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    • 39. 发明专利
    • CHARGED PARTICLE BEAM-IRRADIATING DEVICE
    • JP2001033599A
    • 2001-02-09
    • JP20866699
    • 1999-07-23
    • HITACHI LTD
    • TAKEUCHI KAZUHIROKAWAKUBO YUKIOSATO TADASHI
    • H01J37/301G21K5/00G21K5/04
    • PROBLEM TO BE SOLVED: To suppress the melting of an opening for suppressing the enlargement of an opening diameter and to suppress the load of a differential exhaust system by providing cooling structure at the opening of the partition between the acceleration chamber and the irradiation chamber of charged particle beams for lowering temperature. SOLUTION: For example, in the electron beam-irradiating device used for manufacturing a semiconductor, for example, a cooling pipe 10 is provided while adhering to an opening 5 by a support tool 11 for cooling the surrounding of the beam opening 5 and is guided to a cooling device 12 for circulating and cooling a refrigerant, thus decreasing the temperature of the opening 5, for example, to approximately 1,300 deg.C for preventing the melting of a partition and avoiding the increase in the load of a differential exhaust device 9. Temperature is measured by emission of light near the opening 5, and the flow rate of the refrigerant of the cooling device 12 is controlled. Also, a fin may be welded to the opening 5, for example copper with a high thermal conductivity may be welded to a material such as titanium near the opening 5, and coating thickness near the opening 5 may be changed according to a specified form.