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31. 发明申请

US20070090674A1 Vehicle seat apparatus 有权
标题翻译：汽车座椅装置
公开(公告)号：US20070090674A1
公开(公告)日：2007-04-26
申请号：US11582405
申请日：2006-10-18
申请人： Yukie Miyauchi , Naoki Niimi , Kenji Maeda
发明人： Yukie Miyauchi , Naoki Niimi , Kenji Maeda
IPC分类号： B60N2/48
CPC分类号： B60N2/20 , B60N2/0881 , B60N2/12
摘要： A vehicle seat apparatus includes a lower arm, an upper arm being rotatable relative to the lower arm in a front-rear direction of a vehicle seat, a pressing member fixed at the upper arm, a base member fixed at the lower arm, a first link supported by the base member so as to be rotatable and having a stopper pin positioned on a rotation path of the pressing member when a walk-in operation is performed and positioned out of the rotation path of the pressing member when a tilt-down operation is performed; and a second link rotatably supported by the first link and maintaining the stopper pin so as to be one of on and out of the rotation path of the pressing member, the second link being provided in a manner where a rotational axis thereof is coaxial to a central axis of the stopper pin.
摘要翻译：车辆座椅装置包括下臂，上臂可相对于下臂在车辆座椅的前后方向上旋转，固定在上臂的按压构件，固定在下臂的基座构件，第一连杆，其被支撑在所述基座部件上，以便当从所述按压部件的旋转路径进行倾斜操作时，所述止动销位于所述按压部件的旋转路径上，所述止动销位于所述按压部件的旋转路径上，被执行以及由所述第一连杆可旋转地支撑并且将所述止动销保持为所述按压构件的旋转路径的一个之一的第二连杆，所述第二连杆以其旋转轴线与所述按压构件的同轴方式设置止动销的中心轴。

32. 发明申请

US20070086945A1 PREPARATIONS FOR DIAGNOSIS OF PANCREATIC EXOCRINE FUNCTION 失效
标题翻译：诊断胰腺功能的准备
公开(公告)号：US20070086945A1
公开(公告)日：2007-04-19
申请号：US11565514
申请日：2006-11-30
申请人： Asuka ITO , Tadashi Kohno , Isaburo Hosoi , Junko Hirayama , Kunihiko Shibata , Kenji Maeda
发明人： Asuka ITO , Tadashi Kohno , Isaburo Hosoi , Junko Hirayama , Kunihiko Shibata , Kenji Maeda
IPC分类号： A61K49/00 , A61K38/54
CPC分类号： A61K49/0043 , A61K49/00 , A61K49/0004 , A61K49/006 , A61K49/1815
摘要： A preparation for the diagnosis of pancreatic exocrine function by determining the amount in which a substance administered to a subject or a degradation product or metabolite thereof migrates into the blood and/or is excreted out of the body, wherein the substance is carried by a carrier and released from the carrier when exposed to the action of a pancreatic exocrine function-related factor.
摘要翻译：一种胰腺外分泌功能的诊断准备，其通过确定给予受试者或其降解产物或代谢物的物质迁移到血液中和/或从体外排出的量，其中所述物质由载体携带并且当暴露于胰腺外分泌功能相关因子的作用时从载体释放。

33. 发明申请

US20060169410A1 Plasma processing apparatus capable of controlling plasma emission intensity 审中-公开
标题翻译：能够控制等离子体发射强度的等离子体处理装置
公开(公告)号：US20060169410A1
公开(公告)日：2006-08-03
申请号：US11065078
申请日：2005-02-25
申请人： Kenji Maeda , Kenetsu Yokogawa , Tadamitsu Kanekiyo
发明人： Kenji Maeda , Kenetsu Yokogawa , Tadamitsu Kanekiyo
IPC分类号： C23F1/00
CPC分类号： H01J37/32935 , H01J37/32082 , H01J2237/3341
摘要： An antenna electrode having a substantially circular shape, is arranged on a plane of a processing vessel, which is located opposite to a stage for mounting a sample within the processing vessel, and positioned parallel to the stage. An emission monitor monitors emission intensity of plasma present in at least 3 different points along a radial direction of the antenna electrode. A control unit adjusts an energizing current supplied to an external coil for forming a magnetic field within the processing vessel. The control unit adjusts the energizing current supplied to the external coil based upon the monitoring result obtained from the emission monitor so as to control the emission intensity of the plasma to become uniform emission intensity.
摘要翻译：具有大致圆形形状的天线电极被布置在处理容器的平面上，该处理容器的平面位于与用于将样品安装在处理容器内并平行于平台的台的相对的位置。发射监视器监视沿着天线电极的径向至少3个不同点存在的等离子体的发射强度。控制单元调节提供给外部线圈的激励电流，以在处理容器内形成磁场。控制单元基于从发射监视器获得的监视结果来调节供给外部线圈的通电电流，以控制等离子体的发射强度变为均匀的发射强度。

34. 发明授权

US07036915B2 Composition for forming piezoelectric film, producing method for piezoelectric film, piezoelectric element and ink jet recording head 有权
标题翻译：用于形成压电膜的组合物，压电膜制造方法，压电元件和喷墨记录头
公开(公告)号：US07036915B2
公开(公告)日：2006-05-02
申请号：US10665571
申请日：2003-09-22
申请人： Shinji Eritate , Motokazu Kobayashi , Makoto Kubota , Fumio Uchida , Chiemi Shimizu , Kenji Maeda
发明人： Shinji Eritate , Motokazu Kobayashi , Makoto Kubota , Fumio Uchida , Chiemi Shimizu , Kenji Maeda
IPC分类号： B41J2/045
CPC分类号： B41J2/161 , B41J2/1645 , B41J2/1646 , C23C18/08 , C23C18/1204 , H01L41/1876 , H01L41/318
摘要： A composition for forming a piezoelectric film containing a dispersoid obtained from a metallic compound includes at least one of 1,8-diazabicyclo[5.4.0]-7-undecene, 1,5-diazabicyclo[4.3.0]non-5-ene, and 1,4-diazabicyclo[2.2.2]octane.
摘要翻译：用于形成含有由金属化合物获得的分散质的压电膜的组合物包括1,8-二氮杂双环[5.4.0] -7-十一碳烯，1,5-二氮杂双环[4.3.0]壬-5-烯中的至少一种和1,4-二氮杂双环[2.2.2]辛烷。

35. 发明申请

US20050121761A1 Semiconductor device and method for fabricating the same 有权
公开(公告)号：US20050121761A1
公开(公告)日：2005-06-09
申请号：US11035986
申请日：2005-01-18
申请人： Kenji Maeda , Takashi Takata , Takao Ochi , Hiroki Naraoka , Takeshi Kawabata , Yoshiyuki Arai , Shigeru Nonoyama , Hajime Homma
发明人： Kenji Maeda , Takashi Takata , Takao Ochi , Hiroki Naraoka , Takeshi Kawabata , Yoshiyuki Arai , Shigeru Nonoyama , Hajime Homma
IPC分类号： H01L23/12 , H01L21/56 , H01L21/98 , H01L23/29 , H01L23/31 , H01L25/065 , H01L25/07 , H01L25/18 , H05K1/18 , H01L23/02
CPC分类号： H05K1/186 , H01L24/81 , H01L24/83 , H01L24/97 , H01L25/0652 , H01L25/0657 , H01L25/50 , H01L2224/1134 , H01L2224/131 , H01L2224/13144 , H01L2224/13155 , H01L2224/16225 , H01L2224/2919 , H01L2224/32225 , H01L2224/73204 , H01L2224/81191 , H01L2224/83101 , H01L2224/83102 , H01L2224/83192 , H01L2224/92125 , H01L2224/97 , H01L2924/00013 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/0665 , H01L2924/15787 , H01L2924/18161 , H01L2924/19041 , H01L2924/19043 , H01L2924/3511 , H01L2224/81 , H01L2224/83 , H01L2924/00014 , H01L2224/13099 , H01L2924/00 , H01L2924/00012
摘要： A semiconductor chip is mounted on a first surface of a substrate, the substrate having wiring formed on the first surface, so that a circuit formation surface of the semiconductor chip faces the first surface of the substrate and that electrodes provided on the circuit formation surface are connected with the wiring. A sealing resin layer is then formed on the first surface of the substrate to cover the semiconductor chip. The sealing resin layer and the semiconductor chip are ground starting from a surface opposite to the circuit formation surface to thin the semiconductor chip.

36. 发明授权

US06879385B2 Nondestructive reading method for isotopic label 失效
标题翻译：同位素标签的非破坏性阅读方法
公开(公告)号：US06879385B2
公开(公告)日：2005-04-12
申请号：US10380248
申请日：2001-10-04
申请人： Tokudai Neda , Yasuharu Yokoi , Kenji Maeda , Kenji Horiuchi , Satoshi Yamashita
发明人： Tokudai Neda , Yasuharu Yokoi , Kenji Maeda , Kenji Horiuchi , Satoshi Yamashita
IPC分类号： G01N21/35 , G01N21/65 , G06K7/10 , G06K19/06 , G07D7/12 , G07F7/12 , G06K9/74
CPC分类号： G01N21/3563 , G01N21/65 , G06K7/10 , G06K19/06 , G07D7/1205
摘要： A nondestructive reading method for an isotopic label, capable of easily and quickly reading information on an isotopic label imparted to an article in advance without destroying the label, and a nondestructive reading-use isotopic label suitably using this method. In addition, information obtained by this nondestructive reading method is used to easily and quickly judge the authenticity of an article.
摘要翻译：用于同位素标签的非破坏性阅读方法，能够容易且快速地读取预先赋予物品的同位素标签上的信息而不破坏标签，以及适当地使用该方法的非破坏性阅读用同位素标签。另外，通过这种非破坏性阅读方法获得的信息用于容易且快速地判断物品的真实性。

37. 发明授权

US06755935B2 Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US06755935B2
公开(公告)日：2004-06-29
申请号：US09793443
申请日：2001-02-27
申请人： Hideyuki Kazumi , Ichiro Sasaki , Kenji Maeda , Tsutomu Tetsuka , Hironobu Kawahara
发明人： Hideyuki Kazumi , Ichiro Sasaki , Kenji Maeda , Tsutomu Tetsuka , Hironobu Kawahara
IPC分类号： H01L213065
CPC分类号： H01J37/32082 , H01J37/32541
摘要： A plasma processing apparatus has a vacuum vessel, a processing chamber arranged in the vacuum vessel and supplied with gas, a support electrode arranged in the processing chamber to support an object to be processed, a radio frequency providing unit for supplying a radio frequency in UHF or VHF band, and a magnetic field generating unit for generating a magnetic field in the processing chamber, wherein the radio frequency providing unit includes an antenna having a groove or step formed in its surface opposing the process object, whereby plasma of high density and high uniformity can be generated in a wide parameter region.
摘要翻译：等离子体处理装置具有真空容器，设置在真空容器中并供给气体的处理室，布置在处理室中的支撑电极，以支撑被处理物体;射频提供单元，用于在UHF中提供射频或VHF频带，以及用于在处理室中产生磁场的磁场产生单元，其中所述射频提供单元包括在其与所述处理对象相对的表面中形成有凹槽或台阶的天线，由此形成高密度和高的等离子体可以在宽参数区域中产生均匀性。

38. 发明授权

US06629182B1 Electronic device and docking system and power control system therefor 失效
标题翻译：电子设备和对接系统及其电源控制系统
公开(公告)号：US06629182B1
公开(公告)日：2003-09-30
申请号：US09122325
申请日：1998-07-24
申请人： Shigeru Mizoguchi , Kenji Maeda , Jun Oida
发明人： Shigeru Mizoguchi , Kenji Maeda , Jun Oida
IPC分类号： G06F100
CPC分类号： G06F1/3228 , G06F1/1632 , G06F1/263
摘要： In an electronic device capable of being driven on a battery, there is provided a docking system configuration in which a docking unit mainly serving as an extension can be attached/detached to/from a master unit by using a system bus as a bridge. The docking unit is adapted to operate alone upon start-up of a power source even while being detached from the master unit. In each of the master unit and the docking unit, detection is made for whether the units are docked each other and for whether a residual capacity of a driving battery in steps is decreased. When it is detected that the residual capacity of the driving battery is decreased, either of operation suspending processing or operation end processing is selectively executed.
摘要翻译：在能够在电池上驱动的电子设备中，提供了一种对接系统配置，其中主要用作扩展的对接单元可以通过使用系统总线作为桥连接/从主单元分离。对接单元适于在启动电源时单独操作，即使在与主单元分离时也是如此。在主单元和对接单元中的每一个中，检测单元是否彼此对接，以及是否减少了步进的驱动电池的剩余容量。当检测到驱动电池的剩余容量减小时，选择性地执行操作暂停处理或操作结束处理中的任一个。

39. 发明授权

US06624084B2 Plasma processing equipment and plasma processing method using the same 失效
标题翻译：等离子体处理设备和等离子体处理方法使用相同
公开(公告)号：US06624084B2
公开(公告)日：2003-09-23
申请号：US09741996
申请日：2000-12-22
申请人： Kenji Maeda , Yutaka Omoto , Ichiro Sasaki , Hironobu Kawahara
发明人： Kenji Maeda , Yutaka Omoto , Ichiro Sasaki , Hironobu Kawahara
IPC分类号： H01L2100
CPC分类号： H01J37/32082 , H01J37/32623 , H01J37/32697
摘要： In plasma processing equipment having a vacuum processing chamber, a plasma generation means, a stage for loading a wafer to be processed in the vacuum processing chamber, an opposing electrode having an area almost equal to or wider than the aforementioned wafer which is installed opposite to the stage, and a bias power source for applying a high frequency bias to the wafer, a current path correction means is provided for correcting the current path part in the neighborhood of the outer periphery of the wafer among the high frequency current paths produced by the high frequency bias so as to be directed toward the wafer opposing surface of the opposing electrode.
摘要翻译：在具有真空处理室的等离子体处理设备中，等离子体产生装置，用于在真空处理室中装载待处理的晶片的阶段，具有几乎等于或大于上述晶片的面积的对置电极，该级和用于向晶片施加高频偏压的偏压电源，提供电流路径校正装置，用于校正由该晶体管产生的高频电流路径中的晶片外周附近的电流路径部分高频偏压以指向相对电极的晶片相对表面。

40. 发明授权

US06582991B1 Semiconductor device and method for fabricating the same 失效
公开(公告)号：US06582991B1
公开(公告)日：2003-06-24
申请号：US09886997
申请日：2001-06-25
申请人： Kenji Maeda , Takashi Takata , Takao Ochi , Hiroki Naraoka , Takeshi Kawabata , Yoshiyuki Arai , Shigeru Nonoyama , Hajime Homma
发明人： Kenji Maeda , Takashi Takata , Takao Ochi , Hiroki Naraoka , Takeshi Kawabata , Yoshiyuki Arai , Shigeru Nonoyama , Hajime Homma
IPC分类号： H01L2144
CPC分类号： H05K1/186 , H01L24/81 , H01L24/83 , H01L24/97 , H01L25/0652 , H01L25/0657 , H01L25/50 , H01L2224/1134 , H01L2224/131 , H01L2224/13144 , H01L2224/13155 , H01L2224/16225 , H01L2224/2919 , H01L2224/32225 , H01L2224/73204 , H01L2224/81191 , H01L2224/83101 , H01L2224/83102 , H01L2224/83192 , H01L2224/92125 , H01L2224/97 , H01L2924/00013 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01078 , H01L2924/01079 , H01L2924/014 , H01L2924/0665 , H01L2924/15787 , H01L2924/18161 , H01L2924/19041 , H01L2924/19043 , H01L2924/3511 , H01L2224/81 , H01L2224/83 , H01L2924/00014 , H01L2224/13099 , H01L2924/00 , H01L2924/00012
摘要： A semiconductor chip is mounted on a first surface of a substrate, the substrate having wiring formed on the first surface, so that a circuit formation surface of the semiconductor chip faces the first surface of the substrate and that electrodes provided on the circuit formation surface are connected with the wiring. A sealing resin layer is then formed on the first surface of the substrate to cover the semiconductor chip. The sealing resin layer and the semiconductor chip are ground starting from a surface opposite to the circuit formation surface to thin the semiconductor chip.

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