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31. 发明授权

US5170453A Optical module 失效
标题翻译：光模块
公开(公告)号：US5170453A
公开(公告)日：1992-12-08
申请号：US573583
申请日：1990-08-28
申请人： Hisao Go , Hidenori Takahashi
发明人： Hisao Go , Hidenori Takahashi
IPC分类号： G02B6/42 , H01L25/16 , H01L31/0203 , H01L33/62
CPC分类号： H01L31/0203 , G02B6/4265 , G02B6/4274 , G02B6/4292 , H01L25/167 , G02B6/4245 , H01L2924/0002 , H01L33/62
摘要： An optical module comprises an optical connector, to one end of which one end of an optical fiber is connected; an optically operating element secured to the optical connector, the optically operating element being optically coupled to the optical fiber; electronic circuit elements forming an electronic circuit connected to the optically operating element; a substrate bearing the electronic circuit elements; lead pins consisting of inner and outer leads, the inner leads being connected to the electronic circuit; and a molded resin member holding as one unit the optical connector, the optically operating element, the electronic circuit elements, the substrate and the lead pins except the one end of the optical connector and the outer leads of the lead pins. The optical module is manufactured using a lead fram comprising a plurality of lead parts which are formed into the lead pins later; a frame for supporting the lead parts; a substrate forming part supported by a few of the lead parts; and a holding member for holding the optical connector.
摘要翻译：光学模块包括光连接器，光纤连接器的一端连接在光纤连接器的一端; 固定到光学连接器的光学操作元件，光学操作元件光耦合到光纤; 形成连接到光学操作元件的电子电路的电子电路元件; 具有电子电路元件的基板; 引脚由内引线和外引线组成，内引线连接到电子电路; 以及将光连接器的一端和引线针的外引线以外的光连接器，光操作元件，电子电路元件，基板和引线引脚保持为一个单元的模制树脂部件。光学模块使用包括稍后形成在引脚中的多个引线部分的引线框来制造; 用于支撑引导部件的框架; 由几个引线部分支撑的基板形成部分; 以及用于保持光连接器的保持构件。

32. 发明授权

US09463275B2 Infusion pump 有权
标题翻译：输液泵
公开(公告)号：US09463275B2
公开(公告)日：2016-10-11
申请号：US14346828
申请日：2012-09-11
申请人： Mitsutaka Ueda , Ryoichi Akai , Hidenori Takahashi
发明人： Mitsutaka Ueda , Ryoichi Akai , Hidenori Takahashi
IPC分类号： A61M1/00 , A61M5/168 , A61M5/142 , F04B43/08
CPC分类号： A61M5/16813 , A61M5/14212 , A61M5/14224 , A61M5/14228 , F04B43/082
摘要： An infusion pump has a primary finger with an inclined surface, which is obliquely inclined to an advancing and retracting direction, and a secondary finger with an inclined surface, which is slidable relative to the inclined surface of the primary finger. When the primary finger is advanced, the secondary finger is retracted in proportion to the variation (increasing) in an entire width of an infusion tube, and when the primary finger is retracted, the secondary finger is advanced in proportion the variation (decreasing) in the entire width of the infusion tube. This configuration can suppress the occurrence of any gap between a tip surface of the secondary finger and an outer peripheral surface of the infusion tube in the advancing and retracting process of the primary finger. Consequently, this prevents the infusion tube from meandering, and suppresses the reduction in the accuracy of the rate of infusion.
摘要翻译：输液泵具有主指状物，其具有倾斜的倾斜表面，其倾斜地朝向前进和后退方向，以及具有相对于主指状物的倾斜表面可滑动的倾斜表面的次级手指。当主指状物前进时，辅助手指与输液管的整个宽度的变化（增加）成比例地缩回，并且当主指缩回时，次级手指按比例（递减）输液管的整个宽度。这种构造可以抑制在主指的前进和缩回过程中二次手指的尖端表面和输注管的外周表面之间的任何间隙的发生。因此，能够防止输液管曲折，能够抑制输液速度的精度降低。

33. 发明授权

US09217919B2 Photosensitive composition, pattern-forming method using the composition, and resin used in the composition 有权
标题翻译：使用组合物的感光组合物，图案形成方法和组合物中使用的树脂
公开(公告)号：US09217919B2
公开(公告)日：2015-12-22
申请号：US13062285
申请日：2009-08-26
申请人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
发明人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
IPC分类号： G03F7/004 , C08F12/20 , C08F12/22 , C08F12/30 , C08F12/32 , G03F7/039 , C09D125/18
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/22 , C08F12/30 , C08F12/32 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F222/36 , C08F212/32 , C08F2220/1883
摘要： A radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.
摘要翻译：一种辐射敏感性组合物，其包含具有离子结构位点的部分结构（A）的化合物（P），并且能够在用光化射线或辐射照射时分解以产生酸和部分结构（B），其具有至少一个酚羟基，羟基的一部分或全部氢原子或各自被能够通过酸的作用而离开的基团保护的基团，其中化合物中包含的部分结构（A）的离子结构位点（ P）是在通过光化射线或辐射照射时能够在化合物（P）中产生酸阴离子的结构; 使用其的图案形成方法; 和用于组合物中的树脂。

34. 发明授权

US08895222B2 Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition 有权
标题翻译：光敏感或辐射敏感性树脂组合物和抗蚀剂膜和图案形成方法使用该组合物
公开(公告)号：US08895222B2
公开(公告)日：2014-11-25
申请号：US12729336
申请日：2010-03-23
申请人： Tomotaka Tsuchimura , Hidenori Takahashi , Takayuki Ito , Takeshi Inasaki , Shohei Kataoka
发明人： Tomotaka Tsuchimura , Hidenori Takahashi , Takayuki Ito , Takeshi Inasaki , Shohei Kataoka
IPC分类号： G03F7/004 , G03F7/028 , G03F7/029 , G03F7/039 , G03F7/20 , C08F224/00
CPC分类号： C08F224/00 , C08F12/20 , C08F12/22 , C08F12/24 , C08F12/30 , C08F12/32 , C08F212/14 , C09D125/18 , G03F7/0045 , G03F7/029 , G03F7/0392 , G03F7/2037 , Y10S430/122 , C08F220/16 , C08F212/32 , C08F2220/1883 , C08F2220/1825
摘要： Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.
摘要翻译：本发明提供一种光活性射线敏感性或辐射敏感性树脂组合物，其包含（P）树脂，该树脂含有（A）具有离子结构部分的重复单元，该离子结构部分能够在照射光化学射线或辐射时在侧链上产生酸性阴离子，其中所述离子结构部分的阳离子部分具有酸可分解基团或碱可分解基团。

35. 发明申请

US20130196973A1 BENZODIOXANE INHIBITORS OF LEUKOTRIENE PRODUCTION 有权
公开(公告)号：US20130196973A1
公开(公告)日：2013-08-01
申请号：US13418377
申请日：2012-03-13
申请人： Asitha Abeywardane , Michael J. Burke , Thomas Martin Kirrane , Matthew Russell Netherton , Anil Kumar Padyana , Lana Louise Smith Keenan , Hidenori Takahashi , Michael Robert Turner , Qiang Zhang , Qing Zhang
发明人： Asitha Abeywardane , Michael J. Burke , Thomas Martin Kirrane , Matthew Russell Netherton , Anil Kumar Padyana , Lana Louise Smith Keenan , Hidenori Takahashi , Michael Robert Turner , Qiang Zhang , Qing Zhang
IPC分类号： C07D319/20 , C07D417/10 , C07D471/10 , C07D417/14 , C07D405/14 , C07D491/056 , C07D487/04 , C07D487/10 , C07D405/10 , C07D487/08
CPC分类号： C07D295/16 , A61K31/397 , A61K31/5377 , C07D295/096 , C07D319/20 , C07D405/10 , C07D405/12 , C07D405/14 , C07D417/10 , C07D417/14 , C07D471/10 , C07D487/04 , C07D487/08 , C07D487/10 , C07D491/056
摘要： The present invention relates to compounds of formula (I): wherein R1 to R3, A, X and n are as defined herein. The compounds of formula (I) are useful as inhibitors of leukotriene A4 hydrolase (LTA4H) and treating LTA4H related disorder. The present invention also relates to pharmaceutical compositions comprising the compounds of formula (I), methods of using these compounds in the treatment of various diseases and disorders, and processes for preparing these compounds.

36. 发明授权

US08420655B2 Benzimidazole inhibitors of leukotriene production 有权
标题翻译：苯并咪唑抑制剂白三烯生产
公开(公告)号：US08420655B2
公开(公告)日：2013-04-16
申请号：US12957766
申请日：2010-12-01
申请人： Zhidong Chen , Ming-Hong Hao , Weimin Liu , Ho-Yin Lo , Pui Leng Loke , Chuk Chui Man , Tina Marie Morwick , Peter Allen Nemoto , Hidenori Takahashi , Heather Tye , Lifen Wu
发明人： Zhidong Chen , Ming-Hong Hao , Weimin Liu , Ho-Yin Lo , Pui Leng Loke , Chuk Chui Man , Tina Marie Morwick , Peter Allen Nemoto , Hidenori Takahashi , Heather Tye , Lifen Wu
IPC分类号： A61K31/506 , C07D403/14
CPC分类号： C07D471/04 , C07D401/12 , C07D403/12 , C07D409/12 , C07D413/12 , C07D417/12
摘要： The present invention relates to compounds of formula (I): and pharmaceutically acceptable salt thereof, wherein R1-R7 are as defined herein. The invention also relates to pharmaceutical compositions comprising these compounds, methods of using these compounds in the treatment of various diseases and disorders, processes for preparing these compounds and intermediates useful in these processes.
摘要翻译：本发明涉及式（I）化合物及其药学上可接受的盐，其中R 1 -R 7如本文所定义。本发明还涉及包含这些化合物的药物组合物，使用这些化合物治疗各种疾病和病症的方法，制备这些化合物的方法和可用于这些方法的中间体。

37. 发明申请

US20130040096A1 PATTERN FORMING METHOD AND ACTINIC-RAY- OR RADIATION-SENSTIVE RESIN COMPOSITION 有权
标题翻译：图案形成方法和丙烯酰胺或辐射敏感性树脂组合物
公开(公告)号：US20130040096A1
公开(公告)日：2013-02-14
申请号：US13642751
申请日：2011-05-20
申请人： Kaoru Iwato , Hidenori Takahashi , Shuji Hirano , Sou Kamimura , Keita Kato
发明人： Kaoru Iwato , Hidenori Takahashi , Shuji Hirano , Sou Kamimura , Keita Kato
IPC分类号： G03F7/039 , H01L21/027 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/0758 , G03F7/11 , G03F7/2041 , G03F7/325 , G03F7/40 , Y10T428/24
摘要： Provided is a method of forming a pattern and an actinic-ray- or radiation-sensitive resin composition that excels in the limiting resolving power, roughness characteristics, exposure latitude (EL) and bridge defect performance. The method of forming a pattern includes (1) forming an actinic-ray- or radiation-sensitive resin composition into a film, (2) exposing the film to light, and (3) developing the exposed film with a developer containing an organic solvent. The actinic-ray- or radiation-sensitive resin composition contains (A) a resin containing a repeating unit with a structural moiety that is configured to decompose when exposed to actinic rays or radiation to thereby generate an acid, and (B) a solvent.
摘要翻译：提供了形成极限分辨能力，粗糙度特性，曝光宽容度（EL）和桥梁缺陷性能优异的图案和光化射线或辐射敏感性树脂组合物的方法。形成图案的方法包括（1）将光化学射线或辐射敏感性树脂组合物形成膜，（2）将膜曝光，和（3）用含有机溶剂的显影剂显影曝光膜。所述光化学射线或辐射敏感性树脂组合物含有（A）含有具有结构部分的重复单元的树脂，所述结构部分被配置为当暴露于光化射线或辐射时分解从而产生酸，和（B）溶剂。

38. 发明授权

US08343709B2 Processed pigment, pigment-dispersed composition, colored photosensitive composition, color filter, liquid crystal display element, and solid image pickup element 有权
标题翻译：加工颜料，颜料分散组合物，着色光敏组合物，滤色器，液晶显示元件和固体摄像元件
公开(公告)号：US08343709B2
公开(公告)日：2013-01-01
申请号：US12204397
申请日：2008-09-04
申请人： Kazuhiro Fujimaki , Koichi Sugihara , Shigekazu Suzuki , Hidenori Takahashi
发明人： Kazuhiro Fujimaki , Koichi Sugihara , Shigekazu Suzuki , Hidenori Takahashi
IPC分类号： G03F7/00 , G03F7/004 , C08K5/00
CPC分类号： G03F7/0007 , C09B67/0013 , C09B67/009 , C09B68/20 , C09B68/4257 , C09B68/44 , C09B69/101 , C09B69/109 , G02B5/223 , G03F7/105 , Y10T428/2982
摘要： Provided are a processed pigment excellent in dispersibility and dispersion stability, a pigment-dispersed composition excellent in dispersibility and dispersion stability of a pigment that uses the processed pigment, a colored photosensitive composition using the pigment-dispersed composition, and a color filter having improved color properties that uses the colored photosensitive composition, in which a pigment is covered with at least one of a specific polymer compound selected from the following (SP-1) to (SP-3); (SP-1) A polymer compound having a heterocycle on a side chain, (SP-2) A graft polymer compound having a weight average molecular weight of from 1,000 to 100000, (SP-3) A polymer compound represented by the following formula (3-1), wherein, RC, RD, A1 and P1 respectively represent an organic linkage group, a single bond or a divalent organic linkage group, a monovalent organic group containing such as an organic dye structure, and a polymer skeleton.
摘要翻译：提供了分散性和分散稳定性优异的加工颜料，使用该加工颜料的颜料的分散性和分散稳定性优异的颜料分散组合物，使用该颜料分散组合物的着色感光性组合物和具有改善颜色的滤色器使用着色光敏组合物的性质，其中颜料被选自以下（SP-1）至（SP-3）中的特定聚合物化合物中的至少一种覆盖; （SP-1）侧链上具有杂环的高分子化合物（SP-2）重均分子量为1000〜100000的接枝高分子化合物（SP-3）由下式（3-1），其中，RC，RD，A1和P1分别表示有机连接基团，单键或二价有机连接基团，含有有机染料结构的一价有机基团和聚合物骨架。

39. 发明授权

US08248033B2 Secondary battery temperature-increasing control apparatus and vehicle including the same, and secondary battery temperature-increasing control method 失效
标题翻译：二次电池升温控制装置及其车辆，以及二次电池升温控制方法
公开(公告)号：US08248033B2
公开(公告)日：2012-08-21
申请号：US13382672
申请日：2010-07-07
申请人： Yuji Nishi , Hidenori Takahashi , Masatoshi Tazawa
发明人： Yuji Nishi , Hidenori Takahashi , Masatoshi Tazawa
IPC分类号： H01M10/46
CPC分类号： B60L11/1872 , B60L3/0046 , B60L3/0053 , B60L11/1875 , B60L2210/14 , Y02T10/7011 , Y02T10/705 , Y02T10/7225 , Y02T90/34
摘要： An ECU determines whether the ripple current is within a target range (S50). When it is determined that the ripple current is not within the target range (NO in S50), the ECU determines whether the ripple current is greater than or less than the target range (S80). When it is determined that the ripple current is less than the target range (NO in S80), the ECU reduces the carrier frequency of the boost converter that is a component of the ripple generating section (S90). On the other hand, when it is determined that the ripple current is greater than the target range (YES in S80), the ECU increases the carrier frequency of the boost converter (S100).
摘要翻译： ECU判定纹波电流是否在目标范围内（S50）。当确定纹波电流不在目标范围内（S50中为“否”）时，ECU判断纹波电流是否大于或小于目标范围（S80）。当确定纹波电流小于目标范围（S80中为“否”）时，ECU降低作为波纹发生部分的分量的升压转换器的载波频率（S90）。另一方面，当确定纹波电流大于目标范围（S80中为“是”）时，ECU增加升压转换器的载波频率（S100）。

40. 发明申请

US20120139036A1 MANUFACTURING METHOD OF SEMICONDUCTOR APPARATUS AND SEMICONDUCTOR APPARATUS 有权
标题翻译：半导体器件和半导体器件的制造方法
公开(公告)号：US20120139036A1
公开(公告)日：2012-06-07
申请号：US13320211
申请日：2010-07-29
申请人： Yasushi Niimura , Sota Watanabe , Hidenori Takahashi , Takumi Fujimoto , Takeyoshi Nishimura , Takamasa Wakabayashi
发明人： Yasushi Niimura , Sota Watanabe , Hidenori Takahashi , Takumi Fujimoto , Takeyoshi Nishimura , Takamasa Wakabayashi
IPC分类号： H01L29/78 , H01L21/336
CPC分类号： H01L29/7811 , H01L21/266 , H01L29/0615 , H01L29/0619 , H01L29/063 , H01L29/0638 , H01L29/0696 , H01L29/0878 , H01L29/1095 , H01L29/404 , H01L29/41741 , H01L29/41766 , H01L29/42368 , H01L29/66712 , H01L29/66727 , H01L29/7395 , H01L29/7802
摘要： A screen oxide film is formed on an n− drift layer (2) that is disposed on an anterior side of an n-type low-resistance layer (1), and a nitride film is formed on the screen oxide film. The nitride film is photo-etched using a first mask and thereby, a nitride shielding film (61) is formed. N-type impurity ions at a concentration higher than that of the n− drift layer are implanted through the nitride shielding film (61) from an anterior side of a semiconductor substrate and are thermally diffused and thereby, an n counter layer (7) is formed. The screen oxide film is removed. A gate oxide film (3a) is formed. A gate electrode (9) is formed on the gate oxide film (3a). P-type impurity ions are implanted from the anterior side of the semiconductor substrate using the gate electrode (9) and the nitride shielding film (61) as a mask and thereby, p− well regions (10) are formed. N-type impurity ions are implanted from the anterior side of the semiconductor substrate using the gate electrode (9) and the nitride shielding film (61) as a mask and thereby, n source regions (11) are formed.
摘要翻译：在设置在n型低电阻层（1）的前侧的n漂移层（2）上形成荧光体氧化膜，在该荧光体氧化膜上形成氮化膜。使用第一掩模对氮化物膜进行光蚀刻，从而形成氮化物屏蔽膜（61）。浓度高于n-漂移层的N型杂质离子从半导体衬底的前侧通过氮化物屏蔽膜（61）注入并被散热，从而n对准层（7）为形成。去除屏幕氧化膜。形成栅氧化膜（3a）。栅电极（9）形成在栅氧化膜（3a）上。使用栅电极（9）和氮化物屏蔽膜（61）作为掩模，从半导体衬底的前侧注入P型杂质离子，从而形成p-阱区（10）。使用栅电极（9）和氮化物屏蔽膜（61）作为掩模，从半导体衬底的前侧注入N型杂质离子，从而形成n个源区（11）。

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