会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 32. 发明授权
    • Foreign substance inspecting apparatus and method thereof
    • 异物检查装置及其方法
    • US5856868A
    • 1999-01-05
    • US889558
    • 1997-07-08
    • Kinya KatoYumi Nakagawa
    • Kinya KatoYumi Nakagawa
    • G01N21/94G01N21/88
    • G01N21/94
    • A foreign substance inspecting apparatus and method for detecting a foreign substance on a surface, includes a light source for providing light; a plurality of condensing optical systems for collecting the light from the light source and for forming a plurality of light spots on the surface; a scanning system for scanning the surface using the light spots formed by the condensing optical systems; a detecting optical system for detecting light scattered from at least one of the light spots by the foreign substance on the surface; and a surface shape measuring system for measuring a shape of the surface, wherein a focus of each one of the condensing optical systems is individually adjusted according to the surface shape measured by the surface shape measuring system.
    • 用于检测表面上的异物的异物检查装置和方法包括:用于提供光的光源; 多个聚光系统,用于收集来自光源的光并在表面上形成多个光斑; 使用由聚光光学系统形成的光斑扫描表面的扫描系统; 检测光学系统,用于检测由表面上的异物从至少一个光斑散射的光; 以及用于测量表面形状的表面形状测量系统,其中根据由表面形状测量系统测量的表面形状单独地调整每个聚光光学系统的焦点。
    • 34. 发明授权
    • Alignment method
    • 对齐方法
    • US5726757A
    • 1998-03-10
    • US719315
    • 1996-09-25
    • Masaki KatoKinya KatoKei Nara
    • Masaki KatoKinya KatoKei Nara
    • G03F7/20G03F9/00G01B11/00
    • G03F7/70275G03F7/70358G03F9/70
    • In an exposure apparatus, an alignment-detecting light component of a mask and that of a plate are spatially separated from each other, thereby enabling highly accurate alignment with little influence of the light from the plate on detection of the mask position. An alignment optical system comprises a light source means for supplying a luminous flux; a scan beam forming optical system for forming, based on the luminous flux, a scan beam at a visual field area on a first substrate with respect to a predetermined optical system; a scanning means for optically scanning, in a predetermined direction, the scan beam formed on the first substrate; a first detection means for detecting a diffracted and reflected light component from a first mark generated when optically scanned with the scan beam formed on the first substrate; and a second detection means for detecting, by way of the predetermined optical system and through a path different from the path through which the diffracted and reflected light component from the first mark is detected, a diffracted and reflected light component from a second mark generated when optically scanned with the scan beam which is formed on the second substrate by way of the predetermined optical system.
    • 在曝光装置中,掩模的对准检测光分量和板的对准检测光分量在空间上彼此分离,从而在对掩模位置的检测时几乎不受来自板的光的影响。 对准光学系统包括用于提供光通量的光源装置; 扫描光束形成光学系统,用于基于光通量,相对于预定光学系统在第一基板上的视野区域处形成扫描光束; 扫描装置,用于在预定方向上光扫描形成在第一基板上的扫描光束; 第一检测装置,用于从由形成在第一基板上的扫描光束进行光扫描时产生的第一标记中检测衍射和反射光分量; 以及第二检测装置,用于通过预定的光学系统和通过不同于检测到来自第一标记的衍射和反射光分量的路径的路径来检测来自第二标记的衍射和反射光分量, 通过预定的光学系统用形成在第二基板上的扫描光束进行光学扫描。
    • 37. 发明授权
    • Apparatus for measuring thickness of plate-shaped article
    • 用于测量板状制品厚度的装置
    • US5177564A
    • 1993-01-05
    • US806298
    • 1991-12-13
    • Kinya KatoKazuhiro Takaoka
    • Kinya KatoKazuhiro Takaoka
    • G01B11/06
    • G01B11/06
    • An apparatus for measuring the thickness of a plate-shaped article with a substantially rectangular lateral face, comprises a measuring optical system including a light-emitting unit for emitting a measuring light beam along an optical axis in a predetermined plane, and a light-receiving unit provided on said optical axis and adapted to generate an output signal corresponding to the amount of detected measuring light, support system for supporting the article in such a manner that the article is substantially parallel to the predetermined plane and the measuring light enters obliquely the lateral face of the article, relative movement unit for moving, in a direction crossing said predetermined plane, either of said article and the measuring light relative to the other, and determination unit for determining the thickness of the article, based on the output signal of the measuring optical system and the amount of movement by the relative movement unit.
    • 一种用于测量具有大致矩形侧面的板状物品的厚度的装置,包括测量光学系统,该测量光学系统包括用于沿预定平面沿光轴发射测量光束的发光单元,以及光接收 单元,其设置在所述光轴上并且适于产生对应于检测到的测量光量的输出信号,所述支撑系统用于以使得所述制品基本上平行于所述预定平面的方式支撑所述物品,并且所述测量光倾斜地进入所述外侧 所述物品的表面,相对运动单元,用于在与所述预定平面交叉的方向上相对于另一物体和所述测量光中的任一个移动;以及确定单元,用于基于所述物品的输出信号 测量光学系统和相对运动单元的移动量。
    • 38. 发明授权
    • Illumination optical assembly, exposure device, and device manufacturing method
    • 照明光学组件,曝光装置和器件制造方法
    • US09523918B2
    • 2016-12-20
    • US14126126
    • 2011-11-25
    • Norio MiyakeKinya Kato
    • Norio MiyakeKinya Kato
    • G03B27/54G03F7/20G02B5/30G02B26/08G02B27/09G02B27/28
    • G03F7/7015G02B5/3083G02B26/0816G02B27/0927G02B27/286G03F7/20G03F7/70075G03F7/70116G03F7/70566
    • There is provided an illumination optical system for illuminating an illumination objective surface. The illumination optical system includes a first spatial light modulator which has a plurality of optical elements arranged on a first plane, a polarizing member which is arranged in an optical path on an illumination objective surface side with respect to the first plane and which gives a polarization state change to a first light beam passes through a first area in a plane intersecting an optical axis of the illumination optical system, the polarization state change being different from a polarization state change given to a second light beam passes through a second area in the intersecting plane, and a second spatial light modulator which has a plurality of optical elements controlled individually and arranged on a second plane, and which variably forms a light intensity distribution on an illumination pupil of the illumination optical system.
    • 提供了一种用于照明照明物镜表面的照明光学系统。 照明光学系统包括:第一空间光调制器,其具有布置在第一平面上的多个光学元件;偏振构件,其布置在相对于第一平面的照明物镜表面侧上的光路中,并且具有偏振 对第一光束的状态变化通过与照明光学系统的光轴相交的平面中的第一区域,与给予第二​​光束的偏振态变化不同的偏振态变化通过相交的第二区域 平面和第二空间光调制器,其具有单独控制并且布置在第二平面上的多个光学元件,并且可变地在照明光学系统的照明光瞳上形成光强度分布。