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    • 33. 发明授权
    • LCD aperture ratios
    • LCD开口率
    • US07843518B2
    • 2010-11-30
    • US11975968
    • 2007-10-22
    • Sung-Hoon YangSo-Woon KimChong-Chul ChaiChang-Oh JeongEun-Guk LeeJe-Hun Lee
    • Sung-Hoon YangSo-Woon KimChong-Chul ChaiChang-Oh JeongEun-Guk LeeJe-Hun Lee
    • G02F1/1343
    • G02F1/136213G02F1/136227G02F2201/40
    • A display substrate includes respective pluralities of gate lines, data lines, switching elements, storage lines, pixel electrodes, and an organic insulation layer. The gate lines and the data lines define a plurality of unit pixels. The storage lines are respectively formed adjacent to the respective drain electrodes of the respective switching elements of respective rows of the unit pixels. The organic insulation layer has a hole that is formed within the area of each of the unit pixels and that extends from a contact area formed at a portion of the corresponding drain electrode of the pixel to a portion corresponding to the storage line thereof. This arrangement enables the marginal area needed to prevent mismatch of the hole in the areas of the contact area and the storage line to be reduced, thereby increasing the aperture ratio of the display.
    • 显示基板包括多条栅极线,数据线,开关元件,存储线,像素电极和有机绝缘层。 栅极线和数据线限定多个单位像素。 存储线分别形成为与各行的单位像素的各个开关元件的各个漏电极相邻。 有机绝缘层具有形成在每个单位像素的区域内的孔,并且从形成在像素的相应漏电极的一部分的接触区域延伸到对应于其存储线的部分。 这种布置使得能够减小接触区域和存储线的区域中的孔的失配所需的边缘区域,从而增加显示器的开口率。
    • 34. 发明授权
    • Thin film transistor array panel and method for manufacturing the same
    • 薄膜晶体管阵列面板及其制造方法
    • US07352004B2
    • 2008-04-01
    • US11249500
    • 2005-10-14
    • Je-Hun LeeYang-Ho BaeBeom-Seok ChoChang-Oh Jeong
    • Je-Hun LeeYang-Ho BaeBeom-Seok ChoChang-Oh Jeong
    • H01L29/04H01L29/10H01L31/00
    • H01L27/3279H01L27/124H01L27/1288H01L51/0023H01L51/56
    • The invention provides a thin film transistor (TFT) array panel that includes an insulating substrate; a gate line formed on the insulating substrate and having a first layer of an Al containing metal, a second layer of a Cu containing metal that is thicker than the first layer, and a gate electrode; a gate insulating layer arranged on the gate line; a semiconductor arranged on the gate insulating layer; a data line having a source electrode and arranged on the gate insulating layer and the semiconductor; a drain electrode arranged on the gate insulating layer and the semiconductor and facing the source electrode; a passivation layer having a contact hole and arranged on the data line and the drain electrode; and a pixel electrode arranged on the passivation layer and coupled with the drain electrode through the contact hole.
    • 本发明提供一种薄膜晶体管(TFT)阵列面板,其包括绝缘基板; 形成在所述绝缘基板上并具有含有Al的金属的第一层,比所述第一层更厚的含Cu金属的第二层的栅极线和栅电极; 栅极绝缘层,布置在栅极线上; 布置在栅绝缘层上的半导体; 数据线,其具有源电极并且布置在所述栅极绝缘层和所述半导体上; 布置在所述栅绝缘层和所述半导体上并面对所述源电极的漏电极; 钝化层,其具有接触孔并且布置在所述数据线和所述漏电极上; 以及设置在钝化层上并通过接触孔与漏电极耦合的像素电极。
    • 36. 发明授权
    • Thin film transistor array panel and manufacturing method thereof
    • 薄膜晶体管阵列面板及其制造方法
    • US08207534B2
    • 2012-06-26
    • US12417280
    • 2009-04-02
    • Je-Hun LeeSung-Jin KimHee-Joon KimChang-Oh Jeong
    • Je-Hun LeeSung-Jin KimHee-Joon KimChang-Oh Jeong
    • H01L29/786
    • G02F1/13439G02F1/13458H01L27/12H01L27/124H01L29/458H01L29/4908
    • A thin film transistor array panel is provided, which includes a substrate, a plurality of gate line formed on the substrate, a plurality of common electrodes having a transparent conductive layer on the substrate, a gate insulating layer covering the gate lines and the common electrodes, a plurality of semiconductor layers formed on the gate insulating layer, a plurality of data lines including a plurality of source electrodes and formed on the semiconductor layer and the gate insulating layer, a plurality of drain electrodes formed on the semiconductor layer and the gate insulating layer, and a plurality of pixel electrodes overlapping the common electrodes and connected to the drain electrodes. Because the common electrodes are made of ITON, IZON, or a-ITON, or a double layer of ITO/ITON, IZO/IZON, or a-a-ITO/a-ITON, when H2 or SiH4 are injected to form a silicon nitride (SiNX) layer on the common electrodes, the opaque metal Sn or Zn in which the metal component is reduced in the IZO, ITO, or a-ITO is not produced on the surfaces of the common electrode.
    • 提供薄膜晶体管阵列面板,其包括基板,形成在基板上的多个栅极线,在基板上具有透明导电层的多个公共电极,覆盖栅极线和公共电极的栅极绝缘层 形成在所述栅极绝缘层上的多个半导体层,形成在所述半导体层和所述栅极绝缘层上的多个源极电极的多条数据线,形成在所述半导体层上的多个漏电极和所述栅极绝缘体 并且与公共电极重叠并连接到漏电极的多个像素电极。 由于公共电极由ITON,IZON或者-IONON制成,或者是将双重层的ITO / ITON,IZO / IZON或者a-ITO / a-ITON,当注入H 2或SiH 4以形成氮化硅时 SiNX)层,在公共电极的表面上不产生在IZO,ITO或ITO中还原金属成分的不透明金属Sn或Zn。
    • 37. 发明申请
    • THIN FILM TRANSISTOR ARRAY PANEL AND MANUFACTURING METHOD THEREOF
    • 薄膜晶体管阵列及其制造方法
    • US20110284857A1
    • 2011-11-24
    • US13204553
    • 2011-08-05
    • Je-Hun LEESung-Jin KimHee-Joon KimChang-Oh Jeong
    • Je-Hun LEESung-Jin KimHee-Joon KimChang-Oh Jeong
    • H01L27/088H01L21/84
    • G02F1/13439G02F1/13458H01L27/12H01L27/124H01L29/458H01L29/4908
    • A thin film transistor array panel is provided, which includes a substrate, a plurality of gate line formed on the substrate, a plurality of common electrodes having a transparent conductive layer on the substrate, a gate insulating layer covering the gate lines and the common electrodes, a plurality of semiconductor layers formed on the gate insulating layer, a plurality of data lines including a plurality of source electrodes and formed on the semiconductor layer and the gate insulating layer, a plurality of drain electrodes formed on the semiconductor layer and the gate insulating layer, and a plurality of pixel electrodes overlapping the common electrodes and connected to the drain electrodes. Because the common electrodes are made of ITON, IZON, or a-ITON, or a double layer of ITO/ITON, IZO/IZON, or a-a-ITO/a-ITON, when H2 or SiH4 are injected to form a silicon nitride (SiNX) layer on the common electrodes, the opaque metal Sn or Zn in which the rmetal component is reduced in the IZO, ITO, or a-ITO is not produced on the surfaces of the common electrode.
    • 提供薄膜晶体管阵列面板,其包括基板,形成在基板上的多个栅极线,在基板上具有透明导电层的多个公共电极,覆盖栅极线和公共电极的栅极绝缘层 形成在所述栅极绝缘层上的多个半导体层,形成在所述半导体层和所述栅极绝缘层上的多个源极电极的多条数据线,形成在所述半导体层上的多个漏电极和所述栅极绝缘体 并且与公共电极重叠并连接到漏电极的多个像素电极。 由于公共电极由ITON,IZON或者-IONON制成,或者是将双重层的ITO / ITON,IZO / IZON或者a-ITO / a-ITON,当注入H 2或SiH 4以形成氮化硅时 SiNX)层,在公共电极的表面上不产生在IZO,ITO或ITO中还原金属成分的不透明金属Sn或Zn。
    • 40. 发明授权
    • TFT substrate and display device having the same
    • TFT基板和具有该TFT基板的显示装置
    • US07741641B2
    • 2010-06-22
    • US11371057
    • 2006-03-08
    • Yang-Ho BaeChang-Oh JeongMin-Seok OhJe-Hun LeeBeom-Seok Cho
    • Yang-Ho BaeChang-Oh JeongMin-Seok OhJe-Hun LeeBeom-Seok Cho
    • H01L29/43H01L29/786
    • H01L29/4908H01L27/124H01L29/458
    • A TFT substrate includes a base substrate, a gate wiring formed on the base substrate, a gate insulation layer, an activation layer, an oxidation-blocking layer, a data wiring, a protection layer and a pixel electrode. The gate wiring includes a gate line and a gate electrode. The gate insulation layer is formed on the base substrate to cover the gate wiring. The activation layer is formed on the gate insulation layer. The oxidation-blocking layer is formed on the activation layer. The data wiring includes a data line, a source electrode and a drain electrode. The source and drain electrodes are disposed on the oxidation-blocking layer therefore lowering the on-current (“Ion”) for turning on the TFT and increasing the off-current (“Ioff”) for turning off the TFT due to the oxidation-blocking layer.
    • TFT基板包括基底基板,形成在基底基板上的栅极布线,栅极绝缘层,激活层,氧化阻挡层,数据布线,保护层和像素电极。 栅极布线包括栅极线和栅电极。 栅极绝缘层形成在基底基板上以覆盖栅极布线。 活化层形成在栅绝缘层上。 氧化阻挡层形成在活化层上。 数据线包括数据线,源电极和漏电极。 源电极和漏电极设置在氧化阻挡层上,因此降低用于导通TFT的导通电流(“Ion”),并且由于氧化阻挡层而增加关闭TFT的截止电流(“Ioff”), 阻挡层。