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    • 40. 发明申请
    • Memory device
    • 内存设备
    • US20070138522A1
    • 2007-06-21
    • US11639174
    • 2006-12-14
    • Takeshi KijimaYasuaki HamadaTatsuya Shimoda
    • Takeshi KijimaYasuaki HamadaTatsuya Shimoda
    • H01L29/94
    • G11C11/22H01L27/11507H01L28/56
    • A memory device including: a lower electrode; a ferroelectric layer formed above the lower electrode; a charge compensation layer formed above the ferroelectric layer and including an oxide having a composition differing from a composition of the ferroelectric layer; and upper electrodes formed above the charge compensation layer. The upper electrodes includes: a saturated polarization forming electrode used for forming a domain polarized to saturation in a predetermined direction in a predetermined region of the ferroelectric layer; a writing electrode disposed apart from the saturated polarization forming electrode; and a reading electrode disposed apart from the writing electrode.
    • 一种存储装置,包括:下电极; 形成在下电极上方的铁电层; 电荷补偿层,其形成在所述铁电层的上方,并且具有与所述铁电体层的组成不同的组成的氧化物; 以及形成在电荷补偿层上方的上电极。 上电极包括:饱和极化形成电极,用于在铁电层的预定区域中形成在预定方向上偏振到饱和的畴; 写入电极,与饱和偏振形成电极分开设置; 以及与写入电极分开设置的读取电极。