专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明授权

US07261830B2 Applying imprinting material to substrates employing electromagnetic fields 失效
标题翻译：将压印材料应用于采用电磁场的基板
公开(公告)号：US07261830B2
公开(公告)日：2007-08-28
申请号：US10687562
申请日：2003-10-16
申请人： Anshuman Cherala , Sidlgata V. Sreenivasan , Norman E. Schumaker
发明人： Anshuman Cherala , Sidlgata V. Sreenivasan , Norman E. Schumaker
IPC分类号： C23F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： The present invention comprises a method for applying a liquid, such as imprinting material, to a substrate that features use of an electromagnetic field to rapidly spread the liquid over a desired portion of the substrate, while confining the same to the desired region.
摘要翻译：本发明包括用于将液体（例如压印材料）施加到特征为使用电磁场的衬底的方法，以将液体快速地扩散到衬底的期望部分上，同时将其限定在所需区域。

32. 发明授权

US08066930B2 Forming a layer on a substrate 有权
标题翻译：在基材上形成一层
公开(公告)号：US08066930B2
公开(公告)日：2011-11-29
申请号：US12749552
申请日：2010-03-30
申请人： Sidlgata V. Sreenivasan , Michael P. C. Watts
发明人： Sidlgata V. Sreenivasan , Michael P. C. Watts
IPC分类号： B29C41/12 , B81C1/00
CPC分类号： G03F7/0002 , B29C59/02 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed to a method of forming an imprinting layer on a substrate including high resolution features, and transferring the features into a solidified region of the substrate. Desired thickness of the residual layer may be minimized in addition to visco-elastic behavior of the material.
摘要翻译：本发明涉及一种在包括高分辨率特征的基板上形成压印层的方法，并将特征转移到基板的固化区域中。除了材料的粘弹性行为之外，残留层的期望厚度可以最小化。

33. 发明授权

US07071088B2 Method for fabricating bulbous-shaped vias 失效
标题翻译：制造球状通孔的方法
公开(公告)号：US07071088B2
公开(公告)日：2006-07-04
申请号：US10227105
申请日：2002-08-23
申请人： Michael P. C. Watts , Sidlgata V. Sreenivasan
发明人： Michael P. C. Watts , Sidlgata V. Sreenivasan
IPC分类号： H01L21/44
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , H01L21/0272 , H01L21/28587 , H01L21/312 , H01L21/76804 , H01L21/76817
摘要： The present invention provides a method for fabricating bulbous-shaped vias on a substrate, having a surface, by disposing, on the substrate, a polymerizable fluid composition. A mold is placed in contact with the polymerizable fluid composition. The mold includes a relief structure on a surface thereof to create a recess in a layer of the polymerizable fluid composition. The polymerizable fluid composition is subjected to conditions to cause polymerization, forming a polymerized layer having a solidified indentation. An opening to the surface of the substrate is formed by removing material disposed on the substrate surface through etch processes. In a further embodiment a conductive layer may be disposed in the opening to form a gate. A lift-off process may be employed to remove the polymerized layer.
摘要翻译：本发明提供一种在基板上制造球状通孔的方法，其具有通过在基板上设置可聚合流体组合物的表面。将模具放置成与可聚合流体组合物接触。模具在其表面上包括浮雕结构，以在可聚合流体组合物的层中形成凹部。可聚合流体组合物经历引起聚合的条件，形成具有固化压痕的聚合层。通过蚀刻处理去除设置在基板表面上的材料来形成通向基板表面的开口。在另一个实施例中，导电层可以设置在开口中以形成栅极。可以采用剥离工艺来除去聚合层。

34. 发明授权

US08349241B2 Method to arrange features on a substrate to replicate features having minimal dimensional variability 有权
标题翻译：在衬底上布置特征以复制具有最小尺寸变化性的特征的方法
公开(公告)号：US08349241B2
公开(公告)日：2013-01-08
申请号：US10264960
申请日：2002-10-04
申请人： Sidlgata V. Sreenivasan , Michael P. C. Watts
发明人： Sidlgata V. Sreenivasan , Michael P. C. Watts
IPC分类号： B29C35/00 , B29C43/00
CPC分类号： G03F7/0002 , B29C43/003 , B29C59/022 , B29C2035/0827 , B29C2035/0833 , B29C2043/025 , B29C2059/023 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed to a method of and a mold for arranging features on a substrate to replicate the features with minimal dimensional variability. The method includes arranging features on a layer to minimize thickness variations in the layer that are attributable to density variations of the plurality of features on the layer. The features are transferred into an underlying substrate. It is believed that by forming the features so as to define a uniform fill factor in the layer, the thickness variations may be reduced, if not abrogated. To that end, one method in accordance with the present invention includes forming a flowable material on the substrate. Thereafter, a plurality of features is formed in a region of the flowable material. The plurality of features are arranged to provide a substantially uniform fill factor in the region.
摘要翻译：本发明涉及一种用于在基板上排列特征以用最小的尺寸变化来复制特征的方法和模具。该方法包括在层上布置特征以使层中的厚度变化最小化，这可归因于该层上的多个特征的密度变化。这些特征被转移到下面的基底中。相信通过形成特征以在层中限定均匀的填充因子，如果不被废除，则可以减小厚度变化。为此，根据本发明的一种方法包括在基底上形成可流动的材料。此后，在可流动材料的区域中形成多个特征。多个特征被布置成在该区域中提供基本均匀的填充因子。

35. 发明授权

US08828297B2 Patterning of non-convex shaped nanostructures 有权
标题翻译：非凸形纳米结构的图案化
公开(公告)号：US08828297B2
公开(公告)日：2014-09-09
申请号：US13290770
申请日：2011-11-07
申请人： Sidlgata V. Sreenivasan , Vikramjit Singh , Frank Y. Xu , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Vikramjit Singh , Frank Y. Xu , Byung-Jin Choi
IPC分类号： B82Y40/00 , G03F7/00
CPC分类号： B29C59/022 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L29/0673
摘要： Methods of making nano-scale structures with geometric cross-sections, including convex or non-convex cross-sections, are described. The approach may be used to directly pattern substrates and/or create imprint lithography templates or molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates, such as into a functional or sacrificial resist to form functional nanoparticles.
摘要翻译：描述了制造具有几何横截面的纳米级结构的方法，包括凸形或非凸形横截面。该方法可以用于直接图案化衬底和/或创建压印光刻模板或模具，其可以随后用于将纳米形图案直接复制到其它衬底中，例如形成功能性或牺牲抗蚀剂以形成功能纳米颗粒。

36. 发明授权

US08556616B2 Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template 有权
标题翻译：模板具有不同的厚度以便于排出位于基板和模板之间的气体
公开(公告)号：US08556616B2
公开(公告)日：2013-10-15
申请号：US13073533
申请日：2011-03-28
申请人： Douglas J. Resnick , Mario Johannes Meissl , Byung-Jin Choi , Sidlgata V. Sreenivasan
发明人： Douglas J. Resnick , Mario Johannes Meissl , Byung-Jin Choi , Sidlgata V. Sreenivasan
IPC分类号： B29C59/02
CPC分类号： H01L21/67126 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6715
摘要： A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and the recess in superimposition with the first region, with a portion of the first surface in superimposition with the first region being spaced-apart from the second side a first distance and a portion of the first surface in superimposition with the second region being spaced-apart from the second side a second distance, with the second distance being greater than the first distance; and a mold disposed on the first side of the body in superimposition a portion of the first region.
摘要翻译：一种纳米压印光刻模板，其特别包括具有第一和第二相对侧的主体，第一表面设置在第一侧上，第二侧具有设置在其中的凹部，该主体具有第一和第二区域，第二区域围绕第一所述凹部与所述第一区域叠加，所述第一表面的与所述第一区域重叠的部分与所述第二侧面间隔开第一距离，并且所述第一表面的与所述第二区域重叠的部分间隔开从第二侧排出第二距离，第二距离大于第一距离; 以及模具，其设置在所述主体的第一侧上，以叠加所述第一区域的一部分。

37. 发明授权

US07935292B2 Imprinting of partial fields at the edge of the wafer 失效
标题翻译：在晶片边缘印刷局部场
公开(公告)号：US07935292B2
公开(公告)日：2011-05-03
申请号：US12479437
申请日：2009-06-05
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi
IPC分类号： B29C59/02
CPC分类号： B29C43/58 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5808 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： Edge field patterning of a substrate having full fields and partial fields may include patterning using a template having multiple mesas with each mesa corresponding to a field on the substrate. Polymerizable material may be deposited solely between the template and the full fields of the substrate. A non-reactive material may be deposited between the template and partial fields of the substrate.
摘要翻译：具有全场和部分场的衬底的边缘场图案化可以包括使用具有多个台面的模板进行图案化，每个台面与每个台面对应于衬底上的场。可聚合材料可以仅沉积在模板和基底的整个场之间。非反应性材料可以沉积在基板的模板和部分场之间。

38. 发明授权

US07802978B2 Imprinting of partial fields at the edge of the wafer 有权
标题翻译：在晶片边缘印刷局部场
公开(公告)号：US07802978B2
公开(公告)日：2010-09-28
申请号：US11694500
申请日：2007-03-30
申请人： Sidlgata V. Sreenivasan , Byung-Jin Choi
发明人： Sidlgata V. Sreenivasan , Byung-Jin Choi
IPC分类号： B28B17/00 , B29C59/00
CPC分类号： B29C43/58 , B29C43/003 , B29C43/021 , B29C2043/025 , B29C2043/5808 , B29C2043/5825 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed towards several aspects of imprint lithography that have to be improved to address imprinting of partial fields and dies at the edge of the wafer.
摘要翻译：本发明涉及压印光刻的几个方面，这些方面必须被改进以解决在晶片边缘处局部场和模具的压印。

39. 发明申请

US20090214689A1 Imprint Lithography Templates Having Alignment Marks 审中-公开
标题翻译：印记平版印刷模板具有对齐标记
公开(公告)号：US20090214689A1
公开(公告)日：2009-08-27
申请号：US12437368
申请日：2009-05-07
申请人： Todd C. Bailey , Stephen C. Johnson , Matthew E. Colburn , Byung-Jin Choi , Britain J. Smith , Carlton G. Willson , Sidlgata V. Sreenivasan , John G. Ekerdt
发明人： Todd C. Bailey , Stephen C. Johnson , Matthew E. Colburn , Byung-Jin Choi , Britain J. Smith , Carlton G. Willson , Sidlgata V. Sreenivasan , John G. Ekerdt
IPC分类号： B29C59/16 , B44C1/22
CPC分类号： B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/00
摘要： One embodiment of the present invention is an imprint template for imprint lithography that comprises alignment marks embedded in bulk material of the imprint template.
摘要翻译：本发明的一个实施例是用于压印光刻的压印模板，其包括嵌入压印模板的散装材料中的对准标记。

40. 发明申请

US20090140458A1 POROUS TEMPLATE AND IMPRINTING STACK FOR NANO-IMPRINT LITHOGRAPHY 有权
标题翻译：用于纳米印刷的多孔模板和印刷堆叠
公开(公告)号：US20090140458A1
公开(公告)日：2009-06-04
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
IPC分类号： B28B11/08 , B32B3/26 , B05D3/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
摘要翻译：压印光刻模板或压印叠层包括限定平均孔径至少约0.4nm的多个孔的多孔材料。多孔材料的孔隙率至少约为10％。多孔模板，多孔印迹叠层或两者可用于压印光刻工艺，以便于将模板和压印叠层之间的气体扩散到模板，压印叠层或两者中，使得压印叠层之间的可聚合材料并且模板在压印堆栈和模板之间快速形成基本上连续的层。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式