会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 33. 发明授权
    • Signal transmitting device, transmitter and receiver
    • 信号发射装置,发射机和接收机
    • US08270836B2
    • 2012-09-18
    • US12637870
    • 2009-12-15
    • Yoshihide SatoKazuhiro SuzukiHidenori YamadaTomo Baba
    • Yoshihide SatoKazuhiro SuzukiHidenori YamadaTomo Baba
    • H04J14/02
    • G09G5/006H04B10/2504
    • A signal transmitting device includes a transmitter, a receiver, and four optical fibers. The transmitter includes a first electro-optical converter electro-optically converting original electrical red video signal into optical red video signal in original video signal, a second electro-optical converter electro-optically converting original electrical green video signal into optical green video signal a third electro-optical converter electro-optically converting original electrical blue video signal into optical blue video signal, a parallel/serial converter converting original electrical parallel signal having a lower transfer rate than a transfer rate of the original video signal into original electrical serial signal, and a fourth electro-optical converter electro-optically converting the original electrical serial signal transmitted from the parallel/serial converter into optical serial signal. The receiver includes a first optical-electro converter, a second optical-electro converter, a third optical-electro converter, a fourth optical-electro converter, a clock signal generator, and a serial/parallel converter.
    • 信号发送装置包括发送器,接收器和四个光纤。 发射机包括第一电光转换器,其将原始电红色视频信号电转换为原始视频信号中的光学红色视频信号,第二电光转换器将原始电气绿色视频信号电光转换为光学绿色视频信号,第三 电光转换器将原始电蓝色视频信号电光转换成蓝色蓝色视频信号,并行/串行转换器将具有比原始视频信号的传输速率低的传输速率的原始电气并行信号转换成原始电气串行信号,以及 将从并行/串行转换器发送的原始电气串行信号电光转换成光学串行信号的第四电光转换器。 接收机包括第一光电转换器,第二光电转换器,第三光电转换器,第四光电转换器,时钟信号发生器和串行/并行转换器。
    • 34. 发明授权
    • Information processing system that processes portions of an application program using programmable logic circuits
    • 使用可编程逻辑电路处理应用程序的部分的信息处理系统
    • US06336209B1
    • 2002-01-01
    • US09280681
    • 1999-03-29
    • Yoshio NishiharaYoshihide SatoNorikazu YamadaHiroyuki MiyakeEigo Nakagawa
    • Yoshio NishiharaYoshihide SatoNorikazu YamadaHiroyuki MiyakeEigo Nakagawa
    • G06F1750
    • G06F17/5054G06F15/7867
    • By reusing circuit information designed in the past, the amount of computation for combining circuit information for layout and wirings is significantly reduced. A memory part stores a plurality of pieces of circuit information for forming circuits in programmable logic circuits. Each of pieces of the circuit information has an identifier of its own circuit information, and in the case where part or all of the circuit information is formed with other circuit information, has the identifiers of the other circuit information as reference identifiers, as circuit data thereof. An acquisition part passes specification circuit information from an application program to an editing part, obtains circuit information of a specified circuit, sent from the editing part, and forms the specified circuit in the programmable logic circuits according to the circuit information. The editing part generates circuit information of a circuit specified by specification information from the acquisition part from circuit information of the specified circuit and other circuit information indicated by reference identifiers, obtained from the memory part.
    • 通过重用以往设计的电路信息,用于组合用于布局和布线的电路信息的计算量显着降低。 存储器部分存储用于在可编程逻辑电路中形成电路的多条电路信息。 电路信息中的每一个具有其自己的电路信息的标识符,并且在使用其他电路信息形成电路信息的一部分或全部的情况下,将其他电路信息的标识符作为参考标识符,作为电路数据 其中。 获取部件将规定电路信息从应用程序传递到编辑部分,获得从编辑部分发送的指定电路的电路信息,并根据电路信息在可编程逻辑电路中形成指定的电路。 编辑部分从存储部分获得的由指定电路的电路信息和由参考标识符指示的其他电路信息从获取部分指定的电路的电路信息生成。
    • 35. 发明授权
    • Washing liquid for post-polishing and polishing-cleaning method in
semiconductor process
    • 用于后抛光的洗涤液和半导体工艺中的抛光清洗方法
    • US5830280A
    • 1998-11-03
    • US818724
    • 1997-03-14
    • Yoshihide SatoTakayuki KomiyaHiroki Ohno
    • Yoshihide SatoTakayuki KomiyaHiroki Ohno
    • H01L21/02H01L21/304H01L21/306H01L21/308H01L21/321C03C23/00
    • H01L21/02074H01L21/3212
    • A polishing treatment called CMP (chemical mechanical polishing) is utilized for filling a contact hole formed in a silicon oxide film with a metallic layer in a manufacturing process of a semiconductor device. After a CMP treatment, a target surface, on which the silicon oxide film and the metallic layer are exposed, is washed with a washing liquid so as to remove residues due to the CMP treatment. The washing liquid comprises a fluorine compound for providing an etchant for the silicon oxide film and the metallic layer, and a protective agent which can be adhered onto a surface of the metallic layer so as to form a protective film. The ratio between the fluorine compound and the protective agent is set such that etching rates of the silicon oxide film and the metallic layer to be effected by the washing liquid fall within ranges of from 0.5 nm/min to 5 nm/min and from 0.5 nm/min to 6 nm/min, respectively, and a ratio between these etching rates falls within a range of from "2:1" to "1:3".
    • 在半导体器件的制造工艺中,利用称为CMP(化学机械抛光)的抛光处理来填充形成在具有金属层的氧化硅膜中的接触孔。 在CMP处理之后,用清洗液清洗其上露出氧化硅膜和金属层的目标表面,以便除去由CMP处理引起的残留物。 洗涤液包含用于提供氧化硅膜和金属层的蚀刻剂的氟化合物,以及可以粘附在金属层的表面上以形成保护膜的保护剂。 氟化合物和保护剂之间的比率设定为使得由洗涤液体进行的氧化硅膜和金属层的蚀刻速率在0.5nm / min至5nm / min和0.5nm的范围内 /分钟〜6nm /分钟,这些蚀刻速度之间的比例落入“2:1”至“1:3”的范围内。