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    • 33. 发明申请
    • Luminescent display device and method that drives the same
    • 发光显示装置及其驱动方法
    • US20070075954A1
    • 2007-04-05
    • US11472841
    • 2006-06-22
    • Du OhYoung ParkHoon Chung
    • Du OhYoung ParkHoon Chung
    • G09G3/36
    • G09G3/3258G09G3/2022G09G3/3266G09G2300/0465G09G2300/0842G09G2310/0262G11C19/184
    • A luminescent display device and a method for driving the same are disclosed which are capable of increasing the aspect ratio of pixel regions. The luminescent display device includes a display including gate lines, and data lines extending orthogonally to the gate lines, a first shift register connected to one end of each of the gate lines, to sequentially supply first scan pulses to the gate lines, respectively, a second shift register connected to the other end of each of the gate lines, to sequentially supply second scan pulses to the gate lines, respectively, switching elements each adapted to switch an ON voltage or an OFF voltage from the associated data line in accordance with the first scan pulse from the associated gate line, and to switch an OFF voltage from the associated data line in accordance with the second scan pulse from the associated gate line, drive switching elements each adapted to generate current in accordance with the ON voltage from the associated switching element, each drive switching element being turned off in accordance with the OFF voltage from the associated switching element, capacitors each connected between gate and source terminals of an associated one of the drive switching elements, and light emitting elements each adapted to emit light in accordance with the current from the associated drive switching element.
    • 公开了能够增加像素区域的纵横比的发光显示装置及其驱动方法。 发光显示装置包括显示器,其包括栅极线和与栅极线正交延伸的数据线,连接到每条栅极线的一端的第一移位寄存器,以分别向栅极线顺序地提供第一扫描脉冲, 第二移位寄存器连接到每条栅极线的另一端,以分别顺序地向栅极线提供第二扫描脉冲,每个开关元件适于根据相关联的数据线切换导通电压或断开电压 来自相关联的栅极线的第一扫描脉冲,以及根据来自关联的栅极线的第二扫描脉冲从相关联的数据线切换OFF电压,驱动开关元件,每个驱动开关元件适于根据来自相关联的栅极线的导通电压产生电流 开关元件,每个驱动开关元件根据来自相关联的开关元件的OFF电压被切断,电容器各自 连接在相关联的一个驱动开关元件的栅极和源极端子之间,以及各自适于根据来自相关联的驱动开关元件的电流发光的发光元件。
    • 38. 发明申请
    • Sump assembly and dish washer using the same
    • 水槽组件和洗碗机使用相同
    • US20060249184A1
    • 2006-11-09
    • US11263824
    • 2005-11-02
    • Yang ChungYoung ParkSi JeonTae Lee
    • Yang ChungYoung ParkSi JeonTae Lee
    • B08B3/00
    • A47L15/4204A47L15/4225
    • The present invention is to provide a sump assembly which enables leaked washing water therein to be circulated smoothly without remaining therein, and a dishwasher using the same cleanly and sanitarily. For this, the present invention includes a sump housing for holding washing water; an impeller housing secured to the sump housing for placing an impeller pumping the washing water therein; a filter housing provided on an upper portion of the impeller housing for placing a filter filtering the washing water therein; and a connection device for making a lower portion of the filter housing in communication with the sump housing. Owing to the above configuration, the dishwasher may be used cleanly and sanitarily, resulting in enhancing washing efficiency and endurance of a product.
    • 本发明提供一种能够使其中泄漏的洗涤水能够平稳循环而不残留的贮槽组件,以及使用该洗涤水清洁地和卫生地使用的洗碗机。 为此,本发明包括用于保持洗涤水的贮槽壳体; 叶轮壳体固定到贮槽壳体上,用于将叶轮泵送其中的洗涤水; 过滤器壳体,其设置在所述叶轮壳体的上部,用于将过滤其中的洗涤水的过滤器放置; 以及用于使过滤器壳体的下部与贮槽壳体连通的连接装置。 由于上述结构,洗碗机可以清洁地和卫生地使用,从而提高了洗涤效率和产品的耐久性。
    • 40. 发明申请
    • Method of depositing thin film on substrate using impulse ALD process
    • 使用脉冲ALD工艺在衬底上沉积薄膜的方法
    • US20060210712A1
    • 2006-09-21
    • US11377153
    • 2006-03-16
    • Young ParkSahng LeeKi LeeTae Seo
    • Young ParkSahng LeeKi LeeTae Seo
    • C23C16/00
    • C23C16/45527C23C16/45523
    • Provided is a method of depositing a thin film on a substrate using an impulse feeding process. The method includes performing a second reaction gas continuous feeding process of continuously feeding a second reaction gas into a chamber in which the substrate is installed, and performing a number of times, during the second reaction gas continuous feeding process, a process cycle including a first reaction gas feeding process of feeding a first reaction gas into the chamber and a first reaction gas purge process of purging the first reaction gas that is not adhered onto the substrate. The second reaction gas continuous feeding process includes a second reaction gas impulse process of feeding the second reaction gas at an impulse flow rate greater than a basic flow rate during the first reaction gas purge process.
    • 提供了使用脉冲进给工艺在基板上沉积薄膜的方法。 该方法包括进行将第二反应气体连续供给到其中安装基板的室中的第二反应气体连续进料过程,并且在第二反应气体连续进料过程期间进行多次,包括第一反应气体 将第一反应气体进料到反应室中的反应气体进料过程以及清洗未附着在基材上的第一反应气体的第一反应气体吹扫工序。 第二反应气体连续进料方法包括在第一反应气体净化过程中以大于碱性流速的脉冲流速供给第二反应气体的第二反应气体脉冲过程。