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    • 32. 发明申请
    • Foods containing large amount of functional components and method of producing the same
    • US20070148299A1
    • 2007-06-28
    • US10583866
    • 2004-12-21
    • Makoto KiharaYoshihiro OkadaOsamu IshikawaKazutoshi Ito
    • Makoto KiharaYoshihiro OkadaOsamu IshikawaKazutoshi Ito
    • A21D10/00
    • A23L33/175A21D2/38A21D13/04A21D13/40A21D13/60A23L7/109A23L7/13A23L7/152A23L7/197A23L7/20A23L33/105
    • Processing methods that provide food or food materials including high functional ingredients contents are disclosed. By using seeds of one or more of wheat, barley, oats and rye soaked in water or hot water, or the processed products of germinated barley or malt as food materials, without using functional ingredients like amino acids as additives, functional ingredients contents like GABA or targeted other free amino acids in foods are increased during the manufacturing process of foods. Also, for not only food or food products with processed products of one or more of wheat, barley, oats and rye but also food or food products with non-processed wheat, barley, oats and rye or food or food products with usual raw material of grains, it is provided that food or food products included high functional ingredients contents or their processing methods by controlling the manufacturing process of food or food products. By including processed product of one or more of wheat, barley, oats and rye like soaked products of malt or germinated barley or seeds of one or more of wheat, barley, oats and rye which are controlled with the germination day depending on the targeted free amino acids or dietary fibers to foods materials, free amino acids contents or GABA content can be increased during the fermentation process or the aging process of the manufacturing process of food or food products. As a result, food or food products including increased free amino acids and GABA contents without using amino acids or GABA as additives and their manufacturing processes are provided. Also, functional ingredients contents are increased by controlling temperature during the fermentation process or the aging process for manufacturing food or food products with non-processed barley like barley flour in usual materials of foods (not using processed products of one or more of wheat, barley, oats and rye), or food or food products with usual materials of grains.
    • 33. 发明授权
    • Polishing body
    • 抛光体
    • US07201641B2
    • 2007-04-10
    • US11288086
    • 2005-11-29
    • Kou HasegawaHozumi SatouOsamu IshikawaYukio Hosaka
    • Kou HasegawaHozumi SatouOsamu IshikawaYukio Hosaka
    • B24B1/00
    • B24B37/245B24B37/24B24D3/28B24D11/001B24D18/0009C09K3/1454
    • An object of the present invention is to provide a polishing body, wherein the abrasive in the polishing body are extremely dispersed well, which provides stable polishing performance in the polishing process, and which can effectively reduce the occurrence of scratches even in a case a large quantity of the abrasive are contained. A polishing part constituting the polishing body in the invention is produced obtained by loading predetermined amounts of butadiene, styrene, methyl methacrylate, itaconic acid, acrylic acid, α-methylstyrenedimer, and t-dodecylmercaptan in an autoclave, making the mixture react for 16 hours at 75° C. to obtain an emulsion wherein a copolymer is dispersed, adjusting this emulsion to pH 8.5, incorporating cerium oxide powder with an average primary particle diameter of 0.3 μm and stirring to obtain an aqueous dispersion, drying this aqueous dispersion by spreading it thinly across a film, and mold pressing the dried product obtained. The above-mentioned polishing part may have a crosslinked structure. The polishing body in the invention can be used favorably in a polishing pad and the like, for polishing the surface of a semiconductor wafer or the like.
    • 本发明的目的是提供一种抛光体,其中抛光体中的磨料非常分散,在抛光过程中提供稳定的抛光性能,并且即使在大的情况下也能有效地减少划痕的发生 含有磨料的数量。 通过在高压釜中加载预定量的丁二烯,苯乙烯,甲基丙烯酸甲酯,衣康酸,丙烯酸,α-甲基苯乙炔二酮和叔十二烷基硫醇,制得本发明中构成抛光体的抛光部分,使混合物反应16小时 在75℃下得到其中分散共聚物的乳液,将该乳液调节至pH8.5,并加入平均一次粒径为0.3μm的二氧化铈粉末并搅拌,得到水分散液,通过涂布干燥该水性分散体 薄膜穿过薄膜,并模压所获得的干燥产品。 上述抛光部分可以具有交联结构。 本发明的研磨体可以在抛光垫等中有利地使用,用于研磨半导体晶片等的表面。
    • 35. 发明授权
    • Abrasive material
    • 磨料
    • US07001252B2
    • 2006-02-21
    • US10030141
    • 2001-05-29
    • Kou HasegawaHozumi SatouOsamu IshikawaYukio Hosaka
    • Kou HasegawaHozumi SatouOsamu IshikawaYukio Hosaka
    • B24B7/22
    • B24B37/245B24B37/24B24D3/28B24D11/001B24D18/0009C09K3/1454
    • An object of the present invention is to provide a polishing body, wherein the abrasive in the polishing body are extremely dispersed well, which provides stable polishing performance in the polishing process, and which can effectively reduce the occurrence of scratches even in a case a large quantity of the abrasive are contained. A polishing part constituting the polishing body in the invention is produced obtained by loading predetermined amounts of butadiene, styrene, methyl methacrylate, itaconic acid, acrylic acid, α-methylstyrenedimer, and t-dodecylmercaptan in an autoclave, making the mixture react for 16 hours at 75° C. to obtain an emulsion wherein a copolymer is dispersed, adjusting this emulsion to pH8.5, incorporating cerium oxide powder with an average primary particle diameter of 0.3 μm and stirring to obtain an aqueous dispersion, drying this aqueous dispersion by spreading it thinly across a film, and mold pressing the dried product obtained. The above-mentioned polishing part may have a crosslinked structure. The polishing body in the invention can be used favorably in a polishing pad and the like, for polishing the surface of a semiconductor wafer or the like.
    • 本发明的目的是提供一种抛光体,其中抛光体中的磨料非常分散,在抛光过程中提供稳定的抛光性能,并且即使在大的情况下也能有效地减少划痕的发生 含有磨料的数量。 通过在高压釜中加载预定量的丁二烯,苯乙烯,甲基丙烯酸甲酯,衣康酸,丙烯酸,α-甲基苯乙炔二酮和叔十二烷基硫醇,制得本发明中构成抛光体的抛光部分,使混合物反应16小时 在75℃下,得到其中分散共聚物的乳液,将该乳液调节至pH8.5,并加入平均一次粒径为0.3μm的二氧化铈粉末并搅拌,得到水分散体,通过涂布干燥该水性分散体 薄膜穿过薄膜,模压所得干燥产品。 上述抛光部分可以具有交联结构。 本发明的研磨体可以在抛光垫等中有利地使用,用于研磨半导体晶片等的表面。
    • 36. 发明授权
    • Dimming apparatus for fluorescent lamps
    • 荧光灯调光装置
    • US6133697A
    • 2000-10-17
    • US381690
    • 1999-09-23
    • Satoshi NagaiKenichiro NishiTakahisa HamaguchiKentaro EguchiJun BunyaOsamu Ishikawa
    • Satoshi NagaiKenichiro NishiTakahisa HamaguchiKentaro EguchiJun BunyaOsamu Ishikawa
    • H05B41/392G05F1/00
    • H05B41/3921H05B41/3925Y10S315/04
    • The present invention is to provide a fluorescent lamp dimming apparatus capable of continuously dimming the fluorescent lamp, and capable of eliminating a fluctuation of light outputs, and in particular, capable of turning ON the fluorescent lamp in a low temperature. The fluorescent lamp dimming apparatus is comprised of a lamp voltage detecting circuit for detecting a discharge voltage of the fluorescent lamp, and a control unit intermittently controls the output frequency of a high frequency power supply in such a manner that the output frequency becomes higher than a dimming frequency based on the dimming signal so as to periodically change a current supplied to the fluorescent lamp into a low current; and when the output frequency of the high frequency power supply becomes higher than the dimming frequency, the control unit sets a lower limit dimming set value based upon a detection voltage of the lamp voltage detecting circuit in order that the output frequency of the high frequency power supply is controlled to become lower than, or equal to the upper limit frequency in accordance with the lower limit dimming set value.
    • PCT No.PCT / JP98 / 02073 Sec。 371 1999年9月23日第 102(e)1999年9月23日PCT PCT日期:1998年5月11日PCT公布。 公开号WO99 /​​ 59383 日期:1999年11月18日本发明提供一种荧光灯调光装置,其能够对荧光灯进行连续调光,能够消除光输出的波动,特别是能够在低温下接通荧光灯。 荧光灯调光装置包括用于检测荧光灯的放电电压的灯电压检测电路,并且控制单元以这样的方式间歇地控制高频电源的输出频率,使得输出频率变得高于 基于所述调光信号的调光频率,以便周期性地将提供给所述荧光灯的电流改变为低电流; 并且当高频电源的输出频率变得高于调光频率时,控制单元基于灯电压检测电路的检测电压设定下限调光设定值,以使高频电源的输出频率 电源根据下限调光设定值被控制为低于或等于上限频率。
    • 39. 发明授权
    • Liquid curable plastic composition
    • 液体可固化塑料组合物
    • US5093386A
    • 1992-03-03
    • US664491
    • 1991-03-05
    • Timothy E. BishopTohru OhtakaOsamu IshikawaMasanobu TakahashiKatsutoshi Igarashi
    • Timothy E. BishopTohru OhtakaOsamu IshikawaMasanobu TakahashiKatsutoshi Igarashi
    • C08F290/14C08G18/32C08G18/48C08G18/67C08G18/81C08L75/16
    • C08G18/672C08F290/147C08G18/3212C08G18/4825C08G18/4854C08G18/4858C08G18/8175C08L75/16
    • A liquid photocurable plastic composition is disclosed which comprises:(a) from 14% to 70% by weight of a polyurethane (meth)acrylate having a polyoxyalkylene structure in the backbone of the polyurethane, said polyurethane (meth)acrylate containing 0.8 to 8 weight percent of ethylenic unsaturation, from 50% to 98% by weight of the polyoxyalkylene structure, and having a number average molecular weight of 1,000 to 7,000;(b) from 5% to 40% by weight of a polyurethane (meth)acrylate having at least 15% by weight of a tricyclodecane structure in the backbone of the polyurethane and a number average molecular weight of from 500 to 1,000;(c) a reactive diluent; and(d) a polymerization initiator. This combination provides a liquid curable plastic composition suitable as the secondary coating or bundling material for use with optical fibers to provide compositions which photocure rapidly to provide cured coatings which are relatively hard and elongatable and which can be applied at low viscosity without encountering excessive sensitivity to water.
    • 公开了一种液体光固化塑料组合物,其包含:(a)14重量%至70重量%的在聚氨酯主链中具有聚氧化烯结构的聚氨酯(甲基)丙烯酸酯,所述聚氨酯(甲基)丙烯酸酯含有0.8至8重量% 乙烯不饱和度的百分比为50〜98重量%的聚氧化烯结构,数均分子量为1,000〜7,000; (b)5重量%至40重量%的在聚氨酯主链中具有至少15重量%的三环癸烷结构并且数均分子量为500至1,000的聚氨酯(甲基)丙烯酸酯; (c)反应性稀释剂; 和(d)聚合引发剂。 这种组合提供了适合作为与光纤一起使用的第二涂层或捆扎材料的液体可固化塑料组合物,以提供快速光固化以提供固化涂层的组合物,其固化涂层相对较硬且可伸长,并可以低粘度施加,而不会过度敏感 水。