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31. 发明授权

US08900659B2 Metal nanowires, nanomesh, and a method of fabrication 有权
标题翻译：金属纳米线，纳米线和制造方法
公开(公告)号：US08900659B2
公开(公告)日：2014-12-02
申请号：US13811259
申请日：2011-07-19
申请人： Hua Chun Zeng , Shengmao Zhang , Yu Chang , Mei Ling Lye
发明人： Hua Chun Zeng , Shengmao Zhang , Yu Chang , Mei Ling Lye
IPC分类号： B05D7/00 , H01B5/00 , D01F9/08 , B05D3/00 , B05D5/12 , B32B15/14 , B32B37/02 , H01B1/16 , B22F1/00 , B22F1/02 , B22F3/00 , B22F9/24
CPC分类号： D01F9/08 , B05D3/207 , B05D5/12 , B22F1/0025 , B22F1/025 , B22F3/002 , B22F9/24 , B32B15/14 , B32B37/02 , B82Y30/00 , H01B1/16 , Y10T428/12528 , Y10T428/12569 , Y10T428/12903
摘要： The present invention relates to a method of forming copper nanowires with a metallic coating. In a preferred embodiment, the metallic coating is copper. Due to the metal coating, the nanowires become magnetically guidable and chemically stable. As such, the nanowires can be used to form nanomesh. Further, the nanowire and nanomesh of the present invention can be used as transparent electrodes that are used in TV, PC, touch-control, and solar industries.
摘要翻译：本发明涉及一种用金属涂层形成铜纳米线的方法。在优选实施例中，金属涂层是铜。由于金属涂层，纳米线变得磁性引导和化学稳定。因此，纳米线可用于形成纳米线。此外，本发明的纳米线和纳米线可以用作TV，PC，触摸控制和太阳能工业中使用的透明电极。

32. 发明授权

US08721847B2 Homing of arbitrary scan path of a rotating magnetron 有权
标题翻译：回旋磁控管的任意扫描路径
公开(公告)号：US08721847B2
公开(公告)日：2014-05-13
申请号：US13347030
申请日：2012-01-10
申请人： Yu Chang , William Kuang , Ronald D. DeDore , Jitendra R. Bhimjiyani , Wesley W. Zhang
发明人： Yu Chang , William Kuang , Ronald D. DeDore , Jitendra R. Bhimjiyani , Wesley W. Zhang
IPC分类号： C23C14/35
CPC分类号： C23C14/35 , C23C14/54 , H01J37/3408 , H01J37/3455
摘要： A control system and method for controlling two motors determining the azimuthal and circumferential position of a magnetron rotating about the central axis of the sputter chamber in back of its target sputtering and capable of a nearly arbitrary scan path, e.g., with a planetary gear mechanism. A system controller periodically sends commands to the motion controller which closely controls the motors. Each command includes a command ticket, which may be one of several values. The motion controller accepts only commands having a command ticket of a different value from the immediately preceding command. One command selects a scan profile stored in the motion controller, which calculates motor signals from the selected profile. Another command instructs a dynamic homing command which interrogates sensors of the position of two rotating arms to determine if the arms in the expected positions. If not, the arms are rehomed.
摘要翻译：一种用于控制两个电动机的控制系统和方法，所述两个电动机确定围绕其目标溅射背面的溅射室的中心轴线旋转的磁控管的方位角和圆周位置，并且能够以几乎任意的扫描路径，例如用行星齿轮机构。系统控制器周期性地向控制电机的运动控制器发送命令。每个命令包括一个命令票证，它可以是几个值之一。运动控制器仅接受具有与前一个命令不同的命令票证的命令。一个命令选择存储在运动控制器中的扫描轮廓，其从所选轮廓计算马达信号。另一个命令指示动态归位命令，其询问两个旋转臂的位置的传感器以确定臂在预期位置。如果没有，武器被重新安置。

33. 发明申请

US20090111280A1 METHOD FOR REMOVING OXIDES 审中-公开
标题翻译：去除氧化物的方法
公开(公告)号：US20090111280A1
公开(公告)日：2009-04-30
申请号：US12328466
申请日：2008-12-04
申请人： Chien-Teh Kao , Jing-Pei (Connie) Chou , Chiukin (Steven) Lai , Sal Umotoy , Joel M. Huston , Son Trinh , Mei Chang , Xiaoxiong (John) Yuan , Yu Chang , Xinliang Lu , Wei W. Wang , See-Eng Phan
发明人： Chien-Teh Kao , Jing-Pei (Connie) Chou , Chiukin (Steven) Lai , Sal Umotoy , Joel M. Huston , Son Trinh , Mei Chang , Xiaoxiong (John) Yuan , Yu Chang , Xinliang Lu , Wei W. Wang , See-Eng Phan
IPC分类号： H01L21/31
CPC分类号： H01L21/02104 , C23C14/022 , C23C14/50 , C23C14/541 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/32568 , H01J37/32862 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L2924/0002 , H01L2924/00
摘要： A method for removing native oxides from a substrate surface is provided. In one embodiment, the method comprises positioning a substrate having an oxide layer into a processing chamber, generating a plasma of a reactive species from a gas mixture within the processing chamber, exposing the substrate to the reactive species while forming a volatile film on the substrate and maintaining the substrate at a temperature below 65° C., heating the substrate to a temperature of at least about 75° C. to vaporize the volatile film and remove the oxide layer, and depositing a first layer on the substrate after heating the substrate.
摘要翻译：提供了从衬底表面去除天然氧化物的方法。在一个实施例中，该方法包括将具有氧化物层的衬底定位到处理室中，从处理室内的气体混合物产生反应物质的等离子体，将衬底暴露于反应性物质，同时在衬底上形成挥发性膜并将衬底保持在低于65℃的温度下，将衬底加热到至少约75℃的温度以蒸发挥发性膜并去除氧化物层，并且在加热衬底之后在衬底上沉积第一层。

34. 发明申请

US20080268645A1 METHOD FOR FRONT END OF LINE FABRICATION 有权
标题翻译：前线制造方法
公开(公告)号：US20080268645A1
公开(公告)日：2008-10-30
申请号：US12134715
申请日：2008-06-06
申请人： CHIEN-TEH KAO , Jing-Pei (Connie) Chou , Chiukin (Steven) Lai , Sal Umotoy , Joel M. Huston , Son Trinh , Mei Chang , Xiaoxiong (John) Yuan , Yu Chang , Xinliang Lu , Wei W. Wang , See-Eng Phan
发明人： CHIEN-TEH KAO , Jing-Pei (Connie) Chou , Chiukin (Steven) Lai , Sal Umotoy , Joel M. Huston , Son Trinh , Mei Chang , Xiaoxiong (John) Yuan , Yu Chang , Xinliang Lu , Wei W. Wang , See-Eng Phan
IPC分类号： H01L21/311
CPC分类号： H01L21/02104 , C23C14/022 , C23C14/50 , C23C14/541 , H01J37/32082 , H01J37/32357 , H01J37/3244 , H01J37/32522 , H01J37/32541 , H01J37/32568 , H01J37/32862 , H01J2237/2001 , H01L21/67069 , H01L21/67109 , H01L2924/0002 , H01L2924/00
摘要： In one embodiment, a method for removing native oxides from a substrate surface is provided which includes supporting a substrate containing silicon oxide within a processing chamber, generating a plasma of reactive species from a gas mixture within the processing chamber, cooling the substrate to a first temperature of less than about 65° C. within the processing chamber, and directing the reactive species to the cooled substrate to react with the silicon oxide thereon while forming a film on the substrate. The film usually contains ammonium hexafluorosilicate. The method further provides positioning the substrate in close proximity to a gas distribution plate, and heating the substrate to a second temperature of about 100° C. or greater within the processing chamber to sublimate or remove the film. The gas mixture may contain ammonia, nitrogen trifluoride, and a carrier gas.
摘要翻译：在一个实施例中，提供了从衬底表面去除天然氧化物的方法，其包括在处理室内支撑含有氧化硅的衬底，从处理室内的气体混合物产生反应物质的等离子体，将衬底冷却至第一在处理室内温度小于约65℃，并且将反应性物质引导到冷却的基底以与其上的氧化硅反应，同时在基底上形成膜。该膜通常含有六氟硅酸铵。该方法进一步提供将衬底定位在紧邻气体分配板的位置，并将衬底加热至处理室内约100℃或更高的第二温度以升华或去除膜。气体混合物可以含有氨，三氟化氮和载气。

35. 发明申请

US20060130971A1 Apparatus for generating plasma by RF power 审中-公开
标题翻译：用于通过RF功率产生等离子体的装置
公开(公告)号：US20060130971A1
公开(公告)日：2006-06-22
申请号：US11137200
申请日：2005-05-24
申请人： Yu Chang , Gwo-Chuan Tzu , Salvador Umotoy , Chien-Teh Kao , William Kuang , Xiaoxiong Yuan , Mei Chang
发明人： Yu Chang , Gwo-Chuan Tzu , Salvador Umotoy , Chien-Teh Kao , William Kuang , Xiaoxiong Yuan , Mei Chang
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01L21/31116 , H01J37/32082 , H01J37/32357 , H01J37/32541 , H01L21/28247 , H01L21/67069 , H01L29/665
摘要： A method and apparatus for processing a substrate is provided. In one aspect, the chamber comprises a chamber body and a support assembly at least partially disposed within the chamber body adapted to support a substrate thereon. The chamber further comprises a lid assembly disposed on an upper surface of the chamber body. The lid assembly includes a top plate and a gas delivery assembly which define a plasma cavity therebetween, wherein the gas delivery assembly is adapted to heat the substrate. A remote plasma source having a U-shaped plasma region is connected to the gas delivery assembly.
摘要翻译：提供了一种用于处理衬底的方法和设备。在一个方面，所述腔室包括室主体和至少部分地设置在所述腔体内的适于在其上支撑衬底的支撑组件。所述室还包括设置在所述室主体的上表面上的盖组件。盖组件包括顶板和在其间限定等离子体腔的气体输送组件，其中气体输送组件适于加热衬底。具有U形等离子体区域的远程等离子体源连接到气体输送组件。

36. 发明申请

US20050155531A1 Table having solidly securing structure 审中-公开
标题翻译：表具有牢固的固定结构
公开(公告)号：US20050155531A1
公开(公告)日：2005-07-21
申请号：US10760936
申请日：2004-01-16
申请人： Yu Chang
发明人： Yu Chang
IPC分类号： A47B3/00 , A47B3/091
CPC分类号： A47B3/0911
摘要： A table includes a table top having one or more walls and one or more apertures formed in each of two sides, a foot support includes two beams attached to the sides of the table top and each having a flap engaged into the apertures of the table top The walls of the table top are disposed between the beams and the flaps, and a number of fasteners are engaged through the beams and the walls of the table top and the flaps of the beam, to solidly secure the beams to the table top. The engagement of the flaps of the beams into the table top may solidly anchor or secure the beams and thus the foot support to the table top.
摘要翻译：桌子包括具有一个或多个壁的桌面和在两侧中的每一侧形成的一个或多个孔，脚支撑件包括附接到台面的侧面的两个梁，并且每个具有接合到台面的孔中的挡板桌面的墙壁设置在梁和襟翼之间，并且许多紧固件通过梁和台面的壁和梁的襟翼接合，以将梁牢固地固定到台面上。梁的折板与桌面的接合可以牢固地固定或固定梁，从而将脚支撑固定到台面上。

37. 发明授权

US06646235B2 Multi-zone resistive heater 失效
公开(公告)号：US06646235B2
公开(公告)日：2003-11-11
申请号：US10037151
申请日：2001-10-19
申请人： Steven Aihua Chen , Henry Ho , Michael X. Yang , Bruce W. Peuse , Karl Littau , Yu Chang
发明人： Steven Aihua Chen , Henry Ho , Michael X. Yang , Bruce W. Peuse , Karl Littau , Yu Chang
IPC分类号： H05B368
CPC分类号： H01L21/67103
摘要： A heating apparatus including a stage comprising a surface having an area to support a wafer and a body, a shaft coupled to the stage, and a first and a second heating element. The first heating element is disposed within a first plane of the body of the stage. The second heating element is disposed within a second plane of the body of the stage at a greater distance from the surface of the stage than the first heating element. A reactor comprising a chamber, a resistive heater, a first temperature sensor, and a second temperature sensor. A resistive heating system for a chemical vapor deposition apparatus comprising a resistive heater. A method of controlling the temperature in a reactor comprising providing a resistive heater in a chamber of a reactor, measuring the temperature with at least two temperature sensors, and controlling the temperature in the reactor by regulating a power supply to the first heating element and the second heating element according to the temperature measured by the first temperature sensor and the second temperature sensor.

38. 发明授权

US6156079A Window support member for a semiconductor processing system 失效
标题翻译：用于半导体处理系统的窗口支撑构件
公开(公告)号：US6156079A
公开(公告)日：2000-12-05
申请号：US176648
申请日：1998-10-21
申请人： Henry Ho , Yu Chang , Kuo-Chun Wu , Steven A. Chen
发明人： Henry Ho , Yu Chang , Kuo-Chun Wu , Steven A. Chen
IPC分类号： H01L21/00 , H05B3/00 , C23C16/00 , F26B19/00 , F27D11/00 , H01L21/64
CPC分类号： H01L21/67115 , H05B3/0047 , Y10T29/41
摘要： A semiconductor processing system includes a semiconductor processing chamber constructed of a main body, a window support member, and a window. The window support member is located over an opening into the main body. The window is located over the window support component. At least one radiation passage is formed in the window support component. The radiation passage has a first end which is open to the internal dimensions of the main body and a second end, opposing the first end, which terminates against the window.
摘要翻译：半导体处理系统包括由主体，窗户支撑构件和窗构成的半导体处理室。窗口支撑构件位于主体的开口的上方。窗口位于窗口支撑组件的上方。至少一个辐射通道形成在窗户支撑部件中。辐射通道具有对主体的内部尺寸敞开的第一端和与第一端相对的第二端，该第二端终止于窗口。

39. 发明授权

US09150602B2 Precursor used for labeling hepatorcyte receptor and containing trisaccharide and diamide demercaptide ligand, method for preparing the same, radiotracer and pharmaceutical composition of the same 有权
标题翻译：用于标记肝细胞受体并含有三糖和二酰胺十氯过硫酸配体的前体，其制备方法，放射性示踪剂及其药物组合物
公开(公告)号：US09150602B2
公开(公告)日：2015-10-06
申请号：US13556486
申请日：2012-07-24
申请人： Show-Wen Liu , Yu Chang , Cheng-Fang Hsu , Ming-Che Tsai , Tsung-Hsien Chiang , Yueh-Feng Deng , Kuei-Lin Lu , Chih-Yuan Lin , Da-Ming Wang , Ching-Yun Li
发明人： Show-Wen Liu , Yu Chang , Cheng-Fang Hsu , Ming-Che Tsai , Tsung-Hsien Chiang , Yueh-Feng Deng , Kuei-Lin Lu , Chih-Yuan Lin , Da-Ming Wang , Ching-Yun Li
IPC分类号： C07H15/18 , C07H1/00
CPC分类号： C07H15/18 , C07H1/00
摘要： A precursor used for labeling hepatocyte receptors and applied to radiotracers for imaging or pharmaceutical compositions for liver cancers is revealed. The precursor is a bifunctional compound. The bifunctional group includes a trisaccharide structure and a diamide dimercaptide (N2S2) ligand. The trisaccharide has high affinity to asialoglycoprotein receptors (ASGPR) on surfaces of hepatocytes while N2S2 ligand reacts with radioisotopes to form neutral complexes. Thus the precursor stays on surfaces of hepatocytes to provide radioisotope labeling or treatment effect of liver cancers.
摘要翻译：用于标记肝细胞受体并应用于放射性示踪剂以用于肝癌成像的前体或用于肝癌的药物组合物。前体是双官能化合物。双官能团包括三糖结构和二酰胺二硫醇（N 2 S 2）配体。三糖对肝细胞表面的脱唾液酸糖蛋白受体（ASGPR）具有高亲和力，而N2S2配体与放射性同位素反应形成中性复合物。因此，前体停留在肝细胞的表面，以提供肝癌的放射性同位素标记或治疗效果。

40. 发明授权

US09045513B2 Method for preparing precursor used for labeling hepatocyte receptor and containing trisaccharide and DTPA ligand 有权
标题翻译：制备用于标记肝细胞受体并含有三糖和DTPA配体的前体的方法
公开(公告)号：US09045513B2
公开(公告)日：2015-06-02
申请号：US13571731
申请日：2012-08-10
申请人： Chih-Yuan Lin , Yu Chang , Jen-Tsung Wang , Cheng-Fang Hsu , Wei-Ti Kuo , Hung-Wen Yu , Wuu-Jyh Lin , Mei-Hui Wang
发明人： Chih-Yuan Lin , Yu Chang , Jen-Tsung Wang , Cheng-Fang Hsu , Wei-Ti Kuo , Hung-Wen Yu , Wuu-Jyh Lin , Mei-Hui Wang
IPC分类号： C07H15/04 , C07H1/06 , C07K1/13
CPC分类号： C07H1/06 , C07H15/04 , C07K1/13
摘要： A method for preparing a precursor used to label hepatocyte receptors is revealed. The precursor contains a bifunctional structure including trisaccharide and DTPA ligand. During synthesis processes of the precursor, silica gel columns and Reverse phase-18 (RP-18) columns are used for purification. Thus both the purification times and cost of each purification are reduced. Moreover, use diethyl ether to facilitate precipitation of products and remove a part of coupling reagent. Removing the coupling reagent helps purification of products. Furthermore, Nα,Nα-bis(carboxymethyl)-L-lysine hydrate and benzyl chloroformate are coupled to form a trisaccharide skeleton so as to ensure the yield rate of trisaccharide structure.
摘要翻译：揭示了制备用于标记肝细胞受体的前体的方法。该前体含有包括三糖和DTPA配体的双功能结构。在前体的合成过程中，使用硅胶柱和反相18（RP-18）柱进行纯化。因此，每次纯化的纯化时间和成本均降低。此外，使用乙醚促进产物沉淀并除去一部分偶联剂。去除偶联剂有助于净化产品。此外，Nα，Nα-双（羧甲基）-L-赖氨酸水合物和氯甲酸苄酯偶联形成三糖骨架，以确保三糖结构的产率。

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