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31. 发明专利

JPH09133001A AIR-COOLED BLADE FOR GAS TURBINE 失效
公开(公告)号：JPH09133001A
公开(公告)日：1997-05-20
申请号：JP29127695
申请日：1995-11-09
申请人： TOSHIBA CORP
发明人： HASHIDATE YOSHIO
IPC分类号： F01D5/18 , F02C7/18
摘要： PROBLEM TO BE SOLVED: To improve cooling efficiency by cooling air of gas turbine air-cooled blade. SOLUTION: A gas turbine air-cooled blade 1 is provided with three cooling passages 2A, 2B, 2C, allowing cooling air A to flow, in the inside. The cooling passage 2B has a blade central return 4 connecting a root direction passage 13 and a tip end direction passage 10 in a blade central part 1g, the cooling passage 2C has a blade central return 4 connecting a tip end direction passage 11 and a root direction passage 14 in the blade central part 1g. The blade central return 4 of each cooling passage 2B, 2C is formed so as to reverse a flow direction of the cooling air A between a direction of a blade tip end part if and a direction of a blade root part 1e.

32. 发明专利

JPH0868343A GAS TURBINE AIR-COOLED BLADE 失效
公开(公告)号：JPH0868343A
公开(公告)日：1996-03-12
申请号：JP20474194
申请日：1994-08-30
申请人： TOSHIBA CORP
发明人： HASHIDATE YOSHIO
IPC分类号： F01D5/18 , F02C7/18
摘要： PURPOSE: To improve cooling performance and heat efficiency by forming a notch part in the surface of a turbulence motor, in a turbulence promoter gas turbine air-cooled blade mounted in the internal cooling passage of a gas turbine. CONSTITUTION: Triangle-shaped notches 22 are formed in a turbulence promoter 21 arranged in a cooling passage 20. The notch parts 22 are formed in such a state to cross the direction of a flow. Since, when the notches 22 are formed in a manner described above, a heat transfer area is increased and a three- dimensional turbulence vortex occurs, heat transfer performance of a recirculation part to a re-adhesion point being the slip stream of the turbulence promotor 21 is improved. An L and M in a cooling passage formed in a moving blade 25 are divided into two continuous cooling passage by partition plates 26. In this case, cooling air is caused to flow in such a manner that an inflow in a radial direction is generated in cooling passages Li and Mi in the vicinity of the back of the blade and an out flow is generated in cooling flow passages Lo and Mo in the vicinity of the belly side of the blade.

33. 发明专利

JPH07180041A VAPOR RECOVERING PLATE 失效
公开(公告)号：JPH07180041A
公开(公告)日：1995-07-18
申请号：JP32787393
申请日：1993-12-24
申请人： TOSHIBA CORP
发明人： HASHIDATE YOSHIO
IPC分类号： C23C14/24
摘要： PURPOSE:To continuously and stably recover the unavailable vapor deposited (or condensed) on a vapor recovering plate. CONSTITUTION:Plural protrusions 23 (protrusion width Wp =3Wp for promoting the dripping of liq. droplets are formed on the recovering surface of a vapor recovering plate 21. Plural protrusions or grooves inclined to one side of the adjacent recessed part from the projecting surface are formed on the plate 21.

34. 发明专利

JPH05295523A 失效
公开(公告)号：JPH05295523A
公开(公告)日：1993-11-09
申请号：JP9936992
申请日：1992-04-20
申请人： TOSHIBA CORP
发明人： HASHIDATE YOSHIO
IPC分类号： C23C14/24
摘要： PURPOSE:To enable the sure and continuous liquefaction and recovery of a material which is to be deposited by evaporation and is stuck on vapor recovering plates and to enable long-time continuous operation. CONSTITUTION:A vapor sealing container 2 which has a wall surface inclined to form an aperture formed wider in the upper part than in the lower part and formed narrower than the upper part of a crucible 3 housing the material 5 to be deposited by evaporation in the lower part and is provided with the aperture 2a to be admitted with an electron beam 8 is mounted within a vacuum chamber 1 held at a prescribed vacuum degree (10 to 10 Torr). A substrate 6 to be deposited by evaporation with the material 5 to be deposited by evaporation is supported in the upper part of this vapor sealing container 2 and an electron gun 7 is mounted on the outside of the vapor sealing container 2 alongside the crucible 3. A pair of the vapor recovering plates 10 which are formed of a porous material and are previously impregnated with the material 5 to be deposited by evaporation are inclined diagonally below from above the substrate 6 and are mounted mirror-symmetrically above the vapor sealing container 2.

35. 发明专利

JPH05117846A VACUUM VAPOR DEPOSITION DEVICE 失效
公开(公告)号：JPH05117846A
公开(公告)日：1993-05-14
申请号：JP28305691
申请日：1991-10-29
申请人： TOSHIBA CORP
发明人： HASHIDATE YOSHIO
IPC分类号： C23C14/30
摘要： PURPOSE:To provide an economically favorable vacuum vapor deposition device which is possible to recover by surely and continuously liquidizing a depositing material stuck to a vapor recovering plate and is possible to continuously work for a long period. CONSTITUTION:The vacuum vapor deposition device is constituted by providing a vapor enclosed vessel in a vacuum chamber, by arranging a crucible housing the depositing material under the vapor enclosed vessel, by vaporizing the depositing material housed in the crucible by heating with an electron gun and by depositing the depositing material vaporized on a substrate provided above the crucible to form a vapor deposited film. And the depositing material vaporizing in different direction from direction to the substrate is deposited on a recovering surface of the vapor recovering plate provided on a different position from the substrate and the depositing material is heated to liquidize, flows down along the recovering surface of the vapor recovering plate and is recovered in the crucible. Furthermore, plural of the groove 22,23 are formed on whole area of the recovering surface of the vapor recovering plate 21 so that the depositing material almost uniformly flows down along the recovering surface of the recovering plate.

36. 发明专利

JPH04285158A VACUUM DEPOSITION DEVICE 失效
公开(公告)号：JPH04285158A
公开(公告)日：1992-10-09
申请号：JP4715091
申请日：1991-03-13
申请人： TOSHIBA CORP
发明人： HASHIDATE YOSHIO
IPC分类号： C23C14/30 , H01L21/203 , H01L21/285
摘要： PURPOSE:To surely and continuously liquify and recover the stuck vapor deposition substance by providing a vapor recovering plate in the position different from a base plate in a vacuum tank, and forming a groove continuously changed into a circular shape from a circular arc shape along inclination on the surface of the vapor recovering plate. CONSTITUTION:A vapor deposition film is formed in a vacuum tank by heating and vaporizing the vapor deposition substance housed in a crucible by irradiation of electron beams and sticking this vapor on the base plate arranged to the upside of the crucible. In the vacuum deposition device, a vapor recovering plate 21 is provided in the position different form the base plate. Unavailable vapor flow 10 vaporized in the direction different from the base plate is stuck on the surface of the vapor recovering plate 21. Thereafter, this vapor deposition substance is heated, melted and recovered. A plurality of pieces of groove continuously changed into a circular shape from a circular arc shape are formed along the downside from the upside of inclination on the recovery surface of the vapor recovering plat 21. Thereby, when the stuck vapor deposition substance is heated and melted, droplets of liquid flow down along the grooves and are recovered without separation and dropping. The device is continuously operated for a long time.

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