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    • 33. 发明授权
    • Process for purifying silica
    • 二氧化硅纯化方法
    • US4676964A
    • 1987-06-30
    • US857376
    • 1986-04-30
    • Akira SekiYuuki NaritaYoshio AsoShunro Nagata
    • Akira SekiYuuki NaritaYoshio AsoShunro Nagata
    • C01B33/158C01B33/12
    • C01B33/158
    • This invention concerns a process for purifying silica produced from an alkali silicate aqueous solution, which usually contains more than 200 ppm of impurities, to silica containing less than 30 ppm of impurities. Concretely, the purification process of silica comprises: dispersing silica gel, containing a lot of impurities, in water and filtering the solution; dispersing the filtered out silica gel again in an aqueous solution of pH 2 or less and filtering the aqueous solution; putting the silica gel to heat-treatment and acid-treatment with continuous stirring in order to break the inside siloxane link and dissolve out impurities therefrom and filtering the acid solution; rinsing a produced cake with pure water to wash away the inside residual solution and drying the cake.
    • 本发明涉及一种将通常含有大于200ppm杂质的碱金属硅酸盐水溶液生产的二氧化硅纯化成含有少于30ppm杂质的二氧化硅的方法。 具体地说,二氧化硅的纯化方法包括:将含有大量杂质的硅胶分散在水中并过滤溶液; 将滤出的硅胶再次分散在pH2以下的水溶液中,过滤水溶液; 将硅胶在连续搅拌下进行热处理和酸处理,以破坏内部硅氧烷连接并溶解杂质并过滤酸溶液; 用纯水冲洗生产的滤饼以洗涤内部残留溶液并干燥滤饼。