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    • 34. 发明授权
    • Semiconductor integrated circuit device and method of manufacturing the same, and cell size calculation method for DRAM memory cells
    • 半导体集成电路器件及其制造方法,以及DRAM存储单元的单元尺寸计算方法
    • US06459113B1
    • 2002-10-01
    • US09760804
    • 2001-01-17
    • Toshinori MoriharaHiroki ShimanoKazutami Arimoto
    • Toshinori MoriharaHiroki ShimanoKazutami Arimoto
    • H01L27108
    • H01L27/10805H01L27/0207
    • There is provided a semiconductor integrated circuit device comprising: a field placement creating a field pattern in an array form by closest packing on a first conductance-type semiconductor substrate, the field pattern including a plurality of memory cells which define an active area and a device isolation region of a field effect transistor, and which are arranged in a predetermined pitch in the longitudinal and transverse directions, respectively, each memory cell having a pattern of a certain length-to-width size; a cell plate placement providing a capacitor structure between a second conductance-type diffusion region formed by an impurity implant to the active area and a cell plate electrode formed so as to cover part of the active area with a predetermined cell plate pattern through a capacitor dielectric, the cell plate pattern extending in the transverse direction with a certain length size; and a word line placement in which a word line pattern is arranged in the transverse direction of a vacant zone of the active area in which the cell plate electrode is not formed and serves as a gate electrode of the field effect transistor on the active area, the word line pattern being formed through a gate oxide at a predetermined interval, wherein the layout of a cell array of the memory cells is provided by a closest packing cell configuration.
    • 提供了一种半导体集成电路器件,包括:场放置,通过在第一导电型半导体衬底上的最密堆积产生阵列形式的场图案,场图案包括限定有源区域的多个存储单元和器件 隔离区域,并且分别以纵向和横向方向以预定间距布置,每个存储单元具有一定长度至宽度尺寸的图案; 在通过杂质注入形成的第二电导型扩散区域与有源区域之间提供电容器结构的单元板布置和通过电容器电介质以预定的单元板图案覆盖部分有源区域形成的单元板电极 ,细胞板图案以一定的长度尺寸在横向上延伸; 以及字线图案,其中在没有形成单元板电极的有源区域的空白区域的横向上布置字线图案,并且用作有源区域上的场效应晶体管的栅电极, 所述字线图案是以预定间隔通过栅极氧化物形成的,其中所述存储单元的单元阵列的布局由最接近的封装单元配置提供。
    • 40. 发明授权
    • Solid-state image sensor device and differential interface thereof
    • 固态图像传感器装置及其差分接口
    • US08462251B2
    • 2013-06-11
    • US13542431
    • 2012-07-05
    • Hiroki Shimano
    • Hiroki Shimano
    • H04N5/335
    • H04N5/3745H04N5/3577H04N5/3698H04N5/378
    • A solid-state image sensor device comprises an image sensor section for outputting analog signals of an image being taken; a plurality of AD converter sections, arranged with respect to the column direction of the image sensor section, for converting the analog signals into digital signals; a drive circuit section for controlling the image sensor section and the AD converter sections; and a plurality of differential interface sections for transmitting the digital signals converted by the AD converter sections as differential output signals to an external device. Each of the differential interface sections comprises a current value changeover circuit and offset voltage holding circuit operative when an operation mode changeover is made.
    • 固态图像传感器装置包括用于输出正在拍摄的图像的模拟信号的图像传感器部分; 多个AD转换器部分,相对于图像传感器部分的列方向布置,用于将模拟信号转换成数字信号; 用于控制图像传感器部分和AD转换器部分的驱动电路部分; 以及多个差分接口部分,用于将由AD转换器部分转换的数字信号作为差分输出信号发送到外部设备。 每个差分接口部分包括当进行操作模式切换时可操作的电流值转换电路和失调电压保持电路。