专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 再颁专利

USRE39756E1 Vacuum processing operating method with wafers, substrates and/or semiconductors 失效
标题翻译：具有晶片，基板和/或半导体的真空处理操作方法
公开(公告)号：USRE39756E1
公开(公告)日：2007-08-07
申请号：US10062087
申请日：2002-02-01
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B5/04
CPC分类号： H01L21/67748 , C23C14/564 , H01L21/67028 , H01L21/67167
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
摘要翻译：本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中，通过产生等离子体对真空处理室进行干洗。在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

32. 发明授权

US06634116B2 Vacuum processing apparatus 失效
标题翻译：真空加工设备
公开(公告)号：US06634116B2
公开(公告)日：2003-10-21
申请号：US09781452
申请日：2001-02-13
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1330
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A wafer conveyor system for use in a vacuum processing apparatus wherein the conveyor structure is provided with a transfer structure, and a robot apparatus is arranged on the transfer structure. The robot provides for rotation of the wafer in a horizontally from a position in a cassette to an opposite position of the cassette.
摘要翻译：一种用于真空处理设备的晶片输送系统，其中输送机结构设有转移结构，机器人装置设置在转移结构上。机器人将水平地从盒中的位置旋转晶片到盒的相对位置。

33. 发明授权

US06625899B2 Vacuum processing apparatus 失效
标题翻译：真空加工设备
公开(公告)号：US06625899B2
公开(公告)日：2003-09-30
申请号：US09766597
申请日：2001-01-23
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1330
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A vacuum processing apparatus which includes a means for transferring substrates from a loader with a transferring device to a double lock chamber and then to a selected vacuum processing chamber. The substrates are then returned to a substrate by the vacuum loader and back into the substrate table. The surfaces of the substrates are maintained in a horizontal position during processing.
摘要翻译：一种真空处理装置，其包括用于将基板从装载机转移到双重锁定室，然后到选定的真空处理室的装置。然后通过真空装载机将基板返回到基板并返回到基板台中。在处理期间，基板的表面保持在水平位置。

34. 发明授权

US06499229B2 Vacuum processing apparatus 失效
标题翻译：真空加工设备
公开(公告)号：US06499229B2
公开(公告)日：2002-12-31
申请号：US09781293
申请日：2001-02-13
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1900
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage maeans after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
摘要翻译：本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中，通过产生等离子体对真空处理室进行干洗。在完成干洗之后，虚拟衬底返回到虚拟衬底存储器。因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

35. 发明授权

US06487793B2 Vacuum processing apparatus and operating method therefor 失效
公开(公告)号：US06487793B2
公开(公告)日：2002-12-03
申请号：US09766587
申请日：2001-01-23
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B504
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

36. 发明授权

US06463678B2 Substrate changing-over mechanism in a vaccum tank 失效
标题翻译：真空罐中的底物转换机理
公开(公告)号：US06463678B2
公开(公告)日：2002-10-15
申请号：US09782194
申请日：2001-02-14
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1310
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.
摘要翻译：本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中，通过产生等离子体对真空处理室进行干洗。在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

37. 发明授权

US06463676B1 Vacuum processing apparatus and operating method therefor 失效
标题翻译：真空处理装置及其操作方法
公开(公告)号：US06463676B1
公开(公告)日：2002-10-15
申请号：US09780427
申请日：2001-02-12
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B504
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A method and apparatus for transferring a substrate that includes a cassette table capable of holding a plurality of cassettes, wherein the cassettes are capable of receiving a plurality of substrates. An atmospheric loader is arranged between the plurality of cassettes and two lock chambers, and an atmospheric transferring device is provided for transferring one of the plurality of substrates to or from a substrate process.
摘要翻译：一种用于传送基板的方法和装置，其包括能够容纳多个盒的盒台，其中盒能够容纳多个基板。大气装载器布置在多个盒体和两个锁定室之间，并且提供大气传送装置用于将多个基板中的一个传送到基板工艺或从基板工艺传送。

38. 发明授权

US06460270B2 Vacuum processing apparatus 失效
标题翻译：真空加工设备
公开(公告)号：US06460270B2
公开(公告)日：2002-10-08
申请号：US09780394
申请日：2001-02-12
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1330
CPC分类号： H01L21/67748 , B01J3/006 , B41J2/36 , B41J2/365 , C23C14/564 , H01L21/67028 , H01L21/67167 , H01L21/67253 , H01L21/67736 , Y10S134/902 , Y10S414/137 , Y10S414/139 , Y10S414/14
摘要： A vacuum processing apparatus which includes a means for transferring wafer cassettes from a transferring chamber to a lock chamber. The wafer cassettes are mounted within a cassette table in a vertical direction and a first transferring means carries a wafer to and from the cassette tables. The vacuum processing apparatus further includes lock chambers into which the wafers are carried my the first transferring means. A second transferring means carries the wafers to either of the lock chambers.
摘要翻译：一种真空处理设备，其包括用于将晶片盒从传送室传送到锁定室的装置。晶片盒在垂直方向上安装在盒式台中，第一传送装置将晶片携带到盒式桌子上。真空处理装置还包括锁定室，晶片承载在第一传送装置中。第二转移装置将晶片运送到任何一个锁定室。

39. 发明授权

US06446353B1 Vacuum processing apparatus 有权
公开(公告)号：US06446353B1
公开(公告)日：2002-09-10
申请号：US09781270
申请日：2001-02-13
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
发明人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
IPC分类号： F26B1330
摘要： A vacuum processing apparatus which includes a cassette mount table for holding a cassette, a conveying structure for transferring a wafer from the held on the cassette mount table, a robot, and a vacuum loader. The vacuum loader is provided with a vacuum conveyor chamber and a conveying structure which further include an additional robot.

40. 外观设计

USD453402S1 Vacuum processing equipment configuration 失效
标题翻译：真空加工设备配置
公开(公告)号：USD453402S1
公开(公告)日：2002-02-05
申请号：US29099072
申请日：1999-01-12
申请人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou
设计人： Shigekazu Kato , Kouji Nishihata , Tsunehiko Tsubone , Atsushi Itou

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式