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    • 31. 发明授权
    • Laser diode and method for fabricating same
    • 激光二极管及其制造方法
    • US07769066B2
    • 2010-08-03
    • US11600604
    • 2006-11-15
    • Arpan ChakrabortyMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • Arpan ChakrabortyMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • H01S5/00
    • H01S5/34333B82Y20/00H01S5/2004H01S5/3406
    • A laser diode and method for fabricating same, wherein the laser diode generally comprises an InGaN compliance layer on a GaN n-type contact layer and an AlGaN/GaN n-type strained super lattice (SLS) on the compliance layer. An n-type GaN separate confinement heterostructure (SCH) is on said n-type SLS and an InGaN multiple quantum well (MQW) active region is on the n-type SCH. A GaN p-type SCH on the MQW active region, an AlGaN/GaN p-type SLS is on the p-type SCH, and a p-type GaN contact layer is on the p-type SLS. The compliance layer has an In percentage that reduces strain between the n-type contact layer and the n-type SLS compared to a laser diode without the compliance layer. Accordingly, the n-type SLS can be grown with an increased Al percentage to increase the index of refraction. This along with other features allows for reduced threshold current and voltage operation.
    • 一种激光二极管及其制造方法,其中激光二极管通常包括在GaN n型接触层上的InGaN柔性层和在柔性层上的AlGaN / GaN n型应变超晶格(SLS)。 n型GaN分离限制异质结构(SCH)在所述n型SLS上,并且InGaN多量子阱(MQW)有源区在n型SCH上。 在MQW有源区上的GaN p型SCH,AlGaN / GaN p型SLS在p型SCH上,p型GaN接触层在p型SLS上。 顺应层具有与不具有柔顺层的激光二极管相比,n型接触层和n型SLS之间的应变的In百分比。 因此,n型SLS可以以增加的Al百分数生长以增加折射率。 这与其他功能一起允许降低阈值电流和电压操作。
    • 34. 发明授权
    • Laser diode and method for fabricating same
    • 激光二极管及其制造方法
    • US08679876B2
    • 2014-03-25
    • US12826305
    • 2010-06-29
    • Arpan ChakrabortyMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • Arpan ChakrabortyMonica HansenSteven DenbaarsShuji NakamuraGeorge Brandes
    • H01L21/00
    • H01S5/34333B82Y20/00H01S5/2004H01S5/3406
    • A laser diode and method for fabricating same, wherein the laser diode generally comprises an InGaN compliance layer on a GaN n-type contact layer and an AlGaN/GaN n-type strained super lattice (SLS) on the compliance layer. An n-type GaN separate confinement heterostructure (SCH) is on said n-type SLS and an InGaN multiple quantum well (MQW) active region is on the n-type SCH. A GaN p-type SCH on the MQW active region, an AlGaN/GaN p-type SLS is on the p-type SCH, and a p-type GaN contact layer is on the p-type SLS. The compliance layer has an In percentage that reduces strain between the n-type contact layer and the n-type SLS compared to a laser diode without the compliance layer. Accordingly, the n-type SLS can be grown with an increased Al percentage to increase the index of refraction. This along with other features allows for reduced threshold current and voltage operation.
    • 一种激光二极管及其制造方法,其中激光二极管通常包括在GaN n型接触层上的InGaN柔性层和在柔性层上的AlGaN / GaN n型应变超晶格(SLS)。 n型GaN分离限制异质结构(SCH)在所述n型SLS上,并且InGaN多量子阱(MQW)有源区在n型SCH上。 在MQW有源区上的GaN p型SCH,AlGaN / GaN p型SLS在p型SCH上,p型GaN接触层在p型SLS上。 顺应层具有与不具有柔顺层的激光二极管相比,n型接触层和n型SLS之间的应变的In百分比。 因此,n型SLS可以以增加的Al百分数生长以增加折射率。 这与其他功能一起允许降低阈值电流和电压操作。
    • 36. 发明授权
    • Susceptor apparatus for inverted type MOCVD reactor
    • 反型MOCVD反应器的受体装置
    • US08366830B2
    • 2013-02-05
    • US10382198
    • 2003-03-04
    • Shuji NakamuraSteven DenBaarsMax BatresMichael Coulter
    • Shuji NakamuraSteven DenBaarsMax BatresMichael Coulter
    • H01L21/00C23C14/00C23C16/00
    • C23C16/4584C23C16/4581C23C16/46C30B25/10C30B25/12
    • The present invention discloses a susceptor mounting assembly for holding semiconductor wafers in an MOCVD reactor during growth of epitaxial layers on the wafers, that is particularly adapted for mounting a susceptor in an inverted type reactor chamber. It includes a tower having an upper and lower end with the upper end mounted to the top inside surface of the reactor chamber and a susceptor is arranged at the tower's lower end. Semiconductor wafers are held adjacent to the susceptor such that heat from the susceptor passes into wafers. A second embodiment of a susceptor mounting assembly according to the invention also comprises a tower having an upper and lower end. The tower's upper end is mounted to the top inside surface of the reactor chamber. A susceptor is housed within a cup and the cup is mounted to the tower's lower end.
    • 本发明公开了一种用于在晶圆上生长外延层期间将半导体晶片保持在MOCVD反应器中的基座安装组件,其特别适用于将基座安装在倒置型反应室中。 它包括具有上端和下端的塔,其上端安装到反应室的顶部内表面,并且基座设置在塔的下端。 半导体晶片被保持在基座附近,使得来自基座的热量进入晶片。 根据本发明的基座安装组件的第二实施例还包括具有上端和下端的塔。 塔的上端安装在反应室的顶部内表面。 托架被容纳在一个杯子内,杯子安装在塔的下端。