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31. 发明申请

US20040045667A1 Laser-driven cleaning using reactive gases 失效
标题翻译：使用反应气体进行激光驱动清洗
公开(公告)号：US20040045667A1
公开(公告)日：2004-03-11
申请号：US10611161
申请日：2003-11-10
发明人： David Yogev , Boris Livshits (Buyaner)
IPC分类号： B23K026/00 , H01L021/306
CPC分类号： H01L21/67288 , B08B7/0035 , B08B7/0042 , H01L21/67028 , H01L21/67069 , H01L21/681
摘要： A method and apparatus for removing contaminants from the surface of a substrate. An explosive medium is introduced into a vicinity of the substrate, and a beam of electromagnetic energy is directed toward the substrate. Absorption of the electromagnetic energy causes the explosive medium both to generate a blast wave and to form reactive species, the blast wave and the reactive species cooperating to remove the contaminants from the surface substantially without damage to the surface itself.
摘要翻译：一种用于从基底表面去除污染物的方法和装置。将爆炸性介质引入到基板附近，并且将电磁能束束朝向基板。电磁能的吸收会导致爆炸介质产生冲击波并形成反应物质，冲击波和反应物质协同从表面去除污染物，基本上不损伤表面本身。

32. 发明申请

US20040040662A1 Plasma processing method and apparatus for etching nonvolatile material 审中-公开
标题翻译：用于蚀刻非挥发性材料的等离子体处理方法和装置
公开(公告)号：US20040040662A1
公开(公告)日：2004-03-04
申请号：US10229076
申请日：2002-08-28
发明人： Manabu Edamura , Seiichiro Kanno , Ryoji Nishio , Ken Yoshioka , Saburou Kanai , Tadamitsu Kanekiyo
IPC分类号： H01L021/306
CPC分类号： H01J37/32477 , H01J37/321
摘要： A plasma processing apparatus having a process chamber, a process gas feeding pipe for introducing a process gas into the process chamber, a holding electrode for receiving and holding a sample placed in the process chamber, a bias-potential-generating radio-frequency power source for supplying a bias potential to the sample, and an induction coil to produce a plasma, wherein the process chamber comprises a conductor member, disposed to face a portion of an internal surface of the process chamber, for supplying a bias potential to the portion, and a detachable trap member having a surface for deposition of reaction products formed at another portion of the internal surface of the process chamber.
摘要翻译：一种等离子体处理装置，其具有处理室，用于将处理气体引入处理室的处理气体供给管，用于接收和保持放置在处理室中的样品的保持电极，偏置电位产生射频电源用于向样品提供偏置电位，以及感应线圈产生等离子体，其中所述处理室包括导体构件，所述导体构件设置成面对所述处理室的内表面的一部分，用于向所述部分提供偏置电位，以及具有用于沉积形成在处理室的内表面的另一部分处的反应产物的表面的可分离的捕获部件。

33. 发明申请

US20040040656A1 Method and apparatus for CMP retaining ring 审中-公开
标题翻译： CMP保持环的方法和装置
公开(公告)号：US20040040656A1
公开(公告)日：2004-03-04
申请号：US10651174
申请日：2003-08-28
发明人： Raymond J. Hengel JR. , George J. Frank JR.
IPC分类号： H01L021/306 , C23F001/00 , B32B031/00 , C09J001/00
CPC分类号： B24B37/32
摘要： A two piece, metal and plastic, retaining ring used for chemical mechanical polishing of semiconductor substrates. In one embodiment, the plastic is selected from polyphenylene sulfide (PPS), polyethylene terephthalate, polyetheretherketone, polybutylene terephthalate, Ertalyte TX, PEEK, Torlon, Delrin, PET, Vespel, or Duratrol, and the plastic is assembled to a stainless steel ring with a urethane adhesive at room temperature. In another embodiment, the plastic is assembled to the metal portion with an acrylic adhesive at room temperature.
摘要翻译：用于半导体基板的化学机械抛光的两片金属和塑料保持环。在一个实施方案中，塑料选自聚苯硫醚（PPS），聚对苯二甲酸乙二醇酯，聚醚醚酮，聚对苯二甲酸丁二醇酯，Ertalyte TX，PEEK，Torlon，Delrin，PET，Vespel或Duratrol，并将塑料组装到不锈钢环上，室温下的聚氨酯粘合剂。在另一个实施方案中，在室温下用丙烯酸粘合剂将塑料组装到金属部分。

34. 发明申请

US20040035530A1 Sheet-fed treating device 失效
标题翻译：单张纸处理装置
公开(公告)号：US20040035530A1
公开(公告)日：2004-02-26
申请号：US10250907
申请日：2003-07-08
发明人： Hachishiro IIzuka
IPC分类号： H01L021/306
CPC分类号： H01L21/67017 , C23C16/4412 , C23C16/455 , C23C16/4583 , C23C16/4586 , H01J37/32192 , H01J37/32211
摘要： A processing unit of the invention is a single wafer processing unit including: a processing container that can be vacuumed; a stage arranged in the processing container, on which an object to be processed can be placed; a discharging pipe connected to a bottom part of the processing container and extending substantially downward linearly; a vacuum pump directly connected to the discharging pipe; and a stage-supporting pillar arranged to extend in a substantially central portion of the discharging pipe and in a direction of the discharging pipe, the stage-supporting pillar supporting the stage.
摘要翻译：本发明的处理单元是单晶片处理单元，其包括：可被抽真空的处理容器; 布置在处理容器中的能够放置待处理物体的台阶; 排出管，其连接到处理容器的底部并且基本上向下线性延伸; 直接连接到排放管的真空泵; 以及台架支柱，其设置成在排出管的大致中央部分和排出管的方向上延伸，支撑台支撑支柱。

35. 发明申请

US20040023496A1 CMP slurry compositions for oxide films and methods for forming metal line contact plugs using the same 失效
标题翻译：用于氧化膜的CMP浆料组合物及使用其制备金属线接触塞的方法
公开(公告)号：US20040023496A1
公开(公告)日：2004-02-05
申请号：US10603976
申请日：2003-06-25
发明人： Jong Goo Jung , Sang Ick Lee
IPC分类号： C23F001/00 , H01L021/306 , H01L021/4763
CPC分类号： C09G1/02 , H01L21/31053 , H01L21/3212 , H01L21/7684
摘要： CMP slurries for oxide film and a method for forming a metal line contact plug of a semiconductor device are described herein. When a polishing process of a multi-layer film is performed by using the disclosed CMP slurry for oxide film including an HXOn compound (wherein n is an integer from 1 to 4), a stable landing plug poly can be formed by preventing step differences by reducing interlayer polishing speed differences.
摘要翻译：本文描述了用于氧化物膜的CMP浆料和用于形成半导体器件的金属线接触插塞的方法。当通过使用所公开的包括HXOn化合物（其中n是1至4的整数）的氧化物膜的CMP浆料进行多层膜的抛光工艺时，可以通过防止步骤差异减少层间抛光速度差异。

36. 发明申请

US20040020599A1 Treating device 审中-公开
标题翻译：治疗装置
公开(公告)号：US20040020599A1
公开(公告)日：2004-02-05
申请号：US10416962
申请日：2003-05-16
发明人： Sumi Tanaka , Masayuki Tanaka , Tatsuya Handa
IPC分类号： H01L021/306
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/45521 , C23C16/4581 , C23C16/481 , H01L21/28556 , H01L21/67115 , H01L21/68721
摘要： A processing container, a pedestal for mounting wafer W, a processing gas feeder for feeding a processing gas to the front surface of the wafer W, an annular substrate-holding member for holding the wafer W, a purge gas feeder for feeding purge gas into a space formed at the backside surface side of the wafer W, a purge gas flow path for upwardly inducing a purge gas inside said space from between the wafer W and said substrate holding member, and a gas discharge mechanism for discharging said purge gas in a case that a pressure in said space becomes higher than a pressure outside said space within said processing container by a predetermined value. Further, a susceptor is composed of a material with thermal radiation transmissivity equal to or lower than dissimilar members such as temperature sensors contained in the susceptor.
摘要翻译：处理容器，用于安装晶片W的基座，用于将处理气体供给到晶片W的前表面的处理气体供给器，用于保持晶片W的环形基板保持部件，用于将吹扫气体供给到吹扫气体供给器形成在晶片W的背面侧的空间，用于从晶片W和基板保持部件之间向上引导在所述空间内的吹扫气体的吹扫气体流路，以及用于将所述吹扫气体排出到气体排出机构所述空间中的压力变得高于所述处理容器内的所述空间外的压力预定值的情况。此外，基座由具有等于或低于不同构件的热辐射透射率的材料构成，诸如包含在基座中的温度传感器。

37. 发明申请

US20040020439A1 Process chamber window assembly 审中-公开
标题翻译：过程室窗组件
公开(公告)号：US20040020439A1
公开(公告)日：2004-02-05
申请号：US10208333
申请日：2002-07-30
发明人： Chin-Jen Chen , Ming-Yuan Chen , Shui-Yen Lu , Te-Keo Liu
IPC分类号： C23C016/00 , H01L021/306
CPC分类号： H01J37/32458 , C23C16/50
摘要： A process chamber window assembly is described. The process chamber window has an opening in a chamber body, a quartz window plane located on the opening and sealed with a O-ring and a buffer pad with an opening having the same shape as the quartz window pane located thereon. The window also has a view port located in the buffer pad and a fixed frame located on the view port. Screws through a plurality of screw holes in the fixed frame, the view port, the buffer pad and the chamber body fasten the window assembly to the chamber body.
摘要翻译：描述处理室窗组件。处理室窗口在室主体中具有开口，石英窗平面位于开口上并用O形环密封，缓冲垫具有与位于其上的石英窗玻璃相同形状的开口。该窗口还具有位于缓冲垫中的视图端口和位于视图端口上的固定框架。螺钉穿过固定框架，视口，缓冲垫和腔体中的多个螺孔，将窗组件固定到腔体。

38. 发明申请

US20040011466A1 Plasma processing apparatus 审中-公开
标题翻译：等离子体处理装置
公开(公告)号：US20040011466A1
公开(公告)日：2004-01-22
申请号：US10618602
申请日：2003-07-15
申请人： Tokyo Electron Limited
发明人： Naoki Matsumoto , Chishio Koshimizu , Toshiaki Hongoh
IPC分类号： H01L021/306
CPC分类号： H01J37/321
摘要： A plasma processing apparatus for supplying radio-frequency power into a process chamber so as to generate plasma, to thereby treat an object to be processed with the plasma. In the plasma processing apparatus, the process chamber has a top plate which is disposed opposite to the object to be processed, through the medium of a region for generating the plasma, and a radio-frequency antenna is disposed in the inside and outside of the process chamber so that the radio-frequency antenna is wound around the top plate.
摘要翻译：一种等离子体处理装置，用于将高频电力提供到处理室中以产生等离子体，从而用等离子体处理待处理物体。在等离子体处理装置中，处理室具有通过用于产生等离子体的区域的介质而与待处理物体相对设置的顶板，并且在该内部和外部设置有射频天线处理室，使得射频天线缠绕在顶板上。

39. 发明申请

US20040009619A1 Automatic fluid scanner 审中-公开
标题翻译：自动流体扫描仪
公开(公告)号：US20040009619A1
公开(公告)日：2004-01-15
申请号：US10611059
申请日：2003-07-02
申请人： Interlab, Inc.
发明人： Liviu Marian , William J. Fenton
IPC分类号： H01L021/306
CPC分类号： H01L21/6838 , H01L21/6715 , H01L21/67178 , H01L21/6719 , H01L21/67207 , H01L21/67748
摘要： A method and apparatus for using a robot for handling and processing of a semiconductor wafer. In particular, the robot is used to transfer wafers from a variety of wafers holding devices to a number of processing locations. After the wafer is placed in position, the robot places the vacuum wand in a temporary parking position and engages a different tool to process the wafer. In subsequent stages, yet another tool is engaged by the same robot to handle the chemistry used in the process.
摘要翻译：一种使用机器人处理和处理半导体晶片的方法和装置。特别地，机器人用于将晶片从各种晶片保持装置转移到多个处理位置。在将晶片放置就位之后，机器人将真空棒放置在临时停放位置，并接合不同的工具来处理晶片。在随后的阶段中，另一个工具由同一个机器人接合以处理在该过程中使用的化学物质。

40. 发明申请

US20040007592A1 Precision liquid mixing apparatus and method 审中-公开
标题翻译：精密液体混合装置及方法
公开(公告)号：US20040007592A1
公开(公告)日：2004-01-15
申请号：US10418212
申请日：2003-04-18
申请人： The BOC Group, Inc.
发明人： Peter Martin Pozniak , Charles Andre Provost , Rakesh Kumar Singh , Sau Van Vo , Benjamin Rush Roberts
IPC分类号： B67D005/56 , H01L021/306
CPC分类号： B24B37/04 , B01F13/1055 , B01F15/00357 , B01F15/026 , B01F15/0441 , B24B57/02
摘要： A system, apparatus and method is disclosed for providing a consistent liquid mixture according to a predetermined recipe for use at a point of use. The apparatus includes a plurality of liquid component reservoirs in which a constant gas pressure is maintained. A plurality of valves are provided, with individual valves connected to an outlet port of each reservoir. An electronic controller controls the valve actuation in a repetitive sequence to discharge predetermined doses of selected liquid components for mixing to form the consistent liquid mixture. A mixing section receives the sequence of doses to mix them together to form the liquid mixture.
摘要翻译：公开了一种用于根据用于使用点的预定配方提供一致的液体混合物的系统，装置和方法。该装置包括多个保持恒定气体压力的液体成分储存器。提供多个阀，其中单个阀连接到每个储存器的出口。电子控制器以重复的顺序控制阀致动以排出预定剂量的选定液体组分以进行混合以形成一致的液体混合物。混合部分接收剂量序列以将它们混合在一起以形成液体混合物。

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