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31. 发明授权

US5537433A Semiconductor light emitter 失效
标题翻译：半导体发光体
公开(公告)号：US5537433A
公开(公告)日：1996-07-16
申请号：US278178
申请日：1994-07-21
申请人： Masanori Watanabe
发明人： Masanori Watanabe
IPC分类号： H01L33/10 , H01L33/40 , H01L33/46 , H01S5/10 , H01S5/20 , H01S5/223 , H01S5/34 , H01S5/343 , H01S5/347 , H01S3/18 , H01L33/00
CPC分类号： H01L33/10 , B82Y20/00 , H01L33/405 , H01L33/46 , H01S5/20 , H01L33/105 , H01S5/1078 , H01S5/2004 , H01S5/2009 , H01S5/2013 , H01S5/2022 , H01S5/2027 , H01S5/2231 , H01S5/3403 , H01S5/34326 , H01S5/347
摘要： A semiconductor light emitter, such as the light-emitting diode or the semiconductor laser, having a structure in which a light emitting area or an active layer; a transparent layer which is pervious to light radiated from the light emitting area or the active layer; and an opaque layer or an opaque substrate which is impervious to the radiated light are arranged in order or in the inverse order. The semiconductor light emitter includes (a) total reflection layer(s) arranged between the transparent layer(s) and the opaque layer(s) so as to come into contact with the transparent layer. The refractive index of the total reflection layer is smaller than that of the transparent layer. Therefore, at least one part of light, which has been radiated from the light emitting area or the active layer and which has been reflected by the total reflection layer thereafter, is either radiated outward from side surfaces of the transparent layer or returned to the active layer.
摘要翻译：诸如发光二极管或半导体激光器的半导体光发射器具有其中发光区域或有源层的结构; 透明层，其透过从发光区域或有源层发射的光; 并且对于辐射光不透明的不透明层或不透明衬底按顺序或以相反的顺序排列。半导体光发射器包括（a）布置在透明层和不透明层之间的全反射层，以便与透明层接触。全反射层的折射率小于透明层的折射率。因此，已经从发光区域或活性层辐射并且其后被全反射层反射的光的至少一部分或者从透明层的侧表面向外辐射或者返回到活性物质层。

32. 发明授权

US5498568A Method of producing a compound semiconductor crystal layer with a steep heterointerface 失效
标题翻译：具有陡峭异质界面的化合物半导体晶体层的制造方法
公开(公告)号：US5498568A
公开(公告)日：1996-03-12
申请号：US456870
申请日：1995-06-01
申请人： Hiroyuki Hosoba , Junichi Nakamura , Masanori Watanabe
发明人： Hiroyuki Hosoba , Junichi Nakamura , Masanori Watanabe
IPC分类号： C30B25/02 , C30B25/14 , H01L21/20 , H01L21/205 , H01L33/12 , H01L33/30 , H01S5/00
CPC分类号： C30B25/02 , C30B25/14 , C30B29/40 , H01L21/02395 , H01L21/02463 , H01L21/02543 , H01L21/0262 , H01L33/0062 , Y10S438/925
摘要： After a GaAs substrate is set in a reaction container, the pressure in the reaction container is reduced to 10-100 torr and arsine is supplied into the container. A GaAs buffer layer is formed on the GaAs substrate by introducing TMG when the surface temperature of the GaAs substrate is at 650.degree. C. Then, by stopping supply of TMG, the growth of the GaAs buffer layer is stopped (step I). Arsine is switched to phosphine. A time t after the switching, TMA, TMG and TMI adjusted at a predetermined mixing ratio beforehand are introduced into the container, thereby starting the formation of an InGaAlP layer on the GaAs buffer layer. During the growing process, the surface temperature of the GaAs substrate is raised to 750.degree. C. (step II). The InGaAlP layer is grown to a predetermined thickness with the surface temperature of the GaAs substrate being kept at 750.degree. C. (step III).
摘要翻译：将GaAs衬底置于反应容器中后，将反应容器内的压力降低至10-100乇，并将胂供给到容器中。当GaAs衬底的表面温度为650℃时，通过引入TMG，在GaAs衬底上形成GaAs缓冲层。然后，通过停止TMG的供给，停止GaAs缓冲层的生长（步骤I）。胂切换到磷化氢。切换之后的时间t，预先将预定混合比例调节的TMA，TMG和TMI引入容器中，从而开始在GaAs缓冲层上形成InGaAlP层。在生长过程中，将GaAs衬底的表面温度升至750℃（步骤II）。使GaAs衬底的表面温度保持在750℃，将InGaAlP层生长至预定厚度（步骤III）。

33. 发明授权

US5268488A Acrylate compound, preparation process thereof and fungicide using the same 失效
标题翻译：丙烯酸酯化合物，其制备方法和使用其的杀真菌剂
公开(公告)号：US5268488A
公开(公告)日：1993-12-07
申请号：US943470
申请日：1992-09-11
申请人： Masanori Watanabe , Toshinobu Tanaka , Hisato Kobayashi , Shuji Yokoyama , Hideaki Umeyama
发明人： Masanori Watanabe , Toshinobu Tanaka , Hisato Kobayashi , Shuji Yokoyama , Hideaki Umeyama
IPC分类号： A01N37/50 , C07C327/58 , C07D317/66 , C07D207/30 , C07D255/00
CPC分类号： C07C327/58 , C07D317/66 , C07C2101/02 , C07C2101/04 , C07C2102/10
摘要： Disclosed are an acrylate series compound represented by the following formula: ##STR1## wherein R.sup.1 represents a C.sub.1-10 alkoxy group, a halogen atom, a C.sub.1-6 alkyl group, a nitro group, a C.sub.1-6 alkylamino group, a C.sub.1-6 alkylthio group, a halo C.sub.1-6 alkyl group, a pyrrole group, a C.sub.1-6 alkylsulfonyl group, a cyano group, a C.sub.1-6 mono- or dialkylaminosulfonyl group, a phenoxy group which may have a C.sub.1-6 alkoxy group, a benzyloxy group, a halo C.sub.1-6 alkoxy group, a C.sub.3-6 alkenyloxy group, a hydroxyl group, a C.sub.2-7 cyanoalkoxy group, a C.sub.3-6 alkynyloxy group, a C.sub.1-6 alkoxy group substituted by a C.sub.3-6 cycloalkyl group, a C.sub.1-6 alkoxy group substituted by a C.sub.1-6 alkoxy group, a C.sub.2-7 alkoxycarbonyl group or a C.sub.2-7 acyl; R.sup.2 represents a C.sub.3-8 cycloalkyl group which may have a C.sub.1-6 alkyl group; n represents an integer of 0 to 5; a plural number of R.sup.1 s may be the same or different; and when n is 2, two R.sup.1 s may be linked with each other and condensed to a benzene ring to form a saturated 4- to 8-membered ring or a dioxolan ring together with carbon atoms to which they are bonded, a preparation process thereof and a fungicide using the same as an active ingredient.

34. 发明授权

US5141935A Dihydrobenz thiazine derivative and microorganism control agent 失效
标题翻译：二氢苯噻嗪衍生物和微生物控制剂
公开(公告)号：US5141935A
公开(公告)日：1992-08-25
申请号：US411847
申请日：1989-09-25
申请人： Mitsuaki Takenaka , Masanori Watanabe
发明人： Mitsuaki Takenaka , Masanori Watanabe
IPC分类号： A01N43/84 , C07D265/36 , C07D279/16
CPC分类号： C07D279/16
摘要： A compound represented by the formula: ##STR1## wherein R.sup.1 and R.sup.2 each represent a hydrogen atom, a halogen atom, a nitro group, a lower alkyl group or a trifluoromethyl group; R.sup.3 represents a hydrogen atom, a lower alkyl group, a phenyl group or a lower alkoxy-carbonyl group; R.sup.4 and R.sup.5 each represent a hydrogen atom or a lower alkyl group; R.sup.6 represents a halogen atom; and X represents an oxygen atom or a sulfur atom,and a microorganism control agent, comprising the above compound as an active ingredient.
摘要翻译：由下式表示的化合物：其中R 1和R 2各自表示氢原子，卤素原子，硝基，低级烷基或三氟甲基; R3表示氢原子，低级烷基，苯基或低级烷氧基 - 羰基; R4和R5各自表示氢原子或低级烷基; R6代表卤原子; X表示氧原子或硫原子，和含有上述化合物作为有效成分的微生物控制剂。

35. 发明授权

US4883967A Radiation detector and method of manufacturing the same 失效
标题翻译：辐射探测器及其制造方法
公开(公告)号：US4883967A
公开(公告)日：1989-11-28
申请号：US189816
申请日：1988-05-03
申请人： Hiroshi Tsutsui , Sueki Baba , Koichi Ohmori , Tetsuro Ohtsuchi , Masanori Watanabe
发明人： Hiroshi Tsutsui , Sueki Baba , Koichi Ohmori , Tetsuro Ohtsuchi , Masanori Watanabe
IPC分类号： H01L27/144
CPC分类号： H01L27/1446
摘要： Disclosed are a radiation detector and a method of manufacturing the same. The radiation detector includes a radiation screening member for cutting off radiation incident upon the marginal portions of the radiation incident surface of a semiconductor radiation sensor or a semiconductor radiation sensor array for outputting pulses in correspondence with radiation photons, as well as upon the boundary portions between adjacent sensors. In order to manufacture such a radiation detector, leads are provided by the wire bonding, soldering or bump contacting on the radiation screening member, and at least part of the radiation screening member is then fitted to the semiconductor radiation sensor or the semiconductor radiation sensor array so as to make it electrically connected to the electrodes of the semiconductor radiation sensor or the semiconductor radiation sensor array.

36. 发明授权

US4417184A Picture image display apparatus 失效
标题翻译：图像显示装置
公开(公告)号：US4417184A
公开(公告)日：1983-11-22
申请号：US250714
申请日：1981-04-03
申请人： Yoshinobu Takesako , Masanori Watanabe , Kinzo Nonomura
发明人： Yoshinobu Takesako , Masanori Watanabe , Kinzo Nonomura
IPC分类号： H01J31/12 , H01J29/70 , H01J29/72
CPC分类号： H01J31/126
摘要： The picture image display apparatus in accordance with the present invention comprises:a flat type vacuum enclosure having a transparent face panel,a row of parallelly disposed linear thermionic cathodes,electron beam forming electrode which produces a predetermined number of two dimensionally disposed electron beams out of the electron emission from said linear thermionic cathodes,a row of control electrodes disposed parallelly in a direction perpendicular to those of said linear thermionic cathodes,a row of deflection electrodes,a phosphor screen formed on the inner face of said face panel, andan anode of thin metal film formed on said surface of said phosphor screen,wherein the improvement is thata row of deflection-aiding electrodes is disposed between said row of deflection electrode and said anode, said post deflection electrodes being impressed with substantially constant positive potential with respect to said linear thermionic cathodes.
摘要翻译：根据本发明的图像显示装置包括：平面型真空外壳，其具有透明面板，一排平行布置的线性热离子阴极，电子束形成电极，其产生预定数量的二维设置的电子束，来自所述线性热离子阴极的电子发射，与垂直于所述线性热离子阴极的方向平行布置的一排控制电极，一排偏转电极，形成在所述面板的内表面上的荧光屏，以及阳极形成在所述荧光屏的所述表面上的薄金属膜，其中改进在于所述偏转电极行与所述阳极之间设置一排偏转辅助电极，所述后偏转电极被施加基本恒定的正电位，相对于到所述线性热离子阴极。

37. 发明授权

US4259001A Actuating lever stopping device of a camera shutter mechanism 失效
标题翻译：相机快门机构的执行杆停止装置
公开(公告)号：US4259001A
公开(公告)日：1981-03-31
申请号：US755452
申请日：1976-12-29
申请人： Masanori Watanabe , Tadashi Nakagawa , Ichiro Nemoto , Eiichi Onda , Mitsuo Koyama
发明人： Masanori Watanabe , Tadashi Nakagawa , Ichiro Nemoto , Eiichi Onda , Mitsuo Koyama
IPC分类号： G03B9/08 , G03B9/18 , G03B9/36
CPC分类号： G03B9/18
摘要： A camera shutter mechanism comprises a shutter actuating lever movable between a cocked position and a rest position to actuate a part of the camera shutter mechanism, and a cocking lever having an abutting portion for abutting the actuating lever to move the latter from the rest position thereof into the cocked position thereof. The cocking lever and the actuating lever together include a locking mechanism which releasably locks the actuating lever in the rest position. The locking mechanism and the abutting portion are arranged so that when the actuating lever approaches its rest position, it engages the abutting portion so as to rotate the cocking lever into a position in which the locking mechanism locks the actuating lever.
摘要翻译：相机快门机构包括快门启动杆，其可在被启动位置和静止位置之间移动，以致动相机快门机构的一部分;以及启动杆，具有用于抵靠致动杆的抵靠部分，以使其从其静止位置移动进入它的位置。起动杆和致动杆一起包括锁定机构，其将致动杆可释放地锁定在静止位置。锁定机构和抵接部分被布置成使得当致动杆接近其静止位置时，它与抵接部分接合，以便将拨动杆旋转到锁定机构锁定致动杆的位置。

38. 发明授权

US4240732A Flash system changeover device for the shutter of camera 失效
标题翻译：用于相机快门的闪光灯系统切换装置
公开(公告)号：US4240732A
公开(公告)日：1980-12-23
申请号：US018912
申请日：1979-03-09
申请人： Yukio Morino , Shogo Kato , Masanori Watanabe
发明人： Yukio Morino , Shogo Kato , Masanori Watanabe
IPC分类号： G03B9/70 , G03B15/03
CPC分类号： G03B9/70
摘要： A flash changeover device for a shutter is operative when the exposure operation is performed by cancelling the retention on a shutter blade control in the charged state by the operation of an actuating member which has previously been charged and is actuated by a shutter release operation. The device includes a flash system changeover member, a switching member, a synchronizing switch and wherein the switching member is oscillatably mounted on the changeover member so as to close the synchronizing switch in connection with the operation of the actuating member when the flash system changeover member is set to a first position and to close the synchronizing switch in connection with the shutter blade opening operation of the shutter blade control member when the flash system changeover member is set at a second position. The synchronizing switch has contacts having relative positions which are independent of the position of the changeover member when the synchronizing switch is in the open state.
摘要翻译：用于快门的闪光切换装置可操作，当通过先前已经充电并由快门释放操作致动的致动部件的操作来取消在充电状态下的快门叶片控制上的保持来执行曝光操作。该装置包括闪光灯系统切换构件，切换构件，同步开关，并且其中切换构件可摆动地安装在切换构件上，以便当闪光系统切换构件设置在第一位置并且当闪光系统切换构件被设置在第二位置时，关闭与快门叶片控制构件的快门叶片打开操作相关的同步开关。同步开关具有当同步开关处于打开状态时具有与切换构件的位置无关的相对位置的触点。

39. 发明授权

US4208111A Synchronizing device for electronic program shutter 失效
标题翻译：电子程序快门同步装置
公开(公告)号：US4208111A
公开(公告)日：1980-06-17
申请号：US18914
申请日：1979-03-09
申请人： Kiyoshi Kitai , Yukio Morino , Shogo Kato , Masanori Watanabe
发明人： Kiyoshi Kitai , Yukio Morino , Shogo Kato , Masanori Watanabe
IPC分类号： G03B7/16 , G03B9/24 , G03B9/62 , G03B9/70 , G03B9/08
CPC分类号： G03B9/70
摘要： In an electronic program shutter having sectoral shutter blades functioning in varying both the aperture and the exposure time corresponding to the brightness of the field, a synchronizing device according to the present invention comprises a sectoral shutter blade control lever which is oscillatable and capable of opening and closing the sectoral shutter blades and is normally urged in the direction that the sectoral shutter blades keep the aperture closed, a driving member which travels in one direction according to the shutter release operation, an actuating lever rotatable about a shaft fitted on the driving member and interlocked with the sectoral shutter blade control lever, an electromagnet which is unmagnetized at an exposure completion signal given by an exposure control circuit, and an armature which operates a flash light switch and cancels the engagement between the sectoral shutter blade control lever and the actuating lever when the electromagnet is unmagnetized and the attraction by the electromagnet is cancelled.
摘要翻译：在具有扇形快门叶片的电子程序快门中，其具有改变对应于场的亮度的孔径和曝光时间，根据本发明的同步装置包括扇形快门叶片控制杆，其可振荡并且能够打开和关闭扇形快门叶片，并且通常沿着扇形快门叶片保持孔关闭的方向被推动，根据快门释放操作沿一个方向行进的驱动构件，可绕安装在驱动构件上的轴旋转的致动杆，与扇形快门叶片控制杆互锁，在由曝光控制电路给出的曝光完成信号下不磁化的电磁体和操作闪光灯开关的电枢，并抵消扇形快门叶片控制杆和致动杆之间的接合当电磁铁不磁化时，a 电磁铁的取样被取消。

40. 发明授权

US4114174A Shutter opening and closing mechanism for cameras 失效
标题翻译：照相机开关和关闭机构
公开(公告)号：US4114174A
公开(公告)日：1978-09-12
申请号：US766745
申请日：1977-02-08
申请人： Eiichi Onda , Masanori Watanabe , Tadashi Nakagawa , Ichiro Nemoto , Mitsuo Koyama
发明人： Eiichi Onda , Masanori Watanabe , Tadashi Nakagawa , Ichiro Nemoto , Mitsuo Koyama
IPC分类号： G03B9/22 , G03B9/38
CPC分类号： G03B9/22
摘要： A shutter operating mechanism of a camera shutter which has an opening blade and a closing blade operated sequentially to open and close a shutter aperture for an exposure comprises an opening spring normally biasing the opening blade to move from a closed position in which the opening blade covers the shutter aperture to an open position in which the opening blade uncovers the shutter aperture; a second spring normally biasing the closing blade to move from a closed position in which the closing blade covers the shutter aperture to an open position in which the closing blade uncovers the shutter aperture; and a third spring normally biasing the closing blade to move from said open position to said closed position, the arrangement being such that when the shutter is charged, the opening blade and closing blade are in said closed position and when the shutter is released, the closing blade is moved under the bias of said second spring from said closed position to said open position, then the opening blade is moved under the bias of the opening spring from said closed position and to said open position, thereafter the closing blade is returned under the bias of said third spring from said open position to said closed position, thereby completing the exposure. The opening blade may then also be moved to closed position by a fourth spring.Furthermore, there are provided electrical contacts operated by the movement of the closing blade. When the closing blade is moved to uncover the aperture, the contacts are opened or closed and, after the exposure, are closed or opened again by returning movement of the closing blade to the first position.

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