专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US5738739A Method for producing low carbon equivalent rolled steel shapes by controlled rolling 失效
标题翻译：通过控制轧制生产低碳当量轧制钢材的方法
公开(公告)号：US5738739A
公开(公告)日：1998-04-14
申请号：US791833
申请日：1997-01-30
申请人： Kohichi Yamamoto , Yasushi Takeshima , Akira Inagaki , Naoki Oda
发明人： Kohichi Yamamoto , Yasushi Takeshima , Akira Inagaki , Naoki Oda
IPC分类号： B21B1/088 , B21B1/08 , B21B45/00 , B21B45/02 , C21D8/00 , C21D9/00 , C21D11/00 , C22C38/00
CPC分类号： C21D9/0068 , C21D8/00 , B21B1/088 , B21B2045/0221 , C21D2221/00 , H01L2224/2919 , H01L2924/0665
摘要： A method for producing a steel section by a rolling process including a rough rolling step, an intermediate rolling step and a finishing rolling step. The intermediate rolling step comprises water-cooling the flange portion of the rough-rolled steel section between rolling passes in the intermediate rolling step to cool the surface layer of the flange to a temperature not higher than 750.degree. C., and rolling the flange portion during recuperation of the surface layer of the flange at least one time between the rolling passes with a total draft not less than 20% and at an average rolling temperature not higher than 950.degree. C. and, after the finishing rolling step the outer surface of the flange is cooled at a cooling rate ranging from 0.5.degree. to 10.degree. C./sec depending on the thickness of the flange. Also the carbon equivalent of the steel is controlled. The advantage is that steel sections of various contours and dimensions can be produced from minimized varieties of steel compositions.
摘要翻译：通过包括粗轧步骤，中间轧制步骤和精轧步骤的轧制方法生产钢部分的方法。中间轧制步骤包括在中间轧制步骤的轧制过程之间对粗轧部分的凸缘部分进行水冷却，以将法兰的表面层冷却至不高于750℃的温度，并且将凸缘部分在法兰的表面层的至少一次在轧制道次之间至少一次的时间内，总的通过量不小于20％，平均轧制温度不高于950℃，并且在精加工步骤之后，根据法兰的厚度，法兰以0.5至10℃/ sec的冷却速率冷却。钢的碳当量也受到控制。优点是可以从最小化的钢组合物品种生产各种轮廓和尺寸的钢截面。

32. 发明授权

US5259229A Apparatus for cooling thin-webbed H-beam steel 失效
标题翻译：用于冷却薄网H型钢钢的设备
公开(公告)号：US5259229A
公开(公告)日：1993-11-09
申请号：US992402
申请日：1992-12-18
申请人： Akira Inagaki , Masao Kurokawa , Hiroyuki Hasegawa , Toshihiro Ishibashi , Hiroaki Hadano , Takeshi Hioki , Yoshimi Toriyama , Kazuo Fujita , Yasushi Takeshima , Teruyuki Wakatsuki , Yasushi Horiuchi
发明人： Akira Inagaki , Masao Kurokawa , Hiroyuki Hasegawa , Toshihiro Ishibashi , Hiroaki Hadano , Takeshi Hioki , Yoshimi Toriyama , Kazuo Fujita , Yasushi Takeshima , Teruyuki Wakatsuki , Yasushi Horiuchi
IPC分类号： C21D8/00 , C21D9/00 , B21B45/02
CPC分类号： C21D8/00 , C21D9/0068
摘要： An apparatus for cooling thin-webbed H-beam steel includes means for forcibly spray cooling the flanges of the H-beam in intermediate and final hot rolling zones. The cooling is based upon tracking information with respect to predetermined positions along the length of the H-beam. A plurality of flow quantity control blocks are disposed in parallel with each having a three way valve having a water supply side port, a nozzle side port, and a water drain port. A plurality of on-off valves connect the nozzle side port to nozzles in a nozzle group to select nozzles based upon the flange width of the H-beam. A variable throttle mechanism maintains pressure loss at the water drain side equal to pressure loss at the nozzle side. Switching of the three way valve of one flow quantity control block can be carried out without affecting other flow quantity control blocks.
摘要翻译：用于冷却薄腹板H型钢钢的装置包括在中间和最终热轧区域强制喷射冷却H型钢束的凸缘的装置。冷却是基于沿着H型梁的长度的预定位置的跟踪信息。多个流量控制块与具有供水侧端口，喷嘴侧端口和排水口的三通阀并联配置。多个开关阀将喷嘴侧端口连接到喷嘴组中的喷嘴，以基于H型梁的凸缘宽度来选择喷嘴。可变节气门机构保持排水侧的压力损失等于喷嘴侧的压力损失。一个流量控制块的三通阀的切换可以在不影响其他流量控制块的情况下进行。

33. 发明授权

US5187756A Surface acoustic waveguide device and manufacturing method 失效
标题翻译：表面声波导装置及其制造方法
公开(公告)号：US5187756A
公开(公告)日：1993-02-16
申请号：US758608
申请日：1991-09-12
申请人： Masataka Shiba , Akira Inagaki , Minoru Yoshida , Kenchi Ito , Kazumi Kawamoto
发明人： Masataka Shiba , Akira Inagaki , Minoru Yoshida , Kenchi Ito , Kazumi Kawamoto
IPC分类号： H03H9/25 , G02F1/125
CPC分类号： G02F1/125
摘要： The present invention relates to a surface acoustic wave element comprising a substrate, an optical waveguide layer formed on the aforesaid substrate to guide laser light from a laser light source, a surface acoustic wave portion for deflecting or modulating the laser light traveling through the aforesaid optical waveguide layer, a comb-shaped SAW electrode provided on the aforesaid optical waveguide layer to cause the aforesaid surface acoustic wave portion to generate surface acoustic wave, and a terminal provided on the aforesaid optical waveguide layer and connected to the aforesaid SAW electrode to apply a high-frequency alternating voltage thereto, wherein a protection cover is bonded by a viscoelastic adhesive having a refractive index smaller than that of the aforesaid optical waveguide layer to cover the aforesaid SAW electrode and surface acoustic wave portion with air space in such a manner that the aforesaid terminal is positioned outside thereof, and the manufacturing method of the surface acoustic wave element.
摘要翻译：本发明涉及一种弹性表面波元件，包括基板，形成在上述基板上的用于引导来自激光光源的激光的光波导层，用于偏转或调制通过前述光学器件行进的激光的表面声波部分波导层，设置在上述光波导层上的梳形SAW电极，使上述声表面波部分产生声表面波;以及端子，设置在上述光波导层上，并与上述SAW电极连接，高频交流电压，其中保护盖通过具有比上述光波导层的折射率小的折射率的粘弹性粘合剂粘结，以覆盖上述SAW电极和具有空气空间的表面声波部分，使得上述端子位于其外侧，声表面波元件。

34. 发明授权

US4825453A X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US4825453A
公开(公告)日：1989-04-25
申请号：US788861
申请日：1985-10-17
申请人： Yukio Kembo , Yoshihiro Komeyama , Minoru Ikeda , Akira Inagaki
发明人： Yukio Kembo , Yoshihiro Komeyama , Minoru Ikeda , Akira Inagaki
IPC分类号： G03F7/20 , H01L21/027 , H01L21/30 , G21K5/00
CPC分类号： B82Y10/00 , G03F7/2039 , G03F7/70033 , G03F7/70841 , G03F7/70866
摘要： Disclosed is an X-ray exposure apparatus having a low attenuation chamber supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer, the apparatus comprising detecting means for detecting the gas or components mixed in the gas in the low attenuation chamber, control means for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.
摘要翻译：公开了一种具有低吸收少量X射线吸收气体的低衰减室的X射线曝光装置，该低衰减室插入在X射线源和掩模之间，使得透过低衰减室的X射线为照射在掩模上以将掩模图案转印到晶片上的抗蚀剂上，该装置包括用于检测混合在低衰减室中的气体中的气体或成分的检测装置，用于控制气体供应量的控制装置根据检测装置的输出信号进入低衰减室，和/或调节装置，用于根据检测装置的输出信号调节照射在掩模上的所述X射线的曝光量。

35. 发明授权

US4777641A Method and apparatus for alignment 失效
标题翻译：对准方法和装置
公开(公告)号：US4777641A
公开(公告)日：1988-10-11
申请号：US918004
申请日：1986-10-14
申请人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
发明人： Akira Inagaki , Yukio Kembo , Ryuichi Funatsu , Asahiro Kuni , Keiichi Okamoto , Yoshihiro Komeyama
IPC分类号： G02B7/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G21K5/00
CPC分类号： G03F9/70
摘要： A method and apparatus for alignment for use in X-ray exposure or the like wherein a mask is provided having a formation of an alignment pattern made up of at least one linear segment formed in a peripheral section of the mask and a wafer is provided having a formation of an alignment pattern formed in a same direction as the alignment pattern of the mask and made up of linear segments. An illuminating arrangement illuminates a light to the mask alignment pattern along a direction inclined to the alignment direction and the mask alignment pattern and the wafer alignment pattern are imaged and transformed into a video signal. An A/D converts the video signal into a digital signal and stores the digital signal in a memory. The digital video signal is read out from the memory and averaged in a mask alignment pattern by removing a shadow portion caused by the mask alignment pattern and additionally averaged in a wafer alignment pattern area with an averaged wafer alignment pattern signal and an averaged wafer alignment pattern signal being provided. Relative displacement between the mask and the wafer is detected from the averaged mask alignment pattern signal and the averaged wafer alignment pattern signal and the mask and wafer are aligned by moving at least one of the mask and wafer so that displacement between the mask and the wafer does not exist.
摘要翻译：一种用于X射线曝光等的对准用的方法和装置，其中提供具有由形成在掩模的周边部分中的至少一个线性部分构成的取向图案的掩模和晶片，其具有：形成与由掩模的对准图形相同的方向形成并由直线段构成的对准图案。照明装置沿着对准方向倾斜的方向照射到掩模对准图案，并且将掩模对准图案和晶片对准图案成像并变换为视频信号。 A / D将视频信号转换为数字信号，并将数字信号存储在存储器中。从存储器中读出数字视频信号，并通过去除由掩模对准图形引起的阴影部分并以平均的晶片对准图案信号和平均的晶片对准图案在晶片对准图案区域中平均化，以掩模对准图案平均化提供信号。从平均的掩模对准图案信号中检测掩模和晶片之间的相对位移，并且通过移动掩模和晶片中的至少一个来对准平均的晶片对准图案信号并且掩模和晶片，使得掩模和晶片之间的位移不存在。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式