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31. 发明授权

US07399819B2 Silicon compound 有权
标题翻译：硅化合物
公开(公告)号：US07399819B2
公开(公告)日：2008-07-15
申请号：US10528001
申请日：2003-09-17
申请人： Mikio Yamahiro , Hisao Oikawa , Kazuhiro Yoshida , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
发明人： Mikio Yamahiro , Hisao Oikawa , Kazuhiro Yoshida , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
IPC分类号： C08G77/24
CPC分类号： C08G77/442 , C07F7/21 , C08G77/045 , C08G77/38
摘要： A large part of conventional organic-inorganic composite materials is obtained by mechanical blending silsesquioxanes with organic polymers, and therefore it has been very difficult to control the structure thereof as the molecular aggregate of the composite materials. An object of the present invention is to provide a novel silicon compound having a living radical polymerization-initiating ability for an addition-polymerizable monomer and a polymer obtained using the same to thereby solve the problem described above regarding the conventional organic-inorganic composite materials. The present inventors have found that a novel silsesquioxane derivative to which a group having an ability to initiate polymerization of a monomer is useful as means for solving the problem described above. That is, the silsesquioxane derivative of the present invention is represented by Formula (1): wherein R1 is hydrogen, alkyl, aryl or arylalkyl; R2 and R3 are alkyl, phenyl or cyclohexyl; and A is a group having an ability to initiate polymerization of a monomer.
摘要翻译：通过将倍半硅氧烷与有机聚合物机械共混获得大部分常规有机 - 无机复合材料，因此非常难以控制其作为复合材料的分子骨料的结构。本发明的目的是提供一种具有可加聚单体的活性自由基聚合引发能力的新型硅化合物和使用该硅化合物获得的聚合物，从而解决了有关常规有机 - 无机复合材料的上述问题。本发明人已经发现，具有引发单体聚合能力的基团的新型倍半硅氧烷衍生物可用作解决上述问题的手段。也就是说，本发明的倍半硅氧烷衍生物由式（1）表示：其中R 1是氢，烷基，芳基或芳基烷基; R 2和R 3是烷基，苯基或环己基; 而A是具有引发单体聚合能力的基团。

32. 发明申请

US20070045495A1 MOBILE DEVICE CLAMP HOLDER WITH DAMPED RELEASE MECHANISM 有权
标题翻译：具有阻尼释放机构的移动设备夹持器
公开(公告)号：US20070045495A1
公开(公告)日：2007-03-01
申请号：US11463457
申请日：2006-08-09
申请人： Mitsuhiro Asano , Yasuhiro Yamamoto , Michael Gollnitz
发明人： Mitsuhiro Asano , Yasuhiro Yamamoto , Michael Gollnitz
IPC分类号： A47F5/00 , H04M1/00
CPC分类号： H04M1/04 , B60R11/0241
摘要： A holder for a mobile electronic device includes first and second clamping jaws, at least the first clamping jaw being displaceable toward the second clamping jaw to clamp the mobile electronic device. The holder also includes a stop element and an entraining element connected to the first clamping jaw, the entraining element being shaped so that it is displaceable with respect to the stop element, namely jointly with the damping jaw connected to it, in which case at least one extreme position corresponding to the maximum opening of the clamping jaw is defined in the displacement path by the impact of the stop element against the entraining element. The holder includes a damper element, which is mounted on the stop element and damps the stopping of the stop element against the entraining element.
摘要翻译：用于移动电子设备的保持器包括第一和第二夹爪，至少第一夹爪可向第二夹爪移动以夹紧移动电子装置。保持器还包括止动元件和连接到第一夹紧爪的夹带元件，夹持元件被成形为使得其相对于止动元件可移位，即与连接到止动元件的阻尼钳口共同，在这种情况下至少通过止动元件相对于夹带元件的冲击，在位移路径中限定与钳夹的最大开口相对应的一个极限位置。保持器包括阻尼元件，该阻尼元件安装在止动元件上并阻止止动元件停止夹带元件。

33. 发明申请

US20060287454A1 Silicon compounds 有权
标题翻译：硅化合物
公开(公告)号：US20060287454A1
公开(公告)日：2006-12-21
申请号：US10548365
申请日：2004-03-05
申请人： Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
发明人： Mikio Yamahiro , Hisao Oikawa , Kenya Ito , Yasuhiro Yamamoto , Masami Tanaka , Nobumasa Ootake , Kenichi Watanabe , Kohji Ohno , Yoshinobu Tsujii , Takeshi Fukuda
IPC分类号： C08F230/08 , C07F7/04
CPC分类号： C08G77/04 , C07F7/21 , C08F10/00 , C08F30/08 , C08F2500/03
摘要： The present invention provides a silicon compound represented by Formula (1) and a polymer obtained by using the same, and this makes it possible not only to obtain an organic-inorganic composite material having a distinct structure but also to control the structure of the above polymer as a molecular aggregate. wherein R1 is a group independently selected from hydrogen, alkyl having a carbon atom number of 1 to 40, substituted or non-substituted aryl and substituted or non-substituted arylalkyl; in this alkyl having a carbon atom number of 1 to 40, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O—, —CH═CH—, cycloalkylene or cycloalkenylene; in alkylene in this arylalkyl, optional hydrogens may be substituted with fluorine, and optional —CH2— may be substituted with —O— or —CH═CH—; and A1 is a group having an α-haloester bond.
摘要翻译：本发明提供由式（1）表示的硅化合物和使用它的聚合物，不仅可以获得具有不同结构的有机 - 无机复合材料，而且可以控制上述结构聚合物作为分子聚集体。其中R 1是独立地选自氢，碳原子数为1至40的烷基，取代或未取代的芳基和取代或未取代的芳基烷基的基团; 在该碳原子数为1至40的烷基中，任选的氢可被氟取代，并且任选的-CH 2 - 可以被-O-，-CH-CH-，亚环烷基或环亚烯基在该芳烷基中的亚烷基中，任选的氢可以被氟取代，任选的-CH 2 - 可以被-O-或-CH-CH-取代; 且A 1是具有α-卤代酯键的基团。

34. 发明授权

US07045909B2 Alignment mark structure 失效
公开(公告)号：US07045909B2
公开(公告)日：2006-05-16
申请号：US11004105
申请日：2004-12-06
申请人： Yasuhiro Yamamoto , Takahiro Yamauchi
发明人： Yasuhiro Yamamoto , Takahiro Yamauchi
IPC分类号： H01L23/544
CPC分类号： G03F9/7076 , H01L23/544 , H01L2223/5442 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002 , Y10S438/975 , H01L2924/00
摘要： A semiconductor substrate having an upper layer and an alignment mark structure formed on a surface region of the upper layer, the surface region defined by opposite first and second parallel sides extending along the upper layer, outer side walls extending upwardly from the upper layer and extending lengthwise along the side, and are defined lengthwise by alternating first and second wall portions, each of the first wall portions is spaced farther from the first side of the surface region than is each of the second wall portions, and an alignment pattern defined by openings in the alignment mark structure.

35. 发明申请

US20060001747A1 Image processing device 失效
公开(公告)号：US20060001747A1
公开(公告)日：2006-01-05
申请号：US11169920
申请日：2005-06-30
申请人： Yasuhiro Yamamoto
发明人： Yasuhiro Yamamoto
IPC分类号： H04N5/76
CPC分类号： H04N5/907 , H04N5/772
摘要： An image-processing device that performs image processes for pixel data of an image, to generate image-processed data. The amount of the image-processed data is greater than that of the pixel data, for each line of the image. The pixel data are stored in a recording area of a memory. The capacity of the recording area for one line's worth of the pixel data is coincident with a maximum amount of data in one line of the image-processed data. The pixel data are stored in the recording area such that a last pixel data in a sequentially stored series of pixel data for the one line is stored at an end address of the recording area.

36. 发明授权

US06980278B2 Self-cleaning method for semiconductor exposure apparatus 失效
标题翻译：半导体曝光装置的自清洁方法
公开(公告)号：US06980278B2
公开(公告)日：2005-12-27
申请号：US10748240
申请日：2003-12-31
申请人： Ryoichi Aoyama , Toshio Onodera , Yasuhiro Yamamoto , Daigo Hoshino
发明人： Ryoichi Aoyama , Toshio Onodera , Yasuhiro Yamamoto , Daigo Hoshino
IPC分类号： G02B3/08 , G03F7/20 , H01L21/027 , H01L21/304 , G03B27/42 , G03B27/52 , G03B27/54
CPC分类号： G03F7/70075 , G03F7/70925
摘要： To an original plate holder 16 to which an original pattern plate 15 is set in ordinary exposure, a transmittable plate 20 having a concave-shaped concave portion 22 formed at a middle of a quartz glass plate is set in self-cleaning and irradiated with ultraviolet light emitted from a light source 11. The ultraviolet light is diffused through the concave lens of the transmittable plate 20 and an entire surface of a projection lens 17 is irradiated with it. Accordingly, molecular bonds of a contaminant adhering to the surface of the projection lens 17 are cut off with strong energy of the ultraviolet light, so that the contaminant is decomposed, vaporized, and then removed.
摘要翻译：在普通曝光中设置有原稿图案板15的原版固定器16上设置有形成在石英玻璃板中间的凹形凹部22的透光板20进行自清洁并照射紫外线从光源11发射的光。紫外线通过可透射板20的凹透镜扩散，投影透镜17的整个表面被照射。因此，附着在投影透镜17的表面的污染物的分子键被紫外线的强烈能量切断，使得污染物被分解，汽化，然后除去。

37. 发明授权

US06953733B2 Method of manufacturing alignment mark and aligning method using the same 失效
标题翻译：制造对准标记的方法及使用其的对准方法
公开(公告)号：US06953733B2
公开(公告)日：2005-10-11
申请号：US10700565
申请日：2003-11-05
申请人： Yasuhiro Yamamoto , Takahiro Yamauchi
发明人： Yasuhiro Yamamoto , Takahiro Yamauchi
IPC分类号： G03F1/42 , G03F9/00 , H01L21/027 , H01L23/544 , H01L21/76
CPC分类号： G03F9/7076 , H01L23/544 , H01L2223/5442 , H01L2223/54426 , H01L2223/54453 , H01L2924/0002 , Y10S438/975 , H01L2924/00
摘要： A method of manufacturing an alignment mark structure and aligning a substrate includes providing a semiconductor substrate having an upper layer, the alignment mark structure being formed on a surface region of the upper layer. The method includes providing the surface region as having opposite first and second parallel sides extending along the upper layer, with outer side walls extending upwardly from the upper layer and extending lengthwise along the side. The outer side walls are provided lengthwise with alternating first and second wall portions, each of the first wall portions being spaced farther from the first side of the surface region than each of the second wall portions. An alignment pattern is defined by providing openings in the alignment mark structure.
摘要翻译：制造对准标记结构并对准衬底的方法包括提供具有上层的半导体衬底，所述对准标记结构形成在上层的表面区域上。该方法包括提供具有沿着上层延伸的相对的第一和第二平行边的表面区域，其中外侧壁从上层向上延伸并且沿侧面纵向延伸。外侧壁纵向设置有交替的第一和第二壁部分，每个第一壁部分比表面区域的第一侧更远离每个第二壁部分。通过在对准标记结构中设置开口来限定对准图案。

38. 发明申请

US20050216869A1 Compiler 有权
标题翻译：编译器
公开(公告)号：US20050216869A1
公开(公告)日：2005-09-29
申请号：US11087752
申请日：2005-03-24
申请人： Ryoko Miyachi , Tomoo Hamada , Hajime Ogawa , Shohei Michimoto , Yasuhiro Yamamoto , Teruo Kawabata , Hirotetsu Tomita
发明人： Ryoko Miyachi , Tomoo Hamada , Hajime Ogawa , Shohei Michimoto , Yasuhiro Yamamoto , Teruo Kawabata , Hirotetsu Tomita
IPC分类号： G06F17/50
CPC分类号： G06F8/423 , G06F17/505
摘要： A compiler apparatus enabling description of a particular hardware module in the existing programming language, although the description has not been possible in hardware designing to input programming language. In the header file 24, a particular hardware indescribable in programming language is defined. And the compiler apparatus includes a parser unit 30 analyzing syntax of source program 22, an intermediate code converting unit 32 converting the syntactically analyzed source program 22 to an intermediate code and code generating unit 36 converting the intermediate code to the RTL description. The intermediate code converting unit 32 includes a detecting unit 40 detecting a particular hardware defined in the header file 24 out of the source program 22 and a replacing unit 42 replacing the detected particular hardware in the detecting unit 40 with the intermediate code corresponding to a particular hardware.
摘要翻译：尽管在硬件设计中输入编程语言的描述是不可能的，但是使用现有编程语言来描述特定硬件模块的编译器装置。在头文件24中，定义了难以形容的编程语言中的特定硬件。并且编译装置包括分析源程序22的语法的解析器单元30，将语法分析的源程序22转换成将中间代码转换为RTL描述的中间代码和代码生成单元36的中间代码转换单元32。中间代码转换单元32包括检测单元40，其检测来自源程序22中的头文件24中定义的特定硬件;以及替换单元42，用检测单元40中的检测到的特定硬件替换与特定的对应的中间代码硬件。

39. 发明授权

US06846006B2 Vehicular air bag device 有权
标题翻译：车载气囊装置
公开(公告)号：US06846006B2
公开(公告)日：2005-01-25
申请号：US10085124
申请日：2002-03-01
申请人： Yorihito Okuda , Katsumi Kawamoto , Yasuhiro Yamamoto , Hiroshi Ogawa
发明人： Yorihito Okuda , Katsumi Kawamoto , Yasuhiro Yamamoto , Hiroshi Ogawa
IPC分类号： B60R21/20 , B60R21/215
CPC分类号： B60R21/205 , B60R21/2165 , B60R2021/21537
摘要： In a vehicular air bag device which has a door member that is disposed on the rear face of an air bag lid portion, and that is pressed by an inflation pressure of an air bag body to be swung via a hinge portion, thereby forming an inflation opening in the air bag lid portion, a first hinge portion and a second hinge portion are disposed as the hinge portion. The second hinge portion is bent in a stage where the inflation pressure of the air bag body is lower than a predetermined value, to cause formation of the inflation opening to be started.
摘要翻译：在车辆用安全气囊装置中，其具有设置在气囊盖部的背面的门构件，并且被通过铰链部摆动的气囊体的充气压力而被按压，由此形成充气在气囊盖部分开口，第一铰链部分和第二铰链部分被设置为铰链部分。第二铰链部分在气囊体的充气压力低于预定值的阶段中弯曲，以形成充气开口的形成。

40. 发明授权

US06610818B2 Process for producing amino resin particles 有权
公开(公告)号：US06610818B2
公开(公告)日：2003-08-26
申请号：US10034089
申请日：2001-12-28
申请人： Yasuhiro Yamamoto , Shuji Shimizu , Masafumi Inoue , Hideki Oishi
发明人： Yasuhiro Yamamoto , Shuji Shimizu , Masafumi Inoue , Hideki Oishi
IPC分类号： C08J510
CPC分类号： C08J3/16 , C08G12/30 , C08G12/32 , C08J3/26 , C08J2361/20
摘要： A process for producing amino resin particles includes: a reaction process for obtaining a reaction solution containing an amino resin precursor which is obtained by a reaction of an amino compound with formaldehyde, and having a viscosity in a range of from 2×10−2 Pa·s to 5.8×10−2 Pa·s at a temperature in a range of from 95° C. to 98° C.; an emulsion process for obtaining an emulsion by emulsifying the reaction solution; and a curing process for curing the amino resin precursor in the emulsion state by adding a catalyst to the emulsion. With this producing process, it is possible to readily produce amino resin particles with an essentially uniform particle size (narrow particle size distribution). Further, with use of an aqueous dispersion of an inorganic pigment which is obtained by wet pulverizing the inorganic pigment in an aqueous medium until the average particle size of the inorganic pigment measured by a light scattering method becomes not more than 300 nm, it is possible to obtain amino resin particles with superior properties in coloring strength, visibility, heat resistance, solvent resistance, and chemicals resistance.

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