave and convex structure on a surface thereof, in which the mold contains TiO2-containing quartz glass, and at least the step (i) is conducted in a helium gas atmosphere.
摘要翻译：本发明涉及一种在其表面上具有细凹凸结构的制品的制造方法，包括以下步骤（i）至（iii）：（i）将可光固化组合物夹在具有倒置的在其表面和基板上的细凹凸结构的结构; （ii）用光照射光固化性组合物的工序; 和（iii）将模具与固化物分离的步骤，以获得包含基材的物品在其表面上具有在其表面上具有微细凹凸结构的固化产物，其中模具含有含TiO 2的石英玻璃，并且至少步骤（i）在氦气气氛中进行。

48. 发明申请

US20120149543A1 TIO2-CONTAINING SILICA GLASS, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY 审中-公开
标题翻译：含二氧化硅的玻璃，以及用于EUV光刻的光学部件
公开(公告)号：US20120149543A1
公开(公告)日：2012-06-14
申请号：US13401475
申请日：2012-02-21
申请人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
发明人： Akio KOIKE , Yasutomi Iwahashi , Shinya Kikugawa
IPC分类号： C03C3/06 , C03C3/076
CPC分类号： C03C3/06 , C03C4/0085 , C03C2201/42 , C03C2203/44 , G03F7/70958
摘要： The present invention relates to a TiO2-containing silica glass having a TiO2 content of 7.5 to 12% by mass, a fictive temperature of 1,000° C. or higher, and a temperature at which a coefficient of linear thermal expansion is 0 ppb/° C. being within the range of 40 to 110° C.
摘要翻译：本发明涉及TiO 2含量为7.5〜12质量％，假想温度为1000℃以上的含TiO 2的二氧化硅玻璃，线膨胀系数为0ppb /°的温度 C.在40至110℃的范围内

49. 发明申请

US20120121857A1 METHOD FOR PRODUCING TIO2-SIO2 GLASS BODY, METHOD FOR HEAT-TREATING TIO2-SIO2 GLASS BODY, TIO2-SIO2 GLASS BODY, AND OPTICAL BASE FOR EUVL 有权
标题翻译：生产TIO2-SIO2玻璃体的方法，热处理TIO2-SIO2玻璃体，TIO2-SIO2玻璃体和EUVL光学基质的方法
公开(公告)号：US20120121857A1
公开(公告)日：2012-05-17
申请号：US13295652
申请日：2011-11-14
申请人： Akio Koike , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
发明人： Akio Koike , Takahiro Mitsumori , Yasutomi Iwahashi , Tomonori Ogawa
IPC分类号： C03C3/04 , B32B3/00 , C03B25/00
CPC分类号： C03B19/1453 , B82Y10/00 , B82Y40/00 , C03B32/00 , C03B2201/42 , C03C3/06 , C03C4/0085 , C03C2201/42 , C03C2203/52 , G03F1/24
摘要： The present invention relates to a process for production of a TiO2—SiO2 glass body, comprising a step of, when an annealing point of a TiO2—SiO2 glass body after transparent vitrification is taken as T1(° C.), holding the glass body after transparent vitrification in a temperature region of from T1−90(° C.) to T1−220(° C.) for 120 hours or more.
摘要翻译：本发明涉及一种制备TiO 2 -SiO 2玻璃体的方法，包括以下步骤：当将透明玻璃化后的TiO 2 -SiO 2玻璃体的退火点作为T1（℃）时，将玻璃体在从T1-90（℃）到T1-220（℃）的温度区域透明玻璃化120小时以上。

50. 发明申请

US20110301015A1 PROCESS FOR PRODUCING POROUS QUARTZ GLASS OBJECT, AND OPTICAL MEMBER FOR EUV LITHOGRAPHY 失效
标题翻译：用于生产多孔石英玻璃物体的工艺和用于EUV光刻的光学部件
公开(公告)号：US20110301015A1
公开(公告)日：2011-12-08
申请号：US13210673
申请日：2011-08-16
申请人： Takahiro MITSUMORI , Yasutomi Iwahashi , Akio Koike
发明人： Takahiro MITSUMORI , Yasutomi Iwahashi , Akio Koike
IPC分类号： C03C3/04 , C03B20/00
CPC分类号： C03B19/1423 , C03B2201/42 , C03B2207/06 , C03B2207/20 , C03C3/06 , C03C2201/42 , C03C2203/44
摘要： The present invention relates to a process for producing a porous quarts glass body containing hydrolyzing a metal dopant precursor and an SiO2 precursor in a flame of a burner to form glass fine particles, and depositing and growing the formed glass fine particles on a base material, in which the burner has at least two nozzles, and in which a mixed gas containing (A) a metal dopant precursor gas, (B) an SiO2 precursor gas, (C) one gas of H2 and O2, and (D) one or more gases selected from the group consisting of a rare gas, N2, CO2, a hydrogen halide and H2O, with a proportion of the gas (D) being from 5 to 70 mol %; and (E) the other gas of H2 and O2 of (C), are fed into different nozzles of the burner from each other.
摘要翻译：本发明涉及一种制造多孔石英玻璃体的方法，该方法包括在燃烧器的火焰中水解金属掺杂剂前体和SiO 2前体以形成玻璃微粒，并将形成的玻璃微粒沉积和生长在基材上，其中燃烧器具有至少两个喷嘴，其中包含（A）金属掺杂剂前体气体，（B）SiO 2前体气体，（C）H 2和O 2的一种气体的混合气体和（D）一种或选自稀土气体，N 2，CO 2，卤化氢和H 2 O的更多气体，一部分气体（D）为5-70mol％; 和（E）（C）的H 2和O 2的其它气体彼此供给到燃烧器的不同喷嘴中。

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