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    • 32. 发明专利
    • Perpendicular magnetic recording head and manufacturing method thereof
    • 全能磁记录头及其制造方法
    • JP2009117027A
    • 2009-05-28
    • JP2008283461
    • 2008-11-04
    • Headway Technologies Incヘッドウェイテクノロジーズ インコーポレイテッド
    • SHO RIKIKATSUSMYTH JOEDOVEK MORISSASAKI YOSHITAKAHAN CHERNG-CHYI
    • G11B5/31
    • G11B5/3116G11B5/1278G11B5/23G11B5/3163
    • PROBLEM TO BE SOLVED: To provide a perpendicular magnetic recording head improving recording performance by suppressing saturation of magnetic fluxes in a trailing shield. SOLUTION: The perpendicular magnetic recording head includes: a tapered main pole layer 21 having a slope 21s, a tapered non-magnetic top-shaping layer 22 having a slope 22s positioned in the same plane as the slope 21s, a recording gap layer 23, and a trailing shield 24, which are stacked in this order. Since the tapered main pole layer 21 has a tapered portion, intensity of a recording magnetic field is increased. Since the tapered non-magnetic top-shaping layer 22 is inserted between the trailing shield 24 and the tapered main pole layer 21, saturation of magnetic fluxes in the trailing shield 24 is prevented. Since both the tapered main pole layer 21 and the tapered non-magnetic top-shaping layer 22 have tapered portions, effective throat height is easily controlled more than when there is no tapered portion. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供垂直磁记录头,通过抑制后挡板中的磁通量的饱和度来改善记录性能。 解决方案:垂直磁记录头包括:具有斜面21s的锥形主极层21,具有位于与斜面21s相同的平面中的斜面22s的锥形非磁性顶部成形层22,记录间隙 层23和后挡板24,其按顺序堆叠。 由于锥形主极层21具有锥形部分,所以记录磁场的强度增加。 由于锥形非磁性顶部成形层22插入在后屏蔽件24和锥形主极层21之间,所以防止尾部屏蔽件24中的磁通量的饱和。 由于锥形主极层21和锥形非磁性顶部成形层22都具有锥形部分,所以与没有锥形部分相比,有效喉部高度容易受到控制。 版权所有(C)2009,JPO&INPIT
    • 34. 发明专利
    • Perpendicular magnetic recording head and method of manufacturing the same
    • 全能磁记录头及其制造方法
    • JP2008300027A
    • 2008-12-11
    • JP2008142684
    • 2008-05-30
    • Headway Technologies Incヘッドウェイテクノロジーズ インコーポレイテッド
    • HAN CHERNG-CHYILI MINLIU FENGLINSHO RIKIKATSU
    • G11B5/31
    • G11B5/3163G11B5/1278G11B5/3116G11B5/315Y10T29/49032Y10T29/49052
    • PROBLEM TO BE SOLVED: To provide a method of manufacturing a perpendicular magnetic recording head for achieving high recording area densities up to 500 Gbit/in 2 . SOLUTION: A pair of bottom side shields 20 and a pair of non-magnetic material layers 30 are formed by forming non-magnetic layers on a lower side shield forming layer, selectively etching them, and forming a groove 800 having a truncated wedge-shaped sectional shape. Next, a magnetic pole tip part 10 of a magnetic pole 100 is formed inside the groove 800 so as to be separated from the pair of lower side shields 20 via a side gap layer 50. Finally, an upper shield 80 is formed above the magnetic pole tip part 10 so as to be separated from the magnetic pole tip part 10 via a recording gap layer 70. The magnetic pole tip part 10 is shielded from three directions of lower parts of both sides and the upper side by the pair of lower side shields 20 and the upper shield 80. COPYRIGHT: (C)2009,JPO&INPIT
    • 要解决的问题:提供一种用于实现高达500Gbit / in 2 的高记录面积密度的垂直磁记录头的制造方法。 解决方案:一对底侧屏蔽20和一对非磁性材料层30通过在下侧屏蔽形成层上形成非磁性层而形成,选择性地蚀刻它们,并且形成具有截断的凹槽800 楔形截面形状。 接下来,磁极100的磁极尖部10形成在槽800的内部,以便经由侧间隙层50与一对下侧屏蔽件20分离。最后,在屏蔽层80的上方形成有上屏蔽件80 磁极尖部10经由记录间隙层70与磁极末端部10分离。磁极末端部10从两侧的下部和上侧的三个方向被一对下侧 屏蔽20和上护罩80.版权所有(C)2009,JPO&INPIT
    • 35. 发明专利
    • Magnetic head for vertical magnetic recording, and its manufacturing method
    • 用于垂直磁记录的磁头及其制造方法
    • JP2008034077A
    • 2008-02-14
    • JP2007038797
    • 2007-02-20
    • Headway Technologies IncShinka Jitsugyo Kkヘッドウェイテクノロジーズ インコーポレイテッド新科實業有限公司SAE Magnetics(H.K.)Ltd.
    • SASAKI YOSHITAKAITO HIROYUKISHIMIZU TATSUJISHIMIZU TATSUYA
    • G11B5/31
    • G11B5/3146G11B5/11G11B5/1278G11B5/1871G11B5/3116G11B5/315
    • PROBLEM TO BE SOLVED: To determine a throat height correctly, to suppress the protrusion of an edge on a medium facing surface of a shield due to heat produced by a coil, and to suppress the occurrence of a wide area adjacent track erasure. SOLUTION: The shield 13 has a first layer 13A1, a second layer 13A2, a third layer 13B, a first connecting section 13C and a second connecting section 13D. The first layer 13A1 has a first surface that is arranged on the front side in a travelling direction of a recording medium with respect to an edge of a magnetic pole layer 12 on the medium facing surface, a second surface that faces the magnetic pole layer 12, and a third surface that is on the opposite side of the second surface. The second layer 13A2 is in contact with the third surface. The third layer 13B is arranged so that the magnetic pole layer 12 is sandwiched by the first layer 13A1 and the third layer 13B. The first connecting section 13C connects the first layer 13A1 and the third layer 13B without contact with the magnetic pole layer 12. The second connecting section 13D connects the magnetic pole layer 12 and the third layer 13B at the position farther from the medium facing surface than the first connecting section 13C. COPYRIGHT: (C)2008,JPO&INPIT
    • 要解决的问题:为了正确地确定喉部高度,为了抑制由于线圈产生的热量而导致的屏蔽物的面向介质的表面上的边缘的突出,并且抑制相邻轨道擦除的广泛区域的发生 。 解决方案:屏蔽13具有第一层13A1,第二层13A2,第三层13B,第一连接部13C和第二连接部13D。 第一层13A1具有相对于介质对向表面上的磁极层12的边缘沿着记录介质的行进方向的前侧布置的第一表面,面对磁极层12的第二表面 ,以及位于第二表面的相反侧的第三表面。 第二层13A2与第三表面接触。 第三层13B被布置成使得磁极层12被第一层13A1和第三层13B夹在中间。 第一连接部分13C连接第一层13A1和第三层13B,而不与磁极层12接触。第二连接部分13D将磁极层12和第三层13B连接在比介质面向表面更远的位置处,比 第一连接部13C。 版权所有(C)2008,JPO&INPIT
    • 39. 发明专利
    • Method of forming photoresist pattern, and method of electrically forming isolated shape
    • 形成光电子图案的方法以及电气形成隔离形状的方法
    • JP2007156496A
    • 2007-06-21
    • JP2006330285
    • 2006-12-07
    • Headway Technologies Incヘッドウェイテクノロジーズ インコーポレイテッド
    • LAUCHLAN LAURIE J
    • G03F7/20G03F7/30H01L21/027
    • G11B5/3163G03F1/36
    • PROBLEM TO BE SOLVED: To provide a method of forming a photoresist pattern capable of precisely forming an isolated hole pattern image having a high aspect ratio for the photoresist layer.
      SOLUTION: Additional hole shapes 21 as narrower dummy hole shapes are disposed additionally, next to a main isolated hole shape 11 of a binary mask 12. The photoresist layer, formed on a substrate, is exposed and developed using the binary mask 12. Accordingly, the isolated hole pattern (main trench), having the high aspect ratio is formed, in a region corresponding to the isolated hole shape 11. The ratio of the isolated hole shape width to the thickness of the photoresist layer is set so that the resist does not remain at the bottom of the main trench after development, but will remain at the bottom of the additional hole pattern (additional trench) made by the additional hole shapes 21. If the substrate is made conductive to perform electroplating processing, a plating film is grown only on the substrate at the inner side of the main trench, and the isolated shape, having a high aspect ratio (e.g., magnetic pole or the like), can be formed.
      COPYRIGHT: (C)2007,JPO&INPIT
    • 要解决的问题:提供一种形成能够精确地形成光致抗蚀剂层具有高纵横比的孤立孔图案图像的光致抗蚀剂图案的方法。 解决方案:在二进制掩模12的主隔离孔形状11附近另外设置作为较窄的虚拟孔形状的附加孔形21.在基板上形成的光致抗蚀剂层使用二进制掩模12曝光和显影 因此,在与孤立孔形状11对应的区域中形成具有高纵横比的隔离孔图案(主沟槽)。隔离孔形状宽度与光致抗蚀剂层的厚度的比例被设定为 抗蚀剂在显影后不会保留在主沟槽的底部,而是保留在由附加孔形21形成的附加孔图案(附加沟槽)的底部。如果使基底导电以进行电镀处理,则 电镀膜仅在主沟槽的内侧的基板上生长,并且可以形成具有高纵横比的隔离形状(例如,磁极等)。 版权所有(C)2007,JPO&INPIT