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31. 发明授权

US09791776B2 Resist composition and method for producing resist pattern 有权
公开(公告)号：US09791776B2
公开(公告)日：2017-10-17
申请号：US13441032
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Yuichi Mukai
发明人： Koji Ichikawa , Takahiro Yasue , Yuichi Mukai
IPC分类号： G03F7/039 , G03F7/004 , G03F7/09 , G03F7/029 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/029 , G03F7/0392 , G03F7/0397 , G03F7/092 , G03F7/2041
摘要： A resist composition contains (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1 and R2, m and n, R3 and R4, X1, R5 and Z1+ are defined in the specification.

32. 发明授权

US09176379B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09176379B2
公开(公告)日：2015-11-03
申请号：US13441205
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
发明人： Koji Ichikawa , Takahiro Yasue , Tatsuro Masuyama
IPC分类号： G03F7/004 , G03F7/027 , G03F7/20 , G03F7/039
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/027 , G03F7/0397 , G03F7/20 , G03F7/2041
摘要： A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用可溶于碱性水溶液中，（B）具有要通过碱性显影剂，和（C）由式（I）表示的化合物，其中R1和R2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2 C7酰氧基，C2〜C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

33. 发明授权

US09176378B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09176378B2
公开(公告)日：2015-11-03
申请号：US13441185
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
发明人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition of the invention includes: (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator represented by the formula (II), and (D) a compound represented by the formula (I), wherein R1, R2, m, n, Q1, Q2, L1, ring W1 and Z+ are defined in the specification.
摘要翻译：本发明的抗蚀剂组合物包括：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸作用而溶于碱性水溶液中的树脂，（B）由式（II）表示的酸发生剂）和（D）由式（I）表示的化合物，其中R1，R2，m，n，Q1，Q2，L1，环W1和Z +在说明书中定义。

34. 发明授权

US09128373B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09128373B2
公开(公告)日：2015-09-08
申请号：US13441035
申请日：2012-04-06
申请人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
发明人： Koji Ichikawa , Takahiro Yasue , Satoshi Yamaguchi
IPC分类号： G03F7/004 , G03F7/039 , G03F7/20
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0397 , G03F7/2041
摘要： A resist composition includes; (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having an acid-labile group; and (D) a compound represented by the formula (I), wherein R1 and R2 in each occurrence independently represent a C1 to C12 hydrocarbon group, a C1 to C6 alkoxyl group, a C2 to C7 acyl group, a C2 to C7 acyloxy group, a C2 to C7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.
摘要翻译：抗蚀剂组合物包括：（A）在碱性水溶液中不溶或难溶的树脂，但是通过酸的作用变得可溶于碱性水溶液，（B）具有酸不稳定基团的酸发生剂; 和（D）式（I）表示的化合物，其中R 1和R 2各自独立地表示C1〜C12烃基，C1〜C6烷氧基，C2〜C7酰基，C2〜C7酰氧基 C2-C7烷氧基羰基，硝基或卤素原子; m和n独立地表示0〜4的整数。

35. 发明授权

US09052591B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US09052591B2
公开(公告)日：2015-06-09
申请号：US13552281
申请日：2012-07-18
申请人： Koji Ichikawa , Takahiro Yasue
发明人： Koji Ichikawa , Takahiro Yasue
IPC分类号： G03F7/039 , G03F7/004 , G03F7/20
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, A13, A14, X12, R3, R4, m′ and n′ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，A13，A14，X12，R3，R4，m'和n'在说明书中定义。

36. 发明授权

US08852846B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08852846B2
公开(公告)日：2014-10-07
申请号：US13439478
申请日：2012-04-04
申请人： Yukako Anryu , Koji Ichikawa
发明人： Yukako Anryu , Koji Ichikawa
IPC分类号： G03F7/004 , G03F7/38 , C07C303/32 , C07D277/06 , C07D279/06 , C07D281/06 , C07D295/06 , C07D279/12 , C07D303/32 , G03F7/039 , G03F7/20
CPC分类号： C07D279/12 , C07C303/32 , C07D277/06 , C07D279/06 , C07D281/06 , C07D295/06 , C07D303/32 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041 , Y10S430/121 , Y10S430/123
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C20 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, W represents a group represented by the formula (W1), (W2), (W3), (W4) or (W5): and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C20二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，W表示由式（W1），（W2），（W3），（W4）或（W5）表示的基团：Z +表示有机抗衡离子。

37. 发明授权

US08741543B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08741543B2
公开(公告)日：2014-06-03
申请号：US13551874
申请日：2012-07-18
申请人： Koji Ichikawa , Satoshi Yamaguchi , Yuki Suzuki
发明人： Koji Ichikawa , Satoshi Yamaguchi , Yuki Suzuki
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator having an acid labile group, wherein R1, A1, A13, A14, X12 are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂和具有酸不稳定基团的酸产生剂，其中R1，A1，A13，A14，X12在说明书中定义。

38. 发明授权

US08663899B2 Resist composition and method for producing resist pattern 有权
标题翻译：抗蚀剂组合物和抗蚀剂图案的制造方法
公开(公告)号：US08663899B2
公开(公告)日：2014-03-04
申请号：US13551855
申请日：2012-07-18
申请人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
发明人： Koji Ichikawa , Takashi Hiraoka , Hiromu Sakamoto
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/2041
摘要： A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), and an acid generator, wherein R1, A1, R2, Rb1, Rb2, Lb1, ring Wb1, Rb3, Rb4, and Z1+ are defined in the specification.
摘要翻译：一种抗蚀剂组合物，其具有由式（I）表示的结构单元的树脂，树脂在碱性水溶液中不溶或难溶，但通过酸而不溶于碱性水溶液，不包括结构单元由式（I）表示的酸产生剂，其中R1，A1，R2，Rb1，Rb2，Lb1，环Wb1，Rb3，Rb4和Z1 +在本说明书中定义。

39. 发明授权

US08557500B2 Salt and photoresist composition comprising the same 有权
标题翻译：包含其的盐和光致抗蚀剂组合物
公开(公告)号：US08557500B2
公开(公告)日：2013-10-15
申请号：US13406634
申请日：2012-02-28
申请人： Koji Ichikawa , Hiromu Sakamoto , Takahiro Yasue
发明人： Koji Ichikawa , Hiromu Sakamoto , Takahiro Yasue
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C07C309/17 , C07C25/18 , C07C309/12 , C07C381/12 , C07C2603/74 , C07D303/16 , C07D305/06 , C07D307/33 , C07D307/77 , C07D327/04 , C07D333/46 , C07D497/18 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.
摘要翻译：本发明提供由式（I）表示的盐：其中Q1和Q2独立地表示氟原子或C1-C6全氟烷基，L1表示C1-C17二价饱和烃基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，L 2表示单键或C 1 -C 6烷二基，其中一个或多个-CH 2 - 可以被-O-或-CO-代替，Y代表C3-C18 可以具有一个或多个取代基的脂环族烃基，脂环族烃基中的一个或多个-CH 2 - 可以被-O - ， - CO-或-SO 2 - 代替，Z +代表有机抗衡离子。

40. 发明授权

US08481243B2 Resin and photoresist composition comprising the same 有权
标题翻译：树脂和包含其的光致抗蚀剂组合物
公开(公告)号：US08481243B2
公开(公告)日：2013-07-09
申请号：US13345941
申请日：2012-01-09
申请人： Hyungjoo Kim , Akira Kamabuchi , Koji Ichikawa
发明人： Hyungjoo Kim , Akira Kamabuchi , Koji Ichikawa
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： C08F20/38 , C07D327/04 , C08F228/06 , G03F7/0045 , G03F7/0046 , G03F7/0397
摘要： The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10X10-A11sX11-A12- (a-1) wherein X10 and X11 each independently represents —O—, —NH—, —CO—, —CO—O—, —O—CO—, —CO—NH— or —NH—CO—, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or —CO—.
摘要翻译：本发明提供一种树脂，其包含由式（aa）表示的结构单元：其中R 1表示任选具有一个或多个卤素原子，氢原子或卤素原子的C 1 -C 6烷基，T 1表示C 4 -C 34磺内酯任选具有一个或多个取代基的环基，Z1表示任选具有一个或多个取代基的C1-C6烷二基或由式（a-1）表示的基团：-A10X10-A11sX11-A12-（a-1）其中 X10和X11各自独立地表示-O-，-NH-，-CO-，-CO-O-，-O-CO-，-CO-NH-或-NH-CO-，A10，A11和A12各自独立地表示任选具有一个或多个取代基的C 1 -C 5二价脂族烃基，s表示0或1，Z 2表示单键或-CO-。

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