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    • 37. 发明授权
    • Semiconductor device and method of forming compact coils for high performance filter
    • 用于形成高性能滤波器的紧凑型线圈的半导体器件和方法
    • US08111112B2
    • 2012-02-07
    • US12705790
    • 2010-02-15
    • Kai LiuRobert Charles Frye
    • Kai LiuRobert Charles Frye
    • H03H7/00H01H85/02H01L27/08
    • H03H7/09H01F17/0006H01F2017/0046H01F2017/0073H03H7/1708H03H7/1775Y10T29/4902
    • A semiconductor device has a first coil structure formed over the substrate. A second coil structure is formed over the substrate adjacent to the first coil structure. A third coil structure is formed over the substrate adjacent to the second coil structure. The first and second coil structures are coupled by mutual inductance, and the second and third coil structures are coupled by mutual inductance. The first, second, and third coil structures each have a height greater than a skin current depth of the coil structure defined as a depth which current reduces to 1/(complex permittivity) of a surface current value. In the case of copper, the coil structures have a height greater than 5 micrometers.The first, second, and third coil structures are arranged in rounded or polygonal pattern horizontally across the substrate with a substantially flat vertical profile.
    • 半导体器件具有形成在衬底上的第一线圈结构。 在与第一线圈结构相邻的衬底上形成第二线圈结构。 在与第二线圈结构相邻的衬底上形成第三线圈结构。 第一和第二线圈结构通过互感耦合,并且第二和第三线圈结构通过互感耦合。 第一,第二和第三线圈结构各自具有高于线圈结构的皮肤电流深度的高度,其被定义为电流减小到表面电流值的1 /(复数介电常数)的深度。 在铜的情况下,线圈结构的高度大于5微米。 第一,第二和第三线圈结构以基本上平坦的垂直轮廓横跨衬底水平布置成圆形或多边形图案。