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31. 发明授权

US06692887B1 Radiation-sensitive resin composition 有权
公开(公告)号：US06692887B1
公开(公告)日：2004-02-17
申请号：US09197699
申请日：1998-11-23
申请人： Mitsuhito Suwa , Toru Kajita , Shin-ichiro Iwanaga , Toshiyuki Ota
发明人： Mitsuhito Suwa , Toru Kajita , Shin-ichiro Iwanaga , Toshiyuki Ota
IPC分类号： G03F7004
CPC分类号： C08G61/08 , C08L65/00 , G03F7/0045 , G03F7/039 , Y10S430/111
摘要： A radiation-sensitive resin composition including (A) a resin containing an alicyclic skeleton in its backbone, and (B) a radiation-sensitive acid-generating agent, is provided. This composition is excellent in transparency with respect to radiation and dry etching resistance, and can give a photoresist pattern excellent in adhesion to substrates, sensitivity, resolution, and developability.

32. 发明授权

US06593043B2 Composition of positive photosensitive resin precursor, and display device thereof 有权
公开(公告)号：US06593043B2
公开(公告)日：2003-07-15
申请号：US09985059
申请日：2001-11-01
申请人： Mitsuhito Suwa , Kazuto Miyoshi , Masao Tomikawa
发明人： Mitsuhito Suwa , Kazuto Miyoshi , Masao Tomikawa
IPC分类号： G03F7023
CPC分类号： G03F7/0226 , G03F7/0233 , H01L27/32
摘要： A composition of a positive photosensitive resin precursor includes (a) a polyamic acid ester and/or a polyamic acid each having at least one selected from a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group at the end of a principal chain of the polymer, (b) a compound having a phenolic hydroxyl group, and (c) a quinonediazide sulfnate. The composition can be subjected to dissolution in an alkaline developer.

33. 发明授权

US06322949B2 Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06322949B2
公开(公告)日：2001-11-27
申请号：US09739833
申请日：2000-12-20
申请人： Mitsuhito Suwa , Haruo Iwasawa , Toru Kajita , Shin-ichiro Iwanaga
发明人： Mitsuhito Suwa , Haruo Iwasawa , Toru Kajita , Shin-ichiro Iwanaga
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , G03F7/038 , G03F7/039 , Y10S430/115 , Y10S430/122 , Y10S430/128
摘要： A positive-tone or negative-tone radiation sensitive resin composition comprising (A) a photoacid generator represented by the following formula (1-1) or (1-2): wherein R1, R2, R5, and R6 are an alkyl group , R3 and R7 are a hydroxyl group or —OR4 (wherein R4 is an organic group), A1− and A2− indicate a monovalent anion, a and c denote an integer of 4-7, and b and d an integer of 0-7. The positive-tone resin composition further comprises (B1) an acid-cleavable group-containing resin or (B2) an alkali-soluble resin and an alkali solubility control agent, and the negative-tone radiation sensitive resin composition further comprises (C) an alkali-soluble resin and (D) a crosslinking agent. The resin compositions are highly sensitive and exhibit superior resolution and pattern forming performance.
摘要翻译：一种正色调或负色调辐射敏感性树脂组合物，其包含（A）由下式（1-1）或（1-2）表示的光酸产生剂：其中R1，R2，R5和R6是烷基， R3和R7是羟基或-OR4（其中R4是有机基团），A1-和A2-表示一价阴离子，a和c表示4-7的整数，b和d是0-7的整数。正色调树脂组合物还包含（B1）含有酸分解性基团的树脂或（B2）碱溶性树脂和碱溶性调节剂，负色调辐射敏感性树脂组合物还包含（C）碱溶性树脂和（D）交联剂。树脂组合物高度敏感，表现出优异的分辨率和图案形成性能。

34. 发明授权

US06180316B2 Radiation sensitive resin composition 有权
标题翻译：辐射敏感树脂组合物
公开(公告)号：US06180316B2
公开(公告)日：2001-01-30
申请号：US09231762
申请日：1999-01-15
申请人： Toru Kajita , Mitsuhito Suwa , Haruo Iwasawa , Masafumi Yamamoto
发明人： Toru Kajita , Mitsuhito Suwa , Haruo Iwasawa , Masafumi Yamamoto
IPC分类号： G03F7004
CPC分类号： G03F7/0395 , G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/111
摘要： A radiation-sensitive resin composition which comprises, (A) a polymer containing, (a) a recurring unit (I) of the following formula (1): or a recurring unit (I) of the formula (1) and a recurring unit (II) of the following formula (2), and (b) a recurring unit (III) which is derived from a monomer having at least two polymerizable carbon—carbon double bonds by cleavage of the carbon—carbon double bonds, wherein the monomer has, in addition to said at least two polymerizable carbon—carbon double bonds, at least one acid-decomposable divalent group of the following formula (3) or (4), said at least two polymerizable carbon—carbon double bonds being linked via the least one acid-decomposable divalent group of the formula (3) or (4), and (B) a photoacid generator.
摘要翻译：一种辐射敏感性树脂组合物，其包含（A）含有（a）下式（1）的重复单元（I）或式（1）的重复单元（I）的聚合物和重复单元（II）和（b）通过裂解碳 - 碳双键衍生自具有至少两个可聚合碳 - 碳双键的单体的重复单元（III），其中单体除了所述至少两个可聚合碳 - 碳双键之外，还具有至少一个下式（3）或（4）的可酸分解的二价基团，所述至少两个可聚合碳 - 碳双键经由至少一个式（3）或（4）的酸可分解的二价基团，和（B）光酸产生剂。

35. 发明授权

US5804311A Liquid curable resin composition for optical fibers 失效
标题翻译：光纤用液固树脂组合物
公开(公告)号：US5804311A
公开(公告)日：1998-09-08
申请号：US701428
申请日：1996-08-22
申请人： Mitsuhito Suwa , Zen Komiya , Yuji Takasugi , Takashi Ukachi
发明人： Mitsuhito Suwa , Zen Komiya , Yuji Takasugi , Takashi Ukachi
IPC分类号： C03C25/10 , C03C25/28 , C09D4/06 , G02B6/02 , C08F265/02 , C08F265/08
CPC分类号： C09D4/06 , C03C25/106 , C03C25/28 , Y10T428/2933 , Y10T428/2938
摘要： A liquid curable resin composition for optical fibers comprising a polymer (a) having a number average molecular weight of 5,000 or more and derived from at least two types of recurring ethylenic units, of which one type has a substituent group containing an ethylenically unsaturated group and the second type is substituted by a group --COOR.sup.3 (wherein R.sup.3 is a hydrogen atom or a hydrocarbon group having 1-30 carbon atoms), an aryl group, a cyano group, an alkyl group having 1-10 carbon atoms or by one or more halogen atoms.
摘要翻译：一种光纤用液态固化性树脂组合物，其含有数均分子量为5000以上且由至少两种重复烯属性单元衍生的聚合物（a），其中一种具有含有烯键式不饱和基团的取代基，第二种类型被-COOR 3（其中R3是氢原子或具有1-30个碳原子的烃基），芳基，氰基，具有1-10个碳原子的烷基或一个或多个更多的卤素原子。

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