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31. 发明申请

US20090017400A1 PATTERN FORMING METHOD 审中-公开
标题翻译：图案形成方法
公开(公告)号：US20090017400A1
公开(公告)日：2009-01-15
申请号：US12140119
申请日：2008-06-16
申请人： Shinji Tarutani , Kenji Wada , Hideaki Tsubaki
发明人： Shinji Tarutani , Kenji Wada , Hideaki Tsubaki
IPC分类号： G03F7/20
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/2022 , G03F7/2041
摘要： A pattern forming method, includes: exposing a resist film with actinic rays or radiation a plurality of times; and heating the resist film at a first temperature in at least one interval between the exposures.
摘要翻译：一种图案形成方法，包括：用光化射线或辐射多次曝光抗蚀剂膜; 以及在所述曝光之间的至少一个间隔中以第一温度加热所述抗蚀剂膜。

32. 发明授权

US08877828B2 Method for producing curable composition for imprints 有权
标题翻译：印刷用固化性组合物的制造方法
公开(公告)号：US08877828B2
公开(公告)日：2014-11-04
申请号：US13371088
申请日：2012-02-10
申请人： Yuichiro Enomoto , Kunihiko Kodama , Shinji Tarutani
发明人： Yuichiro Enomoto , Kunihiko Kodama , Shinji Tarutani
IPC分类号： C08F2/46 , C08F20/18 , G03F7/00 , B82Y10/00 , G03F7/16 , B82Y40/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/16
摘要： Provided is a method of producing a curable composition for imprints including (A) a polymerizable monomer, (B) a polymerization initiator, and (C) a solvent which is capable of effectively suppressing lifting or separation of patterns, excellent in coatability, and excellent in time-dependent stability. The method of producing a curable composition for imprints comprises preparing one species of liquid (D) which contains at least either one of the polymerizable monomer (A) and the polymerization initiator (B), passing the liquid (D) through a filter, and then adding the solvent (C).
摘要翻译：提供一种印刷用固化性组合物的制造方法，其包括（A）可聚合单体，（B）聚合引发剂和（C）可有效抑制图案的提升或分离，涂布性优异的溶剂和优异的在时间上依赖稳定。制备用于印记的可固化组合物的方法包括制备一种含有可聚合单体（A）和聚合引发剂（B）中的至少一种的液体（D），使液体（D）通过过滤器，以及然后加入溶剂（C）。

33. 发明授权

US08820541B2 Method for producing curable composition for imprints 有权
标题翻译：印刷用固化性组合物的制造方法
公开(公告)号：US08820541B2
公开(公告)日：2014-09-02
申请号：US13239062
申请日：2011-09-21
申请人： Yuichiro Enomoto , Kunihiko Kodama , Shinji Tarutani
发明人： Yuichiro Enomoto , Kunihiko Kodama , Shinji Tarutani
IPC分类号： B01D35/02 , C08F14/18 , C08F12/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0046 , G03F7/027 , G03F7/0755 , G03F7/16
摘要： A method for producing a curable composition for imprints includes the step of passing a curable composition containing a polymerizable monomer (A) and a polymerization initiator (B) through a filter having an effective filter area of 200 cm2 or more at least one time. The method suppresses pattern-peeling when peeling the mold employed in forming a pattern using the curable composition for imprints, and thus provides excellent patternability.
摘要翻译：用于印记的可固化组合物的制备方法包括使含有可聚合单体（A）和聚合引发剂（B）的可固化组合物通过至少一次有效过滤面积为200cm 2或更大的过滤器的步骤。该方法在使用该印刷用固化性组合物剥离形成图案的模具时，抑制图案剥离，从而提供优异的图案性。

34. 发明授权

US08603733B2 Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method 有权
标题翻译：图案形成方法，图案形成方法中使用的抗蚀剂组合物，显影剂和漂洗溶液
公开(公告)号：US08603733B2
公开(公告)日：2013-12-10
申请号：US13196530
申请日：2011-08-02
申请人： Shinji Tarutani , Hideaki Tsubaki , Kazuyoshi Mizutani , Kenji Wada , Wataru Hoshino
发明人： Shinji Tarutani , Hideaki Tsubaki , Kazuyoshi Mizutani , Kenji Wada , Wataru Hoshino
IPC分类号： G03F7/00 , G03F7/004 , G03F7/32 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , G03F7/325 , G03F7/40
摘要： A pattern forming method comprising a step of applying a resist composition whose solubility in a negative tone developer decreases upon irradiation with an actinic ray or radiation and which contains a resin having an alicyclic hydrocarbon structure and a dispersity of 1.7 or less and being capable of increasing the polarity by the action of an acid, an exposure step, and a development step using a negative tone developer; a resist composition for use in the method; and a developer and a rinsing solution for use in the method, are provided, whereby a pattern with reduced line edge roughness and high dimensional uniformity can be formed.
摘要翻译：一种图案形成方法，包括施加抗蚀剂组合物的步骤，所述抗蚀剂组合物在负光谱显影剂中的溶解度随着光化射线或辐射的照射而降低，并且其含有具有脂环族烃结构和分散性为1.7以下并且能够增加的树脂通过酸的作用的极性，曝光步骤和使用负色调显影剂的显影步骤; 用于该方法的抗蚀剂组合物; 并且提供了用于该方法的显影剂和冲洗溶液，由此可以形成线边缘粗糙度降低且尺寸均匀性高的图案。

35. 发明申请

US20100248136A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION 有权
标题翻译：丙酰胺或辐射敏感性树脂组合物和使用组合物形成图案的方法
公开(公告)号：US20100248136A1
公开(公告)日：2010-09-30
申请号：US12750369
申请日：2010-03-30
申请人： Shinichi SUGIYAMA , Shinji Tarutani , Takayuki Kato , Kaoru Iwato , Hiroshi Saegusa
发明人： Shinichi SUGIYAMA , Shinji Tarutani , Takayuki Kato , Kaoru Iwato , Hiroshi Saegusa
IPC分类号： G03F7/20 , G03F7/004 , C08F24/00 , C08F18/20
CPC分类号： C08F24/00 , C08F32/08 , G03F7/0046 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： According to one embodiment, an actinic-ray- or radiation-sensitive resin composition comprises a hydrophobic resin (HR) containing a fluorine atom, wherein the hydrophobic resin (HR) comprises any of repeating units (a) of general formula (I) or (II) below:
摘要翻译：根据一个实施方案，光化射线或辐射敏感性树脂组合物包含含有氟原子的疏水性树脂（HR），其中所述疏水性树脂（HR）包含通式（I）的重复单元（a）或通式（二）：

36. 发明授权

US07635553B2 Pattern forming method and resist composition used therefor 有权
标题翻译：图案形成方法和用于其的抗蚀剂组合物
公开(公告)号：US07635553B2
公开(公告)日：2009-12-22
申请号：US11528572
申请日：2006-09-28
申请人： Shinji Tarutani
发明人： Shinji Tarutani
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/0046 , G03F7/0048 , G03F7/0395 , G03F7/0758 , Y10S430/114 , Y10S430/136
摘要： A pattern forming method comprising: coating a resist composition on a substrate; adjusting a rotational speed of the substrate within a range of 500 to 1,500 rpm so that a film thickness of the resist composition coated is adjusted; and subjecting the resist composition to drying, exposure and development, wherein the resist composition includes: (A) a compound capable of generating an acid upon irradiation with one of actinic rays and radiation; (B) a resin of which dissolution rate in an alkali developer increases under the action of an acid; (C) a mixed solvent; and (D) a surfactant, and the mixed solvent (C) includes at least one member selected from a group A of solvents and at least one member selected from a group B of solvents, or includes at least one member selected from the group A of solvents and at least one member selected from a group C of solvents: Group A: propylene glycol monoalkyl ether carboxylates, Group B: propylene glycol monoalkyl ethers, alkyl lactates, acetic acid esters, one of chain and cyclic ketones, and alkoxyalkyl propionates, and Group C: γ-butyrolactone, ethylene carbonate and propylene carbonate.
摘要翻译：一种图案形成方法，包括：在基材上涂布抗蚀剂组合物; 在500〜1500rpm的范围内调整基板的旋转速度，调整涂布的抗蚀剂组合物的膜厚; 并且对抗蚀剂组合物进行干燥，曝光和显影，其中抗蚀剂组合物包括：（A）在用光化射线和辐射之一照射时能够产生酸的化合物; （B）在酸性作用下碱显影剂溶解速率增加的树脂; （C）混合溶剂; 和（D）表面活性剂，并且混合溶剂（C）包括选自溶剂组A和选自B组溶剂的至少一种的至少一种，或者包括选自A组的溶剂和选自溶剂组C中的至少一种：A组：丙二醇单烷基醚羧酸酯，B组：丙二醇单烷基醚，乳酸烷基酯，乙酸酯，链和环酮之一和烷氧基烷基丙酸酯，和C组：γ-丁内酯，碳酸亚乙酯和碳酸亚丙酯。

37. 发明申请

US20060040208A1 Chemical amplification resist composition and pattern-forming method using the same 失效
标题翻译：化学放大抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US20060040208A1
公开(公告)日：2006-02-23
申请号：US11206220
申请日：2005-08-18
申请人： Shinji Tarutani , Hyou Takahashi , Kenji Wada
发明人： Shinji Tarutani , Hyou Takahashi , Kenji Wada
IPC分类号： G03C1/76
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0392
摘要： A chemical amplification resist composition comprising (A) a resin increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, (C) a compound having a fluorine atom and a hydroxyl group, and a pKa value of from 4 to 15, and (D) a solvent, and a pattern-forming method using the same.
摘要翻译：一种化学放大抗蚀剂组合物，其包含（A）通过酸的作用增加在碱性显影剂中的溶解度的树脂，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）具有氟原子和羟基，pKa值为4〜15，和（D）溶剂，以及使用其的图案形成方法。

38. 发明授权

US08911930B2 Method of forming pattern using actinic-ray or radiation-sensitive resin composition, and pattern 有权
标题翻译：使用光化射线或辐射敏感树脂组合物形成图案的方法和图案
公开(公告)号：US08911930B2
公开(公告)日：2014-12-16
申请号：US13375749
申请日：2010-06-03
申请人： Yuichiro Enomoto , Shinji Tarutani , Akinori Shibuya , Shuhei Yamaguchi
发明人： Yuichiro Enomoto , Shinji Tarutani , Akinori Shibuya , Shuhei Yamaguchi
IPC分类号： G03F7/26 , G03F7/095 , G03F7/32 , C08F20/28 , G03F7/004 , G03F7/039
CPC分类号： C08F20/28 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/095 , G03F7/325
摘要： According to one embodiment, a method of forming a pattern includes the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition.
摘要翻译：根据一个实施方案，形成图案的方法包括将光化学射线或辐射敏感性树脂组合物施加到基底上以便形成膜的步骤，通过掩模选择性地使膜暴露的步骤，并且步骤通过使用含有有机溶剂的显影剂显影曝光的薄膜，其中光化射线或辐射敏感性树脂组合物含有通过酸的作用极性增加的树脂（A），使得包含有机溶剂的显影剂中的树脂减少，当暴露于光化射线或辐射时产生含有氟原子的酸和溶剂（C）的光致酸产生剂（B），并且其中含有光酸产生剂（B）相对于组合物的总固体成分为8〜20质量％。

39. 发明授权

US08241840B2 Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method 有权
标题翻译：图案形成方法，图案形成方法中使用的抗蚀剂组合物，图案形成方法中使用的负显影液和用于图案形成方法的负显影用漂洗溶液
公开(公告)号：US08241840B2
公开(公告)日：2012-08-14
申请号：US12825088
申请日：2010-06-28
申请人： Hideaki Tsubaki , Shinji Tarutani , Kazuyoshi Mizuyoshi , Kenji Wada , Wataru Hoshino
发明人： Hideaki Tsubaki , Shinji Tarutani , Kazuyoshi Mizuyoshi , Kenji Wada , Wataru Hoshino
IPC分类号： G03F7/30 , G03F7/004
CPC分类号： G03F7/0397 , G03F7/325 , Y10S430/106 , Y10S430/111
摘要： A pattern forming method includes (a) coating a substrate with a resist composition including a resin that includes a repeating unit represented by a following general formula (NGH-1), and, by the action of an acid, increases the polarity and decreases the solubility in a negative developing solution; (b) exposing; and (d) developing with a negative developing solution: wherein RNGH1 represents a hydrogen atom or an alkyl group; and RNGH2 to RNGH4 each independently represents a hydrogen atom or a hydroxyl group, provided that at least one of RNGH2 to RNGH4 represents a hydroxyl group.
摘要翻译：图案形成方法包括：（a）用包含由以下通式（NGH-1）表示的重复单元的树脂的抗蚀剂组合物涂布基材，并且通过酸的作用增加极性，并降低在负显影液中的溶解度; （b）曝光; 和（d）用负显影液显影：其中RNGH1表示氢原子或烷基; 并且RNGH 2至RNGH 4各自独立地表示氢原子或羟基，条件是RNGH 2至RNGH 4中的至少一个表示羟基。

40. 发明申请

US20120077131A1 METHOD OF FORMING PATTERN USING ACTINIC-RAY OR RADIATION-SENSITIVE RESIN COMPOSITION, AND PATTERN 有权
标题翻译：使用丙酰胺或辐射敏感性树脂组合物形成图案的方法和图案
公开(公告)号：US20120077131A1
公开(公告)日：2012-03-29
申请号：US13375749
申请日：2010-06-03
申请人： Yuichiro Enomoto , Shinji Tarutani , Akinori Shibuya , Shuhei Yamaguchi
发明人： Yuichiro Enomoto , Shinji Tarutani , Akinori Shibuya , Shuhei Yamaguchi
IPC分类号： G03F7/20
CPC分类号： C08F20/28 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/095 , G03F7/325
摘要： According to one embodiment, a method of forming a pattern includes the step of applying an actinic-ray- or radiation-sensitive resin composition on a substrate so as to form a film, the step of selectively exposing the film through a mask and the step of developing the exposed film with the use of a developer containing an organic solvent, wherein the actinic-ray- or radiation-sensitive resin composition contains a resin (A) whose polarity is increased by the action of an acid so that the solubility of the resin in the developer containing an organic solvent is decreased, a photoacid generator (B) that when exposed to actinic rays or radiation, generates an acid containing a fluorine atom and a solvent (C), and wherein the photoacid generator (B) is contained in the composition in a ratio of 8 to 20 mass % based on the total solids of the composition.
摘要翻译：根据一个实施方案，形成图案的方法包括将光化学射线或辐射敏感性树脂组合物施加到基底上以便形成膜的步骤，通过掩模选择性地使膜暴露的步骤，并且步骤通过使用含有有机溶剂的显影剂显影曝光的薄膜，其中光化射线或辐射敏感性树脂组合物含有通过酸的作用极性增加的树脂（A），使得包含有机溶剂的显影剂中的树脂减少，当暴露于光化射线或辐射时产生含有氟原子的酸和溶剂（C）的光致酸产生剂（B），并且其中含有光酸产生剂（B）相对于组合物的总固体成分为8〜20质量％。

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